Literature DB >> 33033414

X-ray characterization of contact holes for block copolymer lithography.

Daniel F Sunday1, Florian Delachat2, Ahmed Gharbi2, Guillaume Freychet2, Christopher D Liman1, Raluca Tiron2, R Joseph Kline1.   

Abstract

The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost approach to patterning structures with critical dimensions (CDs) which are smaller than can be achieved by traditional photolithography. The CD of contact holes can be reduced by assembling a cylindrical BCP inside a patterned template and utilizing the native size of the cylinder to dictate the reduced dimensions of the hole. This is a particularly promising application of the DSA technique, but in order for this technology to be realized there is a need for three-dimensional metrology of the internal structure of the patterned BCP in order to understand how template properties and processing conditions impact BCP assembly. This is a particularly challenging problem for traditional metrologies owing to the three-dimensional nature of the structure and the buried features. By utilizing small-angle X-ray scattering and changing the angle between the incident beam and sample we can reconstruct the three-dimensional shape profile of the empty template and the residual polymer after self-assembly and removal of one of the phases. A two-dimensional square grid pattern of the holes results in scattering in both in-plane directions, which is simplified by converting to a radial geometry. The shape is then determined by simulating the scattering from a model and iterating that model until the simulated and experimental scattering profiles show a satisfactory match. Samples with two different processing conditions are characterized in order to demonstrate the ability of the technique to evaluate critical features such as residual layer thickness and sidewall height. It was found that the samples had residual layer thicknesses of 15.9 ± 3.2 nm and 4.5 ± 2.2 nm, which were clearly distinguished between the two different DSA processes and in good agreement with focused ion beam scanning transmission electron microscopy (FIBSTEM) observations. The advantage of the X-ray measurements is that FIBSTEM characterizes around ten holes, while there are of the order of 800 000 holes illuminated by the X-ray beam.

Entities:  

Keywords:  block copolymers; lithography; nanofabrication; small-angle scattering

Year:  2019        PMID: 33033414      PMCID: PMC7539622     

Source DB:  PubMed          Journal:  J Appl Crystallogr        ISSN: 0021-8898            Impact factor:   3.304


  13 in total

1.  Templating three-dimensional self-assembled structures in bilayer block copolymer films.

Authors:  A Tavakkoli K G; K W Gotrik; A F Hannon; A Alexander-Katz; C A Ross; K K Berggren
Journal:  Science       Date:  2012-06-08       Impact factor: 47.728

2.  Nanoimprint-induced molecular orientation in semiconducting polymer nanostructures.

Authors:  Htay Hlaing; Xinhui Lu; Tommy Hofmann; Kevin G Yager; Charles T Black; Benjamin M Ocko
Journal:  ACS Nano       Date:  2011-09-06       Impact factor: 15.881

3.  Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning.

Authors:  He Yi; Xin-Yu Bao; Jie Zhang; Christopher Bencher; Li-Wen Chang; Xiangyu Chen; Richard Tiberio; James Conway; Huixiong Dai; Yongmei Chen; Subhasish Mitra; H-S Philip Wong
Journal:  Adv Mater       Date:  2012-05-02       Impact factor: 30.849

4.  Enabling complex nanoscale pattern customization using directed self-assembly.

Authors:  Gregory S Doerk; Joy Y Cheng; Gurpreet Singh; Charles T Rettner; Jed W Pitera; Srinivasan Balakrishnan; Noel Arellano; Daniel P Sanders
Journal:  Nat Commun       Date:  2014-12-16       Impact factor: 14.919

5.  Real-time shape evolution of nanoimprinted polymer structures during thermal annealing.

Authors:  Ronald L Jones; Tengjiao Hu; Christopher L Soles; Eric K Lin; Ronald M Reano; Stella W Pang; Diego M Casa
Journal:  Nano Lett       Date:  2006-08       Impact factor: 11.189

6.  Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat.

Authors:  Hyo Seon Suh; Do Han Kim; Priya Moni; Shisheng Xiong; Leonidas E Ocola; Nestor J Zaluzec; Karen K Gleason; Paul F Nealey
Journal:  Nat Nanotechnol       Date:  2017-03-27       Impact factor: 39.213

7.  Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates.

Authors:  Wubin Bai; Karim Gadelrab; Alfredo Alexander-Katz; Caroline A Ross
Journal:  Nano Lett       Date:  2015-09-25       Impact factor: 11.189

8.  Advancing X-ray scattering metrology using inverse genetic algorithms.

Authors:  Adam F Hannon; Daniel F Sunday; Donald Windover; R Joseph Kline
Journal:  J Micro Nanolithogr MEMS MOEMS       Date:  2016-07-07       Impact factor: 1.220

9.  Characterizing Patterned Block Copolymer Thin Films with Soft X-rays.

Authors:  Daniel F Sunday; Jiaxing Ren; Christopher D Liman; Lance D Williamson; Roel Gronheid; Paul F Nealey; R Joseph Kline
Journal:  ACS Appl Mater Interfaces       Date:  2017-06-06       Impact factor: 9.229

10.  Density multiplication and improved lithography by directed block copolymer assembly.

Authors:  Ricardo Ruiz; Huiman Kang; François A Detcheverry; Elizabeth Dobisz; Dan S Kercher; Thomas R Albrecht; Juan J de Pablo; Paul F Nealey
Journal:  Science       Date:  2008-08-15       Impact factor: 47.728

View more

北京卡尤迪生物科技股份有限公司 © 2022-2023.