| Literature DB >> 27973430 |
Sebastian Canovas-Carrasco1, Antonio-Javier Garcia-Sanchez2, Felipe Garcia-Sanchez3, Joan Garcia-Haro4.
Abstract
Nanotechnology is an emerging scientific area whose advances, among many others, have a positive direct impact on the miniaturization of electronics. This unique technology enables the possibility to design and build electronic components as well as complete devices (called nanomachines or nanodevices) at the nano scale. A nanodevice is expected to be an essential element able to operate in a nanonetwork, where a huge number of them would coordinate to acquire data, process the information gathered, and wirelessly transmit those data to end-points providing innovative services in many key scenarios, such as the human body or the environment. This paper is aimed at studying the feasibility of this type of device by carefully examining their main component parts, namely the nanoprocessor, nanomemory, nanoantenna, and nanogenerator. To this end, a thorough state-of-the-art review is conveyed to discuss, substantiate, and select the most suitable current technology (commercial or pre-commercial) for each component. Then, we further contribute by developing a complete conceptual nanodevice layout taking into consideration its ultra-small size (similar to a blood cell) and its very restricted capabilities (e.g., processing, memory storage, telecommunication, and energy management). The required resources as well as the power consumption are realistically estimated.Entities:
Keywords: nanodevice; nanotechnology; terahertz band; ultra-low power device; wireless nanosensor network
Year: 2016 PMID: 27973430 PMCID: PMC5191084 DOI: 10.3390/s16122104
Source DB: PubMed Journal: Sensors (Basel) ISSN: 1424-8220 Impact factor: 3.576
Figure 1Nanodevices flowing through the bloodstream.
Figure 2Nanodevice—a general view of our proposal.
Comparison of nanoprocessor technologies.
| Transistor Technology | Minimum Transistor Size | Advantages | Disadvantages | Feasibility |
|---|---|---|---|---|
| Silicon | 14 nm | Mature technology | Scalability concerns | Yes |
| Low-cost manufacturing | ||||
| SiGe | 7 nm | Good scalability | Experimental technology | Yes |
| Low-cost manufacturing | ||||
| Ultra-low power consumption | ||||
| CNT | Sub 20 nm | Great scalability | Experimental technology | Yes |
| Ultra-low power consumption | Difficult manufacturing process | |||
| High speed | ||||
| Atomic | One atom thick | Ultra-small size | Operation under strict laboratory conditions | Not yet |
Comparison of non-volatile memory technologies.
| Storage Technology | Cell Size | Advantages | Disadvantages | Feasibility |
|---|---|---|---|---|
| NAND Flash SLC | 784 nm2 | Mature technology | Scalability concerns | Yes |
| Low power consumption | ||||
| Low-cost manufacturing | ||||
| NAND Flash MLC | 392 nm2 | Mature technology | High power consumption | Yes |
| Low-cost manufacturing | Low write and read speed | |||
| NOR Flash | 1293 nm2 | Mature technology | Scalability concerns | Yes |
| High read speed | High power consumption (write) | |||
| Low energy consumption (read) | ||||
| Racetrack | 200 nm2 | Good scalability | Experimental technology | Not clear |
| High r/w speed | ||||
| Ultra-low power consumption | ||||
| GMR | 0.7 nm2 | Excellent scalability | Experimental technology | Not clear |
| High energy consumption (write) |
Comparison of RAM memory technologies.
| Storage Technology | Cell Size | Advantages | Disadvantages | Feasibility |
|---|---|---|---|---|
| DRAM | 2900 nm2 | Mature technology | High energy consumption | Yes |
| High density | ||||
| SRAM | 64,000 nm2 | Mature technology | Low density | Yes |
| Low energy consumption | ||||
| A-RAM | 1176 nm2 | High density | Novel technology | Yes |
| Low energy consumption | ||||
| PRAM | 127.5 nm2 | Ultra-high density | Experimental technology | Not yet |
| High access speed |
Figure 3Cross-section of a FGMOS transistor. The transversal voltage between the channel and the control gate attracts part of the electron flow (from source to drain) to the floating gate. This additional kinetic energy injects the charges into the FG, where they remain until an inverse voltage is applied.
Figure 4Radiocommunication scheme, transmitter and receiver endpoints.
Figure 5ZnO nanowire tensile and compression strains.
Comparison among storing technologies.
| Storage Technology | Advantages | Disadvantages | Feasibility |
|---|---|---|---|
| Batteries | High energy density | High degradation | Not clear |
| Mechanical properties | |||
| Use of toxic materials | |||
| Supercapacitors | High capacitance | Low energy density | Yes |
| Ultra low degradation | |||
| Mechanical properties (flexible and thin) | |||
| Non-toxic materials |
Figure 6Nanodevice layout.
Power consumption per component.
| Component | Power Consumption (nW) |
|---|---|
| Processor (ROM and RAM included) | 140 |
| Radiocommunication system | 1000 |
| Sensor | 50 |
| Flash memory module | 30/305 1 |
1 Read/Write, given in pJ/bit.