| Literature DB >> 19089258 |
Leonardo Gonçalves Cunha1, Roberta Caroline Bruschi Alonso, Eduardo José Carvalho de Souza-Junior, Ana Christina Elias Claro Neves, Lourenço Correr-Sobrinho, Mário Alexandre Coelho Sinhoreti.
Abstract
The aim of this study was to evaluate the effect of different curing methods on the stress generated by the polymerization shrinkage of a restorative composite in two moments: immediately after light exposure and after 5 min. Photoactivation was performed using two different light sources: (1) xenon plasma arc (PAC) light (1,500 mW/cm2 - 3s) and (2) a quartz-tungsten-halogen (QTH) light with three light-curing regimens: continuous exposure (40 s at 800 mW/cm2 - CL); soft-start (10 s at 150 mW/cm2 and 30 s at 800 mW/cm2 - SS) and intermittent light [cycles of 4 s (2 s with light on at 600 mW/cm2 and 2 s of light off), for 80s - IL]. The composite resin was applied between two 5-mm diameter metallic rods, mounted in a servohydraulic machine. The maximum stress was recorded immediately after light exposure (FF) and after 5 min (5F). The results were submitted to ANOVA and Tukey's test (5%). For each method, the results obtained in FF and 5F were, respectively: CL (3.58 and 4.46 MPa); SS (2.99 and 4.36 MPa); IL (3.11 and 4.32 MPa) and PAC (0.72 and 3.27 MPa). The stress generated by the polymerization shrinkage during light exposure can be associated with the photoactivation method used. A significant increase in the stress level was observed during the post-curing period up to 5 min, for all evaluated methods.Entities:
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Year: 2008 PMID: 19089258 PMCID: PMC4327535 DOI: 10.1590/s1678-77572008000400007
Source DB: PubMed Journal: J Appl Oral Sci ISSN: 1678-7757 Impact factor: 2.698
FIGURE 1Polymerization stress testing configuration. (A) upper portion of the system, connected to the load cell; (B) cylindrical metallic device; (C) photoactivation units in position; (D) lower metallic mould with central hole; (E) composite specimen; (F) lower portion of the system
Light-curing methods with their outputs and respective manufacturers
| Curing Method | Curing Protocol | Equipment | Manufacturer |
|---|---|---|---|
| Continuous QTH light | 800 mW/cm2 for 40 s | XL 2500 | 3M, St. Paul, USA |
| Stepped QTH light | 10 s - 150mW/cm2
| XL 2500 | 3M, St. Paul, USA |
| Intermittent QTH light | 600 mW/cm2 in cycles of 4s, | Optilux 150 | Demetron Res Corp, |
| Xenon plasma arc (PAC) | 1,500 mW/cm2 for 3 s | Apollo 95E | DMD, Westlake Village, USA |
Stress means in MPa (SD) generated by the photoactivation methods in the both time points
| Curing Method | Period | |
|---|---|---|
| Immediately after light exposure | 5 min after light exposure | |
| Continuous QTH light | 3.58 a, A (0.54) | 4.46 a, B (1.09) |
| Stepped QTH light | 2.99 a, A (0.30) | 4.36 a, B (0.40) |
| Intermittent QTH light | 3.11 a, A (0.31) | 4.32 a, B (0.49) |
| Xenon plasma arc | 0.72 b, A (0.14) | 3.27 b, B (0.58) |
Different lowercase letters in columns and uppercase letters in rows indicate statistically significant difference (Tukey's test; p<0.05).