| Literature DB >> 27772720 |
Hong Chen Guo1, Enyi Ye1, Zibiao Li2, Ming-Yong Han1, Xian Jun Loh3.
Abstract
As a very promising surface coating technology, atomic layer deposition (ALD) can be used to modify the surfaces of polymeric materials for improving their functions and expanding their application areas. Polymeric materials vary in surface functional groups (number and type), surface morphology and internal structure, and thus ALD deposition conditions that typically work on a normal solid surface, usually do not work on a polymeric material surface. To date, a large variety of research has been carried out to investigate ALD deposition on various polymeric materials. This paper aims to provide an in-depth review of ALD deposition on polymeric materials and its applications. Through this review, we will provide a better understanding of surface chemistry and reaction mechanism for controlled surface modification of polymeric materials by ALD. The integrated knowledge can aid in devising an improved way in the reaction between reactant precursors and polymer functional groups/polymer backbones, which will in turn open new opportunities in processing ALD materials for better inorganic/organic film integration and potential applications.Entities:
Keywords: Atomic layer deposition; Inorganic/polymer interfaces; Polymeric materials; Surface chemistry; Thin films
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Year: 2016 PMID: 27772720 DOI: 10.1016/j.msec.2016.01.093
Source DB: PubMed Journal: Mater Sci Eng C Mater Biol Appl ISSN: 0928-4931 Impact factor: 7.328