| Literature DB >> 32942676 |
Monika Topa1, Joanna Ortyl1,2.
Abstract
The photoinduced polymerization of monomers is currently an essential tool in various industries. The photopolymerization process plays an increasingly important role in biomedical applications. It is especially used in the production of dental composites. It also exhibits unique properties, such as a short time of polymerization of composites (up to a few seconds), low energy consumption, and spatial resolution (polymerization only in irradiated areas). This paper describes a short overview of the history and classification of different typical monomers and photoinitiating systems such as bimolecular photoinitiator system containing camphorquinone and aromatic amine, 1-phenyl-1,2-propanedione, phosphine derivatives, germanium derivatives, hexaarylbiimidazole derivatives, silane-based derivatives and thioxanthone derivatives used in the production of dental composites with their limitations and disadvantages. Moreover, this article represents the challenges faced when using the latest inventions in the field of dental materials, with a particular focus on photoinitiating systems based on iodonium salts. The beneficial properties of dental composites cured using initiation systems based on iodonium salts have been demonstrated.Entities:
Keywords: cationic photoinitiator; free radical photoinitiator; iodonium salt; light-cured composites; photopolymerization; polymerization shrinkage
Year: 2020 PMID: 32942676 PMCID: PMC7560344 DOI: 10.3390/ma13184093
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1Illustrative diagram showing the influence of factors on the quality of obtained dental composites.
Figure 2Mechanism of free radical polymerization and cationic ring-opening polymerization with their corresponding photoinitiation systems.
Figure 3Examples of methacrylate monomers used in commercial and conventional dental composites based on free radical photopolymerization mechanism.
Properties of the popular free radical monomers to obtained dental composites [84].
| Monomer | Molecular Weight [g/mol] | ρmona [g/cm3] | ρpolb [g/cm3] | ΔVp [%] | Viscosity [mPa·s] |
|---|---|---|---|---|---|
| TEGDMA | 286 | 1.072 | 1.250 | −14.3 | 100 |
| UDMA | 470 | 1.110 | 1.190 | −6.7 | 5000–10,000 |
| Bis-GMA | 512 | 1.151 | 1.226 | −6.1 | 500,000–800,000 |
ρmona—density of monomer, ρpolb—density of polymer.
Figure 4Examples of monomers used in cationic photopolymerization (a) oxirane, (b) spiro-orthocarbonate, (c) silorane: a merger of siloxanes and oxiranes.
Figure 5Comparison of the properties of monomers polymerizable via free radical mechanism with monomers polymerizable via cationic mechanism.
Figure 6The range of emission spectra of UV and visible light-curing units and the range of the absorption of standard co-initiators camphorquinone used in the dental application (UV—ultraviolet, LCU—light-curing units, LED—light-emitting diode, PAC—plasma arc).
Figure 7Comparison of the normalized molar extinction coefficient of standard type I initiators (top) and type II initiators together with amines (bottom) used in dental applications with the emission characteristics of standard light-curing units.
Figure 8The initiation mechanism using bimolecular photoinitiator system containing camphorquinone and aromatic amine; mechanism of reaction amine with oxygen.
Figure 9Color of a polymer composition composed of CQ (0.3 (wt.%)/EDB (0.5 wt.%) and BisGMA/TEGDMA (7:3) before and after photopolymerization.
Figure 10Structure of the photoinitiating system, based on CQ (0.3 (wt.%)/EMBO (0.5 wt.%) and (1) = 0.01 wt.%, (I1) = 4 wt.% or (1) = 0.02 wt.%, (I1) = 4 wt.%, which generates the brown color after photopolymerization.
Summary of the photoinitiators used in dental application, their basic properties, and photoinduced cleavage of photoinitiators.
| Acronym of Photoinitiator | Structure, Together with a Scheme | Maximum | Advantages | Disadvantages | Ref. |
|---|---|---|---|---|---|
| CQ |
| λmax = 468nm | wide absorption range based on the visible range | molar extinction coefficient in the range of 400–500 nm is only 40 [dm3 · mol–1 · cm–1], strongly yellow color | [ |
| PPD |
| λmax = 400nm | improve the color stability | necessary to use LED light sources with two violet emission bands (380–420 nm and blue 420–520 nm), dual peak LEDs | [ |
| TPO |
| λmax = 382nm | high efficiency of generating radicals, | low initiation efficiency, the need for UV light sources | [ |
| IVO |
| λmax = 445nm | no cytotoxicity, | initiators only for free radical polymerization | [ |
| HABI |
| display extended absorption tails well into the visible spectral region | effective in initiating thiol-ene photopolymerization | poor absorption in the visible spectrum, sometimes requiring a photosensitizer, low solubility in standard resins used in a dental application and low solubility in organic solvents | [ |
| Silane |
| ultraviolent strong absorption in the 300–350 nm region | very effective in free radical photopolymerization, witch iodonium salts or pyridinium can be used for cationic photopolymerization | need for UV light sources | [ |
|
| λmax = 425 nm | excellent bleaching properties, | low value of molar extinction | [ | |
|
| λmax = 486nm for SED1 | suitable for free radical photopolymerization exposure to blue (@ 455 nm) and even green (@ 520 nm) LED | not suitable for methacrylate photopolymerization | [ | |
|
| λmax = 442 nm in acetonitirle | excellent bleaching properties, a high water solubility, and a very good stability in acidic | not suitable for methacrylate photopolymerization | [ | |
| TX |
| λmax = ∼378 nm | water-soluble co-initiators, | generally, less reactive than CQ/amine system | [ |
Figure 11Structure of novel germanium derivatives.
Figure 12Synthetic pathway to obtain Ivocerin® product.
Figure 13Proposed reaction mechanism of germanium derivatives as a photoinitiator in the presence of monomers.
Figure 14Structures of different hexaarylbiimidazole (HABI) derivatives.
Figure 15The radical-mediated thiol–ene polymerization mechanism.
Figure 16Proposed mechanism of the photolysis of the carbon-nitrogen (C–N) bond between the imidazole rings of HABI.
Figure 17Photoinitiation process of type-II photoinitiator systems based on 2-chlorohexaarylbiimidazole (o-Cl-HABI) and various N-phenylglycine (NPG) derivatives.
Figure 18Proposed mechanism of formation cations from the photoinitiating system DKSi/iodonium salt.
Figure 19Chemical structures of the silane derivatives: TTMMS—tris (trimethylsilyl) silane; DKSi—tert-butyl (tert-butyldimethylsilyl) glyoxylate; Et-DKSi—ethyl (tert-butyldimethyl)silyl glyoxylate; Bn-DKSi—benzyl (tert-butyldimethyl)silyl glyoxylate; SED1—1-phenyl-2-(triisopropylsilyl)ethane-1,2-dione;SED2—1-(3,4,5-trimethoxyphenyl)-2-(triisopropylsilyl)ethane-1,2-dione; DKSi-COOH—2-oxo-2(tert-butyldimethylsilyl) acetic acid.
Figure 20Structure of QTX.
Figure 21Photodissociation of iodonium salts by the mechanism: A—heterolytic and B—homolytic.
Commercial iodonium photoinitiators used in industrial practice [196].
| Photoinitiator | Structure | Wavelength of Maximum Absorbance (λmax) [nm] |
|---|---|---|
| Iodonium Photoinitiators Generating Benzene | ||
| Hycure-810 (ChemFine) |
| 230–260 nm |
| Uvacure 1600 |
| 240 nm |
| Sarcat CD-1012 (Sartomer) |
| 240 nm |
| Iodonium Photoinitiators not Generating Benzene | ||
| OMNICAT 440 (IGM) |
| 267 nm |
| Irgacure 250 (Ciba) |
| 240–245 nm |
| UV 9310 (GE) |
| 240 nm |
| Rhodorsil 2076 (Rhodia) |
| 240 nm |
| Rhodorsil 2074 (Rhodia) |
| 240–250 nm |
| Sylanto-7MP |
| 350 nm |
| Sylanto-7MS |
| 349 nm |
Figure 22Comparison of the absorption characteristics of commercial iodonium photoinitiators with the emission characteristics of a commercially available dental lamp D -LIGHT® PR and photograph of the lamp.
Summary of the photoinitating systems consisting iodonium salt for free radical photopolymerization used in dental application.
| Photoinitiating Systems Based on Iodonium Salts | Reference of Photoinitiating System | Monomers/ | Influence of Addition Iodonium Salt/Properties of the Dental Composition with Iodonium Salt | Ref. |
|---|---|---|---|---|
| 1 mol% CQ + 0.25 mol% DPIHFP | 1 mol% CQ | 50 wt.% Bis-GMA | increase conversion in short photo-activation time | [ |
| 1 mol% CQ + 1 mol% EDAB + 1 mol% DPIHFP | 1 mol% CQ + 1 mol% EDAB | 50 wt.% Bis-GMA | reduce the inhibitory polymerization effect from an organic solvent | [ |
| 1 mol% CQ + 1 mol% DPIHFP | 1 mol% CQ | 50 wt.% Bis-GMA | improve dentin bonding performance | [ |
| 1 mol% CQ + 1 mol% EDAB + 1 mol% DPIHFP | 1 mol% CQ + 1 mol% EDAB | BisGMA:HEMA (60:40 wt.%) | increase conversion, | [ |
| 1 mol% BAPO + 1 mol% DPIHFP | 1 mol% BAPO | 50 wt.% Bis-GMA | highest polymerization and conversion rate for 1 mol% BAPO/1 mol% EDAB/1 mol% DPIHFP in short photo-activation time | [ |
| QTX + DPIHFP | QTX | 50 wt.% Bis-GMA, 25 wt.% TEGDMA | similar conversion rates as in the case of the standard two-component system (CQ + EDAB); lower reactivity | [ |
| 1 mol% CQ + 2 mol% DMAEMA/ | 1 mol% CQ/2 mol% DMAEMA | 20 wt.% Bis-GMA | improve the reactivity and mechanical properties | [ |
| 0.5, 1 or 2 mol% DPIHFP | commercially available dual-polymerizing self-adhesive resin cements: RelyX U100 (3M ESPE) and BisCem | increase the degree of conversion, microhardness and push-out bond strength | [ | |
| 0.5 mol% CQ + 0.5 mol% DPI | 0.5 mol% CQ | 25 wt.% BisGMA | improve flexural strength and modulus of elasticity, cohesive strength, as well as lower sorption and water solubility | [ |
| 0.25 wt.% CQ + 1 wt.% ETDA + 1 wt.% DPIHP | 0.25 wt.% CQ + 1 wt.% ETDA | 37 wt.% E-BisADM | enhance the degree of conversion, glass transition temperature (Tg) as well as resin permeability (rP). | [ |
| 1 part of CQ and 2 parts of OPPI | CQ only | 37.5 wt.% BisGMA | reduce initial color and improve color stability | [ |
| CQ + Ph3GeH + DPI | CQ + EDB + DPI | 70 wt.% Bis-GMA | excellent bleaching properties, | [ |
| 0.5 wt.% CQ + 1 wt.% IS1 | 0.5 wt.% CQ + 1 wt.% EDB | 30 wt.% BisGMA | excellent bleaching properties, | [ |
| 0.2 wt.% CQ + 0.5 wt.% EDB + 1 wt.% S5 | 0.2 wt.% CQ + 0.5 wt.% EDB | Spectrum® TPH®3 resin received from Dentsply Sirona | strongly oxygen-inhibited conditions, | [ |
| 0.5 wt.% CQ + 1 wt.% NaMeSP + 1 wt.% SC938 | 0.5 wt.% CQ + 1 wt.% NaMeSP | 30 wt.% BisGMA | excellent bleaching properties, | [ |
| 0.5 wt.% CQ + 1 wt.% DPPBS + 1 wt.% Iod | 0.5 wt.% CQ + 1 wt.% EDB | 30 wt.% BisGMA | oxygen inhibition | [ |
BisGMA—bisphenol glycidyl methacrylate; BisEMA/E-BisADM—ethoxylated Bisphenol A dimethacrylate; HEMA—2-hydroxyethyl methacrylate; TEGDMA—triethyleneglycol dimethacrylate; UDMA—urethane dimethacrylate; GDMA—1,3-glycerol dimethacrylate; DPIHFP/DPI/SC938—diphenyliodonium hexafluorophosphate; OPPI—p-octyloxy-phenyl-phenyl iodonium hexafluoroantimonate; DPIpTS—diphenyliodonium p-toluenesulfinate; S5—aryliodonium ylides; S6—aryliodonium ylides; IS1—phenyl(2,4,6-trimethoxyphenyl)iodonium p-toluenesulfonate; IS2—(4-methylphenyl)(2,4,6-trimethylphenyl)iodonium trifluoromethanesulfonate; IS3—bis(4-tert-butylphenyl) iodonium p-toluenesulfonate; IS4—3,5-dichlorophenyl)(2,4,6-trimethoxyphenyl)iodonium p-toluenesulfonate; IS5- bis(4-fluorophenyl)iodonium trifluoromethanesulfonate (IS5); CQ—camphorochinone; EDAB/ETDA—dimethylaminoethyl amine benzoate; PPD—1-phenyl-1,2-propanedione; BAPO—phenylbis (2,4,6-trimethylbenzoyl)-phosphine oxide; Ph3GeH—triphenylgermanium hydride; BARB—1,3-diethyl-2-thio-barbituric acid; QTX—2-hydroxy-3-(3,4dimethyl-9-oxo-9H-thioxanthen-2-yloxy)-N,N,N-trimethyl-1-propanaminium chloride; SULF—p-toluenesulfinic acid sodium salt hydrate; DMAEMA—2-dimethylaminoethyl methacrylate; NapTS—sodium p-toluenesulfinate; NaMeSP—sodium 1-methyl 3- sulfinopropanoate; ZnBnS zinc benzylsulfinate; NaAcABS—sodium 4-(acetylamino)benzenesulfinat; ZniPrS—zinc isopropylsulfinate; NaBuNS—sodium butylnaphtalenesulfinate; NapTSo—sodium p-toluenesulfonate; DPPBS—sodium 3-(diphenylphophino)benzenesulfonate.
Summary of the photoinitiating systems consisting of iodonium salt for cationic and IPN photopolymerization used in a dental application.
| Iodonium Salt | Other Co-initiators | Monomers | Properties | Ref. | ||
|---|---|---|---|---|---|---|
|
|
|
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| lowering of shrinkage | [ | |
| Rhodosil 2074 | CQ | EMBO | UV 30 | |||
|
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| greater decrease of volumetric shrinkage and better mechanical properties | [ | |||
| CQ | MTOSN | |||||
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| DMAEMA | BisS-GMA | |||||
|
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| lower shrinkage stress | [ | |||
| CQ | DPHA | |||||
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| Diol | EPS5000 | |||||
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| exceptional bleaching properties | [ | |
| DPI | (TMS)3SiH | DVE-3 | DEGVE | |||
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| SC938 | Ph3GeH | CHDVE | DODECYL VINYL ETHER | |||
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| PI 2074 | EDB | DEGDVE | VEEM | |||
|
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| higher initiation ability than the well-known CQ-based systems, but | [ | |||
| ANPQ | BisGMA | |||||
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| AATQ | TEGDMA | |||||
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| PANQ | EPOX | |||||