| Literature DB >> 21053339 |
Rahul R Nair1, Wencai Ren, Rashid Jalil, Ibtsam Riaz, Vasyl G Kravets, Liam Britnell, Peter Blake, Fredrik Schedin, Alexander S Mayorov, Shengjun Yuan, Mikhail I Katsnelson, Hui-Ming Cheng, Wlodek Strupinski, Lyubov G Bulusheva, Alexander V Okotrub, Irina V Grigorieva, Alexander N Grigorenko, Kostya S Novoselov, Andre K Geim.
Abstract
A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10(12) Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young's modulus of 100 N m(-1) and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.Entities:
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Year: 2010 PMID： 21053339 DOI： 10.1002/smll.201001555
Source DB: PubMed Journal: Small ISSN： 1613-6810 Impact factor: 13.281