| Literature DB >> 24121338 |
Kazuya Hasegawa1, Nobutaka Shimizu, Hideo Okumura, Nobuhiro Mizuno, Seiki Baba, Kunio Hirata, Tomoyuki Takeuchi, Hiroshi Yamazaki, Yasunori Senba, Haruhiko Ohashi, Masaki Yamamoto, Takashi Kumasaka.
Abstract
SPring-8 BL41XU is a high-flux macromolecular crystallography beamline using an in-vacuum undulator as a light source. The X-rays are monochromated by a liquid-nitrogen-cooling Si double-crystal monochromator, and focused by Kirkpatrick-Baez mirror optics. The focused beam size at the sample is 80 µm (H) × 22 µm (V) with a photon flux of 1.1 × 10(13) photons s(-1). A pinhole aperture is used to collimate the beam in the range 10-50 µm. This high-flux beam with variable size provides opportunities not only for micro-crystallography but also for data collection effectively making use of crystal volume. The beamline also provides high-energy X-rays covering 20.6-35.4 keV which allows ultra-high-resolution data to be obtained and anomalous diffraction using the K-edge of Xe and I. Upgrade of BL41XU for more rapid and accurate data collection is proceeding. Here, details of BL41XU are given and an outline of the upgrade project is documented.Entities:
Keywords: SPring-8; high-energy beam; high-flux beam; macromolecular crystallography; micro-crystallography
Year: 2013 PMID: 24121338 PMCID: PMC3795554 DOI: 10.1107/S0909049513022176
Source DB: PubMed Journal: J Synchrotron Radiat ISSN: 0909-0495 Impact factor: 2.616
Figure 1(a) Schematic of the optics layout of BL41XU showing distances from the light source. (b) Design of the new optics layout for the upgrade project. The slit in the experimental hutch 1 (EH1) is a high-precision slit which defines the virtual source size. The dotted-line rectangle in EH1 shows where the second diffractometer will be installed for the high-energy mode. ID, insertion device; FE slit, front-end slit; DCM, double-crystal monochromator; HM, horizontal-focusing mirror; VM, vertical-focusing mirror.
Beamline details
| Beamline name | BL41XU |
| Source type | In-vacuum undulator |
| Monochromator | Double-crystal Si(111) liquid-nitrogen-cooled |
| Energy range | 6.5–17.5 keV (LEM), 20.6–35.4 keV (HEM) |
| Wavelength range | 0.71–1.9 Å (LEM), 0.35–0.6 Å (HEM) |
| Mirrors | Rh-coated Si, 700 mm (H), 400 mm (V) |
| Beam size without pinhole (FWHM, H × V) | 80 µm × 22 µm (12.4 keV) |
| Photon flux without pinhole | 1.1 × 1013 photons s−1 (12.4 keV) |
| Goniometer | QKSU0 (KOHZU) |
| Cryo capability | CRYOCOOL-G2b-LT2 (Cryo Industries) |
| Sample mounting | SPACE |
| CCD detector | MX225HE (Rayonix) |
| Imaging-plate detector | RAXIS V (Rigaku) |
Figure 2(a) Pinhole unit and guard pipe equipped on the diffractometer. They are evacuated during sample mounting and sample centering. (b) The pinhole and the guard pipe are inserted into the beam path. (c) Pinhole unit disassembled into the pinhole disks, the base plate and the cover plate.
Figure 3Beam shape observed by a beam monitor placed at the sample position. The beam monitor is composed of a phosphor screen of 10 µm Gd2O2S:Tb, optical lens and a CCD camera. The pixel size of the image is 3 µm. The beam size is 15.1 µm × 13.6 µm, 21.2 µm × 17.3 µm, 24.9 µm × 18.4 µm and 44.5 µm × 21.4 µm (FWHM, H×V), respectively.
Figure 4Photon flux versus X-ray energy. The four-blade slits were used in HEM instead of pinholes because the high-energy X-rays penetrate the pinhole disks. The HEM data (20.6–35.4 keV) were obtained before the implementation of liquid-nitrogen cooling to the DCM, i.e a water-cooling system had been used.
Figure 5Experimental environment of BL41XU (a) inside the vacuum chamber located upstream of the diffractometer. (b) Magnified view around the sample position.