Nazek El-Atab1, Nadeem Qaiser1, Huda Badghaish1, Sohail F Shaikh1, Muhammad Mustafa Hussain1,2. 1. MMH Laboratories, Electrical Engineering, Computer Electrical Mathematical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia. 2. EECS, University of California, Berkeley, California 94720, United States.
Abstract
Since the outbreak of the severe respiratory disease caused by the novel coronavirus (COVID-19), the use of face masks has become ubiquitous worldwide to control the rapid spread of this pandemic. As a result, the world is currently facing a face mask shortage, and some countries have placed limits on the number of masks that can be bought by each person. Although the surgical grade N95 mask provides the highest level of protection currently available, its filtration efficiency for sub-300 nm particles is around 85% due to its wider pore size (∼300 nm). Because the COVID-19 virus shows a diameter of around 65-125 nm, there is a need for developing more efficient masks. To overcome these issues, we demonstrate the development of a flexible, nanoporous membrane to achieve a reusable N95 mask with a replaceable membrane and enhanced filtration efficiency. We first developed a flexible nanoporous Si-based template on a silicon-on-insulator wafer using KOH etching and then used the template as a hard mask during a reactive ion etching process to transfer the patterns onto a flexible and lightweight (<0.12 g) polymeric membrane. Pores with sizes down to 5 nm were achieved with a narrow distribution. Theoretical calculations show that airflow rates above 85 L/min are possible through the mask, which confirms its breathability over a wide range of pore sizes, densities, membrane thicknesses, and pressure drops. Finally, the membrane is intrinsically hydrophobic, which contributes to antifouling and self-cleaning as a result of droplets rolling and sliding on the inclined mask area.
Since the outbreak of the severe respiratory disease caused by the novel coronavirus (COVID-19), the use of face masks has become ubiquitous worldwide to control the rapid spread of this pandemic. As a result, the world is currently facing a face mask shortage, and some countries have placed limits on the number of masks that can be bought by each person. Although the surgical grade N95 mask provides the highest level of protection currently available, its filtration efficiency for sub-300 nm particles is around 85% due to its wider pore size (∼300 nm). Because the COVID-19 virus shows a diameter of around 65-125 nm, there is a need for developing more efficient masks. To overcome these issues, we demonstrate the development of a flexible, nanoporous membrane to achieve a reusable N95 mask with a replaceable membrane and enhanced filtration efficiency. We first developed a flexible nanoporous Si-based template on a silicon-on-insulator wafer using KOH etching and then used the template as a hard mask during a reactive ion etching process to transfer the patterns onto a flexible and lightweight (<0.12 g) polymeric membrane. Pores with sizes down to 5 nm were achieved with a narrow distribution. Theoretical calculations show that airflow rates above 85 L/min are possible through the mask, which confirms its breathability over a wide range of pore sizes, densities, membrane thicknesses, and pressure drops. Finally, the membrane is intrinsically hydrophobic, which contributes to antifouling and self-cleaning as a result of droplets rolling and sliding on the inclined mask area.
In December 2019, an outbreak
of a severe pneumonic disease due to the novel coronavirus (COVID-19)
started in Wuhan, China, and then rapidly spread around the world.
As of May 9, 2020, the COVID-19 virus has been confirmed in 4,080,426
people worldwide with 279,286 deaths,[1] resulting
in a higher mortality rate than influenza. The disease is extremely
infectious, with infectedpeople mainly experiencing fatigue, dry
cough, and fever, although a large percentage of carriers remain asymptomatic.
Virus transmission is believed to take place via respiratory
droplets resulting from sneezing and coughing.[2−5] Respiratory droplets exist in
different sizes,[6,7] where aerosols specifically consist
of droplets that are sub-5 μm in size. Droplets that are larger
than 5 μm generally do not travel long distances and settle
within 1–2 m as a result of gravitational force.[8] However, aerosols are smaller and lighter and
therefore can remain floating in the air for extended periods, which
can severely increase the spread of the virus.[9−11] Thus, the use
of facial masks provides a physical barrier that inhibits exposure
to respiratory droplets.[12−14]Unprecedented measures
have been taken globally to stop the rapid spread of this ongoing
pandemic, including travel restrictions, remote working, and homeschooling.
Moreover, wearing masks when going out in public became necessary
and obligatory in some regions to reduce the transmission and contamination
rate. As a result, demand for single-use surgical masks escalated
drastically. The sudden increase in the demand for such face masks
led to their shortage in the market and the inability of the manufacturers
to ramp up their capacity to meet the demands. Consequently, several
countries have placed limitations on the maximum number of masks a
person can buy during a specific period. For instance, in Taiwan,
a person can purchase no more than 2 masks per week.[15] In addition, it was suggested that the protective masks
should be reserved for workers in the health sector who are at higher
risk.[16]Although several types of
commercial face masks can provide different levels of protection,
the surgical grade N95 is found to be the most efficient mask so far.[17] However, it is expensive, in limited supply,
and its filtration efficiency for particles with sizes smaller than
300 nm is around 85% due to the larger pore size in the filter layer
(∼300 nm).[17] Moreover, the COVID-19
virus has been shown to belong to the beta-COVs category with an elliptic
or spherical shape and size in the range of 65–125 nm,[18] which confirms the need for the development
of more efficient filtration masks. In general, air filters can be
divided into two main categories: depth filters and membranes.[19] Depth filters are usually based on cellulose,
glass fibers, or glass wool, and the filtering mechanism is based
on either impaction, interception, diffusion, sedimentation, or electrostatic
attraction.[19] Depth filters achieve air
stabilization by retaining the particles within them rather than on
their surface. In contrast, membrane-based filters consist of a thin
and porous polymeric film, and the filtration mechanism is based on
straining.[19] In this case, the size of
the pores is smaller than the size of the particles, causing their
filtration. Nevertheless, one issue that arises in such filters is
cake formation in which filtered particles accumulate on the surface
of the membrane and then block and limit the passage of additional
filtrate through the membrane. As a result, an antifouling mechanism
is needed to clean the filter in this case.To overcome the
above-mentioned problems, we demonstrate the development of a nanoporous
membrane (down to 5 nm pores) that can be attached on a reusable N95
mask and replaced after every use. The porous membrane is based on
a naturally hydrophobic polymer such that the droplets that come into
contact with the mask will roll and slide over the mask due to the
large inclination angle of the membrane when worn on the face mask.
The membrane is developed by first fabricating a Si-based nanoporous
template via patterning and potassium hydroxide (KOH)
etching of a silicon-on-insulator wafer. The released porous template
is then used as a hard mask to transfer the patterns onto an ultrathin
and hydrophobic polymeric film via reactive ion etching
(RIE). The porous template can be reused to develop multiple membranes;
in addition, the template can be reused on the same membrane following
a “step-and-repeat” process to increase its porosity.
The results show that nanopores with sizes down to 5 nm can be achieved
with a narrow distribution. We performed theoretical calculations
to assess the breathability of the obtained membrane and found that
airflow rates above 85 L/min can be obtained. Finally, we analyzed
the effects of the pore size, density, membrane thickness, and pressure
drop on the breathability of the mask. Thus, the proposed solution
is to develop nanoporous membranes that could be attached on top of
an N95 mask to provide protection against the COVID-19 virus. After
every use, the membrane would be removed and replaced with a new one
while the same N-95 mask would be reused, as explained in Figure .
Figure 1
Schematic showing the
use of the nanoporous membrane fabricated on an 8 in. wafer on a reusable
N95 mask after folding it. The membrane can be replaced after every
use.
Schematic showing the
use of the nanoporous membrane fabricated on an 8 in. wafer on a reusable
N95 mask after folding it. The membrane can be replaced after every
use.To develop the membrane, a Si-based
porous template is first fabricated. An SOI wafer with 77 nm thick
active silicon coated with a 15 nm thick SiO2 hard mask
is initially patterned using e-beam lithography such that an array
of 90 nm by 90 nm squares is obtained. The spacing is initially fixed
at 200 nm to avoid the proximity effect. Next, RIE is used to get
rid of the SiO2 hard mask in the exposed areas, whereas
KOH is used to achieve V-grooves. KOH etches Si preferentially in
the ⟨100⟩ plane, leaving behind V-grooves with sidewalls
that form at 54.7° with the surface. The final size of the apertures/pores
is, thus, a function of the patterned square features, the thickness
of the SOI, and the KOH etch time. Therefore, photolithography could
be used to pattern larger squares (in the micrometer range) when the
initial thickness of the SOI is thicker (in the micrometer range).
The SOI is then released by etching the BOX layer using vapor HF,
as depicted in Figure . Finally, the porous template is coated with a sputtered layer of
copper to enhance its mechanical resilience and its etch selectivity
when used as a hard mask in the development of the membranes.
Figure 2
Fabrication
process flow of the Si-based nanoporous template using a combination
of patterning and KOH etching to achieve the nanosized pores. Optical
image of the flexible SOI is shown.
Fabrication
process flow of the Si-based nanoporous template using a combination
of patterning and KOH etching to achieve the nanosized pores. Optical
image of the flexible SOI is shown.On another Si(100) wafer with thermally grown SiO2, a
10 μm polyimide (PI) film is spin-coated and cured. We used
the SiO2 layer because its bonding energy with PI is lower
than that with Si, which eases the process of peeling off the membrane.
The template with nanopores would then be physically secured on top
of the PI film and employed as a hard mask during the PI plasma etching
in an RIE system in order to transfer the nanopatterns onto the polymeric
film. Finally, the hard mask is removed while the nanoporous membrane
is peeled off; the membrane can then be attached onto an N95 mask.
The PI-based membrane with the same size as the N95 mask is ultralightweight
(<0.12 g). Figure depicts the fabrication process flow of the membrane in addition
to an optical image of the membrane (Figure S2). It is worth noting that the processes of coating/curing and etching
of such a PI-based layer using RIE has been previously demonstrated
by our group.[20,21]
Figure 3
Fabrication process flow of the flexible
hydrophobic membrane based on a polyimide thin film with nanopores.
Fabrication process flow of the flexible
hydrophobic membrane based on a polyimide thin film with nanopores.
Results and Discussion
We characterized
the obtained pore sizes after etching in KOH for different durations
using scanning electron microscopy (SEM), as shown in Figure . The size of the square apertures
ranges from 5 nm to 55 nm when the etching time is fixed at 12 s up
to 23 s, respectively. The top patterned 90 nm by 90 nm squares are
also visible in the SEM images.
Figure 4
Scanning electron microscopy images of
the nanoapertures after etching in 44% KOH at 72 °C for (A) 12
s, (B) 12 s, (C) 12 s, (D) 15 s, (E) 16 s, (F) 19 s, (G) 20 s, (H)
21 s, and (I) 23 s. The patterned 90 nm by 90 nm squares are also
visible in the SEM images.
Scanning electron microscopy images of
the nanoapertures after etching in 44% KOH at 72 °C for (A) 12
s, (B) 12 s, (C) 12 s, (D) 15 s, (E) 16 s, (F) 19 s, (G) 20 s, (H)
21 s, and (I) 23 s. The patterned 90 nm by 90 nm squares are also
visible in the SEM images.The distribution of the pore sizes is narrow (∼5 nm), which
makes it efficient in the application as a hard mask during membrane
development (Figure A). We used e-beam lithography in this case to pattern the 90 nm
by 90 nm squares due to the thin 77 nm SOI wafer; however, larger
patterns could be realized using photolithography when a thicker SOI
wafer is available (Figure B). Moreover, in this case, the spacing between the nanopores
is larger than the spacing between the patterned squares as a result
of the etching profile following V-grooves. With a 200 nm spacing
between the 90 nm by 90 nm patterned squares, the resulting spacing
between 10 nm pores is 280 nm, whereas the resulting spacing between
50 nm pores is 240 nm. Nevertheless, the density of pores or porosity
of the membrane can be improved by performing multiple patterning
steps with the hard mask using a step-and-repeat process.
Figure 5
(A) Measured
nanoaperture sizes for different etch durations in 44% KOH; the error
bar is based on measurements taken on 15 nanoapertures distributed
over an area of 5 mm by 5 mm. (B) SOI thickness and corresponding
size of the patterned contact to achieve a 100 nm aperture after KOH
etching.
(A) Measured
nanoaperture sizes for different etch durations in 44% KOH; the error
bar is based on measurements taken on 15 nanoapertures distributed
over an area of 5 mm by 5 mm. (B) SOI thickness and corresponding
size of the patterned contact to achieve a 100 nm aperture after KOH
etching.Several aerosol filtration mechanisms
exist, including gravity sedimentation, interception, impingement,
diffusion, and electrostatic attraction.[22,23] Generally, large droplets having dimensions in the range of 1–10
μm experience gravity sedimentation or impingement. For smaller
droplets (aerosols), the electrostatic attraction becomes the most
efficient filtering mechanism, where charged fibers attract the fine
particles and get attached to them.[24] Nevertheless,
these mechanisms take place in depth filters consisting of a mesh
of fibers where the pore sizes are always larger than the fine particle
sizes. Thus, air velocity plays a key role in the efficiency of the
filter, with higher velocities reducing the filtration efficiency.
However, the proposed filter is based on a membrane where the main
filtering mechanism is straining. In this case, filtration occurs
because the size of the pores is smaller than the size of the particles,
so the efficiency of the filter does not depend on the air velocity.
Therefore, it is necessary to customize the pore dimensions based
on the particles to be removed; for instance, the pore size should
be below 60 nm if the droplet containing the COVID-19 virus has a
size >60 nm.Even though the filtration efficiency of straining-based
membranes is not affected by the airflow rate through it, the airflow
rate does have a great impact on the breathability of the mask. According
to the United States National Institute for Occupational Safety and
Health (NIOSH), the airflow rate through a mask should be >85 L/min,
which corresponds to a moderately high work rate.[25] In addition, according to NIOSH, a certified N95 mask should
not show a pressure drop above 343.2 Pa during inhalation and 245.1
Pa during exhalation when tested using an airflow rate of 85 L/min.
A higher pressure drop means that a higher airflow resistance would
be experienced, which degrades the breathability of the mask. Therefore,
in order to assess the performance of the membrane, we calculated
the airflow rate through the pores assuming a maximum pressure drop
of 345 Pa.[25] We also analyzed the effects
of the pores size, density, membrane thickness, and pressure drop
on the airflow rate. To simply the calculation, we assumed the shape
of the pore to be circular because the pore size is in the nanoscale
range. Moreover, we assumed the flow to be laminar with negligible
effects of friction. We estimated the air mean velocity Um using eq and extracted the airflow rate Q using eq :where Um is the air mean velocity (m/s), dp is
the pore diameter (m), ΔP is the pressure gradient
across the mask (Pa), h is the pore length (m), η
is the dynamic viscosity of air (Pa·s), m is
the number of pores, A is the area of the mask (m2), and Q is the volumetric flow rate of air
through the pores (m3/s).[26]The results show that as the size of the pores is increased for the
same spacing or when the spacing between the pores is reduced, the
airflow rate is increased, meaning that the breathability of the membrane
is enhanced due to the enhanced porosity of the membrane (Figure A). It is also worth
noting that for pores with a size of 60 nm (smaller than the size
of the COVID-19), a maximum spacing of ∼330 is needed to achieve
good breathability (85 L/min). This spacing is possible using state-of-the-art
lithography tools based on EUV and DUV. However, when using cheaper
proximity photolithography tools, which have a resolution of ∼1
μm, multiple patterning of the membrane would be necessary to
increase its porosity (Figure B). If the patterned squares on the Si template are 1 μm
by 1 μm, then the spacing between the nanopores would be >1
μm. The thickness of the PI-based membrane can also be customized
by spin-coating it at a higher speed to achieve a thinner membrane
with enhanced breathability (Figure C). In addition, the membrane enables breathability
across a wide range of pressure drops (Figure D). In all of these cases, an increased airflow
rate does not affect the filtration efficiency if the membrane pore
size is smaller than the COVD-19 size as a result of the straining
mechanism.[27] When the pore size of the
filter is larger than the particle size (as in the case of an N95
mask with 300 nm pores), then an increased air flow rate has been
shown to reduce the filtration efficiency.[28]
Figure 6
Performance
of the nanoporous membrane. (A) Calculated airflow rate through the
mask with different pore sizes and densities. The thickness of the
mask is fixed at 2 μm, and the ΔP is
fixed at 345 Pa. (B) Calculated number of pores in the mask assuming
a single patterning step. (C) Calculated airflow rate through the
mask for different polyimide thicknesses. (D) Calculated airflow rate
through the mask for different pressure drops.
Performance
of the nanoporous membrane. (A) Calculated airflow rate through the
mask with different pore sizes and densities. The thickness of the
mask is fixed at 2 μm, and the ΔP is
fixed at 345 Pa. (B) Calculated number of pores in the mask assuming
a single patterning step. (C) Calculated airflow rate through the
mask for different polyimide thicknesses. (D) Calculated airflow rate
through the mask for different pressure drops.Because the main filtration mechanism in the proposed membrane is
based on straining, in which particles that are larger than the pore
dimensions are filtered, a layer of particles would accumulate on
the surface of the membrane, blocking some pores and, therefore, reducing
the airflow rate through the membrane, especially if worn for extended
durations. As a result, an antifouling mechanism would normally be
needed to clean the surface of the membrane. The proposed membrane
is based on PI, which is intrinsically hydrophobic (water contact
angle >90°).[29,30] When the membrane is worn on
the mask, a large inclination angle is obtained (the membrane is almost
vertical), which leads to the rolling and/or sliding off of droplets/aerosols.
The rolling of droplets on inclined hydrophobic surfaces has been
studied extensively in the past, both experimentally and using simulations,
for applications in self-cleaning. As the inclination angle is increased
and the droplet size is reduced, the rotational speed of the droplet
increases, making the antifouling process faster.[31−33] Finally, the
hydrophobicity of PI might be useful in repelling water droplets,
which are the carriers of the novel coronavirus.In conclusion,
we demonstrated the development of a Si-based nanoporous template
using a combination of lithography and KOH-based isotropic etching
steps. Pores with sizes down to 5 nm were achieved with a narrow distribution.
The template was then used as a hard mask during the pattern-transfer
process onto a polymeric thin film in an RIE system. The flexible
membrane could be used on a reusable N95 mask to enhance its filtering
efficiency against sub-300 nm particles, including the COVID-19 virus.
Moreover, the reusability of the N95 mask contributes toward relieving
the challenges arising from the shortage of single-use face masks.
The filtration mechanism is based on straining, with pores that are
smaller than the virus particles. Theoretical calculations on the
airflow rate show that the membrane is breathable over a wide range
of pore sizes, densities, membrane thicknesses, and pressure drops.
Multiple patterning steps can be performed on the membrane to increase
its porosity and to increase the allowable airflow rate through it
without affecting its filtration efficiency. Finally, the membrane
is based on a naturally hydrophobic polymer which contributes to self-cleaning
as a result of the rolling of the droplets on the inclined surface.
Materials and Methods
Development of the Porous
Si Template
In this work,
the size of the squares is fixed at 90 nm by 90 nm, and the KOH etch
time is varied to customize the apertures’ sizes. A 15 nm SiO2 layer deposited in a plasma-enhanced chemical vapor deposition
tool is used as the etch mask. The SiO2 layer is deposited
in two runs and annealed for 10 min at 900 °C to densify the
thin film and to reduce the probability of holes causing its failure
as an etch mask. The 90 nm square features are patterned using an
e-beam lithography tool (JEOL). After development of the 70 nm thick
950 PMMA A2 e-beam resist in 1:3 methyl isobutyl ketone/DI water for
40 s, the exposed SiO2 is etched in an RIE system. Finally,
the sample is immersed in 44% KOH at 72 °C to get the V-grooves.
Development of the Nanoporous and Hydrophobic
Polyimide Membrane
Polyimide (10 μm, PI 2611 from HD
Microsystems) was spin-coated on a Si(100) wafer for 30 s at a speed
of 2000 rpm. PI requires several curing stages including soft-baking,
intermediate curing, and final curing at various temperatures. Soft-baking
is conducted at a temperature of 90 °C for 90 s, whereas intermediate
curing is performed at a temperature of 150 °C for a period of
90 s, and the final curing step is performed at a temperature of 300
°C for a duration of 30 min. It should be noted that the temperature
should be steadily ramped from 150 °C to reach 300 °C at
the rate of 240 °C/h. The PI is etched in an Oxford reactive
ion etching tool using O2 plasma.
Airflow Rate Estimation
In the provided estimations
of the airflow rates shown in Figure , a single patterning step is assumed. However, multiple
pattern-transfer steps can be performed following a step-and-repeat
process to reduce the spacing between the pores and, thus, increase
the porosity of the membrane and its breathability.
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