| Literature DB >> 29364852 |
Fabio Boccuni1, Riccardo Ferrante2, Francesca Tombolini3, Daniela Lega4, Alessandra Antonini5, Antonello Alvino6, Pasqualantonio Pingue7, Fabio Beltram8, Lucia Sorba9, Vincenzo Piazza10, Mauro Gemmi11, Andrea Porcari12, Sergio Iavicoli13.
Abstract
With the increasing interest in the potential benefits of nanotechnologies, concern is still growing that they may present emerging risks for workers. Various strategies have been developed to assess the exposure to nano-objects and their agglomerates and aggregates (NOAA) in the workplace, integrating different aerosol measurement instruments and taking into account multiple parameters that may influence NOAA toxicity. The present study proposes a multi-metric approach for measuring and sampling NOAA in the workplace, applied to three case studies in laboratories each dedicated to materials with different shapes and dimensionalities: graphene, nanowires, and nanoparticles. The study is part of a larger project with the aim of improving risk management tools in nanomaterials research laboratories. The harmonized methodology proposed by the Organization for Economic Cooperation and Development (OECD) has been applied, including information gathering about materials and processes, measurements with easy-to-use and hand-held real-time devices, air sampling with personal samplers, and off-line analysis using scanning electron microscopy. Significant values beyond which an emission can be attributed to the NOAA production process were identified by comparison of the particle number concentration (PNC) time series and the corresponding background levels in the three laboratories. We explored the relations between background PNC and microclimatic parameters. Morphological and elemental analysis of sampled filters was done to identify possible emission sources of NOAA during the production processes: rare particles, spherical, with average diameter similar to the produced NOAA were identified in the nanoparticles laboratory, so further investigation is recommended to confirm the potential for worker exposure. In conclusion, the information obtained should provide a valuable basis for improving risk management strategies in the laboratory at work.Entities:
Keywords: exposure measurement; harmonized tiered approach; industrial hygiene; nanotechnologies; occupational safety and health; risk analysis
Mesh:
Substances:
Year: 2018 PMID: 29364852 PMCID: PMC5855571 DOI: 10.3390/ijms19020349
Source DB: PubMed Journal: Int J Mol Sci ISSN: 1422-0067 Impact factor: 5.923
Figure 1The three nano-objects and their agglomerates and aggregates (NOAA): two-dimensional (2D) graphene (G) (a), one-dimensional (1D) InAs nanowires (NW) (b) and zero-dimensional (0D) SiO2 core shell nanoparticles with Au nanostructure (NP) (c).
Technical Data Sheets of Three Nanomaterials: Nanoparticles (NP), Nanowires (NW), and Graphene (G). n.a.: not available.
| Technical Data Sheets | NP | NW | G |
|---|---|---|---|
| 1. NOAA information | |||
| 1.1 Technical name and/or commercial name | Hollow silica nanoparticles with embedded gold nanoparticles (AuSiO2) | Semiconductor nanowires (NW) | Graphene |
| 1.2 CAS Number | CAS number Au: 7440-57-5 | n.a. (CAS number InAs) | n.a. (CAS number Carbon) |
| 1.3 Molecular structure/Crystal structure | 100 nm silica (SiO2) nanocapsules containing: (i) 30–500 gold nanoparticles with diameters 2–4 nm; (ii) poly( | Crystal structure: mainly hexagonal (Wurzite) with cubic insertions (Zincoblende). NW have their long axis oriented along the hexagonal c-axis which is parallel to the cubic <111> direction | Single atomic layer of carbon atoms disposed in a honeycomb lattice |
| 1.4 Chemical composition (including surface compounds) | The powders are 5% gold and 95% silica (SiO2) and organic polymers. | InAs (50/50) with a top Au0.5In0.5 nanoparticle (eutectic). | Carbon |
| 1.5 Physical form and shape | Spherical nanoparticles | NW are rod-shaped crystals, with hexagonal cross-section and a AuIn nanoparticle attached at one end. | Bi-dimensional crystal taking the form of flakes |
| 1.5.1 Common form | The common forms are: | NW grow normal to the InAs (111) substrate surface, forming a “forest” connected to the substrate at one end. | Single crystals with dimensions from microns to millimeters |
| 1.6 Surface chemistry | Negative charge (−21 V in PBS) | InAs | Carbon |
| 1.7 Production method | Wet chemical synthesis | Chemical Beam Epitaxy (CBE) synthesis | Chemical Vapor Deposition (CVD) synthesis |
| 2. NOAA Characterization | |||
| 2.1 Aggregation/Agglomeration | Single nanoparticles in solutions. Possible aggregation after freeze-drying | NW can agglomerate if detached from the substrate | If detached from the substrate they can aggregate |
| 2.2 Solubility | Tested, up to 100 mg/mL in aqueous solutions | Insoluble in bases, organic solvents and biological media. Soluble in acids. | Non soluble |
| 2.2.1 Dispersibility | Up to 100 mg/mL in ethanol | NW can be dispersed in liquid (i.e., 2-propanol) via sonication or by mechanical transfer from the substrate. | Can be dispersed in organic solvents |
| 2.3 Crystal phase | n.a. | NW are single crystals with a lattice parameter of 6.0583 Angstrom | Hexagonal bi-dimensional lattice |
| 2.4 Dustiness (or bulk material density) | n.a. | Bulk InAs density: 5.67 g/cm3 | n.a. |
| 2.5 Representative image (SEM) | See attached | See attached | In Convertino et al. [ |
| 2.6 Size | 100 ± 20 from TEM images (analysis of at least 300 nanoparticles) | NW can be synthetized with average diameters in the 30–100 nm range, and lengths of 1–2 μm. Dimensions are typically obtained from SEM images. | Graphene flakes have lateral dimensions that vary from fraction of microns to millimeters |
| 2.7 Surface area | About 30,000 nm2/nanostructure | 300,000 nm2 (1 NW) | n.a. |
| 2.8 Catalytic or photocatalytic activity | No | No | n.a. |
| 2.9 Density | n.a. | Average substrate area density of NW ranges from 1 to 250 NW per μm | n.a. |
| 2.10 Porosity | n.a. | No | n.a. |
| 2.11 Surface reactivity | Covalent bonding with silanols (ex. APTES). Possible adsorptions of positive molecules | Little reactivity | n.a. |
| 2.12 Other information | n.a. | n.a. | n.a. |
| 3. Processes | |||
| 3.1 Average quantity produced/used per year | 1 g | 20 mg | 2–3 mg |
| 3.2 Average quantity produced/used in each process | 1 mg | 40 μg | 1 µg |
| 3.3 Process phases description | Synthesis. The nano-architectures are synthesized by a wet chemical approach. A yellow solution of chloroauric acid underwent fast reduction by sodium borohydride in the presence of poly(sodium 4-styrene sulfonate) (PSS), with vigorous stirring, resulting in a deep orange colloidal solution of negatively charged gold NP, less than 3 nm in diameter. Aggregation. The 3 nm gold NP are then assembled in spherical arrays by controlled aggregation achieved by ionic interaction with positive poly( Shell building. The arrays are purified by cycles of centrifugation and silica-coated by a modified Stöber method [ Drying. The colloidal solutions were usually frozen in liquid nitrogen and freeze-dried overnight to obtain a red powder (about 1 mg for each synthesis with an estimated total laboratory production of 1 g/year). | CBE growth. NW are synthesized through epitaxial growth techniques, e.g., the CBE, on a macroscopic crystalline substrate made of a semiconductor material, Si or InAs [ Sample loading. This phase is divided into two following steps:
Sample mounting and loading (before CBE growth). The substrate is first cleaved into small pieces of about 1 cm × 1 cm, and then fixed on a sample holder made of Mo through In-bonding inside a glove box. After that, the sample holder is placed in a cassette and transferred into the CBE system via a load-lock. The load-lock is pumped by a turbo-molecular pump and a base pressure of 10−8 Torr can be achieved in 1–2 h. The cassette is then transferred into the preparation chamber, and after that to the growth chamber, for NW synthesis. Sample unloading and unmounting (after the CBE growth). The plates with the grown samples are transferred from the growth chamber into the preparation chamber, mounted in the cassette that is transferred into the load-lock, and then again into the glove box, where the sample holder is placed on a hot plate at about 350 °C, to allow the In to melt, and the sample can be removed from the Mo plate. Frequently, a new sample mounting and loading (phase 2.1) is done immediately after the sample removal (phase 2.2). Sample cleavage. The next phase is cleavage of the sample, for its morphological characterization by SEM. | Sample preparation and loading. The reactor chamber is vented and the reactor lid is lifted manually; the sample (up to 10 × 10 mm) is placed on the graphite heater inside the reactor; the chamber is closed and pumped up to 5 × 10–1 mbar before starting a process. CVD Growth. The growth process can be divided into two steps, both conducted in a commercial resistively heated cold-wall reactor (Aixtron HT-BM):
Hydrogen etching. SiC substrates are treated with hydrogen etching at a temperature of around 1200 °C and a pressure of 450 mbar for a few minutes, in order to remove polishing scratches and obtain atomically flat terraces. Thermal decomposition. The hydrogen etched substrates are heated in Argon atmosphere at a temperature above 1300 °C and a pressure of 780 mbar for 10–15 min. Reactor cleaning. The quartz and ceramic parts are periodically cleaned in an oven operated in air, in order to remove any carbon deposit. During the cleaning some reactor components are restored by graphite spraying. Cleaning in the furnace. The parts are heated at 950 °C for at least one hour. |
| 3.4 Workplace description | The NP laboratory has an area of 30 m2 (about 90 m3 of volume) | The NW laboratory has an area of 20 m2 (about 60 m3 of volume) | G laboratory has an area of 40 m2 (about 120 m3 of volume) |
| 3.4.1 Other processes in the same workplace | The synthesis are performed in the lab where are also performed chemical synthesis and purifications of organic molecules. | Substrates with NW can be cleaved inside the negative pressure glove box to do SEM observation or other characterization. During SEM observation (taking place in an ISO6 cleanroom) o additional processes take place. | n.a. |
| 3.4.2 Ventilation system | Mechanical ventilation system producing an air change of 3 volumes per hour | Mechanical ventilation system producing an air change of 3 volumes per hour; in case of emergency an automatic system for aspiration/cleaning starts. | Mechanical ventilation system producing an air change of 3–6 volumes per hour |
| 3.5 Number of workers | 1 | 2–3 | 1–2 |
| 3.7 Avg duration of production process | 5 h | 2 h | 2 days |
| 3.8 Avg working days per year | 250 | 230 | n.a. |
| 3.9 Number of production processes per day | 0–6 | 3–4 | n.a. |
| 3.10 Risk assessment method and results | Control Banding: Medium | Control Banding: High | Control Banding: High |
| 3.11 Exposure measurements/monitoring | n.a. | n.a. | n.a. |
| 3.12 Safety operating procedures | yes | yes | yes |
| 3.13 Protective equipment | Phases 1 and 4 are performed within chemical ventilated hood. Worker equipped with personal protective devices (gloves, clothing and glasses). | Phase 1 is in closed system (ultra-high-vacuum reactor); phases 2–3 are performed in a ventilated glove box. Workers are equipped with personal protective devices (gloves, clothing, half- and full-face masks with A2B2E2K2P3 filters). | Phases 2 and 4 are fulfilled in a closed system. Workers are equipped with personal protective devices (gloves, clothing and masks). |
| 4. References | |||
| 4.1 Main references | Voliani and Piazza [ | Tomioka et al. [ | Novoselov et al. [ |
| 5. Other | |||
| 5.1 Any other available information | n.a. | n.a. | n.a. |
Figure 2SEM images of: (a) graphene (G) deposited on SiC (left panel) and Cu (right panel) substrates, magnification 16.72 Kx and 39 x; (b) InAs nanowires (NW) and histogram of section diameter size distribution (DNW), magnification 200 Kx; (c) SiO2 core shell with Au nanostructures (NP) and histogram of diameter size distribution (DNP), magnification 200 Kx.
Figure A1Nanoparticles (NP).
Figure 3Box plots of far-field (FF), outdoor, and near-field (NF) background particle number concentration (PNC) measured by condensation particle counter (CPC) (#/cm3).
Average and standard deviation of measured background concentrations (#/cm3).
| Background Type | Collection Interval | Mean PNC (#/cm3) | σ bkg (#/cm3) |
|---|---|---|---|
| bkgFF | Day 5 | 948 | 127 |
| bkgFF | Day 6 | 1023 | 136 |
| bkgFFavg | Day 5–Day 6 | 986 | 167 |
| bkgoutdoor | Day 9 | 6554 | 1519 |
| bkgNF-G | Day 3 | 2966 | 258 |
| bkgNF-NW | Day 1 | 2835 | 157 |
| bkgNF-NP | Day 7 | 2005 | 95 |
Figure 4Time series of PNC (#/cm3) measured by CPC in the G (a), NW (b) and NP (c) laboratories. The insets show the corresponding fast mobility particle sizer (FMPS) measurements.
Figure 5SEM image (a,b) and EDS spectrum (c,d) of SiO2 core shell NPs collected by the Sioutas (Stage D: 250–500 nm): Magnification 100 Kx, detector SE2, EHT 10.00 KV, WD 8.3 mm.
Figure 6NP laboratory: PNC curve (solid black line + solid dots), background curve (dashed black line) and residual curve (black line + empty dots) as the difference between the PNC curve and the background curve, and the relative humidity curve (blue line + triangles).
Figure 7Schematic maps of the NW lab (a), G lab (b), NP lab (c) and BkgFF lab (d), including the places where each phase (ph.) of the three processes was done and the location of the FF background collection.
Main specifications of real-time and time-integrated instruments employed in the intensive measurement campaign. UV: ultraviolet; PAHs: polycyclic aromatic hydrocarbons; TB: tracheobronchial; A: alveolar.
| Instrument | Class | Principle of Operation | Outputs | Size Range (nm) | Time Resolution (s) | Total Flow L/min | Detection Limits |
|---|---|---|---|---|---|---|---|
| CPC | Real-time device | Optical detection | Particle number concentration (#/cm3) | 10–1000 | 1 | 0.7 | 1 to 100,000 #/cm3 |
| FMPS | Real-time device | Electrical mobility | Particle number concentration (#/cm3) | 5.6–560 | 1 | 10 | Small particles: |
| NSAM | Real-time device | Diffusion charging | Avg. (µm2/cm3) and Tot. (µm2) surface area of TB or A fractions | 10–1000 | 1 | 2.5 | TB: 0 to 2500 μm2/cm3 |
| O3 Analyzer | Real-time device | UV photometric measurement | Ozone conc. (ppb) | - | 20 | 1–3 | >1 ppb |
| PAS2000 | Real-time device | Photoelectric Ionization | PAHs (ng/m3) | 10–1000 | 10 | 2 | >3 ng/m3 |
| nanoMOUDI | Time-integrated device: | Aerodynamic diameter | Particle gravimetric mass | 10–18,000 | - | 30 | - |
| Sioutas | Time-integrated device: | Aerodynamic diameter | Particle gravimetric mass | 250–2500 | - | 9 | - |
Time sheet of measurements during the three case studies.
| Day/Hours | Process/Phase | Day/Hours | Process/Phase |
|---|---|---|---|
| 10:26 a.m.–10:41 a.m. | 0. Background NF | 9:40 a.m.–9:55 a.m. | 0. Background NF |
| 10:41 a.m.–12:05 a.m. | 1. CBE Growth | 9:56 a.m.–11:45 a.m. | 1. CBE Growth |
| 12:07 a.m.–12:33 a.m. | 2. Sample Loading | 12:00 a.m.–12:09 a.m. | 2. Sample Loading |
| 12:25 a.m.–3:15 p.m. | 1. CBE Growth | 12:18 a.m.–12:19 a.m. | 3. Sample Cleavage |
| 2:38 p.m.–2:49 p.m. | 2. Sample Loading | 1:15 a.m.–3:25 p.m. | 1. CBE Growth |
| 3:15 p.m.–4:35 p.m. | 1. CBE Growth | 1:35 p.m.–1:41 p.m. | 2. Sample Loading |
| 4:45 p.m.–5:00 p.m. | 2. Sample Loading | 1:42 p.m.–1:45 p.m. | 3. Cleavage |
| 5:00 p.m.–6:10 p.m. | 0. Background NF | 3:58 p.m.–4:07 p.m. | 2. Sample Loading 1 |
| 4:08 p.m.–4:09 p.m. | 3. Sample Cleavage 1 | ||
| 4:26 p.m.–5:09 p.m. | 0. Background NF | ||
| 10:10 a.m.–10:25 a.m. | 0. Background NF | 10:05 a.m.–10:20 a.m. | 0. Background NF |
| 10:25 a.m.–10:34 a.m. | 1. Sample Preparation and Recator 1 Opening | 10:20 a.m.–10:21 a.m. | 1. Sample Preparation and Recator 1 Opening |
| 10:34 a.m.–11:00 a.m. | 2. CVD Growth | 10:21 a.m.–12:05 a.m. | 2. CVD Growth |
| 11:00 a.m.–11:03 a.m. | 1. Sample Preparation and Recator 1 Opening | 10:45 a.m.–10:55 a.m. | 1. Sample Preparation and Recator 2 Opening |
| 11:03 a.m.–11:50 a.m. | 2. CVD Growth | 12:05 a.m.–12:12 a.m. | 1. Sample Preparation and Recator 1 Opening |
| 11:50 a.m.–11:53 a.m. | 1. Sample Preparation and Recator 1 Opening | 12:12 a.m.–12:33 a.m. | 3.1 Cleaning |
| 11:53 a.m.–12:49 a.m. | 2. CVD Growth | 12:27 a.m.–12:30 a.m. | 3.2 Cleaning: Graphite Spraying |
| 12:49 a.m.–12:53 a.m. | 1. Sample Preparation and Recator 1 Opening | 12:33 a.m.–2:00 p.m. | 0. Background NF |
| 12:53 a.m.–2:58 p.m. | 2. CVD Growth | 2:00 p.m.–2:30 p.m. | 0. Background NF 2 |
| 2:58 p.m.–3:00 p.m. | 1. Sample Preparation and Recator 1 Opening | 2:30 p.m.–end of cycle (Day 5) | 4. Cleaning in Furnace 2 |
| 3:00 p.m.–5:30 p.m. | 2. CVD Growth | ||
| 5:30 p.m.–6:05 p.m. | 0. Background NF | ||
| 11:48 a.m.–6:15 p.m. | 0. Background FF | 9:30 a.m.–5:09 p.m. | 0. Background FF |
| 10:00 a.m.–10:05 a.m. | 0. Background NF 2 | ||
| 10:05 a.m.–10:10 a.m. | 4. Cleaning: Opening The Furnace 2 | ||
| 2:57 p.m.–3:12 p.m. | 0. Background NF | 9:33 a.m.–9:48 a.m. | 0. Background NF |
| 3:12 p.m.–3:33 p.m. | 1. Synthesis | 9:48 a.m.–10:10 a.m. | 1. Synthesis |
| 3:33 p.m.–3:45 p.m. | 2. Aggregation | 9:53 a.m.–9:55 a.m. | 4.1 Drying: Vacuum Pump Turned off (NP produced during day 7) |
| 3:45 p.m.–7:00 p.m. | 3. Shell Building | 10:10 a.m.–10:25 a.m. | 2. Aggregation |
| 7:00 p.m.–7:05 p.m. | 4.1 Drying: Vacuum Pump Turned on | 10:25 a.m.–1:26 p.m. | 3. Shell Building |
| 7:05 p.m.–7:19 p.m. | 4.2 Drying | 1:26 p.m.–1:29 p.m. | 4.1 Drying: Vacuum Pump Turned oN |
| 1:29 p.m.–3:24 p.m. | 4.2 Drying | ||
| 3:24 p.m.–3:28 p.m. | 4.1 Drying: Vacuum Pump Turned off | ||
| 4:25 p.m.–5:29 p.m. | 0. Background NF | ||
| 9:40 a.m.–5:28 p.m. | 0. Background Outdoor | ||
1 CPC and FMPS placed inside the glove box; 2 CPC and FMPS placed close to the furnace.