| Literature DB >> 35010014 |
Muthaiah Shellaiah1, Kien Wen Sun1.
Abstract
Diamond electrodes have long been a well-known candidate in electrochemical analyte detection. Nano- and micro-level modifications on the diamond electrodes can lead to diverse analytical applications. Doping of crystalline diamond allows the fabrication of suitable electrodes towards specific analyte monitoring. In particular, boron-doped diamond (BDD) electrodes have been reported for metal ions, anions, biomolecules, drugs, beverage hazards, pesticides, organic molecules, dyes, growth stimulant, etc., with exceptional performance in discriminations. Therefore, numerous reviews on the diamond electrode-based sensory utilities towards the specified analyte quantifications were published by many researchers. However, reviews on the nanodiamond-based electrodes for metal ions and anions are still not readily available nowadays. To advance the development of diamond electrodes towards the detection of diverse metal ions and anions, it is essential to provide clear and focused information on the diamond electrode synthesis, structure, and electrical properties. This review provides indispensable information on the diamond-based electrodes towards the determination of metal ions and anions.Entities:
Keywords: BDDE; anions quantification; boron doped electrodes; electrochemical assay; metal ions detection; nanofabrication; real analysis; sp2-carbon insertion
Year: 2021 PMID: 35010014 PMCID: PMC8746347 DOI: 10.3390/nano12010064
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1General representation of electrochemical detection of metal ions and anions by diamond-based electrodes.
Figure 2Differential pulse anodic stripping voltametric (DPASV) I−E curves for standard solutions (1−250 μg L−1) of Ag(I) in 0.1 mol L−1 acetate buffer (pH 4.6) at (A) planar film and (B) BDD disk electrodes. The deposition potential was −0.3 V and the deposition time was 120 s. The curves were recorded using a pulse amplitude of 0.05 V; a potential step of 0.004 V; a pulse width of 50 ms; and a pulse period of 100 ms. Concentrations are shown as ppb (μg L−1) (reproduced with the permission of [62]).
Figure 3Anodic stripping voltammograms of (a) silver and (c) copper in heavy metal ion detection. The ion concentrations in silver standard solutions are 10, 25, 50, 100, 200, 500, 800, and 1000 ppb. Deposition potential: −0.1 V; deposition time: 3 min. The ion concentrations in copper standard solutions are 10, 25, 50, 100, 250, 500, and 1000 ppb. Deposition potential: −0.4 V; deposition time: 3 min. Calibration plots for Ag+ and Cu2+ are shown in (b) and (d). The error bars correspond to the standard deviation are obtained from five measurements (n = 5). (e) The simultaneous determination of silver and copper ions in aqueous solutions. The scan rate is 20 mV s−1 (reproduced with the permission of [64]).
Figure 4(a) CV responses of different concentrations of arsenic (III) in phosphate buffer solution pH 3; scan rate 50 mV s−1 at Ir-BDD prepared using complete step deposition. (b) Graph depicts the dependence of current responses on arsenic (III) concentrations (reproduced with the permission of [70]).
Figure 5(a) Differential pulse anodic stripping voltammograms and (b) corresponding calibration plots for simultaneous determination of Cd2+ and Pb2+ with concentrations of 10, 25, 50, 100, 250, 500, 750, and 1000 µg L−1 on D/CNWs—3% electrode. Error bar: n = 3 (reproduced with the permission of [77]).
Figure 6(A) Linear scan voltammograms of Cr6+ (concentration range between 500 ppb and 5 ppm) in 0.1 M HNO3 recorded on a BDD electrode at 50 mV s−1 and between 0.6 and −0.3 V vs. Ag/AgCl sat. T = 23 °C. (B) Chromium detection calibration curve: the peak current density reported in (A) was plotted as a function of Cr6+ concentration (slope: −3.41 × 10−3 ± 3 × 10−5, y-intercept: −4.8 × 10−4 ± 9 × 10−5, r2: 0.999) (reproduced with the permission of [78]).
Figure 7Working principle of Cr (VI) detection by gold nanoparticles (AuNPs)–boron-doped diamond (BDD) electrode (reproduced with the permission of [79]).
Figure 8Schematic of the influence mechanism of B/C ratio on the detection performance of SBDD electrode for Pb2+ (reproduced with the permission of [90]).
Figure 9(A): Differential pulse anodic stripping voltammograms for 1 µL of 2.034 ×10−2 mol L−1 SbCl3 additions in 6 mol L−1 HClO4. Concentrations of Sb3+: (0) 0, (1) 2.44 × 10−6, (2) 3.25 × 10−6, (3) 4.07 ×10−6, (4) 4.88 × 10−6, (5) 5.69 × 10−6, (6) 6.50 × 10−6, and (7) 7.31 × 10−6 mol L−1 of Sb3+ on BDD electrode. Parameters: scan rate 25 mV s−1, modulation amplitude 40 mV, modulation time 50 s, deposition potential −1 V vs. Ag /AgCl and deposition time 240 s (B): Calibration curve for this experiment. Linearity was verified by F-test (reproduced with the permission of ref [93]).
Figure 10Square wave voltammograms for different additions of heavy metals with related calibration lines (electrode: CH4/H2 = 1%, CB-C = 15,000 ppm, c (Bi) = 10 μg/L, (a) c (Me) = 1 μg/L, (b) c (Me) = 3 μg/L, (c) c (Me) = 5 μg/L, (d) c (Me) = 7 μg/L, (e) c (Me) = 10 μg/L) (reproduced with the permission of [97]).
Figure 11(a) Differential pulse anodic stripping voltammetry and (b) corresponding calibration plots for simultaneous analysis of Zn2+, Cd2+, Pb2+, and Cu2+ obtained on a D/G nanoplatelets film electrode. Error bar: n = 3 (reproduced with the permission of [103]).
Summary of diamond-based electrodes in the detection of metal ions.
| Analyte | Electrode | Doping Concentration/Doping Atom | Method of Detection | Linear Range | Detection Limit (LOD) | Ref. |
|---|---|---|---|---|---|---|
| Ag+ | Planar BDD/Disk BDD | 10 ppm/Boron | DPASV | 45.5 nM–2.3 µM and 9.1–682 nM | 31 nM and 43 nM | [ |
| Ag+ | BDD | 2000 ppm/Boron | DPASV | 1–7 nM | 0.2 nM | [ |
| Ag+ and Cu2+ | Diamond/Graphite film | n/a | ASV | 0.91 pM–9 nM and 0.16 pM–15.7 nM, respectively | 0.52 pM and 0.88 pM, respectively | [ |
| Ag+ and Pb2+ | BDD | n/a | ASV | 0.75–0.025 mM and 0.72–0.05 mM, respectively | n/a | [ |
| As3+ | Ir-BDD | B/C = 1:100/Boron; implanted with 800 keV Ir+ | Amperometry | 0.1–100 µM | 20 nM | [ |
| As3+ | Au-BDD | 1020 cm−3 | DPASV | 0.133–534 pM | 0.067 pM | [ |
| As3+ | AuNPs/BDD | n/a | SWASV | 1.33–20 nM | 13.35 nM | [ |
| As3+ | AuNPs- BDD | B/C = 104 ppm/Boron | ASV | 0–100 µM | 64 nM | [ |
| As3+ | stable Ir-BDD | B/C = 0.1%/Boron | CV | 0–100 µM | 4.64 µM | [ |
| Cd2+ | BDD | B/C = 1%/Boron | ASV | 0–0.1 mM | 3. 94 nM | [ |
| Cd2+ | BDD | 8000 ppm/Boron | SWASV | 0.18–2.17 µM | 8.9 nM | [ |
| Cd2+ | BDD | n/a | SWASV | 18–445 pM | 1.8 pM | [ |
| Cd2 + and Pb2 + | BDD | B/C = 2.4%/Boron | SWASV | 0.05–4 µM and 0.05–8 µM, respectively | 30.16 nM and 17.47 nM, respectively | [ |
| Cd2+ and Pb2+ | BDD | 10000 ppm/Boron | DPASV | n/a | n/a | [ |
| Cd2+ and Pb2+ | D/CNWs | D/CNWs = 3%, 5%, 7% and 9% | DPASV | 0.089–8.9 µM, and 0.048–4.83 µM, respectively | 89 nM and 48 nM, respectively | [ |
| Cr6+ | BDD | B/C = 0.1%/Boron | LSV | 0.2–96 nM | 0.57 pM | [ |
| Cr6+ | AuNPs–BDD | n/a | SWCSV | 0.193–19.3 µM | 22.91 nM | [ |
| Cu2+ | BDD | 2000 ppm/Boron | DPV | 10 µM–100 mM | 10 µM | [ |
| Hg2+ | BDD | n/a | DPV | 10 nM–10 µM | 68 nM | [ |
| Hg2+ | AuNPs–BDD | >1020 cm−3/Boron | SWASV | 0.5–100 µM | 5 µM | [ |
| Hg2+ | AuNPs–BDD | >1020 cm−3/Boron | EIS | 1 pM–1 mM | n/a | [ |
| Ni2+ | BDD | ~1020 cm−3/Boron | DPV | 10–500 µM | 26.1 µM | [ |
| Ni2+ and Ni(OH)2 NPs | BDD | n/a | ASV | 5–25 mM | 5.73 µM | [ |
| Ni(OH)2 NPs | BDD | n/a | ASV | 10–25 mM | 0.42 µM | [ |
| Pb2 + | BDD | n/a | SWASV | 9.65–145 nM | 1.45 nM | [ |
| Pb2+ | BDD | B/C = 1000 ppm/Boron | SWASV | 96–482 pM | 19 pM | [ |
| Pb2+ | BDD | B/C = 2000 ppm/Boron | SWASV | 4.83–48.3 nM | < 4.83 nM | [ |
| Pb2+ | SBDD | B/C = 0.05%, 0.1%, 0.2% and 0.4%/Boron | SWASV | 15–362 nM | 3.38 nM | [ |
| Pb2+ and Cd2+ | N-DNRs | n/a | SWASV | 50 nM–1 µM and 10 nM–1.1 µM, respectively | 50 and 10 nM, respectively | [ |
| Pb2+ and Cu2+ | BDD | 8000 ppm/Boron | SWASV | 30–180 nM (for both) | 27 and 4 nM, respectively | [ |
| Sb3+ | BDD | 1000 ppm or 1020 cm−3/Boron | DPASV | 2.44–7.31 µM | 108 nM | [ |
| Zn2+ | BDD | n/a | DPASV | 0.5 nM–5 µM | 0.47 nM | [ |
| Pb2+, Cu2+, and Hg2+ | BD-NCD | B/C = 0.3%/Boron | LSV | 1–22.5 µM (for Pb2+ and Cu2+) and 1–10 µM (for Hg2+) | 1.399, 0.102, and 0.666 µM, respectively | [ |
| Ni2+, Cd2+, and Pb2+ | PVC-BDD | 7000–8000 ppm/Boron | DPASV | 0–100 nM, 0–40 nM, and 0–150 nM, respectively | 0.00424, 0.0221, and 0.25 nM, respectively | [ |
| Zn2+, Cd2+, and Pb2+ | Bismuth modified BDD | 10000 ppm/Boron | SWASV | 15–183 nM, 9–105 nM, and 5–58 nM, respectively | 1.97, 0.57, and 0.51 nM, respectively | [ |
| Ag+, Cu2+, Pb2+, Cd2+, and Zn2+ | NCD | n/a | DPASV | n/a | n/a | [ |
| Zn2+, Cd2+, Pb2+, and Cu2+ | BDD | 1300 ppm/Boron | DPASV | 76–306 pM, 11–219 pM, 18.3–217 pM, and 47.2–315 pM, respectively | 24, 3.16, 5.55, and 14.2 pM, respectively | [ |
| Cd2+, Pb2+, Cu2+, and Hg2+ | BDD | n/a | DPASV | 0.088–0.88 nM, 0.048–0.48 nM, 0.157–1.57 nM, and 0.05–0.5 nM, respectively | 30, 9.65, 1.57, and 3.49 pM, respectively | [ |
| Pb2+, Cd2+, Zn2+, and Cu2+ | BDD | 7000–8000 ppm/Boron | ASV | n/a | n/a | [ |
| Zn2+, Cd2+, Pb2+, and Cu2+ | D/G nanoplatelets | n/a | DPASV | 0.153–3.8 µM, 0.088–2.2 µM, 0.121–1.21 µM, and 0.157–3.93 µM, respectively | 26.3, 4.13, 23.5, and 7.1 nM, respectively | [ |
| Fe3+, Cu2+, Zn2+, Pb2+, and Cd2+ | BDD | 8000 ppm/Boron | SWASV | 36–716 nM, 31–629 nM, 31–612 nM, 9.6–193 nM, and 17.56–351 nM, respectively | 35.45, 22.34, 27, 8.4, and 14 nM, respectively | [ |
n/a = Not available.
Figure 12(a) Representative SWVs for the full concentration range (0.00−1.50 M OCl−) using the array-1 electrode. The insets show the lowest concentrations examined. The dashed arrow points toward increasing OCl− concentrations. The SWV data is collected at 40 Hz with a perturbation amplitude of 0.05 V and data collection every 0.001 V (i.e., the effective scan rate is 0.04 V s−1). (b) Background-subtracted peak currents from SWV data for all electrodes as a function of [OCl−]. Error bars represent the sample standard deviation from n ≥ 3 measurements, and some error bars are contained within the symbols (reproduced with the permission of [111]).
Figure 13Schematic representation of sp2-BDD electrode-mediated detection of pH and OCl− (reproduced with the permission of [112]).
Figure 14(A) Cyclic voltammograms in the concentration range of ~1 to 5 mM NO2 in a 0.1 M KClO4 solution at potentials of +1.1 V (vs. Ag/AgCl) and (B) +1.5 V (vs. Ag/AgCl) (insets: plots of current versus NaNO2 concentration) (reproduced with the permission of [115]).
Summary of diamond-based electrodes in the detection of anions.
| Analyte | Electrode | Doping Concentration/Doping Atom | Method of Detection | Linear Range | Detection Limit (LOD) | Ref |
|---|---|---|---|---|---|---|
| N3− | BDD | 1 × 1019 cm−3/Boron | LSV, DPV, and flow injection analysis | 3.3 mM–0.30 µM | 8 nM | [ |
| H2O2 | Pt-BDD | B/C = 1: 100/Boron and 5 × 1014 cm−2/Platinum | CV and flow injection analysis | 0.1 to 10 µM | 30 nM | [ |
| H2O2 | BDD/PB | 1019–1020 cm−3/Boron | CV and flow injection analysis | n/a | n/a | [ |
| I− | Diamond paste electrode | n/a | DPV | At pM–nM level | Subnanomolar level | [ |
| I−/I2 | BDD | 0.1% wt/Boron | CV | 0–1.2 mM/0–0.6 mM | 20 µM/10 µM | [ |
| F− at [FeF6]3−/[CeF6]2−/[FeF6] | BDD | n/a | LSV and SWV | n/a | 5 µM (LSV, [FeF6]3−), and 0.6 µM (SWV, [CeF6]2−) | [ |
| OCl− | BDD | 1020 atoms cm−3/Boron | SWV and LSV | 0.02–1.5 M (by both) | n/a | [ |
| OCl− | sp2-bonded carbon microspot-BDD | 1020 atoms cm−3/Boron | SWV and LSV | 58.31 µM–1.9 mM | 58.31 µM | [ |
| RNO2− | BDD | n/a | DPV | 0.99–17 µM (absence of O2 at pH 4.0) and 0.99–11 µM (presence of O2 at pH 8.0) | 0.41 µM (absence of O2 at pH 4.0) and 0.34 µM (presence of O2 at pH 8.0) | [ |
| NO2− | BDD | 7000–8000 ppm/Boron | SWV | 4 µM–4 mM | 20 µM | [ |
| NO2− and HONO | BDD | B/C = 1% | CV | 1–5 mM (for both) | 0.24 and 1.27 nM, respectively | [ |
| NO3− | BDD | n/a | LSV | 0–100 µM | 1.5 µM | [ |
| NO3− | BDD | B/C = 0.1%, 1%, 2%, and 3% | LSV | n/a | n/a | [ |
| S2O82− | BDD | 500–8000 ppm/Boron | SWV | n/a | n/a | [ |
| C2O42− | ATAB-BDD | B/C = 10,000 ppm | Amperometry | 0.8–100 µM | 32 nM | [ |
| S2− and NO2− | BDD | B/C = 0.1% | CV, SWV and DPV | 0.02–0.1 mM | n/a | [ |
| NaNO2, CCl3, COOH, and H2O2 | Nafion/Mb/ND/CILE | n/a | CV | 0.02–6.60 mM, 1.1–30 mM, and 0.3–19 mM, respectively | 6.67, 370, and 100 µM, respectively | [ |
| NaNO2, CCl3, COOH, and KBrO3 | Nafion/Hb/AuNPs/ND/CILE | n/a | CV | 0.07–2.6 mM, 1–500 mM, and 0.35–12 mM, respectively | 27, 330, and 3.3 µM, respectively | [ |
n/a = Not available.