| Literature DB >> 29238741 |
Demetrios D Chronopoulos1, Aristides Bakandritsos1, Martin Pykal1, Radek Zbořil1, Michal Otyepka1.
Abstract
Fluorographene, formally a two-dimensional stoichiometric graphene derivative, attracted remarkable attention of the scientific community due to its extraordinary physical and chemical properties. We overview the strategies for the preparation of fluorinated graphene derivatives, based on top-down and bottom-up approaches. The physical and chemical properties of fluorographene, which is considered as one of the thinnest insulators with a wide electronic band gap, are presented. Special attention is paid to the rapidly developing chemistry of fluorographene, which was advanced in the last few years. The unusually high reactivity of fluorographene, which can be chemically considered perfluorinated hydrocarbon, enables facile and scalable access to a wide portfolio of graphene derivatives, such as graphene acid, cyanographene and allyl-graphene. Finally, we summarize the so far reported applications of fluorographene and fluorinated graphenes, spanning from sensing and bioimaging to separation, electronics and energy technologies.Entities:
Keywords: Chemistry; Covalent functionalization; Fluorographene; Graphene derivatives
Year: 2017 PMID: 29238741 PMCID: PMC5721099 DOI: 10.1016/j.apmt.2017.05.004
Source DB: PubMed Journal: Appl Mater Today ISSN: 2352-9407
Fig. 1Illustration of A) exfoliation strategies for the preparation of fluorinated graphenes and, B) fluorination approaches for the preparation of fluorinated graphenes.
Fig. 2A) The electronic band structure of FG in the vicinity of the band gap, which is predicted to amount up to 8 eV. B) SEM (upper part), TEM (middle part), and carbon and fluorine EDS maps (bottom part) images of FG. C) Geometrical features of the hexagonal unit of FG. D) The distance between the F–F planes in FG (3.3 Å) and the interlayer distance between two FG layers (6.2 Å), E) AB stacking motif of FG in graphite fluoride.
Fig. 3Reactions of fluorographene lead to a wide portfolio of graphene derivatives.
Fig. 4Illustration showing the Ge-based metal-oxide-semiconductor (MOS) device simultaneously utilizing the fluorinated graphene as diffusion barrier and dielectric layer. (Reprinted with permission from Zheng et al. [145] Copyright 2015: Wiley-VCH Verlag GmbH & Co.).
Fig. 5FG acting as a probe in laser desorption/ionization time-of-flight mass spectrometry. (Reprinted with permission from Huang et al. [157] Copyright 2017: American Chemical Society.).
Fig. 6Schematics illustrating the structure of HFGO@ZIF-8 composite, fluorinated graphene oxide pillared by the zeolite. (Reprinted with permission from Jayaramulu et al. [159] Copyright 2016: Wiley-VCH Verlag GmbH & Co.).