| Literature DB >> 23456599 |
Dongliang Liu1, Fang Liu, Jingwei He, Lippo V J Lassila, Pekka K Vallittu.
Abstract
A novel tertiary amine containing urethane dimethacrylate monomer UDMTA was synthesized with the aim of replacing Bis-GMA as one component of dental restorative materials. The structure of UDMTA was confirmed by FT-IR and (1)H-NMR spectra. UDMTA was incorporated into Bis-GMA/TEGDMA (50 wt%/50 wt%) resin system to replace Bis-GMA partly and totally. Double bond conversion, polymerization volumetric shrinkage, water sorption and solubility, flexural strength and modulus of UDMTA containing resin formulations were studied with neat Bis-GMA/TEGDMA resin formulation as a reference. Results showed that UDMTA could be used as a coinitiator in photocurable dental resin, UDMTA containing resin had higher double bond conversion and lower polymerization shrinkage than that of Bis-GMA/TEGDMA resin, and the UDMTA containing copolymer had higher flexural strength and flexural modulus than Bis-GMA/TEGDMA copolymer. When UDMTA was used to replace more than 25 wt% of Bis-GMA, the obtained copolymer had higher water sorption and solubility. The optimized resin composition is by replacing 25 wt% of Bis-GMA in Bis-GMA/TEGDMA (50/50 by wt%), for the prepared resin had the best comprehensive properties.Entities:
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Year: 2013 PMID: 23456599 DOI: 10.1007/s10856-013-4897-2
Source DB: PubMed Journal: J Mater Sci Mater Med ISSN: 0957-4530 Impact factor: 3.896