J V Knutsson1, S Lehmann1, M Hjort1, P Reinke2, E Lundgren1, K A Dick1,3, R Timm1, A Mikkelsen1. 1. †Department of Physics and The Nanometer Structure Consortium, Lund University, P.O. Box 118, 22 100 Lund, Sweden. 2. ‡Department of Materials Science and Engineering, University of Virginia, 395 McCormick Road, Charlottesville, Virginia 22904, United States. 3. §Center for Analysis and Synthesis, Lund University, P.O. Box 124, 221 00 Lund, Sweden.
Abstract
While shell growth engineering to the atomic scale is important for tailoring semiconductor nanowires with superior properties, a precise knowledge of the surface structure and morphology at different stages of this type of overgrowth has been lacking. We present a systematic scanning tunneling microscopy (STM) study of homoepitaxial shell growth of twinned superlattices in zinc blende InAs nanowires that transforms {111}A/B-type facets to the nonpolar {110}-type. STM imaging along the nanowires provides information on different stages of the shell growth revealing distinct differences in growth dynamics of the crystal facets and surface structures not found in the bulk. While growth of a new surface layer is initiated simultaneously (at the twin plane interface) on the {111}A and {111}B nanofacets, the step flow growth proceeds much faster on {111}A compared to {111}B leading to significant differences in roughness. Further, we observe that the atomic scale structures on the {111}B facet is different from its bulk counterpart and that shell growth on this facet occurs via steps perpendicular to the ⟨112⟩B-type directions.
While shell growth engineering to the atomic scale is important for tailoring semiconductor nanowires with superior properties, a precise knowledge of the surface structure and morphology at different stages of this type of overgrowth has been lacking. We present a systematic scanning tunneling microscopy (STM) study of homoepitaxial shell growth of twinned superlattices in zinc blendeInAs nanowires that transforms {111}A/B-type facets to the nonpolar {110}-type. STM imaging along the nanowires provides information on different stages of the shell growth revealing distinct differences in growth dynamics of the crystal facets and surface structures not found in the bulk. While growth of a new surface layer is initiated simultaneously (at the twin plane interface) on the {111}A and {111}B nanofacets, the step flow growth proceeds much faster on {111}A compared to {111}B leading to significant differences in roughness. Further, we observe that the atomic scale structures on the {111}B facet is different from its bulk counterpart and that shell growth on this facet occurs via steps perpendicular to the ⟨112⟩B-type directions.
III–V semiconductor
nanowires (NWs) with highly controlled
structural and compositional heterostructures not only play an important
role for fundamental research[1,2] but also have proven
performance potential for devices within electronics,[3,4] photonics,[5,6] and energy harvesting.[6,7] A critical factor in the development of NW devices is epitaxial
shell growth (overgrowth) as it adds another engineering dimension
by providing the option to create radial variations in composition
or doping.[8,9] Shell growth control is complicated by a
number of effects such as undesired tapering and unwanted radial doping.[10] Still, for example, anisotropic overgrowth due
to polarity differences between NW sidewall facets[11,12] can be used to engineer novel NW sidewall decorations such as self-assembled
quantum dots (QDs).[9]In analogy to
the well-studied 2D planar epitaxial heterostructure
formation, NW shell growth beyond trial-and-error engineering requires
an intimate understanding of nucleation sites, growth speeds, and
interplay between neighboring facets to achieve the desired shell
structure. Also of importance are dynamic features such as any variations
of the ratio between layer nucleation and step flow growth. To further
complicate matters, atomic scale precision is needed to avoid unwanted
defect formation, and the growth should therefore be studied with
subnanometer resolution. Such high precision studies have until now
exclusively been carried out using high resolution transmission electron
microscopy (HRTEM). This technique has provided great insights into
shell growth but only allows the side or topview profiles of the NWs
to be studied. However, detailed studies of NW surfaces can be conducted
with scanning tunneling microscopy (STM) which is capable of resolving
individual surface atoms. We present the first systematic study of
the morphology and overgrowth of the V-groove shapes of twin plane
superlattices (TSLs), made possible by our growth capabilities in
combination with our surface science analytical tools.[13−17]Systematic surface studies of NW sidewall growth are especially
relevant as the limited size of their facets can result in behavior
not found for “infinite” planar surfaces. In addition,
NWs often show crystal structures different from the thermodynamically
stable zinc blende (Zb), such as the wurtzite (Wz) structure or random
stacking. Investigating such structures is interesting not only because
it can enhance our fundamental understanding of NW shell growth but
also because it is highly relevant for NW electronics devices since
NW device performance has been shown to be strongly influenced by
surface morphology and surface defects.[10,16,18−20] Since NWs can exhibit complex
surface geometries such as the sawtooth shaped sidewalls emerging
in TSLs,[21,22] consisting of alternating {111}A- and {111}B-type
nanofacets, it is possible to study atomically precise V-shaped grooves.
The effects on growth processes due to the corner geometry of such
grooves have been discussed,[10,23−28] but no surface studies with atomic precision have been conducted.
In addition, detailed understanding of the overgrowth mechanics of
TSLs would allow for positioning control of QDs.[29]In this work, we present STM studies of the homoepitaxial
overgrowth
of the V-grooves between {111}A and {111}B facets of ZbTSLInAs NWs.
Growing InAs NWs often results in natural tapering, i.e., radial growth
by material incorporation on the NW sidewalls in parallel to the intended
axial growth. As a result, a gradient in overgrowth (shell) is formed
along the NW growth axis with little shell growth having occurred
nearest to the axial growth front (at the seed particle) but substantial
overgrowth at the bottom of the NW. By imaging along the NW, information
on different stages in the overgrowth process could be obtained, allowing
us to gain insight into the transition from the initial sawtooth {111}A/B-type
facet morphology of ZbTSL to smooth {110}-type facets;[15] see Figure 1B,C. The
high resolution of STM allows for imaging of single atomic steps as
well as of individual atoms on the NW facets, providing a detailed
picture of the overgrowth process.
Figure 1
(A) 30° degree tilted view scanning
electron micrograph, color
coded for Zb (red) and Wz (green) parts, as well as a model NW. Inset
shows a NW with 1 Zb segment in scale with the main image. (B) Illustration
of Zb TSL in different stages of overgrowth, displaying the {111}A/B-type
facets (blue) as well as the {110}-type overgrowth facets (gray with
red borders). (C) STM images of {110} facet from the top, middle,
and bottom Zb segment, respectively. Top and bottom image have been
differentiated to make height variations more clearly visible. U = −1.6 V, I = 100 pA for top image
and U = −1.0 V, I = 50 pA
for the middle and bottom.
(A) 30° degree tilted view scanning
electron micrograph, color
coded for Zb (red) and Wz (green) parts, as well as a model NW. Inset
shows a NW with 1 Zb segment in scale with the main image. (B) Illustration
of ZbTSL in different stages of overgrowth, displaying the {111}A/B-type
facets (blue) as well as the {110}-type overgrowth facets (gray with
red borders). (C) STM images of {110} facet from the top, middle,
and bottom Zb segment, respectively. Top and bottom image have been
differentiated to make height variations more clearly visible. U = −1.6 V, I = 100 pA for top image
and U = −1.0 V, I = 50 pA
for the middle and bottom.
Experimental Section
The NWs
were grown on an InAs(111)B substrate in a metal–organic
vapor phase epitaxy (MOVPE) reactor using Au particles to seed the
growth. 80 nm Au particles with an areal density of 0.5 and 1.0 μm–2 were deposited using an aerosol technique.[30] A 10 min anneal at 550 °C, in an AsH3/H2 atmosphere, was performed prior to growth in order
to remove surface oxides. Following this, the temperature was set
to the growth temperature of 460 °C, and upon thermal stabilization,
growth was initiated. Growth material was supplied via trimethylindium
(TMIn) and arsine (AsH3) precursors. The growth was executed
in an AIXTRON 200/4 system using a total reactor flow of 13 standard
liters per minute (slm) at a total reactor pressure of 100 mbar. Postprocessing
involved cooling in an AsH3/H2 atmosphere in
order to avert thermal decomposition of the NWs. The crystal structure
was tuned along the NW by altering the V/III-precursor flow ratio
as described in refs (31 and 32).The NWs were transferred to an n-doped epi-ready InAs (111)B substrate
by mechanical break-off[14] and loaded into
vacuum. Removal of native oxides, formed after transport in air, was
performed by annealing the samples at 380 °C in an atomic hydrogen
atmosphere with a pressure of 2 × 10–6 mbar
for 20–40 min. This has been proven to be a suitable way to
clean III–V NWs.[13,14] Importantly, this deoxidation
procedure was found to remove the native oxides while preserving the
general step structure and resulting in no new atomic scale reconstructions
on the surface; see the Supporting Information for more details.The oxide free NWs were investigated using
an Omicron XA STM operated
in ultrahigh vacuum (UHV, p < 10–9 mbar) at room temperature. The STM was operated in constant current
mode, and the set point current and sample bias will be denoted by I and U, respectively. Electrochemically
etched W-tips that were cleaned and sharpened by in situ Ar-sputtering
were used throughout the study.This study is based on data
from two different types of NW samples,
having either 1 or 4 Zb segments. After NW break-off, the two samples
usually oriented themselves differently on the substrate such that
NWs with 1 Zb segment had {111}A/B-type facets facing upward whereas
the 4 Zb segment sample oriented itself with the {110}-type facets
facing up. In Figure 1A, scanning electron
micrographs of typical NWs from both samples and a model NW can be
seen. The crystal structure of each segment was confirmed using TEM
as well as atomically resolved STM images.
Results and Discussion
STM observations of the top Zb segment (see Figure 2A) reveal alternating {111}A- and {111}B-type facets along
the [−1–1–1] growth axis in {112}-equivalent
planes of the NW sidewalls, resulting in a sawtooth like shape of
the Zb segment. The angle between {111}A/B-type facets and the [−1–1–1]
growth axis was measured to be 20° in the STM topography images,
which is in agreement with the expected 19.5°. Every interface
between adjacent {111}A/B-type facets corresponds to a twin plane.
As shown in Figure 2A,B, two types of interfaces
can be identified, concave interfaces (twin plane in the bottom of
a groove) and convex interfaces (twin planes on the ridges of the
sawtooth structure). Adjacent to the sawtooth structure in Figure 2A, with a relative rotation of 30° around the
[−1–1–1] axis, thin zigzag shaped {110}-type
facets can be seen. Their presence has been attributed to overgrowth,[15] and the zigzag shape of the facet edge comes
as a result of a 60° rotation of the crystal symmetry with respect
to the growth axis, occurring at each twin plane position.
Figure 2
(A) STM image
represented in 3D of a top Zb segment seen from a
⟨112⟩-type direction. The convex and concave {111}A/B
interfaces are marked with solid and dashed (both green) arrows, respectively. U = −1.0 V, I = 50 pA. (B) Line
profile along the [−1–1–1] direction
of the Zb segment, as marked by the black dashed arrow in (A).
(A) STM image
represented in 3D of a top Zb segment seen from a
⟨112⟩-type direction. The convex and concave {111}A/B
interfaces are marked with solid and dashed (both green) arrows, respectively. U = −1.0 V, I = 50 pA. (B) Line
profile along the [−1–1–1] direction
of the Zb segment, as marked by the black dashed arrow in (A).For NWs grown in the [−1–1–1]
direction, the
In-terminated {111}A-type facets of the NW sidewalls will be facing
upward and the As-terminated {111}B-type facets face downward with
respect to the growth direction. The growth direction was determined
by locating the Au seed particle, making it possible to identify the
{111}A/B-type facets directly.When traversing along the NW
(thus imaging the V-grooves at different
stages of overgrowth), five distinct surface morphologies could be
identified for the {111}A/B-type facets, denoted as stages I–V.
Each stage represents later and later times in the overgrowth process
(stage I being the earliest, i.e., the part closest to the Au-particle);
see Figure 3A. Stages IV and V were generally
observed in the middle and bottom segments of the 4 Zb segment NW
sample; see Figure 1A.
Figure 3
(A) Model of NW illustrating
where different overgrowth stages
in general were found along the NW. (B–D) STM images and line
profiles of the top Zb segment in overgrowth stages I–III.
The images have been differentiated to make the height variations
more clearly visible. (B) Concave interface between adjacent {111}A-type
(bottom) and {111}B-type facets (top) representative for stage I with
the twin plane marked as a black dashed arrow. The round 2 nm sized
features along the interface line correspond to unintentional material
deposition from the STM tip. The position of the line profile is marked
by the black dashed line. The red and blue areas in the line profiles
represent relative overgrowth on {111}B and {111}A, respectively,
with the gray area corresponding to ideal {111}A/B-type facets without
overgrowth, U = −1.6 V, I = 150 pA. (C) {111}A/B-type facets in stage II. The small island
on the {111}A-type facet was deposited by the STM tip, U = −1.7 V, I = 100 pA. (D) {111}A/B-type
facets in stage III, U = −1.6 V, I = 150 pA.
(A) Model of NW illustrating
where different overgrowth stages
in general were found along the NW. (B–D) STM images and line
profiles of the top Zb segment in overgrowth stages I–III.
The images have been differentiated to make the height variations
more clearly visible. (B) Concave interface between adjacent {111}A-type
(bottom) and {111}B-type facets (top) representative for stage I with
the twin plane marked as a black dashed arrow. The round 2 nm sized
features along the interface line correspond to unintentional material
deposition from the STM tip. The position of the line profile is marked
by the black dashed line. The red and blue areas in the line profiles
represent relative overgrowth on {111}B and {111}A, respectively,
with the gray area corresponding to ideal {111}A/B-type facets without
overgrowth, U = −1.6 V, I = 150 pA. (C) {111}A/B-type facets in stage II. The small island
on the {111}A-type facet was deposited by the STM tip, U = −1.7 V, I = 100 pA. (D) {111}A/B-type
facets in stage III, U = −1.6 V, I = 150 pA.The type I morphology,
depicted in Figure 3B, could only be identified
within the first few twin planes closest
to the Au particle corresponding to very limited overgrowth. In this
stage, the {111}A-type facets are atomically flat without island formation
or noncomplete overgrowth layers (individual atomic layers from the
shell growth). However, step bunching is found toward the convex interface
as indicated by a rounded shape of the line profiles at such positions.
The relative amount of overgrowth between the {111}A/B-type facets
can be estimated from a line profile by identifying the positions
of the concave and convex interfaces. An original, nonovergrown, {111}A/B-type
facet can then be approximated by interpolating a line (along ⟨111⟩-type
directions) between the concave and convex interfaces. The difference
between the line profile and the estimated original facet is assumed
to be a result of overgrowth. Using this method, it can be seen from
Figure 3B that the overgrown film is thicker
on the {111}A-type facet compared to the {111}B-type facet, indicative
of a lower growth on the {111}B-type facet. In line profiles, across
the two facets (as is normally observed in HRTEM), they appear quite
similar in roughness at this stage, but from the STM top view, we
can see that the {111}B-type facets have steps toward the interfaces
of the adjacent {110}-type facets in two ⟨112⟩B-type
directions; thus, in fact, the {111}B-type is more rough already at
this stage.In stage II, represented in Figure 3C, the
surface morphology of the {111}A-type facets is equivalent to the
stage I morphology. When comparing the {111}B-type facet in stages
I and II, several islands having the shape of one or more merged triangles
can be seen in stage II, which was not observed in stage I. The triangle
shaped layers, all having a common base at the concave interface,
have steps in the ⟨112⟩B-type directions and corners
pointing in the ⟨112⟩A-type directions. These layers
are assumed to be newly formed (incomplete) overgrowth layers on the
{111}B-type facet. Since these newly formed layers all have a common
base at the concave twin interface, it is suggested that nucleation
of overgrowth layers on the {111}B-type facets always is initiated
at this position. It has been proposed previously that the corner
geometry of the concave interface favors nucleation.[10,23−25] Our study strongly suggests that this interface is
the preferred site of nucleation for the overgrowth and that growth
occurs exclusively as steps in the ⟨112⟩B-type directions.No islands could be observed on either the {111}A- or {111}B-type
facets that did not have a base at the concave interface, and we suggest
that overgrowth layers on both facets grow via step flow growth once
nucleation has occurred at the concave interface. The triangular shape
of overgrowth layers on the {111}B-type facet shows that the step
flow growth occurs along steps perpendicular to the ⟨112⟩B-,
no steps perpendicular to the ⟨112⟩A-type directions
are observed. This can be explained by the different atomic scale
termination of ⟨112⟩A/B-oriented step edges. A similar
behavior has been observed previously for metallic homoepitaxy on
2D surfaces[33] and is in agreement with observations on H-cleaned (111)B wafers,
where triangular islands also were observed.[34] No incomplete overgrowth layers were observed on {111}A-type facets
suggesting a very rapid growth relative the {111}B-type facets in
the ⟨112⟩-equivalent directions. We note that this growth
mode actually leads to a situation where the profiles of both facets,
as observed in Figure 3B, will look smooth,
while the top view reveals a considerable roughening perpendicular
to the NW growth direction.In stage III, see Figure 3D, additional
triangular layers have formed on the {111}B-type facets such that
many monolayers are visible. The areas of these new triangular layers
are small compared to the area of layers observed in stages I and
II. Although the concave interface itself is still well-defined, the
multitude of layers makes the {111}B-type facet appear somewhat disordered.
The curved shape of the {111}A-type is even more pronounced, making
it hard to clearly define the position of the twin plane at the convex
interface. The {111}A-type facet, however, exhibits no steps and can
still be considered as atomically flat. Despite the many incomplete
layers observed on the {111}B-type facet, the number of overgrowth
layers on the {111}A- and {111}B-type facets are found to be equal
at the concave interface for stages I–IV, as seen in corresponding
line profiles of Figures 3B–D and 4B. This suggests that growth of new layers on the
{111}A/B-type facets is coupled, i.e., initiated on both facets simultaneously
and from the same nucleus. In addition, many triangles can be seen
on the {111}B-type facet along a single interfacial line suggesting
that several nucleation events occur for each overgrowth layer. This
is consistent with the nucleation rate being fast compared to incorporation
of growth material at the sides of the triangular facets. An estimate
of the ratio between the step flow growth of the overgrowth layers
on the {111}B and the nucleation rate along the interface can be calculated
by assuming that the size of a triangle is correlated to the time
of nucleation; see the Supporting Information. We report a mean step flow growth progression per nucleation event,
γs, of 2.0 ± 1.9 nm/event in the ⟨112⟩B-type
directions for stage II of the overgrowth.
Figure 4
(A) STM image of Zb segment
in stage IV viewed in a ⟨110⟩-equivalent
direction with both {110}, {111}A-, and {111}B-type facets visible.
The image has been differentiated to make the height variations more
clearly visible. Twin planes are marked by red dashed lines; dashed
(yellow) arrows show the position of the bottom corner of the V-grooves.
The blue square denotes a contrast enhanced inset image with visible
atomic rows (white lines for guidance) on the {110}-type surface.
Black arrow defines the line profile show in (B). Red triangles show
well-defined part of {111}B facets. Inset (in black rectangle) illustrates the part of the
NW that is shown in the main image. (B) Line profile from (A). Dashed
arrows (black) show the bottom of the V-grooves. Vertical dashed lines
(black) represent twin plane positions. The red and blue areas represent
relative overgrowth on {111}B and {111}A, respectively, with the gray
area corresponding to ideal {111}A/B-type facets without overgrowth. U = −1.9 V, I = 100 pA.
(A) STM image of Zb segment
in stage IV viewed in a ⟨110⟩-equivalent
direction with both {110}, {111}A-, and {111}B-type facets visible.
The image has been differentiated to make the height variations more
clearly visible. Twin planes are marked by red dashed lines; dashed
(yellow) arrows show the position of the bottom corner of the V-grooves.
The blue square denotes a contrast enhanced inset image with visible
atomic rows (white lines for guidance) on the {110}-type surface.
Black arrow defines the line profile show in (B). Red triangles show
well-defined part of {111}B facets. Inset (in black rectangle) illustrates the part of the
NW that is shown in the main image. (B) Line profile from (A). Dashed
arrows (black) show the bottom of the V-grooves. Vertical dashed lines
(black) represent twin plane positions. The red and blue areas represent
relative overgrowth on {111}B and {111}A, respectively, with the gray
area corresponding to ideal {111}A/B-type facets without overgrowth. U = −1.9 V, I = 100 pA.The observation that the overgrowth layers on the
{111}B-type facets
in stage I are more complete compared to stages II and III suggests
that the growth rate is varying over time. The almost complete layers
formed in stage I followed by gradually smaller layers formed in stages
II and III indicate a decreasing step flow growth rate as the overgrowth
proceeds, with large values of γs in stage I and
gradually smaller values for later stages. There are two likely explanations
for a nonlinear growth rate. It could either be as a result of a nonconstant
nucleation rate, i.e., the time between nucleation events at the twin
plane of the concave interface decrease over time resulting in new
layers forming more and more rapidly, or due to a material limited
growth. A nonconstant nucleation rate can be ruled out as it would
give rise to a nonlinear growth of the {110} facet, but a linear growth
of the {110} facet width was measured. The width of the {110} facets
and the depths of the V-groove pockets as well as the width of concave
interface were measured along a top Zb segment. They all show a linear
trend, indicating that the rate of forming overgrowth layers on the
facets must have been constant along the NW and thus over time (see
the Supporting Information). Material limited
growth explains the increase in number of incomplete overgrowth layers;
a large number of layers will decrease the growth speed of each individual
layer if the process is limited by material supply. Although there
is a supersaturation in the catalyst particle, the material incorporation
pathways for sidewall growth differs from Au-induced growth, and it
is possible that the material reaching the {111}B-type facets is limited
due to a more favorable incorporation at the {111}A-type facets. It
can also be speculated that the vicinity of the catalyst particle
gives rise to a gradient in material supply along the NW due to preferential
collection of growth species in the Au-particle. Since complete layers
on the {111}A-type facets are observed for all stages of the growth,
we assume that they are not affected by any significant supply limitations.In stage IV, see Figure 4, generally found
in the middle segment of the 4 Zb sample (see Figure 1A), the {110} overgrowth facets dominate and only small {111}-type
facets remain as also illustrated in the model of Figure 1B. The {111}A-type facets appear as rough and disordered
with poorly defined interfaces toward the adjacent {110}-type facets,
whereas corresponding interfaces of the {111}B-type facets, at least
partially, remain sharp and well-defined. Atomically resolved images
reveal that the twin plane positions do not correlate with the bottom
and ridge positions of the V-grooves in this stage of the overgrowth;
see Figure 4. From the line profile of Figure 4B, it can be seen that the bottom corner of the
V-groove has shifted along [−1–1–1] and is now
located on the {111}B-type facets and not as in previous stages at
the twin planes of the concave interfaces. This shift is a continuous
process throughout stages I–IV as illustrated in Figure 5 and is a consequence of the nonlinear growth rate
on the {111}B facet, resulting in many incomplete overgrowth layers
stacking on top of each other close to the concave interface. In analogy
to stages I–III, a similar amount of material can be found
on both the {111}A- and {111}B-type facets at the twin plane of the
concave interface, strongly suggesting that overgrowth layers on both
facets nucleate at the twin planes. This is all consistent with nucleation
still occurring at the twin plane even after the bottom corner of
the V-groove has shifted, which in turn means that the twin plane
is more favorable regarding nucleation in comparison to the step like
structure of the corner geometry found at the bottom of a V-groove.
This can be explained by recent work from Gamalski et al.[23] where they suggested that the nucleation barrier
at a twin plane might be reduced by line energy terms. These findings
show that twin planes can play an important role regarding the nucleation
and growth of epitaxial layers. However, no growth is seen to initiate
at the twin plane of the convex interface which would indicate that
the actual curvature of the interface plays an important role.
Figure 5
Illustration
of the growth dynamics of the {111}-type facets, showing
schematically stages I–IV from side view (left) and top view
(right).
Illustration
of the growth dynamics of the {111}-type facets, showing
schematically stages I–IV from side view (left) and top view
(right).By comparing the relative amount
of material on the {111}A- and
{111}B-type facets in the profile of Figure 4B, it was possible to estimate that there is roughly 40% more material
on the {111}A, suggesting a much faster growth of the {111}A-type
facet. Similar conclusions have been drawn for other material systems
such as InP[35] and GaAs[24] and are attributed to the polar nature of the {111}A- and
{111}B-type facets and their different surface energies.[36,37] In addition, since no incomplete overgrowth layers could be observed
on the {111}A-type facets in stages I–III, the time to complete
a full overgrowth layer on the {111}A-type facet is less than the
time in between nucleation events whereas the opposite must apply
for the {111}B-type facet.In late stages of the overgrowth
process, see Figure S1 in the Supporting Information, denoted as stage V and
only found in the bottom Zb segment of the 4 Zb sample, it is no longer
possible to identify the {111}-type facets. Instead, a rough disordered
surface corresponding approximately to a {112}-type plane remains
between adjacent {110}-type facets, with a width on the order of 5–10
nm. The roughness of the surface may very well correspond to a well
ordered high index surface. We can thus conclude that, due to the
noncomplete overgrowth of the TSL, the NWs will not experience a perfect
hexagonal cross-section terminated by {110}-type facets; instead,
small {112}-type facets remain. This is further corroborated by STM
studies on WzGaAs NWs where nanometer-sized higher index facets were
observed,[14] thus suggesting that this might
be a general feature for NW systems of various crystal structures
and material compositionsFor a better understanding of the
intricate overgrowth procedure,
we obtained atomically resolved images of the NW facets; see Figure 6. Figure 6E depicts a model
to illustrate the relative orientation of the imaged NW facets presented
in Figure 6. It should be noted that imaging
of V-grooves put some challenging restrictions on the geometry and
sharpness of the STM tip since it must be able to reach down to the
concave interface. The {110}-type facets were found to be unreconstructed,
similar to bulk {110}. A periodic change in atomic row direction occurred
at each twin plane as seen in Figure 6A, but
no differences in atomic appearance were observed compared to bulk
samples. Imaging the {111}A-type facets in stages I–III, represented
in Figure 6B, revealed rows with a separation
of 0.8 nm. InAs(111)A wafers, treated in the same manner as the NWs,
resulted in a (2 × 2) reconstruction as depicted in Figure 6D. The similarities between the {111}A atomic row
spacing on the wafer and NW suggest that a (2 × 2) reconstruction
is also present on the NW surface.
Figure 6
(A) Atomically resolved image of a twin
boundary (red arrow) on
a {110}-type facet of the NW, U = −2.3 V, I = 100 pA. Inset shows an analogously treated surface of
an InAs(110) wafer, U = −2.9 V, I = 200 pA. (B) High resolution image of the {111}A/B-type facets
(interface marked with red arrow) of a top Zb segment as observed
in stages I–III. The image is differentiated for ease of viewing, U = +1.1 V, I = 150 pA. The inset shows
a portion of the {111}A with enhanced contrast, same scale as main
image, U = −1.9 V, I = 150
pA. (C) and (D) Depict corresponding {111}B- and {111}A-type surfaces
from analogously treated InAs(111)A/B wafers, U =
−1.0 V, I = 50 pA and U =
−2.0 V, I = 170 pA, respectively. Same scale
as in (B). (E) Depicts a basic atomic model, i.e., no surface reconstructions
are shown, of a Zb twin plane in a NW illustrating the relative orientation
of relevant surface planes.
(A) Atomically resolved image of a twin
boundary (red arrow) on
a {110}-type facet of the NW, U = −2.3 V, I = 100 pA. Inset shows an analogously treated surface of
an InAs(110) wafer, U = −2.9 V, I = 200 pA. (B) High resolution image of the {111}A/B-type facets
(interface marked with red arrow) of a top Zb segment as observed
in stages I–III. The image is differentiated for ease of viewing, U = +1.1 V, I = 150 pA. The inset shows
a portion of the {111}A with enhanced contrast, same scale as main
image, U = −1.9 V, I = 150
pA. (C) and (D) Depict corresponding {111}B- and {111}A-type surfaces
from analogously treated InAs(111)A/B wafers, U =
−1.0 V, I = 50 pA and U =
−2.0 V, I = 170 pA, respectively. Same scale
as in (B). (E) Depicts a basic atomic model, i.e., no surface reconstructions
are shown, of a Zb twin plane in a NW illustrating the relative orientation
of relevant surface planes.Surprisingly, high resolution images of the {111}B facet,
as in
Figure 6B, do not exhibit the unreconstructed
(1 × 1) pattern typically found on (111)B-oriented wafers which
have undergone analogous treatment, shown in Figure 6C. Instead, a quasi-periodic pattern with an approximate distance
of 1–2 nm between corrugation maxima can be observed such that
it is reminiscent of the (√19 × √19)R23.4°
reconstruction commonly found on GaAs (111)B.[38,39] Images were obtained using both positive and negative bias, and
no qualitative differences were observed depending on polarity. The
reconstruction has not been observed on planar InAs (111)B, and we
therefore attribute it to the special confined terraces found on the
NWs. Atomically resolved images were obtained on {111}B-type NW surfaces
with facet widths ranging from 20 to 60 nm, all revealing a (√19
× √19)R23.4° like surface structure. We note that
investigating NW facets outside this size regime could give insight
into what degree confined terraces affect surface reconstructions,
but this is not within the scope of the present study.
Conclusion
In conclusion, we have, using atomically resolved STM, studied
homoepitaxial growth on intentionally tapered InAs NWs designed to
have {111}A/B terminated twin plane superlattices. We have shown that
the {111}A-type facet has a much faster growth rate in comparison
to the {111}B-type facet. The overgrowth mode on the NW facets was
determined to be a step flow growth. For the {111}B-type facets, the
step flow growth was faster for ⟨112⟩A compared to ⟨112⟩B.
We determine that the slower growing {111}B-type facets have a nonlinear
growth rate, possibly due to a material limited growth. In addition,
it was shown that overgrowth on the {111}A/B-type facets nucleates
at the concave twin plane simultaneously and most probably from the
same nucleus.Thanks to the unique spatial resolution of scanning
probe techniques,
we were able to observe a reconstruction on InAs{111}B, not appearing
on bulk samples and thus demonstrating that the atomic scale surface
structure on NWs cannot always be expected to behave as on larger
surfaces. The atomic surface structure is important when considering
growth and modeling of core–shell NWs, since it will influence
both surface energies and diffusion lengths. In addition, we have
shown that epitaxial overgrowth on NW surfaces is very much affected
by twin planes, and it is not unlikely that stacking faults have similar
effects on the growth. Our findings allow for an increased understanding
and control of radial doping profiles and material variations and
self-assembly of QDs or other novel structures on NW side facets.
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