Literature DB >> 27551326

Advancing X-ray scattering metrology using inverse genetic algorithms.

Adam F Hannon1, Daniel F Sunday1, Donald Windover1, R Joseph Kline1.   

Abstract

We compare the speed and effectiveness of two genetic optimization algorithms to the results of statistical sampling via a Markov chain Monte Carlo algorithm to find which is the most robust method for determining real space structure in periodic gratings measured using critical dimension small angle X-ray scattering. Both a covariance matrix adaptation evolutionary strategy and differential evolution algorithm are implemented and compared using various objective functions. The algorithms and objective functions are used to minimize differences between diffraction simulations and measured diffraction data. These simulations are parameterized with an electron density model known to roughly correspond to the real space structure of our nanogratings. The study shows that for X-ray scattering data, the covariance matrix adaptation coupled with a mean-absolute error log objective function is the most efficient combination of algorithm and goodness of fit criterion for finding structures with little foreknowledge about the underlying fine scale structure features of the nanograting.

Entities:  

Keywords:  Markov chain Monte Carlo; X-ray scattering; covariance matrix adaptation evolutionary strategy; differential evolution; genetic algorithm; nanostructure metrology

Year:  2016        PMID: 27551326      PMCID: PMC4990789          DOI: 10.1117/1.JMM.15.3.034001

Source DB:  PubMed          Journal:  J Micro Nanolithogr MEMS MOEMS        ISSN: 1932-5150            Impact factor:   1.220


  13 in total

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Authors:  N Hansen; A Ostermeier
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2.  Advances in patterning materials for 193 nm immersion lithography.

Authors:  Daniel P Sanders
Journal:  Chem Rev       Date:  2010-01       Impact factor: 60.622

3.  Complex self-assembled patterns using sparse commensurate templates with locally varying motifs.

Authors:  Joel K W Yang; Yeon Sik Jung; Jae-Byum Chang; R A Mickiewicz; A Alexander-Katz; C A Ross; Karl K Berggren
Journal:  Nat Nanotechnol       Date:  2010-03-14       Impact factor: 39.213

4.  Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library.

Authors:  J S Villarrubia; A E Vladár; B Ming; R J Kline; D F Sunday; J S Chawla; S List
Journal:  Ultramicroscopy       Date:  2015-02-20       Impact factor: 2.689

5.  Defining the nanostructured morphology of triblock copolymers using resonant soft X-ray scattering.

Authors:  Cheng Wang; Dong Hyun Lee; Alexander Hexemer; Myung Im Kim; Wei Zhao; Hirokazu Hasegawa; Harald Ade; Thomas P Russell
Journal:  Nano Lett       Date:  2011-08-09       Impact factor: 11.189

6.  Directed assembly of block copolymer blends into nonregular device-oriented structures.

Authors:  Mark P Stoykovich; Marcus Müller; Sang Ouk Kim; Harun H Solak; Erik W Edwards; Juan J de Pablo; Paul F Nealey
Journal:  Science       Date:  2005-06-03       Impact factor: 47.728

7.  Optimizing topographical templates for directed self-assembly of block copolymers via inverse design simulations.

Authors:  Adam F Hannon; Yi Ding; Wubin Bai; Caroline A Ross; Alfredo Alexander-Katz
Journal:  Nano Lett       Date:  2013-12-16       Impact factor: 11.189

8.  Density multiplication and improved lithography by directed block copolymer assembly.

Authors:  Ricardo Ruiz; Huiman Kang; François A Detcheverry; Elizabeth Dobisz; Dan S Kercher; Thomas R Albrecht; Juan J de Pablo; Paul F Nealey
Journal:  Science       Date:  2008-08-15       Impact factor: 47.728

9.  Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates.

Authors:  Sang Ouk Kim; Harun H Solak; Mark P Stoykovich; Nicola J Ferrier; Juan J De Pablo; Paul F Nealey
Journal:  Nature       Date:  2003-07-24       Impact factor: 49.962

10.  Determination of the internal morphology of nanostructures patterned by directed self assembly.

Authors:  Daniel F Sunday; Matthew R Hammond; Chengqing Wang; Wen-Li Wu; Dean M Delongchamp; Melia Tjio; Joy Y Cheng; Jed W Pitera; R Joseph Kline
Journal:  ACS Nano       Date:  2014-08-06       Impact factor: 15.881

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  2 in total

1.  X-ray characterization of contact holes for block copolymer lithography.

Authors:  Daniel F Sunday; Florian Delachat; Ahmed Gharbi; Guillaume Freychet; Christopher D Liman; Raluca Tiron; R Joseph Kline
Journal:  J Appl Crystallogr       Date:  2019       Impact factor: 3.304

2.  Methodology for evaluating the information distribution in small angle scattering from periodic nanostructures.

Authors:  Daniel F Sunday; R Joseph Kline
Journal:  J Micro Nanolithogr MEMS MOEMS       Date:  2018       Impact factor: 1.220

  2 in total

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