Properties of inorganic-organic interfaces, such as their interface dipole, strongly depend on the structural arrangements of the organic molecules. A prime example is tetracyanoethylene (TCNE) on Cu(111), which shows two different phases with significantly different work functions. However, the thermodynamically preferred phase is not always the one that is best suited for a given application. Rather, it may be desirable to selectively grow a kinetically trapped structure. In this work, we employ density functional theory and transition state theory to discuss under which conditions such a kinetic trapping might be possible for the model system of TCNE on Cu. Specifically, we want to trap the molecules in the first layer in a flat-lying orientation. This requires temperatures that are sufficiently low to suppress the reorientation of the molecules, which is thermodynamically more favorable for high dosages, but still high enough to enable ordered growth through diffusion of molecules. On the basis of the temperature-dependent diffusion and reorientation rates, we propose a temperature range at which the reorientation can be successfully suppressed.
Properties of inorganic-organic interfaces, such as their interface dipole, strongly depend on the structural arrangements of the organic molecules. A prime example is tetracyanoethylene (TCNE) on Cu(111), which shows two different phases with significantly different work functions. However, the thermodynamically preferred phase is not always the one that is best suited for a given application. Rather, it may be desirable to selectively grow a kinetically trapped structure. In this work, we employ density functional theory and transition state theory to discuss under which conditions such a kinetic trapping might be possible for the model system of TCNE on Cu. Specifically, we want to trap the molecules in the first layer in a flat-lying orientation. This requires temperatures that are sufficiently low to suppress the reorientation of the molecules, which is thermodynamically more favorable for high dosages, but still high enough to enable ordered growth through diffusion of molecules. On the basis of the temperature-dependent diffusion and reorientation rates, we propose a temperature range at which the reorientation can be successfully suppressed.
Metal–organic interfaces act as a basis for a variety of
possible nanotechnological applications, such as molecular switches,[1,2] thermoelectrics,[3,4] memories,[5] transistors,[6−8] or spintronic devices.[9] Owing to the advances in computational material design, possibilities
for developing functional interfaces with tailored physical properties
and functionalities have increased in the last decades.[10,11] However, the functionality of these interfaces does not depend on
the choice of the metal and the organic component alone. Rather, also
the structure the organic component assumes on the surface plays a
decisive role. A prime example are molecular acceptors that undergo
a (coverage-dependent) reorientation from flat-lying to upright-standing
positions, such as hexaazatriphenylene-hexacarbonitrile (HATCN) and
dinitropyrene-tetraone (NO2-Pyt) on Ag(111).[12,13] Because the electron affinity of organic films depends on their
orientation,[14] this is accompanied by significant
changes of the charge transfer and interface work functions.[13,15] In the two examples above, the structural transition causes a change
of the work function of more than 1 eV, illustrating how important control over the structure is.In principle, such control can be achieved by identifying process
conditions that allow the target structure to grow in thermodynamic
equilibrium.[16,17] In practice, however, often kinetically
trapped phases appear, especially when preparing interfaces using
physical vapor deposition.[18] This is because
kinetics plays a major role: Following Ostwald’s rule of stages,[19] thermodynamically less stable structures form
first. Whether the transition to a more stable structure occurs or
whether the structure becomes kinetically trapped depends on the energetic
barriers and the corresponding transition rates. Therefore, we can
make a virtue out of a necessity by explicitly utilizing kinetic trapping
to grow structures out of thermodynamical equilibrium: In theory,
controlled formation of a kinetically trapped structure should be
possible by selecting a deposition temperature at which the rate for
the phase transition to a thermodynamically more stable structure
is slower than the speed at which the trapped structure grows. This
requires profound knowledge of (a) the underlying transition mechanisms,
and (b) the ability of the molecules to diffuse and aggregate, that
is, to form a seed for a different structure vis-à-vis to continue
growing in the less thermodynamically stable form.In this work, we perform a first step to predict controlled growth
of the model system tetracyanoethylene (TCNE) on Cu(111). While being
computationally more tractable than its cousins HATCN and NO2–PyT on Ag(111), it reveals an even larger change in work
function. When increasing the dosage of TCNE, the system undergoes
a reorientation from flat-lying to upright-standing molecules,[20] which leads to a work function increase of approximately
3 eV. When continuing growth, a second layer of TCNE forms on top
of the first, standing, monolayer.[20]As the layer in direct contact with the surface is the decisive
factor for the properties of the interface,[7] it is highly interesting to study how the reorientation within the
first layer could be suppressed for high dosages. To take a first
step in predicting how the reorientation of TCNE on Cu(111) could
be prevented, here we study, by first-principles, under which conditions
the reorientation can be kinetically suppressed altogether already
for individual TCNE molecules, that is, when not even a single molecule
is able to adopt the upright-standing geometry within a reasonable
time scale. However, computing TCNE on Cu(111) faces a fundamental
challenge: The reorientation on the surface substantially alters the
way the molecules interact with the surface.[20] This includes charge transfer and the connected rehybridization
of molecular and metal orbitals. These orbital rehybridizations are
not covered by state-of-the-art force-field approaches rendering them
(and, by extension, molecular dynamics simulations) inapplicable here.
Instead, we use dispersion-corrected density functional theory (for
details see Methods) to obtain minimum energy
paths and transition states by the nudged elastic band method.[21,22] This method was previously successfully employed to study diffusion
processes of inorganic–organic interfaces.[23,24] Applying harmonic transition state theory,[25,26] we can further determine temperature-dependent rates of diffusion
and reorientation. This allows us to estimate a temperature range
at which the reorientation is suppressed while further growth of lying
seeds is still supported, resulting in a kinetic trapping of lying
TCNE.
Results and Discussion
Transition Paths and Barriers
Arguably,
the ability of the system to undergo a phase transition depends on
the molecules’ ability to diffuse on the surface and, more
importantly, on the rate at which they can change their orientation.
Generally, reorientation processes happen spontaneously and are typically
energetically driven: Once a sufficient number of molecules aggregate
in the upright-standing geometry (i.e., they exceed a so-called critical
nucleus size), this geometry becomes energetically favorable compared
to flat-lying geometries. The number of molecules for this critical
cluster size varies from system to system (and is thought to be between
3 and 10).[27−30] However, collaborative reorientations notwithstanding, it is clear
that at least a single molecule must reorient (i.e., some molecule
has to make the first step). This provides a limit to the rate at
which critical clusters can form in the first place.Consequently,
a useful first step is to investigate these processes for individual
molecules, rather than directly studying transitions between full
close-packed structures. In our case, this is justified because both,
the most favorable flat-lying and the most favorable upright-standing
structure, consist of molecular geometries that would also be stable
local minima on their own due to the strong molecule–substrate
interactions. In addition, this reduced complexity enables studying
kinetic processes at a feasible cost. Therefore, we omit multimolecule
processes that include intermolecular interactions, such as the initial
nucleation, attachment and detachment processes from an island, and
Ehrlich-Schwoebl barriers. Instead, we focus exclusively on two fundamental
aspects in the low coverage growth regime: The diffusion and the reorientation
of individual molecules on the surface.Before we explain which transitions we compute in detail, we briefly
introduce the stable adsorption geometries of individual TCNE molecules
on Cu(111) and the two structures in which we are interested. This
information was previously provided by Egger et al.[20] and is repeated here, as the local geometries are the starting
points for all our further computations.The most favorable way for individual TCNE molecules to adsorb
on the Cu(111) surface is in a “flat-lying” position.
For this case, there are two different possible adsorption geometries
(i.e., local minima) for the molecule, which we will further denote
as L and L (see Figure ). There are also four “upright-standing”
adsorption geometries, denoted as S to S (also shown in Figure ). Their energies
are more than 0.5 eV higher, that is, less stable.
Figure 1
Top view of stable adsorption geometries for TCNE on Cu(111).[20] The orange spheres represent the Cu atoms of
the substrate, whereas the gray and blue spheres are the C and N atoms,
respectively. The white overlay is a reduced representation used in
further plots.
Top view of stable adsorption geometries for TCNE on Cu(111).[20] The orange spheres represent the Cu atoms of
the substrate, whereas the gray and blue spheres are the C and N atoms,
respectively. The white overlay is a reduced representation used in
further plots.In a full monolayer, at low coverages the energetically most favorable
structure consists exclusively of flat-lying molecules in the L position, while its pendant for
high coverages includes the upright-standing positions S, S, and S (for details see Supporting Information and [[20]]). It is clear that for
the flat-lying structure to grow, lying molecules must be able to
diffuse on the surface (“lying diffusion”). The formation
of the upright-standing structure requires that molecules can reorient
from lying to standing (“reorientation”), and, potentially,
that the standing molecules can also diffuse on the surface (“standing
diffusion”).To study diffusion and reorientations, we create a representative
set of distinct transitions between pairs of adsorption geometries
(including their rotational and translational symmetry equivalents).
When naïvely accounting only for, three rotational and three
translational symmetry equivalents for each adsorption geometry, we
would already get transitions. Nevertheless, these will decompose
into a manageable set of symmetry equivalent “elementary”
transitions, which are transitions that possess exactly one transition
state and therefore proceed in a single step. Knowing these elementary
transitions, pathways can be constructed by linking individual elementary
paths in a way that yields the lowest energetic barrier for the total
transition. To efficiently obtain the most relevant elementary transitions,
sets of start- and end points are selected based on two concepts:
First, we restrict the selection to adsorption geometries in adjacent
adsorption sites (i.e., translationally equivalent adsorption positions
which are anchored on neighboring Cu atoms on the surface), implying
that the adsorbate centers are at maximum one Cu-lattice constant
apart. In other words, we neglect so-called “long jumps”.
This is warranted because there is evidence that such long jumps are
improbable for moderate to low temperatures and for small molecules.[31,32] Second, we assume that for moderate to low temperatures kinetics
is mainly dominated by transitions including the adsorption geometry
with the lowest energy in its class either as start and/or end point
(i.e., geometry L for flat-lying
adsorbates and S for the upright-standing
ones). This is warranted because low-energy structures also tend to
have low-energy barriers due to their wide basin of attraction.[33−36] This assumption is also confirmed in hindsight by our results (vide infra). Therefore, we initialized 10 transitions as
depicted in Figure a–j. Although this does not provide all possible transitions,
with this strategy we expect to obtain the most dominant and thus
limiting processes of the distinct transition regimes. To conveniently
indicate transitions from adsorption geometry A to adsorption
geometry B, we use a notation of the form A → B. Hereby, A → B is simply referred to as “forward” transition,
while the transition with inverted initial and final states (B → A) is denoted as “reverse”
transition.
Figure 2
Selected start- (white) and end points (gray) of the transitions
for the lying diffusion (a–d), reorientation (e–g) and
the standing diffusion (i–l). Intermediate steps of multistep
transitions (nonelementary transitions) are colored black. For a clear
representation, the molecule geometries are displayed in a reduced
form that omits the nitrogen atoms, corresponding to the overlay in Figure . In panel h, directions
of the substrate lattice are stated.
Selected start- (white) and end points (gray) of the transitions
for the lying diffusion (a–d), reorientation (e–g) and
the standing diffusion (i–l). Intermediate steps of multistep
transitions (nonelementary transitions) are colored black. For a clear
representation, the molecule geometries are displayed in a reduced
form that omits the nitrogen atoms, corresponding to the overlay in Figure . In panel h, directions
of the substrate lattice are stated.To model the diffusion of lying TCNE molecules, we consider four
possible transitions: Three different transitions that go directly
from one L to another L at a different adsorption site
(Figure a–c),
and the transition from L to
the nearest L geometry (Figure d). The different L → L transitions consist of two direct transitions
to neighboring adsorption sites (shown in Figure a,b) and one transition to a symmetry-equivalent
rotated geometry (Figure c).For the reorientation, we consider transitions from the lying minimum L to the standing end points S (Figure e), S (Figure f) and S (Figure g), that is, to each of the geometries contained
in the upright-standing structure.For the diffusion of standing molecules, the most favorable adsorption
geometry of this class, S, is
always chosen as initial minimum that transitions into either S (Figure l), S (Figure i), S (Figure j) or S (Figure k).In the course of our computations, we found that 5 of the 11 initialized
transitions occur as multistep processes, that is, they include another
adsorption geometry and are, therefore, a combination of other transition
processes: Two of the three L → L diffusion
transitions (Figure b,c) proceed via the adsorption geometry L and thus reduce to consecutive transitions
of L → L and L → L (Figure d). Therefore,
the remaining L → L transition (Figure a) uniquely denotes the direct transition.
In addition, the reorientations L → S (Figure f) and L → S (Figure g) proceed viaS, inferring that the main reorientation process is L → S (Figure e). By investigating L → S in
more detail (discussed later), we also found that this transition
proceeds via a hitherto overlooked intermediate minimum
(M). Upright-standing diffusions of S to all symmetry equivalent S in adjacent adsorption sites (e.g., along the
directions ⟨011⟩) occur as multistep processes over S, S, and/or S (see Supporting Information). All remaining transitions
possess exactly one transition state, hence occur as “elementary”
transitions. In total, the transition states and minimum energy paths
of seven elementary transitions were obtained: Lying TCNE molecules
can either diffuse along ⟨011⟩ directions (L → L) or perform rotations (L → L). The observed process of reorientation from a flat-lying
to an upright-standing position occurs consecutively viaL → M and M → S, as discussed later in more detail. For
the standing diffusion, the motion in straight lines perpendicular
to the molecular plane (similar to a walking motion) is enabled viaS → S, while rotation between the directions
[011], [110], and [101̅] of the Cu(111) surface occurs by S → S and S → S. Figure shows an overview
containing the main geometric characteristics. This includes the initial
and final adsorption geometries, as well as the positions and the
explicit geometries of the obtained transition states. The only exception
is the transition L → S (Figure c), where the intermediate minimum M is provided instead. The corresponding energy barriers,
as well as the absolute adsorption energies of the initial states,
the transition states, and the final states are summarized in Table and visualized in Figure . The detailed energy
paths of all transitions are visualized in the Supporting Information.
Figure 3
Overview of the elementary transition processes of the three different
motion regimes lying diffusion (a,b), reorientation (c–e) and
standing diffusion (f–h). In addition to the initial (white)
and final (gray) adsorption geometries the positions of the transition
states including their specific geometries are provided as well, except
for L → S (c), where instead the obtained
intermediate minimum M (black) is shown. The relative
positions during the transitions itself are presented in a reduced
scheme by omitting the nitrogen atoms.
Table 1
Energetics of the Elementary Transitionsa
transition
Eini/eV
Efin/eV
E‡/eV
ΔE1‡/eV
ΔE–1‡/eV
L1→L1
–2.40
–2.40
–1.85
0.55
0.55
L1→L2
–2.40
–2.34
–1.98
0.42
0.36
L1→M
–2.40
–2.20
–2.10
0.30
0.10
M→S1
–2.20
–1.86
–1.81
0.38
0.05
S1→S2
–1.86
–1.87
–1.81
0.05
0.06
S1→S3
–1.86
–1.83
–1.79
0.07
0.04
S1→S4
–1.86
–1.78
–1.74
0.12
0.03
Adsorption energies of the initial
(Eini), transition (E‡) and final state (Efin) and the corresponding barriers of the forward (ΔE1‡)
and the reverse (ΔE–1‡) transition.
Figure 4
Adsorption energies of initial geometries, transition states, and
final geometries of the various transitions. The black bars represent
the energies of the local minima, whereas the colored bars represent
the energies of the transition states. In addition, barrier heights
of the forward transitions are provided. The vertical arrow denotes
the effective barrier for reorienting from lying to standing TCNE.
Overview of the elementary transition processes of the three different
motion regimes lying diffusion (a,b), reorientation (c–e) and
standing diffusion (f–h). In addition to the initial (white)
and final (gray) adsorption geometries the positions of the transition
states including their specific geometries are provided as well, except
for L → S (c), where instead the obtained
intermediate minimum M (black) is shown. The relative
positions during the transitions itself are presented in a reduced
scheme by omitting the nitrogen atoms.Adsorption energies of the initial
(Eini), transition (E‡) and final state (Efin) and the corresponding barriers of the forward (ΔE1‡)
and the reverse (ΔE–1‡) transition.Adsorption energies of initial geometries, transition states, and
final geometries of the various transitions. The black bars represent
the energies of the local minima, whereas the colored bars represent
the energies of the transition states. In addition, barrier heights
of the forward transitions are provided. The vertical arrow denotes
the effective barrier for reorienting from lying to standing TCNE.Since the L → S reorientation process will strongly
determine the phase transition versus growth behavior, we discuss
this process in more detail. In Figure , the energetic and geometric course of the reorientation
is visualized. In addition to the path where substrate atoms were
included in optimizations (black), also the path obtained by constraining
the substrate during optimizations (gray) is shown. Therein, the different
shifts of adsorption energies and the change of the energy barrier
by 0.2 eV underline that the influence of the substrate is not negligible.
In general, the reorientation occurs in a two-step process: The intermediate
minimum M is 0.20 eV energetically less beneficial than L. The barrier of L → M is 0.30
eV, and thus smaller than the barrier of M → S, which amounts to 0.38 eV. The
effective total barrier for standing up, that is, the difference between
the lowest (L) and highest point
(transition state ‡ in Figure ) of the pathway, is 0.58 eV.
For the reverse transition the molecule needs to overcome only a minute
barrier of 0.05 eV between S and M. The backward reaction is completed by overcoming
the barrier between M and L (0.10 eV).
Figure 5
Energy evolution while reorientating from a flat-lying to an upright-standing
position with (gray line) and without (black line) constraining the
substrate atoms throughout optimizations. The course with the fixed
substrate was sampled with 25 images, whereas for the more accurate
description, that includes the influence of the substrate, only the
minima and the transition states were reoptimized. The interconnecting,
dashed line is an interpolation between these reoptimized points.
In addition, geometries of characteristic positions are provided in
the side view for the initial (L), intermediate (M), and final (S) minima, as well as the two transition states ‡ and ‡.
Energy evolution while reorientating from a flat-lying to an upright-standing
position with (gray line) and without (black line) constraining the
substrate atoms throughout optimizations. The course with the fixed
substrate was sampled with 25 images, whereas for the more accurate
description, that includes the influence of the substrate, only the
minima and the transition states were reoptimized. The interconnecting,
dashed line is an interpolation between these reoptimized points.
In addition, geometries of characteristic positions are provided in
the side view for the initial (L), intermediate (M), and final (S) minima, as well as the two transition states ‡ and ‡.In geometric terms, the reorientation proceeds as follows: The
lying TCNE detaches one CN-group, hereafter referred to as “arm”,
from the surface before reaching the first transition state (‡). The molecule gains stability again at the
intermediate minimum (M) by repositioning its opposite
arm from the top to the hollow site. After the arm next to the already
detached one breaks the second CN–Cu bond, both detached arms
come closer to each other, until arriving at the second transition
state (‡). Here the now nearly flat
molecule encloses an angle of approximately 30° with the substrate
surface. By rotating further into an upright position, the adsorption
geometry S is reached.It is likely that the reorientation process of L → S follows a similar pathway. However, this transition
cannot be rate-limiting for the targeted kinetic trapping, because
the difference of the adsorption energies of L and S (0.56
eV) is already as large as the barrier of L → S (0.58 eV).
Transition Rates
To determine under
which conditions the reorientation of TCNE molecules can be prevented,
while still allowing for growth of the flat-lying structures, we need
to obtain temperature-dependent transition rates by utilizing the
energy barriers. We assume that in a hypothetical physical vapor deposition
(PVD) experiment an ordered flat-lying structure can form as long
as the temperature is sufficiently high for the molecules to readily
diffuse. The speed at which this structure grows is then limited by
the available material. In a PVD experiment, this is given by the
rate at which TCNE molecules are deposited onto the substrate. Furthermore,
it is plausible to assume that the structure becomes (kinetically)
stabilized once it reaches mesoscopic dimensions or becomes buried
under a significant amount of material, that is, once the deposited
TCNE is several layers thick. In other words, if the growth to multilayers
occurs faster than the time required for even a single TCNE to reorient
into an upright position, we assume to have kinetically trapped the
flat-lying structure. In short, we need to find a temperature range
where (a) the diffusion of molecules is much faster and (b) the reorientation
is considerably slower than a given deposition rate.We can
calculate temperature-dependent transition rates k(T) utilizing the harmonic transition state theory
(see Methods for details) with energy barriers
ΔE‡ from Table and attempt frequencies A, as provided in Table :Since our goal is to prevent
the reorientation of individual molecules to the upright-standing
position, we want to discuss a joint process of the reorientation
(L → S) rather than the separate elementary
transitions L → M and M → S. Thus, we assign an effective barrier of
0.58 eV (see Figure ) to the joint process of standing up. For the lying down, S → M is the decisive step (barrier of 0.05 eV).
Table 2
Attempt Frequencies Obtained by Means
of Harmonic Transition State Theorya
L1 → L1
L1 → L2
L1 → S1
S1 → S2
S1 → S3
S1 → S4
A1/Hz
2.0 × 1015
2.9 × 1014
5.0 × 1013
1.7 × 1012
1.0 × 1012
1.7 × 1013
A–1/Hz
2.0 × 1015
1.3 × 1014
8.8 × 1011
4.6 × 1012
1.2 × 1012
1.3 × 1013
A1 and A–1 denote attempt frequencies
of forward and reverse transitions, respectively.
A1 and A–1 denote attempt frequencies
of forward and reverse transitions, respectively.Apart from energy barriers, rates are determined by the attempt
frequencies of the transitions. In principle, attempt frequencies
are the vibration frequencies in direction of the reaction coordinate.
Within harmonic transition state theory, they are explicitly obtained
from the stable vibration frequencies of the initial and the transition
states (for details see Methods). As Table shows, the attempt
frequencies are very different for different processes, covering 5
orders of magnitude. The joint process of lying down (S → L) has with 8.8 × 1011 Hz the
lowest attempt frequency, while the largest is obtained for the L → L diffusion with 2.0 × 1015 Hz. In total, attempt frequencies for the lying diffusion are by
up to 3 orders of magnitude larger than the ones of the standing diffusion.
For the reorientation process, attempt frequencies of the standing
up are about 100 times larger than the attempt frequencies of falling
over.Using these attempt frequencies, the temperature-dependent transition
rates are calculated according to eq and shown in Figure . Before explicitly investigating the rates of the
single processes, we discuss at which rates we can consider transitions
to be suppressed within the growth process. Within PVD experiments,
thin films (i.e., multilayers) of organic materials are typically
deposited within minutes to (at most) days. This corresponds to deposition
rates kdep on the order of 1 monolayer
per minute to 1 monolayer per day. On the basis of the obtained transition
rates (Figure ), we
can identify at which temperatures individual processes occur much
more slowly than the deposition process itself. In other words: We
can consider single processes as suppressed if transition rates k < kdep are enforced. For
the present discussion, we propose a target transition rate k of 1 transition per day (10–5 transitions
per second), as indicated by the black line. The temperatures required
to reach this target transition rate are stated in Table . For a concise representation,
only the limiting transitions, that is, the transitions with the highest
rates within a class, of the lying diffusion (L → L), the standing diffusion (S → S), the standing-up (L → S) and the lying-down (S → L) are plotted. In the Supporting Information a visualization of the rates of all transitions
is provided, as well as a detailed uncertainty discussion including
root-mean-square uncertainty estimates of the obtained suppression
temperatures. Summarizing the outcome, we estimate the uncertainty
of the suppression temperatures of the lying diffusion to ≈30
K, whereas the one for standing up is with ≈40 K the largest
error estimate. For all other transitions the uncertainty is ≈20
K.
Figure 6
Limiting rates of lying diffusion L → L (blue), reorientation L ↔ S (red) and standing diffusion S → S (orange) as a function of the process temperature.
The range of typical deposition rates is marked by the gray area,
and the limiting transition rate for hindering distinct processes
during deposition is indicated by the black line at 1 transition per
day. Within the former, the area where the monolayer of lying molecules
is kinetically trapped against reorientation is highlighted.
Table 3
Estimated Temperatures for Suppressiona
L1 → L1
L1 → L2
L1 → S1
S1 → S2
S1 → S3
S1 → S4
T1/K
140
110
160
20
20
30
T–1/K
140
95
10
20
10
10
T1 and T–1 refer to the temperatures
of suppression of forward and reverse transitions, respectively. Hereby,
transitions are considered being suppressed for a rate of 1 transition
per day.
Limiting rates of lying diffusion L → L (blue), reorientation L ↔ S (red) and standing diffusion S → S (orange) as a function of the process temperature.
The range of typical deposition rates is marked by the gray area,
and the limiting transition rate for hindering distinct processes
during deposition is indicated by the black line at 1 transition per
day. Within the former, the area where the monolayer of lying molecules
is kinetically trapped against reorientation is highlighted.T1 and T–1 refer to the temperatures
of suppression of forward and reverse transitions, respectively. Hereby,
transitions are considered being suppressed for a rate of 1 transition
per day.As shown in Figure , the diffusion of standing TCNE along single symmetry axes (S → S) and the lying-down (S → L) are the fastest processes and exhibit similar rates.
Therefore, standing molecules might not diffuse over long distances
before falling over again. For temperatures above 100 K all processes
of standing diffusion and the lying-down occur on subnanosecond time
scales. The diffusion of the flat-lying molecules freezes out at temperatures
below 110 K. This temperature is relatively high due to concurrent
relaxations of the substrate, specifically a “pulling out”
of Cu atoms bonded to the nitrogen atoms by 0.2 Å. This relaxation
increases the barrier by 0.19 eV. Without it, the diffusion would
freeze out at temperatures below 60 K. For temperatures above 140
K, the lying diffusion proceeds on the order of seconds, which increases
to the order of microseconds at room temperature. Finally, the process
of standing up (L → S) is the slowest. For temperatures
below 160 K we estimate a rate of less than one transition per day.
At room temperature it still occurs very efficiently (millisecond
time scale). Here, we remind the reader that this joint process is,
indeed, a two-step process. For the sake of completeness, the rates
for these two elementary processes are provided in the Supporting Information (Figure S7).On the basis of these results, we predict that, in the temperature
range of 110 to 160 K, the standing up of individual molecules can
be suppressed while molecules can still diffuse.Suggesting a process temperature of 140 K, lying molecules diffuse
by a rate of ≈0.2 transitions per second. This should be sufficiently
high to ensure a diffusion mobility that allows building at least
a full monolayer of lying TCNE within the deposition time. For lower
temperatures, growth of ordered structures is likely to be inhibited
by random aggregation of impinging molecules. For 140 K, the rate
of standing up is 0.3 transitions per year. Once they are standing,
the molecules fall down again within nanoseconds. Therefore, it is
unlikely that standing seeds are created during the growth process,
provided that deposition rates are low enough to avoid aggregation.
For this regime, detailed knowledge of the influence of standing seeds
on the stability of standing molecules becomes dispensable.At first sight, this prediction is qualitatively not consistent
with the experiments of Erley and Ibach, who observed
both, standing and lying molecules for deposition at 100 K.[20,37] While the formation of lying seeds is covered within the estimated
uncertainty, standing seeds should not form according to our predictions.
This contradiction might result from (a) an unrecognized temperature
increase in the experiment of Erley and Ibach during
the highly exothermal deposition process and/or (b) from the reduction
of the energy barrier caused by collaborative effects.For coverages that exceed the one of the favored flat-lying structure
(i.e., when a second layer is created) we assume in the first approximation
of non-interacting adsorbates that the reorientation of the whole
monolayer can be suppressed as well for temperatures below 160 K.
Despite reorientation rates will increase when taking these interactions
into account, we expect to prevent the reorientation of the whole
first layer by depositing further layers fast enough until the layer
thickness reaches a mesoscopic scale. To check whether this assumption
holds true detailed investigations about the intermolecular and interlayer
processes will need to be performed in the future.
Conclusion
To propose experimental conditions that prevent the reorientation
of flat-lying molecules in the first adsorbate layer to the thermodynamically
favored upright-standing positions, we studied kinetic processes of
tetracyanoethylene (TCNE) molecules on a Cu(111) surface. Utilizing
the nudged elastic band method and the harmonic transition state theory,
energy barriers and transition rates were obtained for the diffusion
of lying and standing TCNE molecules, as well as for the reorientation
between these two positions. The most dominant and thus limiting reorientation
process turned out to advance in two steps, exhibiting an effective
energy barrier of 0.58 eV for standing up and 0.05 eV for lying down.
On the basis of the obtained rates, we estimate that for temperatures
above 110 K a sufficiently high diffusion mobility is ensured, which
further allows the formation of an ordered monolayer of flat-lying
TCNE. While our investigation reveals that individual molecules can
be prevented from standing up for temperatures below 160 K, this finding
offers an initial indication for the reorientation behavior of the
whole monolayer. Determining this temperature more precisely and assessing
how long the first layer remains kinetically trapped upon deposition
of further layers will require further studies on the intermolecular
and interlayer processes. Nevertheless, this work constitutes a first
step toward fully understanding transition processes of organic thin
films.
Methods
In this work, the sampling of the potential energy surface is conducted
within the framework of Kohn–Sham density functional theory
as implemented in the software package FHI-aims.[38] We use the PBE[39] functional
and the TSsurf dispersion correction.[40] We apply the repeated slab approach with periodic boundary
conditions in all three dimensions. Unit cell heights of 68 Å
ensure vacuum heights of at least 50 Å between two consecutive
slabs. Hereby a dipole correction[41] is
used to electrostatically decouple the replicas in the z-direction. The TCNE molecules are placed on a substrate consisting
of seven copper layers with a lattice constant of 2.55 Å (which
was obtained by a Birch–Murnaghan fit). The band structure
is sampled using a generalized Monkhorst–Pack grid[42−44] with a spacing of nm–1. A Gaussian broadening
of 0.1 eV is applied to all states.FHI-aims employs numeric atom-centered basis functions. In this
work, we use the “tight” default settings for C and
N. The three uppermost Cu layers are also treated with the “tight”
species defaults, whereas the residual four layers are treated with
“light” settings to save computational time. This is
described in detail in the Supporting Information of a previous publication,[20] in which identical DFT settings are used.The convergence criteria of the SCF-procedure were set to 1 × 10–2 eÅ–3 for the charge density, 1 × 10–5 eV for the
energy and 1 × 10–3 eV Å–1 for the forces.To achieve converged adsorption energies (within ≈30 meV), 6 × 6 Cu supercells are required.The resulting energies correspond to electronic energies of the
whole system Esys at zero Kelvin. Adsorption
energies Eads are determined according
to eq , where Emol is the energy of a relaxed molecule in the
gas phase and Esub is the energy of the
prerelaxed substrate, as used in the slab.By this definition, more favored
adsorption geometries are connected to more negative energies.While molecular dynamics simulations are the standard method for
kinetic studies, their application is not affordable for the investigated
system and purpose. As timesteps for similar systems are typically
in the order of femtoseconds or less, the available simulation time
is not sufficient for reliably escaping basins of a wide area of attraction
to measure barriers and rates of processes such as reorientations.
The computational cost is further increased by sampling the potential
energy surface on the level of density functional theory, which is
necessary to capture the underlying chemistry. Even though advances
in accelerating sampling of rare events[45−47] have been made, we decided
on using transition path sampling methods instead. Transition rates
between single adsorption minima are provided via harmonic transition state theory, whereas energy barriers themself
are determined beforehand with a transition state search method.For the transition state search, the climbing image nudged elastic
band (CI-NEB) method[21,22] augmented with the fast inertial
relaxation engine (FIRE) optimizer[48] is
applied. The workflow can be summed up as the following: The transition
path is initialized in a 4 × 4 supercell between the selected
pair of minima with up to five images using the image dependent pair
potential (IDPP) method[49] as shipped by
the software package ASE.[50] After several
iterations, only the images with the highest energies and/or forces
are updated for efficiency reasons. Once the NEB force of the image
with the highest energy drops below 0.01 eV/Å, further images
are inserted and converged to verify that the highest barrier along
the path is found. All transition paths are sampled by 7 to 25 images
with residual NEB force <0.05 eV/Å, whereas the NEB forces
of all transition states are ≤0.01 eV/Å. In addition,
all transition states are reoptimized in a 6 × 6 supercell where
the atoms of the two uppermost copper layers are set unconstrained:
At first only the substrate is allowed to relax, while afterward the
transition state is reoptimized by unconstraining both the adsorbate
and the substrate to NEB forces < 0.01 eV/Å. The transition
state is, per definition, a first order saddle point, where the Hessian
exhibits exactly one instable eigenmode that corresponds to a negative
curvature or eigenfrequency.Numerical vibrational analyses were performed (Γ-point, 4
× 4 supercell, fixed substrate) for all minima and transition
states, in order to (a) ensure that the transition states have only
one negative frequency, and (b) to obtain the attempt frequencies
required for the harmonic transition state theory. Displacements of
0.01 Å are applied for computing Hessians. In the Supporting Information, we explain why Hessians
are symmetrized and how additional instable frequencies at transition
states and minima are treated.The harmonic transition state theory[25,26] enables determining
the transition rates k as stated in eq .Therein, k is the product of the harmonic attempt frequency A and the Boltzmann-factor containing the Gibbs free energy barrier
ΔG‡ and the temperature T. ΔG‡ is the difference
of the Gibbs free energy of the transition state (G‡) and the initial state (Gini), and in general also depends on the electronic energy,
the temperature, the pressure, and the unit cell size. In this study,
however, the unit cell size and the number of adsorbate molecules
per unit cell stay unchanged for all transitions which reduces the
dependency of ΔG‡ to the
pure electronic energy barrier ΔE‡ (see Supporting Information for details). A is the ratio of the products of the stable vibration frequencies
νi at the initial state and the transition state.
Authors: B Bröker; O T Hofmann; G M Rangger; P Frank; R-P Blum; R Rieger; L Venema; A Vollmer; K Müllen; J P Rabe; A Winkler; P Rudolf; E Zojer; N Koch Journal: Phys Rev Lett Date: 2010-06-18 Impact factor: 9.161
Authors: Steffen Duhm; Georg Heimel; Ingo Salzmann; Hendrik Glowatzki; Robert L Johnson; Antje Vollmer; Jürgen P Rabe; Norbert Koch Journal: Nat Mater Date: 2008-02-10 Impact factor: 43.841
Authors: O T Hofmann; H Glowatzki; C Bürker; G M Rangger; B Bröker; J Niederhausen; T Hosokai; I Salzmann; R-P Blum; R Rieger; A Vollmer; P Rajput; A Gerlach; K Müllen; F Schreiber; E Zojer; N Koch; S Duhm Journal: J Phys Chem C Nanomater Interfaces Date: 2017-10-27 Impact factor: 4.126