| Literature DB >> 35687677 |
Jiewei Chen1,2, Ting Zhang3, Jingli Wang1,4, Lin Xu1, Ziyuan Lin1, Jidong Liu5, Cong Wang1,2, Ning Zhang1,2, Shu Ping Lau1,2, Wenjing Zhang5, Manish Chhowalla6, Yang Chai1,2.
Abstract
Modern electronics demand transistors with extremely high performance and energy efficiency. Charge-based transistors with conventional semiconductors experience substantial heat dissipation because of carrier scattering. Here, we demonstrate low-loss topological phase change transistors (TPCTs) based on tellurium, a Weyl semiconductor. By modulating the energy separation between the Fermi level and the Weyl point of tellurium through electrostatic gate modulation, the device exhibits topological phase change between Weyl (Chern number ≠ 0) and conventional (Chern number = 0) semiconductors. In the Weyl ON state, the device has low-loss transport characteristics due to the global topology of gauge fields against external perturbations; the OFF state exhibits trivial charge transport in the conventional phase by moving the Fermi level into the bandgap. The TPCTs show a high ON/OFF ratio (108) at low operation voltage (≤2 volts) and high ON-state conductance (39 mS/μm). Our studies provide alternative strategies for realizing ultralow power electronics.Entities:
Year: 2022 PMID: 35687677 PMCID: PMC9187226 DOI: 10.1126/sciadv.abn3837
Source DB: PubMed Journal: Sci Adv ISSN: 2375-2548 Impact factor: 14.957
Fig. 1.TPCTs.
(A) Working mechanism of TPCTs OFF/ON states correspond to two topological phases: conventional semiconductor and Weyl semimetal, with distinctly different Fermi arc projections on the surfaces in the real and momentum (z-k-k) space. There is only charge current for the high-resistance conventional semiconductor, while for Weyl semimetal, chiral anomaly current can contribute to the whole conductivity. (B) Proposed switching between ON and OFF states in Te. Top shows Weyl points in the valence band of Te. The Weyl points are marked by the pink circles (W1 and W2), existing in the L-H path. Inset is the Brillouin zone of bulk Te. Bottom shows the density of Te. (C) Berry curvature strength and Chern number of Te under different positions of EF. (D) Gate-tunable semiconductor-metal phase transition in Te. DOS, density of states; a.u., arbitrary units.
Fig. 2.Angle-dependent and carrier-density–dependent chiral anomaly current.
(A) Angle-dependent longitudinal MR in the prepared Te device. , where R(0) is the resistance at zero magnetic field, and R (B) is the resistance under B. Inset is the scanning electron microscope image of the prepared Te device. Scale bar, 10 μm. (B) The temperature-dependent MR of 32-nm-thick sample under B // E. The hole carrier density is 3.39 × 1013 cm−2 at 2 K. (C) The temperature-dependent MR of 12-nm-thick sample under B // E. The hole carrier density is 2.25 × 1012 cm−2 at 2 K. (D) Carrier density–dependent MR in different samples. The insets are the corresponding optical images of the prepared Hall bar structures based on 32-nm-thick and 12-nm-thick samples.
Fig. 3.Topological phase change along with the modulation of conventional charge and chiral anomaly current.
(A) Schematic of TPCTs with Weyl semiconductor Te. Te flake and the side gate electrode are covered with ionic liquid (DEME-TFSI). Gating voltage can drive ions onto the channel surface of Te. (B and C) Magnetotransport tests of (B) 32-nm-thick and (C) 12-nm-thick samples under B // E at different gating voltages, respectively. (D and E) ΔG/W as a function of B2 in (D) 32-nm-thick and (E) 12-nm-thick samples, analog to the Id-Vd curve of conventional charge–based FETs. The linear relationship between ΔG and B2 agrees with the chiral anomaly (Eq. 1) under a relatively low magnetic field. (F) The contribution of conventional charge current and chiral anomaly current under 9 T for 12-nm-thick sample under different gating voltages.
Fig. 4.Performance comparison between conventional charge–based FETs and TPCTs.
(A) Output curves of the Te charge–based FET as Vg increases from −70 to 70 V. (B) Transfer curve of the Te charge–based FET, typical p-type characteristics with an ON/OFF ratio of 2.0 × 105. (C) Chiral anomaly conductance as a function of B2 of the Te TPCT. (D) Transfer curve as a function of Vg of the Te TPCT. (E) Summary of performance in prepared short-channel TPCTs. Inset is the scanning electron microscope image of a typical device with ~300-nm channel length. Scale bar, 2 μm. (F) ON-state conductance versus ON/OFF ratio in our TPCT, the charge FETs based on low-dimensional materials and Si transistors. “RT” and “LT” are the performance of charge-based FETs at room temperature and low temperature, respectively. Three kinds of Intel 14-nm transistors: HP (high performance), SP (standard performance), and ULP (ultralow power) are also shown for comparison.