| Literature DB >> 35965698 |
Fatemeh Farzaneh1, Mahshid Mohammadi-Bassir1, Mohammad Bagher Rezvani1, Fahimeh Dehestani Ardakani2.
Abstract
Objective: Finishing and polishing (F/P) of composites is a fundamental step influencing the clinical service of restorations. The aim of this study was to evaluate the effect of different F/P systems on surface roughness, gloss, and polish retention of composite resins. Materials andEntities:
Keywords: Composite Resins; Dental Polishing; Materials Testing; Surface Properties
Year: 2021 PMID: 35965698 PMCID: PMC9355858 DOI: 10.18502/fid.v18i39.7608
Source DB: PubMed Journal: Front Dent ISSN: 2676-296X
Description of materials
| Composition | Manufacturer | |
|---|---|---|
| Filtek Z350 XT | Filler: Silica and zirconia (clusters of 0.6-1.4 µm and | 3M ESPE, St. Paul, |
| Filtek Z250 | Filler type: Pyrogenic silicic acid (0.02-0.04 µm) | 3M ESPE, St. Paul, |
| Renamel | Filler: Pyrogenic silicic acid (0.02-0.04 µm) | Cosmedent, |
| Shofu composite polishing system (4-step) | 1.Green stone: Silicon carbide abrasive | Shofu, Kyoto, Japan |
| Sof-Lex composite | Aluminum oxide particles: | 3M, ESPE, St. Paul, |
| Cosmedent composite | Diamond particles, silicon dioxide matrix | Cosmedent, Chicago, |
| Diacomp twist composite | Diamond particles, silicon dioxide matrix | EVE |
| Opti1Step composite | Diamond and Silicon carbide particles, silicon dioxide matrix | Kerr Hawe, Bioggio, |
| pH-cycling solution | Demineralization solution: | Razi, Tehran, Iran |
| Crest 7 Complete tooth | Sorbitol, water, hydrated silica, disodium | Gross Greau, |
Mean ± SD of surface roughness (Ra and Rz values in µm) in 15 experimental groups before (1) and after (2) pH-cycling and tooth brushing
| Renamel | Z350 | Z250 | ||||
|---|---|---|---|---|---|---|
| 1 | 2 | 1 | 2 | 1 | 2 | |
|
| ||||||
|
| 0.62±0.2 | 1.27±0.49 | 0.45±0.17 | 1.00±0.43 | 0.92±0.35 | 0.77±0.23 |
|
| 1.55±0.58 | 3.15±1.75 | 1.22±0.74 | 3.70±1.29 | 2.4±0.73 | 2.47±1.41 |
|
| ||||||
|
| 0.57±0.22 | 0.52±0.2 | 0.60±0.24 | 0.95±0.83 | 0.67±0.12 | 0.60±0.08 |
|
| 1.02±0.27 | 1.17±0.62 | 1.50±0.72 | 2.00±1.61 | 1.70±0.74 | 1.15±0.17 |
|
| ||||||
|
| 0.47±0.15 | 0.92±0.4 | 0.46±0.31 | 0.37±0.3 | 0.50±0.2 | 0.42±0.09 |
|
| 1.65±0.73 | 2.47±1.27 | 1.04±0.33 | 1.02±0.73 | 1.78±0.5 | 2±0.8 |
|
| ||||||
|
| 0.70±0.21 | 0.85±0.61 | 0.80±0.47 | 1.10±0.67 | 0.8±0 | 0.80±0.29 |
|
| 3.52±1.61 | 3.57±2.52 | 3.22±1.2 | 5.50±2.35 | 2.50±1.12 | 2.50±0.68 |
|
| ||||||
|
| 0.32±0.12 | 0.30±0.23 | 0.47±0.37 | 0.45±0.36 | 0.20±0.11 | 0.20±0.17 |
|
| 1.37±0.69 | 1.12±0.84 | 2.27±1.95 | 1.60±1.22 | 1.20±0.47 | 1.20±1.15 |
Co: Cosmedent; Sh: Shofu; Op: Opti1Step; SL: Sof-Lex; Di: Diacomp
Different superscripted letters (Ra: lowercase and Rz: uppercase) in the same column show significant differences (P<0.001)
Mean ± SD surface gloss values (GU) in 15 experimental groups before (1) and after (2) pH-cycling and toothbrushing
| Renamel | Z350 | Z250 | ||||
|---|---|---|---|---|---|---|
| 1 | 2 | 1 | 2 | 1 | 2 | |
| SL | 35.9±5.21 | 0.27±5.28 | 35.53±3.16 | 21.66±4.79 | 17.83±4.77 | 22.73±8.82 |
| Di | 21.76±2.92 | 23±7.18 | 51.4±4.13 | 31.06±4.92 | 34.26±3.25 | 25.16±1.05 |
| Co | 45.03±1.93 | 20.4±2.26 | 42.76 | 18±2.1 | 27.3±1.21 | 17.76±0.4 |
| Sh | 27.86±1.59 | 13.66±1.67 | 39.6±1.53 | 25.8±4.14 | 16.76±2.06 | 12.56±4.8 |
| Op | 33.53±2.6 | 17.53±2.53 | 28.6±2.12 | 24.53±13.38 | 27.66±5.7 | 22.63±9.42 |
GU: Gloss unit; Co: Cosmedent; Sh: Shofu; Op: Opti1Step; SL: Sof-Lex; Di: Diacomp
Fig. 1Scanning electron micrograph of the surface of a Renamel specimen after polishing with Cosmedent system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. In all magnifications, a tenacious resinous smear layer can be seen that formed during polishing
Fig. 2Scanning electron micrograph of the surface of a Z250 specimen after polishing with Cosmedent system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. In all magnifications, removal of some rein matrix is seen
Fig. 3Scanning electron micrograph of the surface of a Renamel specimen after polishing with Diacomp system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. In all magnifications, a homogenous and tenacious resinous smear layer can be seen that formed during polishing. In ×700 magnification, some rubber remnants are seen
Fig. 4Scanning electron micrograph of the surface of a Renamel specimen after polishing with Opti1Step system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. In all magnifications, a homogenous and tenacious resinous smear layer can be seen that formed during polishing. At ×700 magnification, some rubber remnants are seen
Fig. 5Scanning electron micrograph of the surface of a Renamel specimen after polishing with Shofu system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. In all magnifications, a tenacious resinous smear layer that formed during polishing and some striations can be seen
Fig. 6Scanning electron micrograph of the surface of a Renamel specimen after polishing with Sof-Lex system. (a) Original magnification ×300. (b) Original magnification ×700. (c) Original magnification ×3000. Some multidirectional lines in all magnifications can be seen