| Literature DB >> 31658708 |
Feng Yu1, Mincong Liu2, Cunhua Ma3, Lanbo Di4, Bin Dai5, Lili Zhang6.
Abstract
Electrocatalysts are becoming increasingly important for both energy conversion and environmental catalysis. Plasma technology can realize surface etching and heteroatom doping, and generate highly dispersed components and redox species to increase the exposure of the active edge sites so as to improve the surface utilization and catalytic activity. This review summarizes the recent plasma-assisted preparation methods of noble metal catalysts, non-noble metal catalysts, non-metal catalysts, and other electrochemical catalysts, with emphasis on the characteristics of plasma-assisted methods. The influence of the morphology, structure, defect, dopant, and other factors on the catalytic performance of electrocatalysts is discussed.Entities:
Keywords: defect rich; electrocatalyst; heteroatom doping; plasma; surface etching
Year: 2019 PMID: 31658708 PMCID: PMC6835459 DOI: 10.3390/nano9101436
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1The roadmap of electrocatalytic reaction technology for sustainable energy use in the future [1]. (Reproduced with permission from [1]. American Association for the Advancement of Science, 2017).
Figure 2Plasma enhanced atomic layer deposition (PEALD) technology (a) direct plasma enhanced atomic layer deposition; (b) remote plasma enhanced atomic layer deposition; (c) radical-enhanced atomic layer deposition [13] (Reproduced with permission from [13], American Vacuum Society, 2007.) HRTEM images of samples with different PEALD deposition times: (d) 12 times, (e) 50 times, and (f) 40 times. Corresponding particle size distribution maps: (g) 12 times and (h) 50 times. (i) The graph of relationship between the average particle size distribution and the number of depositions [15]. (Reproduced with permission from [15]. Elsevier B.V., 2015).
Preparation of electrocatalysts by plasma technology.
| Reaction Type | Samples | Methods | Electrochemical Performance | Ref. |
|---|---|---|---|---|
| MOR | Pt/TiO2 | PEALD | the MOR current density drops to a small value after 1500 s with NCALD < 30. | [ |
| Pt/C | CAPD | The calculated ECSAs of 75.4 m2/g | [ | |
| Pt/GNT | H2 plasma | The current density of 97.9 mA/mg and mass activity of 691.1 mA/mg Pt | [ | |
| Pt/CNTs-HP | H2 plasma | The current density of 15.8 mA/mg | [ | |
| Au@Pt | Ar plasma | Mass activity up to 48 ± 3 m2/g | [ | |
| Pt-Ag | SPS | The calculated ECSAs of 28.15 m2/g | [ | |
| Pt40Pd60 | SPS | The calculated ECSAs of 28.15 m2/g | [ | |
| Pt69Pd31 | SPS | The catalytic activity of 6.81 mA/cm2 | [ | |
| PtPd/KB-2 | SPS | The electrocatalytic activity was more than 4 times of that of commercial Pt/C | [ | |
| Pt/CoPt/MWCNS | SPS | Mass activities of 1719 mA/mg Pt | [ | |
| Pt/C/TiO2-2 | SPS | Mass activities of 315.2 mA/mg Pt | [ | |
| Pt-Ru/OCNT | O2 plasma | The onset potential of 0.3 V | [ | |
| Pt/ZnO/KB | SPS | Catalytic activity of 964 mA/mgPt | [ | |
| OER | Pt-Ir/TiC | Ar plasma | The current density of 2.5 mA/cm2 at 1 V | [ |
| PtOaPdOb@Ti3C2Tx | SPS | Activation potential of 1.5 V in 0.1 M KOH | [ | |
| Ag/1400-15 | Spark plasma sintering | The value of 61 mV | [ | |
| CoNPs@ C | MPECVD | Overpotential of 270 mV | [ | |
| CoO–N/C | Cold plasma deposition | The oxygen evolution potential of 378 mV | [ | |
| Co3O4 nanosheets | Ar plasma | The current density of 44.44 mA/cm2 at 1.6 V | [ | |
| Vo-COOH | Ar plasma | The low overpotential of 262 mV at 10 mA/cm2 | [ | |
| Co3O4−x | Ar plasma | The overpotential of 330 mV and Tafel slope of 58 mV/dec | [ | |
| N-Co3O4 | N2 plasma | The required potential of 1.54 V to reach the current density of 10 mA cm−2 | [ | |
| P-Co3O4 | Ar plasma | The overpotential of 280 mV and Tafel slope of 51.6 mV/dec | [ | |
| CoOx-ZIF | O2 plasma | The required potential of 1.548 V to reach the current density of 10 mA cm−2 | [ | |
| SnCoFe-Ar | Ar plasma | The overpotential of 300 mV and Tafel slope of 42.3 mV/dec | [ | |
| SrTi0.5Fe0.5O3−y | HT-PVD using O2 plasma | The onset potential of 1.40 at 100 μA | [ | |
| SCFP-NF | High-energy argon plasma sputtering | The ultra high mass activity of 1000 mA/mg | [ | |
| CoFe-LDHs-H2O | H2O plasma | The overpotential of only 232 mV | [ | |
| CoFe-LDHs-Ar | Ar plasma | The overpotential of only 232 mV at a current density of 10 mA/cm2 | [ | |
| CoFe-LDHs-N2 | N2 plasma | The overpotential of only 233 mV at a current density of 10 mA/cm2 | [ | |
| FeOx/C | pulsed arc plasma deposition | The discharge specific capacity of 500 mAh/g under 100 mA/g | [ | |
| Co9S8/G | NH3 plasma | The Tafel slope of 82.7 mV/dec | [ | |
| Cu2S/CF | active iodine DBD plasma | The overpotential of 290 mV at a current density of 10 mA/cm2 | [ | |
| CoS/Ni3S2-FeS/PNFF | Air plasma | The overpotential of 136 mV at a current density of 10 mA/cm2 | [ | |
| hNi3N | N2 plasma | The overpotential of 325 mV at a current density of 10 mA/cm2 | [ | |
| NiCoP | PH3 Plasma | The overpotential of 280 mV at a current density of 10 mA/cm2 | [ | |
| NiFePi/P | PECVD | The overpotential of 230 mV at a current density of 10 mA/cm2 | [ | |
| O3-V10-Ni2P | O2 plasam | The Tafel slope of 43.5 mV/dec | [ | |
| PA-CoPO | H2 plasma | The overpotential of 240 mV and Tafel slope of 53 mV/dec | [ | |
| Co-PBA-plasma 2 h | Air plasma | The overpotential of 330 mV at a current density of 100 mA/cm2 | [ | |
| NGF-CFP | N2 plasma | The current density of 10 mA/cm2 at 2.16 V | [ | |
| SO2OR | Pt3Pd2 and PtPd4 | Plasma sputtering | The lower onset potential of 0.587 ± 0.004 V | [ |
| HOR | Pt/C | SPS | The ECSAs value of 266 cm2/mg | [ |
| AMXOR | Ti4O7 | Plasma deposition | A quick oxidation of 0.1 mM AMX | [ |
| ORR | Pt/C | CAPD | The half-wave potential of 0.87 V | [ |
| Pt-Ir/TiC | Ar plasma | Nyquist plots of 0.6 V | [ | |
| Au@Pt | Ar plasma | The peak potential of 0.75 V | [ | |
| Pt/XC72 | SPS | The onset potential of 1.04 V | [ | |
| PdAu/KB | SPS | The reduction peak disappeared after about 700 cycles | [ | |
| AgNW/C | SPS | The high electron density of 13.7 × 10 − 22 m−3 | [ | |
| Pt/rGO-N | SPS | The half-wave potential of 0.87 V | [ | |
| Ag/1400-15 | spark plasma sintering | The electron transfer number of 3.9 | [ | |
| PtNW/GDL | N2 + H2 plasma | The power density of 64 mW/cm2 | [ | |
| CoO–N/C | Cold plasma deposition | A 2-electron process producing H2O2 | [ | |
| Ag@Co3O4 | SPS | The half-wave potential of 0.799 V | [ | |
| 15Co3O4/N-AP/800 | microwave-induced plasma | The Tafel slope of 42 mV/dec | [ | |
| Co-La-Pt | DC arc discharge plasma | The specific capacity of 3250.2 mAh/g and energy density of 8574.2 Wh/kg at 0.025 mA/cm2 | [ | |
| Co3O4−x | Ar plasma | The half-wave potential of 0.84 V | [ | |
| FeOx/C | Pulsed arc plasma deposition | The discharge specific capacity of 500 mAh/g under 100 mA/g | [ | |
| MnOx@C-D | Air plasma | The electron transfer number of 3.81 | [ | |
| A-MnO2 | Ar plasma | The power density of 159 mW/cm2 at a current density of 157 mA/cm2 | [ | |
| Cu3N200/C | PEALD | The half-wave potential of 0.684 V | [ | |
| Fe-N-CNP-CN | SPS | The onset potential of −0.10 V | [ | |
| Fe–N/C | Air plasma | The onset potential of 0.88 V at a loading of 0.60 mg/cm2 | [ | |
| P-Graphene | Ar plasma | The onset potential of 0.912 V and half-wave potential of 0.737 V | [ | |
| P-CNTs | Ar plasma | The onset potential of 0.83 V | [ | |
| P-CC | Ar Plasma | The exchange current density of 2.57 × 10−9 A/cm2 | [ | |
| hCNW-60 | PECVD | The onset potential of 830 mV in 0.1 KOH | [ | |
| N-PEGO | DBD plasma | The onset potential of 0.89 V | [ | |
| NCNTs | MPCVD | The onset potential of 0.87 V and the electron transfer number of 4.1 | [ | |
| VA-NCNTs | N2 plasma | The ORR peak at the potentials of about −0.3 V | [ | |
| NCNPs | SPS | The onset potential of −0.17 V | [ | |
| NCNP-3 | SPS | The onset potential of −0.143 V | [ | |
| BZ90 + DO10 | SPS | The samples were held at 0.5 V with a rotation speed of 1500 rpm for 45,000 s in an O2-saturated 0.1 M KOH solution | [ | |
| O-rGO | O2 Plasma | The current density of 10 µA/cm2 | [ | |
| BCNP | SPS | The current densities of 3.15 mA/cm2 at −0.60 V | [ | |
| FCNP-4 | SPS | The onset potential of 0.22 V and limiting current density of 2.76 mA/cm2 at 0.6 V | [ | |
| BCN nanocarbon | SPS | 15.1% current decrease after 20000 s | [ | |
| CO2RR | Au island | O2 plasma | The faradaic efficiency over 95% | [ |
| CNT/Cu | O2 plasma | Carbon monoxide yields of 178 mmol cm2 mA−1 h−1 | [ | |
| Cu foil | O2 plasma | The ethylene selectivity of 60% | [ | |
| Cu nanocube | O2 plasma | The ethylene selectivity of 60% | [ | |
| ZnO | H2 plasma | The current density of −16.1 mA/cm2 and faradaic efficiency of 83% | [ | |
| PEI-NCNT/GC | NH3 plasma | The current density of 2.2 mA/cm2 | [ | |
| HER | Ni–Fe–C | CH4+H2 Plasma carburizing | The activation potential of 57 mV at a current density of 10 mA/cm2 | [ |
| CoNPs@ C | MPECVD | The overpotential of 153 mV at a current density of 10 mA/cm2 | [ | |
| P-Co3O4 | Ar plasma | The overpotential of 120 mV and Tafel slope of 52 mV/dec | [ | |
| SCFP-NF | high-energy argon plasma sputtering | The onset potential of −0.01 V and Tafel slope of 94 mV/dec | [ | |
| C-30s | C plasma | The Tafel slope of 44 mV/dec | [ | |
| TaS2-15 min | O2 plasma | The onset potential of 310 mV | [ | |
| O2-MoS2 | O2 plasma | The current density of 16.3 mA/cm2 at −350 mV | [ | |
| MoS2 | O2 plasma | The overpotential of 131 mV at a current density of 10 mA/cm2 | [ | |
| H3Mo12O40P/MoS2 | O2 plasma | The Tafel slope of 44 mV/dec | [ | |
| MoS2-15 min | H2 plasma | The overpotential of 240 mV at a current density of 10 mA/cm2 | [ | |
| MoS1.7 | H2 plasma | The overpotential of 143 mV at a current density of 10 mA/cm2 | [ | |
| Co3S4 PNSvac | Ar plasma | The mass activity of 1056.6 A/g at an overpotential of 200 mV | [ | |
| WS2 | PEALD | The overpotential of 90 mV at a current density of 100 mA/cm2 | [ | |
| WS2 | SF6/C4F8 plasma-etched | The overpotential of 100 mV and Tafel slope of 50 mV/dec | [ | |
| CoS/Ni3S2-FeS/PNFF | Air plasma | The overpotential of 75 mV at a current density of 10 mA/cm2 | [ | |
| N-MoSe2/VG | MPECVD | The onset potential of 45 mV and overpotential of 98 mV at 10 mA/cm2 | [ | |
| MoSe2/Mo | N2/H2 plasma | The Tafel slope of 34.7 mV/dec | [ | |
| Ni3N1−x/NF | Microwave plasma | The overpotential of 55 mV and Tafel slope of 54 mV/dec at a current density of 10 mA/cm2 | [ | |
| NiCoP | PH3 plasma | The overpotential of 32 mV at a current density of −10 mA/cm2 | [ | |
| O3-V10-Ni2P | O2 plasma | The overpotential of 108 mV and Tafel slope of 72.3 mV/dec | [ | |
| Ni-FeP/TiN/CC | Plasma-implanted method | The overpotential of 75 mV at a current density of 10 mA/cm2 | [ | |
| CoPx | PEALD | The exchange current density of −8.9 × 105 A/cm2 | [ | |
| PA-CoPO | H2 plasma | The overpotential of 50 mV at a current density of 10 mA/cm2 | [ | |
| WC nanowalls | DC-PACVD | The Tafel slope of 67 mV/dec | [ | |
| Co-PBA-plasma 2 h | Air plasma | The overpotential of 77 mV at a current density of 20 mA/cm2 | [ | |
| SG-P | Ar plasma | The overpotential of 178 mV at a current density of 10 mA/cm2 | [ | |
| 3DSG-Ar | Ar plasma | The Tafel slope of 64 mV/dec | [ | |
| P-NSG | Ar plasma | The onset potential of 58 mV | [ |
Figure 3(a) The sketch of device for sample treatment by H2 plasma. TEM images and corresponding Pt particle size distribution images: (b) Pt/carbon nanotubes (CNTs), (c) Pt/RGO, and (d) Pt/GNT (graphene oxide (GO):CNTs = 1:2, mass ratio). (e) HRTEM and SAED images of Pt/GNT [20]. (Reproduced with permission from [20]. Elsevier B.V., 2018).
Figure 4(a) The experimental device and (b) the schematic diagram of PtPb nanoparticles synthesized by solution plasma sputtering. Catalysts formed in different solutions: (c,d) PtPd/KB in aqueous solution; (e,f) PtPd/KB-2 in water-methanol mixture [30]. (Reproduced with permission from [30]. Elsevier B.V., 2017).
Figure 5(a) The schematic diagram and (b) the physical diagram of carbon-loaded noble metal materials prepared by organic solution plasma. (c) Field emission scanning electron microscope (FESEM), (d) scanning transmission electron microscope (STEM), and (e) HRTEM diagrams of Au/CNBs catalysts [35]. (Reproduced with permission from [35]. Royal Society of Chemistry, 2013).
Figure 6(a) The flow chart of PtOaPdOb@Ti3C2Tx catalysts prepared by liquid plasma reduction. TEM and HRTEM images with 200 W plasma for (b,e) 1 min, (c,f) 3 min, and (d,g) 5 min. (e–g) corresponding fast fourier transform (FFT) diffraction patterns [40]. (Reproduced with permission from [40]. American Chemical Society, 2018).
Figure 7The schematic diagram of (a) graphene-supported Pt nanoparticles (GPN) and (b) N-doped GPN (N-GPN); The images of (c) TEM, (d) HRTEM, and (e) selected area electron diffraction (SAED) for GPN; (f) XPS image; (g) chemical vapor (CV)—0.5 M H2SO4, and (h) CV—0.5 M H2SO4 + 1.0 M CH3OH for GPN and N-GPN [45]. (Reproduced with permission from [45]. American Chemical Society, 2014).
Figure 8(a,c,e–h) EDS images and (b,d) HRTEM images of different plasma activated copper foil before and after reaction; (i) electrochemical activity during CO2RR process; (j) hydrocarbon selectivity of plasma treated Cu foil. The corresponding inset SEM images were after the reaction: H2 plasma treated metal Cu foil, O2 plasma treated with Cu foil at 20 W for 2 min, and O2 plasma treated at 100 W for 10 min, respectively [52]. (Reproduced with permission from [52]. Nature Publish Group, 2016).
Figure 9(a) The schematic diagram of Zn–Co3O4−x/Zn-air hybrid battery; (b) the overall polarization curve of Co3O4 nanorods and Co3O4−x; (c) the constant current charge/discharge curve of Zn–Co3O4−x /Zn-air hybrid battery. (I) Work of the Zn–Co3O4−x battery in an anaerobic environment; (II) Work of the zinc-air battery in an aerobic environment; (III) Work of the hybrid battery in an aerobic environment [62]. (Reproduced with permission from [62]. American Chemical Society, 2018).
Figure 10(a) TEM images, (b) HRTEM images, and (c–f) STEM-EDX elemental mapping images of P–Co3O4; (g) Co K-side extended x-ray absorption fine structure (EXAFS). The inset is the Fourier-transformed EXAFS oscillations; (h) Co K-edge XANES spectra of pristine V0–Co3O4 and P–Co3O4. Top inset magnifies the main peak region. Bottom insets magnify the pre-peak region; (i) deconvoluted pre-peak of Co K-edge XANES. Inset compares the amount of Co2+(Td) and Co3+(Oh) states of pristine, V0–Co3O4, and P–Co3O4 [67]. (Reproduced with permission from [67]. Royal Society of Chemistry, 2017).
Figure 11Comparison of the mass activity at an overpotential of 0.35 V between crystalline powders and NF-supported nanofilms for the oxygen evolution reaction (OER) (a) and hydrogen evolution reaction (HER) (b); the stability tests of SCFP-nickel foam (NF) and control samples for OER (c) and HER (d); (e) The stability tests for the water splitting of bifunctional SCFP-NF catalysts and Pt-NF coupled RuO-NF [73]. (Reproduced with permission from [73]. Wiley-VCH, 2018).
Figure 12The schematic diagram of (a) a dielectric barrier discharge (DBD) reactor and (b) water DBD plasma-activated stripping of CoFe-LDHs nanosheets; TEM, HRTEM, and atomic force microscope (AFM) images and corresponding nanosheet thickness images of bulk CoFe-LDHs (c–f) and plasma-treated CoFe-LDHs–H2O samples (g–j) [74]. (Reproduced with permission from [74]. Royal Society of Chemistry, 2017).
Figure 13(a) The preparation of C-plasma treated and H2 annealed NiMoO4; (b) SEM and (c,d) TEM images of the sample C-30s; the electrochemical performance tests of the sample: (e) linear sweep voltammetry (LSV) curve, (f) Tafel slope, and (g) the relationship between overpotential and Tafel slope at current density of 10 mA/s [83]. (Reproduced with permission from [83]. Wiley-VCH, 2018).
Figure 14(a) Mechanism diagram of O2 plasma treated TaS2 nanosheets for HER; (b) TEM images and (c) HAADF-STEM images of TaS2; (d–f) HAADF-STEM images by plasma treatment for 5 min, 10 min, and 15 min; (g) the density of edge Ta atoms [85]. (Reproduced with permission from [85]. Wiley-VCH, 2016).
Figure 15(a) Plasma-assisted selenization process: inset of (a1) MoSe2/Mo composite prepared by GLAD method; inset of (a2) plasma-assisted selenization treatment. (b) Schematic diagram of HER and charge transfer [99]. (Reproduced with permission from [99]. Wiley-VCH, 2016).
Figure 16(a) Schematic diagram of preparation of self-supporting Ni3N1−x/NF electrode by microwave plasma-generation; (b) TEM images, (c) charge density distribution, and (d) the total electron density and partial electron density (TDOS and PDOS) of Ni3N1−x/NF; (e) adsorption energy of H2O molecules on the surface of Ni3N and Ni3N1−x; (f) free energy of H adsorption by various substances at equilibrium potential [102] (open access).
Figure 17(a) Schematic diagram of the conversion of NiCo–OH nanosheets to NiCoP by PH3 plasma treatment; (b) SEM image, energy spectrum, and crystal structure of NiCoP; (c) free-energy diagram for H2 adsorption on the Ni2P, NiCoP (0001), and Pt (111) surfaces; (d) adsorption energy of water [108] (Reproduced with permission from [108]. American Chemical Society, 2016.) (e) Schematic diagram of the bifunctional electrocatalysts OER and HER; (f) photograph of the water splitting in the alkaline solution at 1.5 V [113] (Reproduced with permission from [113]. Elsevier B.V., 2018).
Figure 18(a) The structure of Co–PBA with the composition of Co3(Fe(CN)6)2; the coordination structure of (b) Co and (c) Fe sites. Each Co center has two open sites, which are occupied by coordinated water molecules, while the Fe center is completely coordinated by six CN groups; (d) schematic diagram of metal sites in Prussian blue’s structure modified by air plasma [117]. (Reproduced with permission from [117]. Wiley-VCH, 2018).
Figure 19(a) Schematic diagram of the preparation of Ar plasma etching graphene and carbon nanotubes surface by Ar plasma; TEM images of (b) graphene and (c) Ar plasma treated graphene; TEM images of (d) carbon nanotubes and (e) Ar plasma treated carbon nanotubes [124]. (Reproduced with permission from [124]. Royal Society of Chemistry, 2016).
Figure 20Schematic diagram of N-doped graphene oxide prepared by low temperature plasma technology [127]. (Reproduced with permission from [127]. Royal Society of Chemistry, 2018).
Figure 21(a) Schematic diagram of preparation of N-doped carbon nanoparticles (NCNP) by solution plasma method; (b) species of doped single atoms [135] (copyright @ 2017 Royal Society of Chemistry.) (c) Process for preparing nano-carbon materials by solution plasma method [139] (open access.) (d–g) Distribution of nitrogen elements of NCNP prepared from acrylonitrile (AN), acrylonitrile + ANA, pyridine (PD), and pyridine + hydrazine (PDA) as precursors [135]. (Reproduced with permission from [135]. Royal Society of Chemistry, 2017).
Figure 22(a) Schematic diagram of the treatment of S-doped graphene BY Ar plasma. (b) Polarization potential and (c) Tafel slope at a scan speed of 5 mV/s in a 0.5 M H2SO4 solution of PG, SG, SG–P, and commercial 20% Pt/C. (d) Current densities of SG, G–P, and SG-P. (e) Cycle performance of SG–P. (f) PG, SG, SG–P, and commercial 20% Pt/C of S’s 2p for SG and SG–P. (g) Different polarization curves for SG–P enriched in thiophene sulfur and oxidized sulfur [143]. (Reproduced with permission from [143]. Elsevier B.V., 2017).
Figure 23(a) Schematic diagram of the preparation of B-doped nanoparticles (BCNP) by solution plasma. (b) SEM image, (c) TEM images, and particle size distribution image; (d) SAED diffraction pattern; and (e) HRTEM images of BCNP [145]. (Reproduced with permission from [145]. Elsevier B.V., 2015).