Nicole L Fry1, Gerry R Boss1, Michael J Sailor1. 1. Department of Chemistry and Biochemistry and Department of Medicine, University of California at San Diego , La Jolla, California 92093, United States.
Abstract
An approach for the preparation of an oxidized porous silicon microparticle drug delivery system that can provide efficient trapping and sustained release of various drugs is reported. The method uses the contraction of porous silicon's mesopores, which occurs during oxidation of the silicon matrix, to increase the loading and retention of drugs within the particles. First, a porous Si (pSi) film is prepared by electrochemical etching of p-type silicon with a resistivity of >0.65 Ω cm in a 1:1 (v/v) HF/ethanol electrolyte solution. Under these conditions, the pore walls are sufficiently thin to allow for complete oxidation of the silicon skeleton under mild conditions. The pSi film is then soaked in an aqueous solution containing the drug (cobinamide or rhodamine B test molecules were used in this study) and sodium nitrite. Oxidation of the porous host by nitrite results in a shrinking of the pore openings, which physically traps the drug in the porous matrix. The film is subsequently fractured by ultrasonication into microparticles. Upon comparison with commonly used oxidizing agents for pSi such as water, peroxide, and dimethyl sulfoxide, nitrite is kinetically and thermodynamically sufficient to oxidize the pore walls of the pSi matrix, precluding reductive (by Si) or oxidative (by nitrite) degradation of the drug payload. The drug loading efficiency is significantly increased (by up to 10-fold), and the release rate is significantly prolonged (by 20-fold) relative to control samples in which the drug is loaded by infiltration of pSi particles postoxidation. We find that it is important that the silicon skeleton be completely oxidized to ensure the drug is not reduced or degraded by contact with elemental silicon during the particle dissolution-drug release phase.
An approach for the preparation of an oxidized porous silicon microparticle drug delivery system that can provide efficient trapping and sustained release of various drugs is reported. The method uses the contraction of porous silicon's mesopores, which occurs during oxidation of the silicon matrix, to increase the loading and retention of drugs within the particles. First, a porous Si (pSi) film is prepared by electrochemical etching of p-type silicon with a resistivity of >0.65 Ω cm in a 1:1 (v/v) HF/ethanol electrolyte solution. Under these conditions, the pore walls are sufficiently thin to allow for complete oxidation of the silicon skeleton under mild conditions. The pSi film is then soaked in an aqueous solution containing the drug (cobinamide or rhodamine B test molecules were used in this study) and sodium nitrite. Oxidation of the porous host by nitrite results in a shrinking of the pore openings, which physically traps the drug in the porous matrix. The film is subsequently fractured by ultrasonication into microparticles. Upon comparison with commonly used oxidizing agents for pSi such as water, peroxide, and dimethyl sulfoxide, nitrite is kinetically and thermodynamically sufficient to oxidize the pore walls of the pSi matrix, precluding reductive (by Si) or oxidative (by nitrite) degradation of the drug payload. The drug loading efficiency is significantly increased (by up to 10-fold), and the release rate is significantly prolonged (by 20-fold) relative to control samples in which the drug is loaded by infiltration of pSi particles postoxidation. We find that it is important that the silicon skeleton be completely oxidized to ensure the drug is not reduced or degraded by contact with elemental silicon during the particle dissolution-drug release phase.
Of the many porous
materials being developed for sustained release
drug delivery systems,[1−11] electrochemically etched porous silicon (pSi) is an attractive candidate
because of its highly tunable nanostructure (micro- to macroporous),
chemically modifiable surface,[12] biocompatibility,[13,14] and biodegradability.[15,16] The biodegradation
product of pSi is orthosilicic acid [Si(OH)4], which is
easily absorbed from the gastrointestinal tract and excreted in the
urine.[17,18] It has been shown that pSi nanoparticles
loaded with drugs can be injected intravenously and are degraded in vivo into benign products excreted by the kidneys.[19]The large surface area of pSi provides
a substantial drug loading
capacity.[20,21] However, interaction between the porous
matrix and the drug must be carefully considered to design an effective
delivery system that provides controlled release of the drug in its
active form. Loaded molecules will quickly diffuse out of porous materials
because of local concentration gradients unless additional interactions
between the porous matrix and drug are generated. Freshly prepared
pSi contains highly reactive surface Si–H species with underlying
elemental silicon, both of which are good reducing agents.[22,23] For example, the reduction potential of pSi is sufficient to reduce,
and thereby inactivate, many organic and inorganic drugs such as doxorubicin,[24] daunorubicin,[25] and
cisplatin.[26] Thus modification of pSi is
needed to both limit redox degradation of drugs and increase the affinity
of the drug for the pSi surface. Various electrostatic or hydrophobic
interactions,[6,20,27,28] covalent chemistries,[29−33] or pore capping reactions[26,34,35] have been used to create more effective
drug delivery systems.Here we describe a new oxidative pSi
trapping method that is versatile
and sufficiently mild to be useful with a range of drugs possessing
a wide variety of characteristics (organic or inorganic, hydrophilic
or hydrophobic, neutral or positively charged, and/or redox-active).
The method relies on the dynamic structure of pSi and physical changes
that occur during its oxidation. Electrochemically etched pSi readily
oxidizes in aqueous solutions,[19,36] which generally results
in reduction of the pore volume because of swelling of the pore walls
as oxygen is incorporated into the silicon skeleton (Scheme 1). We hypothesized that pore wall swelling could
be used to trap a drug within the pSi framework, provided the dimensions
of the initial pores, the oxidized pores, and the drug are in a suitable
size range. The redox activity of the pSi matrix with the drug candidate
is an additional constraint: to prevent the drug from being reduced,
the silicon skeleton must be oxidized by something other than the
drug being trapped. We reasoned that an oxidant of sufficient kinetic
and thermodynamic competency and concentration could be preferentially
reduced, leaving the trapped drug unaffected. Because water is a relatively
weak oxidant, stronger silicon oxidants such as nitrite,[37] peroxide,[38] and dimethyl
sulfoxide (DMSO)[39] are candidates, depending
on the characteristics of the drug being loaded. Nitrite is an interesting
oxidant from the perspective of chemical reactivity. Although it has
a good ability to oxidize silicon or Si–H surface bonds, when
used as a food preservative it actually suppresses oxidation; in that
case, it limits the oxidation of fatty acids by acting as a trap for
free radicals derived from oxygen and other reactive oxygen species.
This ability of nitrite ion to act as a chemical oxidant for silicon
while simultaneously suppressing more deleterious oxidation reactions
is a distinctive characteristic of this oxidant in this work.
Scheme 1
Illustration Showing the Expansion of the Silicon Matrix (top left)
as Oxygen Is Incorporated into the Partially Oxidized (top middle)
or Fully Oxidized (top right) Porous Silicon Skeleton
This leads to a decrease in
pore diameter as the porous silicon film (bottom left) becomes partially
oxidized (bottom middle) and then fully oxidized (bottom left).
Illustration Showing the Expansion of the Silicon Matrix (top left)
as Oxygen Is Incorporated into the Partially Oxidized (top middle)
or Fully Oxidized (top right) Porous Silicon Skeleton
This leads to a decrease in
pore diameter as the porous silicon film (bottom left) becomes partially
oxidized (bottom middle) and then fully oxidized (bottom left).While we have long suspected that silicon oxidation
could be used
to load drugs within the pSi framework,[10] we have never specifically tested or validated that this loading
technique actually leads to drug trapping and further that the drug
is not degraded by the loading process. Thus, in this study, we tested
the redox trapping method using cobinamide, a vitamin B12 analogue that is being developed as a cyanide antidote.[40−44] We chose cobinamide because its hydrophilicity, small size, and
redox-active cobalt center make it difficult to load into porous matrices
in its active oxidized state; thus, it presented a greater challenge
than most drugs, and if the method worked for cobinamide, it would
likely work for other drugs. We compared cobinamide to rhodamine B,
a cationic organic dye with limited redox activity, to prove that
cobinamide’s redox activity was not involved in the oxidation
trapping mechanism. The distinctive UV–visible absorbance spectra
of cobinamide and rhodamine B provided for quick and easy detection
and redox state assessment.
Experimental
Section
Materials
Boron-doped p-type Si wafers (1–10,
0.01–1, or 0.03–0.05 Ω cm resistivity, ⟨100⟩
orientation) were obtained from International Wafer Service, Inc.
Aqueous hydrofluoric acid (48% aqueous), dimethyl sulfoxide, hydrogen
peroxide (30% aqueous), hydrochloric acid (1 M), and sodium hydroxide
(all ACS grade) were purchased from Fisher Scientific. Absolute ethanol
(200 proof) was obtained from Rossville Gold Shield Chemicals. Phosphate-buffered
saline (1×, pH 7.4) was purchased from Mediatech, Inc. Sodium
nitrite and potassium cyanide were obtained from Sigma-Aldrich Chemicals.
Pure aquohydroxocobinamide was produced by base hydrolysis of hydroxocobalamin
(purchased from Sigma-Aldrich).[49]
Preparation
of Porous Silicon Samples
Porous silicon
(pSi) films were prepared by anodic electrochemical etching of polished
Si wafers. A Teflon etch cell was used that exposed 8 cm2 of the Si wafer to a 1:1 (v/v) 48% aqueous HF/ethanol mixture. Samples
were etched at a constant current density of 32 mA/cm2 for
1200, 600, and 430 s for samples 1–3, respectively.
The pSi films were removed from the crystalline silicon substrate
by a current pulse of 5 mA/cm2 for 50 s in a solution of
3.3% aqueous HF in ethanol. The free-standing pSi films were rinsed
with ethanol and dried in vacuo.
Preparation
of Porous Silicon Microparticles
Method A: Postoxidation
(PostOx)
Dried pSi films (10
mg) were immersed in 1 mL of 25 mM sodium nitrite (pH adjusted to
∼5 with HCl) within a glass vial and fractured into microparticles
by ultrasonication for 30 min. The mixture was maintained at room
temperature for 24 h to allow further oxidation of the particles,
and the particles were washed three times each with water and ethanol
by centrifugation and dried in vacuo at 60 °C
for 2 h. The resulting oxidized particles were added to 1 mL of 5
mM cobinamide or rhodamine B in deionized water (pH adjusted to ∼5
with HCl) and agitated for 16 h at room temperature. The cobinamide-
or rhodamine B-loaded particles were then washed three times each
with water and ethanol by centrifugation and dried in vacuo.
Method B: Oxidation Trapping Loading (OxTrap)
A 1 mL
solution of 5 mM cobinamide or rhodamine B and 25 mM sodium nitrite
in water (pH adjusted to ∼5 with HCl) was added to 10 mg of
dried pSi films in a glass vial. The mixture was exposed to ultrasonication
for 30 min to fracture the Si films into microparticles and maintained
at room temperature for 24 h to allow further oxidation of the particles
in the presence of cobinamide or rhodamine B. The particles were washed
three times each with water and ethanol by centrifugation and dried in vacuo at 60 °C for 2 h.
Physical Characterization
of Porous Materials
A scanning
electron microscope (FEI XL30) was used to obtain cross-sectional
images of the pSi samples. Attenuated total reflectance Fourier transform
infrared (ATR-FTIR) spectra were recorded using a Thermo Scientific
Nicolet 6700 FTIR instrument with a Smart iTR diamond ATR fixture.
Raman spectra were recorded using a Renishaw inVia Raman microscope
with a 100 mW, 532 nm laser excitation source. Nitrogen adsorption–desorption
isotherms were acquired on the freshly etched materials at 77 K on
a Micromeritics ASAP 2020 instrument. Thin film optical interference
spectra of the porous Si samples were recorded in a 180° reflection
configuration using an unpolarized tungsten light and an Ocean Optics
4000 CCD spectrometer fitted with a bifurcated fiber-optic cable.
The optical reflectance spectra were processed using a computer and
algorithms described previously.[45]
Cobinamide
and Rhodamine B Release Studies
Porous Si
microparticles loaded with cobinamide or rhodamine B were immersed
in 1 mL of either deionized water or aqueous phosphate-buffered saline
(pH 7.4) at a particle concentration of 100 μg/mL and agitated
at room temperature. The supernatant containing released cobinamide
or rhodamine B was collected at set times (2, 8, 24, 48, 72, 96, and
120 h) and replaced with fresh water or buffer. Concentrations of
released cobinamide were determined by adding excess potassium cyanide
to the solution to convert cobinamide to the dicyano form and then
measuring the absorbance value at 370 nm (ε = 30000 M–1 cm–1). Concentrations of released rhodamine B
were determined by the absorbance at 544 nm (ε = 106000 M–1 cm–1).
Results and Discussion
Preparation
of a Porous Silicon Matrix
In this study,
we were interested in determining how the different porous silicon
morphologies generated from silicon wafers with different resistivities
(under similar reaction conditions) would affect oxidation of the
different silicon structures and how those differences would affect
the loading and subsequent release of cobinamide from the silicon
matrix. Porous silicon films were prepared from single-crystal silicon
⟨100⟩ wafers with three different resistivities: 1.20,
0.65, and 0.05 Ω cm (samples 1–3, respectively).
The silicon wafers were subjected to anodic electrochemical etching
in a 1:1 (v/v) aqueous 48% hydrofluoric acid/ethanol electrolyte solution.
A constant current density of 32 mA/cm2 was used to prepare
all three samples, but the etch time was varied so that the thickness
of each pSi sample was ∼10 μm. We used the spectroscopic
liquid infiltration method (SLIM)[45] to
determine the thickness and total open porosity of the etched films
and found average open porosities of 60% for samples 1 and 2 and 40% for sample 3. These measurements
were confirmed by cross-sectional scanning electron microscopy (Figure
S1 of the Supporting Information) and gravimetric
analysis. The nanostructure of the pores was characterized using nitrogen
adsorption–desorption analysis, with the resulting isotherms
exhibiting type IV hysteresis loops, typical of mesoporous materials
(Figure 1). Porous silicon films were prepared
with different pore morphologies to systematically study the influence
of pore size on loading and subsequent release of cobinamide from
the silicon matrix. The measured Brunauer–Emmett–Teller
(BET)[46] surface areas of the samples were
548, 482, and 299 m2/g for samples 1–3, respectively. As expected, the pore size increased as the concentration
of boron dopant increased for samples 1–3 as determined
by the mean Barrett–Joyner–Halenda (BJH)[47] pore diameters of 3.6, 4.7, and 5.6 nm, respectively.
Figure 1
Nitrogen
adsorption–desorption isotherms for porous silicon
particles prepared from p-type silicon wafers with resistivities of
1.20, 0.65, and 0.05 Ω cm for 1–3, respectively.
The adsorption and desorption branches of the isotherms are shown
as filled and empty circles, respectively.
Nitrogen
adsorption–desorption isotherms for porous silicon
particles prepared from p-type silicon wafers with resistivities of
1.20, 0.65, and 0.05 Ω cm for 1–3, respectively.
The adsorption and desorption branches of the isotherms are shown
as filled and empty circles, respectively.
Optimization of Silicon Oxidation and Drug Trapping Conditions
The surface chemistry of pSi plays a large role in the adsorption
of drugs within the porous matrix. Therefore, we first studied the
interaction between cobinamide and the pSi surface of samples 1–3 using Fourier transform infrared (FTIR) spectroscopy
(Figure 2 and Figures S2 and S3 of the Supporting Information). The presence of silicon
hydride species on the surface of freshly prepared pSi was confirmed
by FTIR signals assigned to Si–H vibrations, at 2108 and 2084
cm–1 (νSiH2 and νSiH stretching
modes, respectively). To study the initial reaction of cobinamide
with the surface of the silicon matrix, FTIR spectra of the pSi samples
were monitored after exposure to aqueous solutions (pH adjusted to
5 with HCl) with and without cobinamide for 2 h. The FTIR spectrum
of the cobinamide-exposed sample (Figure 2C)
has an amide stretching frequency at 1660 cm–1,
which is characteristic of free cobinamide [FTIR of free cobinamide
(Figure S4 of the Supporting Information)] and absent in a control sample exposed to deionized water (Figure 2B). Because the samples were thoroughly washed and
dried before FTIR analysis, the presence of the cobinamide peaks in
the spectrum confirms loading of cobinamide in all three pSi samples
(1–3). A broad silicon oxide band (∼1100
cm–1), along with peaks assigned to OxSi-Hy species
(2200–2250 cm–1), was also present in both
the water- and cobinamide-treated samples. The height of the siliconoxide band compared to those of the OxSi-Hy bands was larger in the
cobinamide-exposed sample than in the water-exposed sample. In addition,
the magnitudes of the Si–H vibrational bands decreased only
slightly for the sample exposed to water alone, while the cobinamide-exposed
sample displayed a complete loss of the Si–H signal. These
findings suggest that the rate of silicon oxidation was increased
in the presence of cobinamide.
Figure 2
Fourier transform infrared (FTIR) spectra
of a freshly etched porous
silicon sample of 2 (bottom), 2 exposed
to water (middle), or an aqueous cobinamide solution (top) for 2 h.
The baselines of the middle and top spectra are offset from the x-axis for comparison.
Fourier transform infrared (FTIR) spectra
of a freshly etched porous
silicon sample of 2 (bottom), 2 exposed
to water (middle), or an aqueous cobinamide solution (top) for 2 h.
The baselines of the middle and top spectra are offset from the x-axis for comparison.The redox interaction between cobinamide and the silicon
matrix
was investigated further using visible reflectance and absorbance
spectroscopy. The optical reflectance spectrum of pSi was used to
monitor the rate of silicon oxidation in the presence of cobinamide,
while the absorbance spectrum of cobinamide was used to determine
whether any redox degradation of cobinamide had occurred. First, silicon
oxidation was analyzed by monitoring changes in the optical reflectance
spectrum over time of pSi sample 2 exposed to cobinamide.
The Fourier transform of these reflectance spectra gave values of
2nL, or an effective optical thickness of the pSi
film.[45] A value of 2nL can be used to assess how the refractive index (n) of the material changes over time [assuming any changes in sample
thickness (L) are negligible]. Exposing pSi to aqueous
cobinamide caused a steady decrease in the value of 2nL over time, which can be attributed to a decrease in the refractive
index of the sample due to the conversion of Si (nD = 3.8) to SiO2 (nD = 1.54) (Figure 3). The absorbance spectrum of the cobinamide solution
after it had been exposed to pSi for 2 h revealed significant changes
compared to that of the original cobinamide solution (Figure 4A). The cobalt center of cobinamide was in the Co3+ oxidation state initially; however, the appearance of new
absorption peaks at 315 and 470 nm suggested the Co3+ center
was reduced to Co2+ by the pSi. The absorbance of the cobinamide
supernatant obtained after the sample had been exposed to pSi for
24 h revealed a complete loss of the lowest-energy absorption band
leaving only a weak, ill-defined absorption spectrum at wavelengths
of <400 nm. Such changes suggest substantial alterations, if not
complete loss of the cobalt–corrin ring coordination.
Figure 3
Experimental optical response vs time showing the oxidation
of
pSi sample 2 upon exposure to aqueous cobinamide solutions
with (●) or without (△) nitrite present. The effective
optical thickness (2nL, where n is
the average refractive index and L is the total thickness
of the sample) was obtained from the fast Fourier transform of the
optical reflectance spectra of both samples obtained at each time
point. The quantity Δ2nL (%) is defined as
(2nL – 2nL0)/2nL0 × 100%, where 2nL0 is the value of 2nL measured immediately
after introduction of the solutions.
Figure 4
UV–visible absorbance spectra of cobinamide
solutions without
(A) or with (B) added nitrite. Absorbance spectra of solutions were
recorded before they were exposed to pSi particles (—), and
absorbance spectra of the supernatants were recorded after periods
of pSi particle exposure of 2 (---) or 24 h (−·−).
To protect the loaded cobinamide from redox degradation, the effect
of added oxidants peroxide, nitrite, and DMSO was evaluated. In these
experiments, the oxidant was introduced into the cobinamide solution
prior to the addition of the pSi sample, so both cobinamide and the
oxidant were present in the solution during drug loading. We found
that cobinamide was unstable in the peroxide and DMSO solutions but
was stable in nitrous acid generated from an acidic sodium nitrite
solution [25 mM NaNO2 (pH 5)] (eq 1).The shift in the 2nL value
measured for pSi samples exposed to cobinamide dissolved in the acidic
nitrite solution decreased much more rapidly compared to the shift
in 2nL observed upon exposure to cobinamide without
nitrite present.Experimental optical response vs time showing the oxidation
of
pSi sample 2 upon exposure to aqueous cobinamide solutions
with (●) or without (△) nitrite present. The effective
optical thickness (2nL, where n is
the average refractive index and L is the total thickness
of the sample) was obtained from the fast Fourier transform of the
optical reflectance spectra of both samples obtained at each time
point. The quantity Δ2nL (%) is defined as
(2nL – 2nL0)/2nL0 × 100%, where 2nL0 is the value of 2nL measured immediately
after introduction of the solutions.In addition, when cobinamide was loaded into the acidic nitrite
solution, no change occurred in the relative height or shape of the
peaks observed in the solution absorbance spectrum of cobinamide after
exposure to pSi for 2 or 24 h (Figure 4B).
Instead, only the overall intensity of the spectrum decreased because
of the decreased concentration of free cobinamide in solution, as
it became trapped within the pSi matrix. The reflectance and absorbance
data both suggest that pSi preferentially reduced the nitrite, thus
protecting cobinamide from redox degradation.To confirm that
cobinamide trapped within the pSi matrix was indeed
protected by the acidic nitrite solution, loaded samples were exposed
to sodium hydroxide (pH 9) to dissolve the porous matrix and release
the trapped cobinamide. The absorbance spectra of the released cobinamide
loaded in samples 1 and 2 were unchanged
compared to the spectrum of preloaded cobinamide, whereas the absorbance
spectrum of sample 3 showed signs of redox degradation
of the released cobinamide.UV–visible absorbance spectra of cobinamide
solutions without
(A) or with (B) added nitrite. Absorbance spectra of solutions were
recorded before they were exposed to pSi particles (—), and
absorbance spectra of the supernatants were recorded after periods
of pSi particle exposure of 2 (---) or 24 h (−·−).Therefore, Raman spectroscopy
was used to elucidate the difference
in cobinamide protection between silicon sample 3 (derived
from the more highly doped p-type Si) and samples 1 and 2. The Raman spectra of samples 1 and 2 contained peaks identical to those in the spectrum of unloaded cobinamide,
with no evidence of elemental (i.e., unoxidized) silicon, whereas
the spectrum of sample 3 had an additional peak at 520
cm–1 assigned to the Si–Si optical phonon
mode of crystalline silicon (Figure 5).[48] Thus, while the silicon matrices of samples 1 and 2 became fully oxidized, some unoxidized
silicon remained after the oxidation trapping of cobinamide in sample 3. This is attributed to the thicker silicon pore walls in
sample 3. Once a certain thickness of silicon oxide had
formed on the pore surface, the room-temperature oxidation process
was expected to slow considerably. Thus, the pore walls of samples 1 and 2 were sufficiently thin to allow complete
oxidation of the Si skeleton. The unoxidized silicon remaining in
sample 3 after oxidative loading most likely became exposed
during the dissolution of the pSi matrix. This exposed elemental silicon
was then able to interact with loaded cobinamide, resulting in the
reductive degradation of the drug.
Figure 5
Raman spectra of preloaded cobinamide
(Free Cbi) and cobinamide-loaded
pSi particles prepared from p-type silicon wafers with resistivities
of 1.20 (1-Cbi), 0.65 (2-Cbi), and 0.05
(3-Cbi) Ω cm via oxidative trapping of cobinamide
with aqueous nitrite solutions (OxTrap).
Raman spectra of preloaded cobinamide
(Free Cbi) and cobinamide-loaded
pSi particles prepared from p-type silicon wafers with resistivities
of 1.20 (1-Cbi), 0.65 (2-Cbi), and 0.05
(3-Cbi) Ω cm via oxidative trapping of cobinamide
with aqueous nitrite solutions (OxTrap).
Comparison of Oxidative Trapping and Postoxidation Cobinamide
Loading Methods
Two different loading methods were compared
to determine which provided a higher loading efficiency and more sustained
release of cobinamide. For these studies, acidic nitrite solutions
were used with pSi samples 1 and 2 to avoid
the redox degradation of cobinamide associated with sample 3. For the oxidative trapping method (OxTrap), cobinamide was dissolved
in an acidic nitrite solution, and the solution was added to freshly
etched pSi films; the mixture was ultrasonicated for 30 min to form
microparticles and maintained at room temperature for 24 h to complete
the oxidation process. For the postoxidation loading method (PostOx),
the pSi films were also maintained in the presence of the nitrite
oxidizing agent during the 30 min ultrasonication and 24 h oxidation
periods, but cobinamide was added to the particles after the 24 h
oxidation step. Optical microscope images of the loaded microparticles
(Figure 6) revealed that the average size of
the microparticles was very similar for the two types of PostOx samples
studied (21 ± 5 μm for 1 and 22 ± 6 μm
for 2).
Figure 6
Bright field optical microscope images of microparticles
prepared
via the oxidation trapping (OxTrap, top) and postoxidation (PostOx,
bottom) methods of loading cobinamide. The pSi microparticles were
prepared via a 30 min ultrasonication of pSi films of sample type 1 (left) and 2 (right).
Bright field optical microscope images of microparticles
prepared
via the oxidation trapping (OxTrap, top) and postoxidation (PostOx,
bottom) methods of loading cobinamide. The pSi microparticles were
prepared via a 30 min ultrasonication of pSi films of sample type 1 (left) and 2 (right).Likewise, ultrasonication of either sample 1 or 2 subjected to the OxTrap method yielded particles
with similar
sizes (46 ± 14 μm for 1 and 48 ± 14 μm
for 2). However, the particles prepared using OxTrap
were significantly larger than those prepared using PostOx for both 1 and 2. Presumably, the simultaneous cobinamide
loading and matrix oxidation that occur with the OxTrap method generate
a stronger, composite particle that is not as easily fractured by
ultrasound energy.The cobinamide loading efficiency was measured
by extracting the
loaded cobinamide from the porous Si microparticle matrix via treatment
with a sodium hydroxide solution (pH 9). The basic solution dissolved
the Si and SiO2 components of the microparticle, releasing
the drug payload into solution. We quantified the cobinamide by converting
it into the dicyano form (by adding excess potassium cyanide) and
measuring the optical absorbance at 370 nm (ε = 30000 M–1 cm–1). The average cobinamide loadings
were 20 ± 8 and 86 ± 10 μg of cobinamide/mg of Si
for sample 1 and 74 ± 6 and 112 ± 6 μg
of cobinamide/mg of Si for sample 2 for the PostOx and
OxTrap particles, respectively. Thus, for both samples 1 and 2, the OxTrap method yielded greater cobinamide
loading than the PostOx method, with sample type 2 showing
the largest relative increase (1.5–4-fold increased mass loading
of drug, relative to that of the PostOx method). The increased cobinamide
loading seen with the microparticles of sample 2 is attributed
to the pore size (4.7 nm) being larger than that of sample 1 (3.6 nm). The reduction in the average pore size upon oxidation
of the silicon matrix is expected to show a more pronounced effect
on the efficiency of drug loading as the pore size approaches the
diameter of the drug payload, and this is observed in the data. When
introduced before oxidation in the OxTrap method, cobinamide can more
freely penetrate the pores, and the silicon oxide can then grow around
the cobinamide molecules.We next tested the retention of cobinamide
within the oxidized
silicon matrix for the different microparticle formulations. In pure
water, the rate of silicon dissolution is relatively slow, which is
expected to delay the release of cobinamide trapped within the siliconoxide matrix. If cobinamide is not physically trapped, it will be
free to diffuse out of the pores even if the silicon matrix has not
degraded. Consistent with these arguments, the release of cobinamide
from the PostOx particles was significantly more rapid than from the
OxTrap particles for both sample types 1 and 2 (Figure 7A), with 50% of the loaded drug
released within 3 h for PostOx versus 3 days for OxTrap formulations.
This confirms that oxidation of the pSi skeleton in the presence of
cobinamide will effectively trap the drug in the pores and that this
process increases the level of retention of cobinamide in the resulting
microparticles. We observed no significant difference in the cobinamide
release rate between samples 1 and 2 for
the PostOx-loaded samples and only a slight difference for the OxTrap
particles. The slight reduction in the release rate for sample 2 could be due to the slightly larger amount of cobinamide
loaded in the particles, which may act to shield the silicon matrix
from water dissolution.
Figure 7
Release of cobinamide into water (A) or aqueous
phosphate-buffered
saline (B) from oxidized pSi particles 1 (circles) and 2 (squares) loaded with cobinamide via the postoxidation (PostOx,
empty symbols) or oxidation trapping (OxTrap, filled symbols) method.
The data were averaged from three samples, and the error bars indicate
the standard deviation.
Release of cobinamide into water (A) or aqueous
phosphate-buffered
saline (B) from oxidized pSi particles 1 (circles) and 2 (squares) loaded with cobinamide via the postoxidation (PostOx,
empty symbols) or oxidation trapping (OxTrap, filled symbols) method.
The data were averaged from three samples, and the error bars indicate
the standard deviation.The release of cobinamide from the microparticles was also
tested
in phosphate-buffered saline (PBS), a more physiologically relevant
solution (Figure 7B). The pSi matrix degraded
more quickly in PBS than in water, although as with pure water, the
release profile showed a smaller rate of cobinamide release for the
OxTrap than for the PostOx microparticles for both samples 1 and 2. However, the difference in release rates was
less pronounced for the PBS experiments than for the water experiments
because of the increased rate of dissolution of silicon in PBS. In
addition, for a given preparation (OxTrap or PostOx), we observed
no significant difference between the release profiles of sample types 1 and 2.To determine if the oxidation
trapping method could be used for
molecules other than cobinamide, we repeated the loading and release
studies of sample type 2 using rhodamine B. We loaded
rhodamine B like cobinamide using both the PostOx and OxTrap methods.
As for cobinamide, a larger mass loading was achieved with the OxTrap
protocol (87 ± 5 μg of rhodamine B/mg of Si) than with
the PostOx method (7 ± 1 μg of rhodamine B/mg of Si). The
release profiles (in deionized water) for the delivery of rhodamine
B from PostOx particles showed more sustained release than from PostOx
particles (Figure 8). The data confirmed that
the OxTrap method is not specific to cobinamide, providing larger
mass loading and more effective trapping for both types of molecules.
Figure 8
Release
of rhodamine B into water from type 2 oxidized
porous silicon particles loaded with rhodamine B via the postoxidation
[PostOx (□)] or oxidation trapping [OxTrap (■)] method.
The data are the means of three samples, and the error bars indicate
the standard deviation.
Release
of rhodamine B into water from type 2 oxidized
porous silicon particles loaded with rhodamine B via the postoxidation
[PostOx (□)] or oxidation trapping [OxTrap (■)] method.
The data are the means of three samples, and the error bars indicate
the standard deviation.
Conclusions
This study focused on the ability of porous
Si to shrink its pore
dimensions upon mild oxidation of the porous skeleton, to enhance
the loading capacity and extend the duration of release of small hydrophilic
drugs. Via oxidation of the silicon matrix in the presence of the
molecular payload (OxTrap), the molecule was more effectively trapped
than it was after simple diffusional loading into a preformed oxide
matrix. It was found that the pore and molecule size is a critical
parameter in this process; the pore and molecule must be appropriately
matched to allow the molecule to diffuse into the unoxidized pore
and not diffuse out of the oxidized pore. For cobinamide, the optimal
unoxidized pore diameter was between 3.6 and 4.7 nm. For redox-active
drugs, the pore wall thickness is an additional important factor.
We found that material with smaller pore diameters (and thus thinner
pore walls) could be completely oxidized to SiO2 under
mild (room temperature, aqueous nitrite) conditions, whereas material
with thicker pore walls retained elemental silicon within the porous
skeleton. This residual silicon then reacted with and degraded the
cobinamide model drug under long-term aqueous release conditions.
In addition, we showed that aqueous acidic nitrite (NO2–) acts as a mild oxidant that does not degrade the model drugs but
is sufficiently reactive to oxidize the Si skeleton, outcompeting
the reduction of cobinamide by Si and thus preserving the activity
of the molecule. We found that porous Si samples prepared in a 1:1
(v/v) HF/ethanol solution from p-type silicon wafers with a resistivity
of ∼0.65 Ω cm possess pore walls sufficiently thin to
become fully oxidized, whereas the pore walls in porous Si made from
silicon with a resistivity of <0.5 Ω cm are too thick and
do not become fully oxidized under the OxTrap reaction conditions.
This approach may be generally applicable to a wider range of drugs,
including more sensitive protein and oligonucleotide therapeutics.
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