| Literature DB >> 30167181 |
Mervin Zhao1,2, Ziliang Ye1,2, Ryuji Suzuki3,4, Yu Ye1,2, Hanyu Zhu1, Jun Xiao1, Yuan Wang1,2, Yoshihiro Iwasa3,4, Xiang Zhang1,2,5.
Abstract
Second-harmonic generation (SHG) has found extensive applications from hand-held laser pointers to spectroscopic and microscopic techniques. Recently, some cleavable van der Waals (vdW) crystals have shown SHG arising from a single atomic layer, where the SH light elucidated important information such as the grain boundaries and electronic structure in these ultra-thin materials. However, despite the inversion asymmetry of the single layer, the typical crystal stacking restores inversion symmetry for even numbers of layers leading to an oscillatory SH response, drastically reducing the applicability of vdW crystals such as molybdenum disulfide (MoS2). Here, we probe the SHG generated from the noncentrosymmetric 3R crystal phase of MoS2. We experimentally observed quadratic dependence of second-harmonic intensity on layer number as a result of atomically phase-matched nonlinear dipoles in layers of the 3R crystal that constructively interfere. By studying the layer evolution of the A and B excitonic transitions in 3R-MoS2 using SHG spectroscopy, we also found distinct electronic structure differences arising from the crystal structure and the dramatic effect of symmetry and layer stacking on the nonlinear properties of these atomic crystals. The constructive nature of the SHG in this 2D crystal provides a platform to reliably develop atomically flat and controllably thin nonlinear media.Entities:
Keywords: 3R-MoS2; atomically thin; phase-matching; second-harmonic generation
Year: 2016 PMID: 30167181 PMCID: PMC6059936 DOI: 10.1038/lsa.2016.131
Source DB: PubMed Journal: Light Sci Appl ISSN: 2047-7538 Impact factor: 17.782
Figure 1Crystal structure of 2H and 3R-MoS2. (a) Schematic of the crystal structure of 2H-MoS2 (two layer unit cell outlined in red) with Mo atoms in maroon and S atoms in yellow. The Mo atoms are hexagonally packed within each layer and trigonal prismatically coordinated with S atoms on the top and bottom. The side projection shows the flipped orientation of each layer and the anti-parallel orientation of the SH dipoles that allow for SHG. (b) Crystal structure of 3R-MoS2 (three layer unit cell outlined in red). Individual layers are identical to the 2H structure, however the unit cell and bulk crystal are noncentrosymmetric. The layers are oriented in such a way that the dipoles are parallel allowing for constructive interference of the SHG light.
Figure 2Optical and SH microscopy images of 3R-MoS2. (a) Optical image of the 3R-MoS2 crystal exfoliated onto a fused quartz substrate. Here, we overlay the layer number on top of the corresponding thickness, which was verified via using a combination of photoluminescence mapping, Raman spectroscopy and atomic-force microscopy. (b) Image produced via scanning and gathering the SH light produced by the 3R-MoS2 (excitation energy of 1.14 eV). We see that the SH intensity in increases with layer thickness, shown in a with the single-layer having the lowest intensity. The strongest emissions at the left and bottom of the crystal (given by yellow and red) correspond to layer numbers greater than six. Scale bars shown in a and b correspond to 15 μm.
Figure 3Layer dependence and scaling of the SH light. (a) SH intensity of the 3R and 2H-MoS2 normalized to the respective single-layer intensity at a SH energy of 1.81 eV. The dependence of the SH intensity is roughly squared with relation to the layer number in the 3R crystal, while it oscillates with layer number in the 2H crystal. The left axis corresponds to the 3R intensity, while the right axis corresponds to the 2H intensity. (b) Power law (Nα, where N is the layer number) derived from the log–log relationship in data such as a across energies from 1.77 to 2.3 eV to determine the range of the expected phase-matching relationship, N2. We note the energies below 1.85 eV and energies between 1.9 and 2.0 eV correspond to scaling accordingly to N2. Two dips marked by arrows correspond to the A (1.85 eV) and B (2.05 eV) excitons of the single-layer MoS2. The enhancement due to the excitons in the single layer decreases the expected scaling of the SHG across the other layers. The deviations above 2.1 eV are noted to arise from the broader linear absorption at energies above the B exciton.
Figure 4SH spectroscopy. (a) SH spectra of the 3R-MoS2. The two peaks occurring at around 1.85 and 2.0 eV correspond to the A and B excitons of K-point transitions in MoS2. The six-layer intensity is one order larger than the single-layer intensity. Increasing the layer number decreases both exciton energies, with the B exciton experiencing a much larger shift (roughly 50 meV). (b) SH spectra of the 2H-MoS2, showing a similar response as the 3R crystal. Only odd layers show SH intensities with comparable amplitudes in the layers. The two and four-layered intensities are overlapped. (c) The A and B exciton energy differences, corresponding to the valence-band splitting, of the 3R and 2H crystal are plotted. The 2H exciton splitting remains close to 180 meV up to five layers, while the 3R exciton splitting dramatically decreases to 130 meV at six layers (which agrees to the bulk value obtained from linear absorption). (d) Simplified electronic band structure showing transitions from the valence band to the excitonic band, derived from the SH spectroscopy data at the K-point of the single layer and bulk 2H and 3R phases. The energy of the A exciton decreases from single layer to bulk in both crystal phases by around 10 meV (exemplified in a lower excitonic band of the bulk crystals), however the valence-band splitting is dramatically different, which effects the large difference between the B exciton energy in the two phases. This splitting difference is due to the different stacking geometries and suppressed-interlayer hopping, resulting in an inequality of the electrostatic potential energy at the MoS2 prisms in the two layers.