Literature DB >> 22550028

Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning.

He Yi1, Xin-Yu Bao, Jie Zhang, Christopher Bencher, Li-Wen Chang, Xiangyu Chen, Richard Tiberio, James Conway, Huixiong Dai, Yongmei Chen, Subhasish Mitra, H-S Philip Wong.   

Abstract

Entities:  

Mesh：

Substances：

Year:  2012        PMID： 22550028     DOI： 10.1002/adma.201200265

Source DB:  PubMed          Journal:  Adv Mater        ISSN： 0935-9648            Impact factor:   30.849


× No keyword cloud information.
  5 in total

1.  Nanomanufacturing: A Perspective.

Authors:  J Alexander Liddle; Gregg M Gallatin
Journal:  ACS Nano       Date:  2016-02-22       Impact factor: 15.881

2.  X-ray characterization of contact holes for block copolymer lithography.

Authors:  Daniel F Sunday; Florian Delachat; Ahmed Gharbi; Guillaume Freychet; Christopher D Liman; Raluca Tiron; R Joseph Kline
Journal:  J Appl Crystallogr       Date:  2019       Impact factor: 3.304

3.  Directed block copolymer self-assembly implemented via surface-embedded electrets.

Authors:  Mei-Ling Wu; Dong Wang; Li-Jun Wan
Journal:  Nat Commun       Date:  2016-02-15       Impact factor: 14.919

4.  Directed self-assembly of a two-state block copolymer system.

Authors:  Hyung Wan Do; Hong Kyoon Choi; Karim R Gadelrab; Jae-Byum Chang; Alfredo Alexander-Katz; Caroline A Ross; Karl K Berggren
Journal:  Nano Converg       Date:  2018-09-27

5.  Multilayer block copolymer meshes by orthogonal self-assembly.

Authors:  Amir Tavakkoli K G; Samuel M Nicaise; Karim R Gadelrab; Alfredo Alexander-Katz; Caroline A Ross; Karl K Berggren
Journal:  Nat Commun       Date:  2016-01-22       Impact factor: 14.919
  5 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.