| Literature DB >> 31497332 |
Dong-Uk Park1, Sangjun Choi2, Seunghee Lee1, Dong-Hee Koh3, Hyoung-Ryoul Kim4, Kyong-Hui Lee5, Jihoon Park6.
Abstract
BACKGROUND: The aim of this study was to describe the types of diseases that developed in semiconductor workers who have registered with the Korea Workers' Compensation and Welfare Service (KWCWS) and to identify potential common occupational characteristics by the type of claimed disease.Entities:
Keywords: Chip assembly; Etching; Fabrication; Leukemia; Semiconductor operation
Year: 2019 PMID: 31497332 PMCID: PMC6717884 DOI: 10.1016/j.shaw.2019.03.003
Source DB: PubMed Journal: Saf Health Work ISSN: 2093-7911
Fig. 1Overall procedure for determining job-related disease. KWCWS, Korea Worker's Compensation and Welfare Service; OLDI, Occupational Lung Diseases Institute; OSHRI, Occupational Safety Health Research Institute.
Operational hierarchical level and health hazards in the semiconductor industry
| Major operation | Minor operation | Major health hazards |
|---|---|---|
| Fabrication operation | Epitaxy and oxidation | Gases and silanes |
| Photomasking and etching | Solvents, acids, alkalis, photoresists, developers, UV light | |
| Doping: diffusion and ion implantation | Gases, dopants, metals, X-ray, ELF-MF | |
| Deposition: chemical vapor deposition | Gases, dopants, ELF-MF | |
| Metallization | Dopants, metals, solvents | |
| Passivation | Silicon oxides and nitrides, aluminum oxide | |
| Testing | Chemicals in case of analysis for quality control | |
| Chip assembly operation | Wafer backgrind/saw | Fused silica, tetramethylammonium hydroxide (TMAH) |
| Die attach/wire bonding | Epoxy resins, ELF-MF | |
| Molding by epoxy | Epoxy resins | |
| Plating/marking/solder ball mounting | Chemicals from thermal decomposition of epoxy molding compound (EMC), flux | |
| Testing by hot and cold temperature | Chemicals from thermal decomposition of EMC, ELF-MF | |
| Nonfabrication | Office | — |
| Nonoffice operations | Supply chemical to fab clean room | |
| Wastewater treatment and so on |
ELF-MF, extremely low-frequency magnetic field; fab, fabrication.Name and classification of the operation may vary among plants.
Wafer size first manufactured by year at company “A.”
| Year | Wafer size first manufactured, inches (mm) |
|---|---|
| 1984 | 4 (50) |
| 1985 | 6 (150) |
| 1988 | 6 |
| 1989 | 6 |
| 1992 | 8 (200) |
| 1994 | 8 |
| 1995 | 8 |
| 1996 | 8 |
| 1999 | 8 |
| 2000 | 8 |
| 2001 | 8 and 12 (300) |
| 2003 | 12 |
Indicating only the year that a specific wafer size was first manufactured. For example, the oldest production line manufactured 4-inch wafers until the end of 2004. In 2003, most production lines still manufactured ≤ 8-inch wafers.
Distribution of registered workers (n = 55) by the type of disease and type of work characteristics
| Demographic and occupational classification | Leukemia | NHL | Other lymphohematopoietic disorder | Subtotal | Breast | Brain | Lung | Other cancers | Rare diseases | Total |
|---|---|---|---|---|---|---|---|---|---|---|
| Sex | ||||||||||
| Male | 8 | 2 | 2 | 12 | 0 | 1 | 3 | 2 | 3 | 21 |
| Female | 6 | 2 | 4 | 12 | 10 | 5 | 0 | 3 | 4 | 34 |
| Age | ||||||||||
| <29 | 5 | 2 | 3 | 10 | 0 | 1 | 0 | 1 | 3 | 15 |
| 30–34 | 2 | 0 | 1 | 3 | 4 | 3 | 0 | 1 | 0 | 11 |
| 35–39 | 3 | 1 | 2 | 6 | 1 | 1 | 2 | 2 | 3 | 15 |
| 40–44 | 1 | 0 | 0 | 1 | 3 | 1 | 1 | 1 | 0 | 7 |
| 45–49 | 2 | 0 | 0 | 2 | 0 | 0 | 0 | 0 | 1 | 3 |
| 50–54 | 1 | 1 | 0 | 2 | 1 | 0 | 0 | 0 | 0 | 3 |
| 55–59 | 0 | 0 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 1 |
| Type of operation | ||||||||||
| Fab | 10 | 1 | 3 | 14 | 6 | 2 | 3 | 3 | 6 | 34 |
| Chip | 4 | 2 | 3 | 9 | 4 | 4 | 0 | 2 | 0 | 19 |
| Outside clean room | 0 | 1 | 0 | 1 | 0 | 0 | 0 | 0 | 1 | 2 |
| Type of job | ||||||||||
| Operator | 7 | 2 | 4 | 13 | 10 | 5 | 0 | 3 | 4 | 35 |
| Maintenance | 6 | 2 | 2 | 10 | 0 | 1 | 3 | 2 | 3 | 19 |
| Product quality analysis | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Year first employed | ||||||||||
| <2000 | 8 | 1 | 2 | 11 | 7 | 3 | 2 | 5 | 5 | 33 |
| 2000–2005 | 4 | 2 | 3 | 9 | 1 | 3 | 1 | 0 | 1 | 15 |
| 2006–2010 | 1 | 0 | 1 | 2 | 2 | 0 | 0 | 0 | 0 | 4 |
| 2011–2015 | 1 | 1 | 0 | 2 | 0 | 0 | 0 | 0 | 1 | 3 |
| Duration employed, year | ||||||||||
| <=5 | 5 | 2 | 4 | 11 | 7 | 3 | 0 | 1 | 5 | 27 |
| 6–10 | 4 | 1 | 2 | 7 | 2 | 2 | 0 | 3 | 0 | 14 |
| 11–15 | 2 | 1 | 0 | 3 | 0 | 0 | 1 | 0 | 2 | 6 |
| 16–20 | 0 | 0 | 0 | 0 | 0 | 1 | 2 | 0 | 0 | 3 |
| >20 | 3 | 0 | 0 | 3 | 1 | 0 | 0 | 1 | 0 | 5 |
| Wafer size handled, inch | ||||||||||
| 4 | 2 | 0 | 0 | 2 | 0 | 2 | 1 | 0 | 1 | 6 |
| 6 | 5 | 0 | 1 | 6 | 2 | 0 | 0 | 2 | 1 | 11 |
| 8 | 1 | 1 | 1 | 3 | 4 | 0 | 2 | 1 | 4 | 14 |
| 12 | 2 | 0 | 1 | 3 | 0 | 0 | 0 | 0 | 0 | 3 |
| NA | 4 | 3 | 3 | 10 | 4 | 4 | 0 | 2 | 1 | 21 |
| Operation | ||||||||||
| Fab operation clean room | ||||||||||
| Etching | 1 | 1 | 1 | 3 | 1 | 1 | 2 | 0 | 0 | 7 |
| Photo | 0 | 0 | 1 | 1 | 1 | 0 | 1 | 2 | 2 | 7 |
| Implantation | 1 | 0 | 0 | 1 | 0 | 1 | 0 | 0 | 0 | 2 |
| Diffusion | 2 | 0 | 0 | 2 | 1 | 0 | 0 | 0 | 2 | 5 |
| CVD | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 1 | 1 | 2 |
| Maintenance for auto transportation facility | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Several operations | 0 | 0 | 1 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Several operations including etching | 2 | 0 | 0 | 2 | 2 | 0 | 0 | 0 | 1 | 5 |
| CMP | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Test | 0 | 0 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 1 |
| Supervisor | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Chemical analysis | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Outside fab operation | ||||||||||
| CCSS | 0 | 1 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Wastewater treatment in fab operation | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 1 | 1 |
| Chip assembly | ||||||||||
| MVP | 0 | 0 | 0 | 0 | 0 | 2 | 0 | 0 | 0 | 2 |
| Test | 1 | 1 | 2 | 4 | 2 | 2 | 0 | 0 | 0 | 8 |
| Plating/cutting/bending | 1 | 1 | 1 | 3 | 0 | 0 | 0 | 0 | 0 | 3 |
| Molding | 0 | 0 | 0 | 0 | 1 | 0 | 0 | 1 | 0 | 2 |
| Oven/mixing | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 0 | 1 |
| Bonding | 1 | 0 | 0 | 1 | 0 | 0 | 0 | 1 | 0 | 2 |
| Cleaning | 0 | 0 | 0 | 0 | 1 | 0 | 0 | 0 | 0 | 1 |
| Total | 14 | 4 | 6 | 24 | 10 | 6 | 3 | 5 | 7 | 55 |
CVD, chemical vapor deposition; fab, fabrication; NHL, non-Hodgkin lymphoma; SLE, systemic lupus erythematosus; CMP, chemical mechanical polishing; CCSS, chemical control supply system; MVP, marking visual packing.
Includes aplastic anemia (n = 4) and malignant lymphoma (n = 2).
Malignant lymphohematopoietic (LHP) disorder.
Includes osteosarcoma (n = 1), thyroid (n = 3), and ovarian (n = 1).
Includes SLE (n = 2), amyotrophic lateral sclerosis (n = 1), multiple sclerosis (n = 1), polyneuropathy (n = 1), systemic sclerosis (n = 1), and Wegener granulomatosis (n = 1).
Four- and 6-inch wafers handled are coded as 4 inches (n = 3); 4- and 8-inch wafers, as 4 inches (n = 2); 4-, 6-, and 8-inch wafers, as 4 inches (n = 2); 6- and 8-inch wafers, as 6 inches (n = 4); and 8- and 12-inch wafers, as 8 inches (n = 1).
Working duration longer than 50% of employment.
Fig. 2Cumulative distribution of diseases developed by registered semiconductor workers (n = 55) by the year first employed (LHP = malignant lymphohematopoietic disorder, including leukemia, NHL, and aplastic anemia; n = 24). LHP, lymphohematopoietic; NHL, non-Hodgkin lymphoma.
Occupational history of semiconductor workers compensated (n = 18) as of July 2017
| Sex | Age | Disease compensated | Company | Major operation | Minor operation | Job title | First year employed | Wafer size handled, inches | Employment duration, years | Work-related compensated organization |
|---|---|---|---|---|---|---|---|---|---|---|
| Female | 21 | Leukemia | A | Fab | Diffusion | Operator | 2003 | 6 | 1.1 | Administrative court |
| Etching | Operator | 2004 | 6 | 0.6 | ||||||
| Female | 31 | Leukemia | A | Fab | Deposition | Operator | 1995 | 6 | 12 | Administrative court |
| CVD | Operator | 2001 | 6 | 3 | ||||||
| Marking | Operator | 2004 | 6 | 0.8 | ||||||
| Etching | Operator | 2005 | 6 | 0.4 | ||||||
| Diffusion | Operator | 2005 | 6 | 0.6 | ||||||
| Etching | Operator | 2006 | 6 | 0.2 | ||||||
| Female | 20 | Aplastic anemia | A | Chip | Test | Operator | 2000 | NA | 1.3 | Administrative court |
| Female | 29 | Leukemia | A | Fab | Etching | Operator | 1999 | 6 | 4.8 | Administrative court |
| Male | 43 | Brain | A | Fab | Implantation | Maintenance | 1983 | 4, 6, and 8 | 18.7 | KWCWS |
| Female | 25 | Ovarian | A | Chip | Bonding | Operator | 1993 | NA | 6.2 | Administrative court |
| Female | 35 | Aplastic anemia | A | Chip | Cutting and electroplating | Operator | 1993 | NA | 6.4 | KWCWS |
| Female | 34 | Breast | A | Fab | Implantation | Operator | 1995 | 8 | 3.3 | KWCWS |
| Etching and photo | Operator | 1998 | 8 | 1.3 | ||||||
| Male | 38 | Leukemia | B | Fab | Implantation | Maintenance | 1997 | 6 and 8 | 13.3 | KWCWS |
| Female | 28 | Malignant lymphoma | A | Fab | Photo | Operator | 2002 | 8 | 3.8 | KWCWS |
| Male | 39 | Lung | A | Fab | Etching | Maintenance | 1994 | 8 and 12 | 16.6 | KWCWS |
| Male | 44 | Lung | A | Fab | Etching | Maintenance | 1984 | 4 | 17.3 | KWCWS |
| Female | 41 | Breast | C | Chip | Sawing, mounting, test | Operator | 1987 | NA | 28 | KWCWS |
| Male | 36 | Malignant lymphoma | B | Fab | Implantation/CVD | Maintenance | 1995 | 6 and 8 | 9.8 | KWCWS |
| Male | 45 | Polyneuropathy | C | Outside fab | Wastewater treatment | Maintenance | 2012 | NA | 0.8 | Administrative court |
| Female | 25 | Multiple sclerosis | A | Fab | CVD/etching | Operator | 2003 | 8 | 1.2 | Administrative court |
| Photo | Operator | 2004 | 8 | 0.8 | ||||||
| Male | 32 | Aplastic anemia | A | Fab | Etching | Maintenance | 2003 | 12 | 5.4 | KWCWS |
| Female | 31 | Brain | A | Chip | Test | Operator | 1997 | NA | 6.2 | Administrative court |
CVD, chemical vapor deposition; fab, fabrication; KWCWS, Korea Worker's Compensation and Welfare Service; NA, not applicable.Death.
Age when diagnosed.
The same letters indicate the same company.