| Literature DB >> 26430114 |
Qing Cao1, Shu-Jen Han2, Jerry Tersoff2, Aaron D Franklin2, Yu Zhu2, Zhen Zhang2, George S Tulevski2, Jianshi Tang2, Wilfried Haensch2.
Abstract
Moving beyond the limits of silicon transistors requires both a high-performance channel and high-quality electrical contacts. Carbon nanotubes provide high-performance channels below 10 nanometers, but as with silicon, the increase in contact resistance with decreasing size becomes a major performance roadblock. We report a single-walled carbon nanotube (SWNT) transistor technology with an end-bonded contact scheme that leads to size-independent contact resistance to overcome the scaling limits of conventional side-bonded or planar contact schemes. A high-performance SWNT transistor was fabricated with a sub-10-nanometer contact length, showing a device resistance below 36 kilohms and on-current above 15 microampere per tube. The p-type end-bonded contact, formed through the reaction of molybdenum with the SWNT to form carbide, also exhibited no Schottky barrier. This strategy promises high-performance SWNT transistors, enabling future ultimately scaled device technologies.Entities:
Year: 2015 PMID: 26430114 DOI: 10.1126/science.aac8006
Source DB: PubMed Journal: Science ISSN: 0036-8075 Impact factor: 47.728