| Literature DB >> 20142888 |
Mithra N Hegde1, Shruti Bhandary.
Abstract
The purpose of this study was to assess the shear bond strength of Total etch Prime and Bond NT and self etch newer dentin bonding agents Clearfil S3, Xeno III Bond, Clearfil Protect Bond and G Bond used to bond composite resin to dentin, and to compare the difference in the shear bond strengths of the self etch newer dentin bonding agents. Hundred freshly extracted noncarious human maxillary premolar teeth were selected. The occlusal surfaces of each tooth were ground to prepare flat dentin surfaces at a depth of 1.5 mm and were randomly grouped, with twenty specimens in each: Group I - Prime and Bond NT, Group II - Clearfil Protect Bond, Group III - Xeno III Bond, Group IV - Clearfil S3 Bond, Group V - G Bond. Each group was treated with its respective bonding agents, as per the manufacturers' instructions Clearfill - Kuraray, Japan, G bond - GC Tokyo, Japan, Xeno- De Trey Densply, Germany. Blocks or Cylinders of composite resin were built up using Teflon mold and cured. Shear bond strengths were tested using Instron Universal testing machine and recorded in Mpa. The results were statistically analyzed using One-way anova and Tukeys HSD test. The total etch adhesive showed higher shear bond strength than self etching adhesives (P < 0.001). Within the limitations of this in vitro study, it can be concluded that all the adhesive agents evaluated showed optimal shear bond strength 17-20 Mpa, except G bond. However, shear bond strength of composite resin to dentin is better with one bottle total etch adhesive than with the newer self etching bonding agents.Entities:
Keywords: Dentin bonding agents; self etch adhesives; total etch adhesives
Year: 2008 PMID: 20142888 PMCID: PMC2813091 DOI: 10.4103/0972-0707.44054
Source DB: PubMed Journal: J Conserv Dent ISSN: 0972-0707
Figure 1Bonding agents used for the study
Figure 2Teflon mold of dimension 2mm × 2mm
Figure 3Instron machine for shear bond strength analysis
Mean and standard deviation values for shear bond strength
| Value | N | Mean | Std. deviation | Minimum | Maximum |
|---|---|---|---|---|---|
| Group I | 20 | 26.092 | .557 | 25.155 | 27.150 |
| Group II | 20 | 24.526 | .534 | 23.555 | 25.545 |
| Group III | 20 | 24.858 | .596 | 23.788 | 25.783 |
| Group IV | 20 | 22.060 | 1.148 | 20.050 | 23.785 |
| Group V | 20 | 16.378 | .642 | 15.233 | 17.334 |
a. F=558.235 P<0.001 vhs
Intergroup comparison of shear bond strength values
| Groups | Mean difference | t | |
|---|---|---|---|
| Group I Group II | 1.566 | 9.079 | .001 vhs |
| Group I Group III | 1.234 | 6.765 | .001 vhs |
| Group I Group IV | 4.032 | 14.131 | .001 vhs |
| Group I Group V | 9.715 | 51.119 | .001 vhs |
| Group II Group III | -.333 | -1.859 | 0.606 ns |
| Group II Group IV | 2.466 | 8.707 | .001 vhs |
| Group II Group V | 8.148 | 43.639 | .001 vhs |
| Group III Group IV | 2.798 | 9.675 | .001 vhs |
| Group III Group V | 8.481 | 43.30 | .001 vhs |
| Group IV Group V | 5.683 | 19.32 | .001 vhs |
Figure 4Bar graph showing comparison of the mean shear bond strength values between total etch (Group I) and self etch adhesives (Group II, Group III, Group IV, Group V)
| Bonding agent | Type | Composition |
|---|---|---|
| Prime & Bond NT | Total –etch | Di-& Trimethacrylate resins Functionalised amorphous silica, PENTA, Photoinitiators Stabilizers, Cetylamine hydrofluoride, Acetone |
| Etchant | 37% phosphoric acid | |
| Clearfil S3 Bond | One step-self etch | Bond: 10 MDP, Bis-GMA, HEMA, Hydrophobic dimethacrylate, Camphoroquinone, Ethyl alcohol, Water, Silanated colloidal silica. |
| Xeno III | One step-self etch | LiquidA: HEMA, Ethanol, Water, Highly dispersed silicon dioxide, BHT |
| Liquid B: Phosphoric acid, Modified methacrylate, Monofluorophosphazene, Modified methacrylate, UDMA, BHT, Camphorquinone, Ethyl-4-imethyl aminobenzoate. | ||
| Clearfil Protect Bond | Two step-self etch | Primer:10-MDP,12 MDPB, HEMA, Hydrophilic dimethacrylates, Water Bond:10-MDP,Bis-GMA, HEMA, Hydrophobic dimethacrylate, Camphoroquinone, p-toluidine, Silanated colloidal silica, Sodium fluoride. |
| G Bond | One step-self etch | Bond: Acetone, 4-META, Water, UDMA, TEGDMA, Phosphate monomer, Fumed silica filler, Photoinitiators. |