Literature DB >> 33658691

Promises and prospects of two-dimensional transistors.

Yuan Liu1, Xidong Duan2, Hyeon-Jin Shin3, Seongjun Park3, Yu Huang4,5, Xiangfeng Duan6,7.   

Abstract

Two-dimensional (2D) semiconductors have attracted tremendous interest as atomically thin channels that could facilitate continued transistor scaling. However, despite many proof-of-concept demonstrations, the full potential of 2D transistors has yet to be determined. To this end, the fundamental merits and technological limits of 2D transistors need a critical assessment and objective projection. Here we review the promise and current status of 2D transistors, and emphasize that widely used device parameters (such as carrier mobility and contact resistance) could be frequently misestimated or misinterpreted, and may not be the most reliable performance metrics for benchmarking 2D transistors. We suggest that the saturation or on-state current density, especially in the short-channel limit, could provide a more reliable measure for assessing the potential of diverse 2D semiconductors, and should be applied for cross-checking different studies, especially when milestone performance metrics are claimed. We also summarize the key technical challenges in optimizing the channels, contacts, dielectrics and substrates and outline potential pathways to push the performance limit of 2D transistors. We conclude with an overview of the critical technical targets, the key technological obstacles to the 'lab-to-fab' transition and the potential opportunities arising from the use of these atomically thin semiconductors.

Entities:  

Year:  2021        PMID: 33658691     DOI: 10.1038/s41586-021-03339-z

Source DB:  PubMed          Journal:  Nature        ISSN: 0028-0836            Impact factor:   49.962


  85 in total

1.  Multigate transistors as the future of classical metal-oxide-semiconductor field-effect transistors.

Authors:  Isabelle Ferain; Cynthia A Colinge; Jean-Pierre Colinge
Journal:  Nature       Date:  2011-11-16       Impact factor: 49.962

2.  The chips are down for Moore's law.

Authors:  M Mitchell Waldrop
Journal:  Nature       Date:  2016-02-11       Impact factor: 49.962

3.  Silicene field-effect transistors operating at room temperature.

Authors:  Li Tao; Eugenio Cinquanta; Daniele Chiappe; Carlo Grazianetti; Marco Fanciulli; Madan Dubey; Alessandro Molle; Deji Akinwande
Journal:  Nat Nanotechnol       Date:  2015-02-02       Impact factor: 39.213

4.  Single-layer MoS2 transistors.

Authors:  B Radisavljevic; A Radenovic; J Brivio; V Giacometti; A Kis
Journal:  Nat Nanotechnol       Date:  2011-01-30       Impact factor: 39.213

5.  High electron mobility, quantum Hall effect and anomalous optical response in atomically thin InSe.

Authors:  Denis A Bandurin; Anastasia V Tyurnina; Geliang L Yu; Artem Mishchenko; Viktor Zólyomi; Sergey V Morozov; Roshan Krishna Kumar; Roman V Gorbachev; Zakhar R Kudrynskyi; Sergio Pezzini; Zakhar D Kovalyuk; Uli Zeitler; Konstantin S Novoselov; Amalia Patanè; Laurence Eaves; Irina V Grigorieva; Vladimir I Fal'ko; Andre K Geim; Yang Cao
Journal:  Nat Nanotechnol       Date:  2016-11-21       Impact factor: 39.213

6.  Channel length scaling of MoS2 MOSFETs.

Authors:  Han Liu; Adam T Neal; Peide D Ye
Journal:  ACS Nano       Date:  2012-09-12       Impact factor: 15.881

7.  MoS2 transistors with 1-nanometer gate lengths.

Authors:  Sujay B Desai; Surabhi R Madhvapathy; Angada B Sachid; Juan Pablo Llinas; Qingxiao Wang; Geun Ho Ahn; Gregory Pitner; Moon J Kim; Jeffrey Bokor; Chenming Hu; H-S Philip Wong; Ali Javey
Journal:  Science       Date:  2016-10-06       Impact factor: 47.728

8.  Black phosphorus field-effect transistors.

Authors:  Likai Li; Yijun Yu; Guo Jun Ye; Qingqin Ge; Xuedong Ou; Hua Wu; Donglai Feng; Xian Hui Chen; Yuanbo Zhang
Journal:  Nat Nanotechnol       Date:  2014-03-02       Impact factor: 39.213

Review 9.  Two-dimensional transistors beyond graphene and TMDCs.

Authors:  Yuan Liu; Xidong Duan; Yu Huang; Xiangfeng Duan
Journal:  Chem Soc Rev       Date:  2018-08-13       Impact factor: 54.564

10.  DEVICE TECHNOLOGY. Phase patterning for ohmic homojunction contact in MoTe₂.

Authors:  Suyeon Cho; Sera Kim; Jung Ho Kim; Jiong Zhao; Jinbong Seok; Dong Hoon Keum; Jaeyoon Baik; Duk-Hyun Choe; K J Chang; Kazu Suenaga; Sung Wng Kim; Young Hee Lee; Heejun Yang
Journal:  Science       Date:  2015-08-07       Impact factor: 47.728

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  19 in total

1.  Epitaxial growth of inch-scale single-crystal transition metal dichalcogenides through the patching of unidirectionally orientated ribbons.

Authors:  Pengfei Yang; Dashuai Wang; Xiaoxu Zhao; Wenzhi Quan; Qi Jiang; Xuan Li; Bin Tang; Jingyi Hu; Lijie Zhu; Shuangyuan Pan; Yuping Shi; Yahuan Huan; Fangfang Cui; Shan Qiao; Qing Chen; Zheng Liu; Xiaolong Zou; Yanfeng Zhang
Journal:  Nat Commun       Date:  2022-06-10       Impact factor: 17.694

2.  Controlled Synthesis of Ultrathin PtSe2 Nanosheets with Thickness-Tunable Electrical and Magnetoelectrical Properties.

Authors:  Huifang Ma; Qi Qian; Biao Qin; Zhong Wan; Ruixia Wu; Bei Zhao; Hongmei Zhang; Zucheng Zhang; Jia Li; Zhengwei Zhang; Bo Li; Lin Wang; Xidong Duan
Journal:  Adv Sci (Weinh)       Date:  2021-10-28       Impact factor: 16.806

Review 3.  Recent Progress in Two-Dimensional MoTe2 Hetero-Phase Homojunctions.

Authors:  Jing Guo; Kai Liu
Journal:  Nanomaterials (Basel)       Date:  2021-12-30       Impact factor: 5.076

4.  An application-specific image processing array based on WSe2 transistors with electrically switchable logic functions.

Authors:  Senfeng Zeng; Chunsen Liu; Xiaohe Huang; Zhaowu Tang; Liwei Liu; Peng Zhou
Journal:  Nat Commun       Date:  2022-01-10       Impact factor: 14.919

5.  Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale.

Authors:  Peizhi Wang; Jinshi Wang; Fengzhou Fang
Journal:  Nanomanuf Metrol       Date:  2021-10-27

Review 6.  Challenges and opportunities in 2D heterostructures for electronic and optoelectronic devices.

Authors:  Suman Kumar Chakraborty; Baisali Kundu; Biswajeet Nayak; Saroj Prasad Dash; Prasana Kumar Sahoo
Journal:  iScience       Date:  2022-02-19

7.  How Materials and Device Factors Determine the Performance: A Unified Solution for Transistors with Nontrivial Gates and Transistor-Diode Hybrid Integration.

Authors:  Chuan Liu; Xiaojie Li; Yiyang Luo; Ya Wang; Sujuan Hu; Chenning Liu; Xiaoci Liang; Hang Zhou; Jun Chen; Juncong She; Shaozhi Deng
Journal:  Adv Sci (Weinh)       Date:  2021-12-16       Impact factor: 16.806

8.  Non-invasive digital etching of van der Waals semiconductors.

Authors:  Jian Zhou; Chunchen Zhang; Li Shi; Xiaoqing Chen; Tae Soo Kim; Minseung Gyeon; Jian Chen; Jinlan Wang; Linwei Yu; Xinran Wang; Kibum Kang; Emanuele Orgiu; Paolo Samorì; Kenji Watanabe; Takashi Taniguchi; Kazuhito Tsukagoshi; Peng Wang; Yi Shi; Songlin Li
Journal:  Nat Commun       Date:  2022-04-05       Impact factor: 14.919

9.  Estimation and Analysis of Higher-Order Harmonics in Advanced Integrated Circuits to Implement Noise-Free Future-Generation Micro- and Nanoelectromechanical Systems.

Authors:  Muhammad Imran Khan; Ahmed S Alshammari; Badr M Alshammari; Ahmed A Alzamil
Journal:  Micromachines (Basel)       Date:  2021-05-10       Impact factor: 2.891

10.  Ionic-Liquid Gating in Two-Dimensional TMDs: The Operation Principles and Spectroscopic Capabilities.

Authors:  Daniel Vaquero; Vito Clericò; Juan Salvador-Sánchez; Jorge Quereda; Enrique Diez; Ana M Pérez-Muñoz
Journal:  Micromachines (Basel)       Date:  2021-12-17       Impact factor: 2.891

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