| Literature DB >> 32461872 |
Edgar Cruz Valeriano1,2, José Juan Gervacio Arciniega3, Christian Iván Enriquez Flores4, Susana Meraz Dávila5,6, Joel Moreno Palmerin7, Martín Adelaido Hernández Landaverde2, Yuri Lizbeth Chipatecua Godoy2, Aime Margarita Gutiérrez Peralta2, Rafael Ramírez Bon2, José Martín Yañez Limón2.
Abstract
In this work, a high-resolution atomic force acoustic microscopy imaging technique is developed in order to obtain the local indentation modulus at the nanoscale level. The technique uses a model that gives a qualitative relationship between a set of contact resonance frequencies and the indentation modulus. It is based on white-noise excitation of the tip-sample interaction and uses system theory for the extraction of the resonance modes. During conventional scanning, for each pixel, the tip-sample interaction is excited with a white-noise signal. Then, a fast Fourier transform is applied to the deflection signal that comes from the photodiodes of the atomic force microscopy (AFM) equipment. This approach allows for the measurement of several vibrational modes in a single step with high frequency resolution, with less computational cost and at a faster speed than other similar techniques. This technique is referred to as stochastic atomic force acoustic microscopy (S-AFAM), and the frequency shifts of the free resonance frequencies of an AFM cantilever are used to determine the mechanical properties of a material. S-AFAM is implemented and compared with a conventional technique (resonance tracking-atomic force acoustic microscopy, RT-AFAM). A sample of a graphite film on a glass substrate is analyzed. S-AFAM can be implemented in any AFM system due to its reduced instrumentation requirements compared to conventional techniques.Entities:
Keywords: atomic force microscopy; fast Fourier transform; mechanical properties; system theory; white noise
Year: 2020 PMID: 32461872 PMCID: PMC7214876 DOI: 10.3762/bjnano.11.58
Source DB: PubMed Journal: Beilstein J Nanotechnol ISSN: 2190-4286 Impact factor: 3.649
Figure 1Experimental setup for S-AFAM, using a NI PXIe-1073 device and a function waveform generator HP/Agilent 33120A.
Figure 2Contact resonance frequencies for a graphite film on a glass substrate. a) Resonance flexural modes acquired using S-AFAM, b) resonance flexural modes acquired using a lock-in amplifier.
Figure 3AFM system, the piezoelectrical signal excitation is considered to be the input, while the deflection signal from the photodiodes is considered to be the output.
Figure 4PSD simulation. a) Free cantilever: L = 300 μm(blue line), L = 400 μm (dashed red line) and L = 500 μm (dotted yellow line); b) cantilever in contact: L = 300 μm (blue line), L = 400 μm (dashed red line) and L = 500 μm (dotted yellow line); c) cantilever in contact for L = 400 μm: = 1 N/m (blue line), = 10 N/m (dashed red line), = 100 N/m (dotted yellow line).
Modeled and observed dynamic behavior for a free AFM cantilever.
| Mode | Experiment (kHz) | FEA (kHz) | Error (%) | Model (kHz) | Error (%) |
| 1 | 70.102 | 58.274 | 16.8 | 73.490 | 4.8 |
| 2 | 204.530 | 198.220 | 3.0 | 205.800 | 0.6 |
| 3 | 386.384 | 383.350 | 0.7 | 403.300 | 4.3 |
| 4 | 639.992 | 651.950 | 1.8 | 666.600 | 4.1 |
Modeled values of klever. A BudgetSensors diamond-coated silicon cantilever with 450 μm length and a spring constant of 0.2 N/m was used in this experiment.
| Manufacturer | Sader method | Model |
| 0.2 | 0.179 ± 6.9% | 0.1474 ± 3.4% |
Figure 5Flexural resonance frequencies as a function of the contact stiffness for a cantilever with the following geometrical parameters: L = 460 μm, a = 58 μm, b = 1.8 μm.
Figure 6Results for a graphite film on a glass substrate. a) Conventional AFM topography; b) RT-AFAM for 188–191 kHz window; and S-AFAM frequency maps for c) 49–53 kHz window, d) 82–97 kHz window, e) 168–176 kHz window and f) 186–194 kHz window.
Figure 7Results for a graphite film on a glass substrate: a) indentation modulus mapping and b) histogram for the mapping.