| Literature DB >> 24368699 |
Anping Cao, Ernst J R Sudhölter, Louis C P M de Smet1.
Abstract
class="Chemical">Since their introducEntities:
Mesh:
Substances:
Year: 2013 PMID: 24368699 PMCID: PMC3926556 DOI: 10.3390/s140100245
Source DB: PubMed Journal: Sensors (Basel) ISSN: 1424-8220 Impact factor: 3.576
Overview of SiNW-based sensors for the detection of inorganic gases and vapors and organic explosives, nerve agents and VOCs.
| 2007 | McAlpine | TD (p) | 18 nm (w) 5 μm (l) | Bare | FET | NO2 | 20 ppb (s) | [ | ||
| 2007 | Chen | BU (n) | 80–200 nm (d) ∼2.5 μm (l) | Pd NPs | FET | H2 | 5% (mc) | [ | ||
| 2009 | Wan | TD (p) | 75, 130 nm (w) 20 μm (l) | Bare | Resistor | NO2, NH3 | 250 ppm (mc) 250 ppm (mc) | [ | ||
| 2009 | Peng | TD (n) | No data | Bare | Resistor | NO | 500 ppb (mc) | [ | ||
| 2010 | Gao | TD (p) | 22, 75 nm (w) 2 μm (l) | Bare | Resistor | NO2 | 250 ppm (mc) | [ | ||
| 2010 | Skucha | BU (p) | 30 nm (d) 2 μm (g) | Bare | FET | H2 | 3 ppm - 5% (mc) | [ | ||
| 2011 | Noh | TD (n) | 30–40 nm (d) 20 μm (h) | Pd coating | Resistor | H2 | ∼5 ppm (s) | [ | ||
| 2011 | Gao | TD (p) | 22–100 nm (w) 2 μm (l) | Bare | Resistor | NO2 | 250 ppm (mc) | [ | ||
| 2012 | Cuscunà | BU (p) | 150–200 nm (d) 5–8 μm (l) | Amino groups (via ammonia plasma) | Resistor (IDE) | NO2 | 10 ppb (mc) | [ | ||
| 2013 | Yun | TD (p) | 100 nm (w) 3 μm(l) | Pd NPs | Resistor | H2 | 0.5% (mc) | [ | ||
| 2003 | Zhou | BU (n) | ∼20 nm (d) 5 mm (g) | Si-H (via HF etch) | Resistor | NH3, H2O | 1,000 ppm (mc), 60% humidity (mc) | [ | ||
| 2006 | Talin | TD (p) | 76 ± 5 nm (d) 4 μm (g) | Bare | FET | NH3 | No data | [ | ||
| 2006 | Kamins | BU (p) | ∼200 nm (d) 7 μm (l) | Bare | Resistor | NH3, HCl | Sat. con. (mc) | [ | ||
| 2008 | McAlpine | TD (p) | 16 nm (w) 5 μm (l) | Peptides | Resistor | NH3, AcOH | 100 ppm (mc) 100 ppm (mc) | [ | ||
| 2009 | Li | TD (n) | 80 μm (l) | Bare | Resistor | Humidity | 10%–100% (mc) | [ | ||
| 2011 | Passi | TD (p) | 25 nm (w) 300 nm (l) | DPCP receptor | FET | Humidity | Ambient (mc) | [ | ||
| 2011 | Hsueh | BU (p) | 90 nm (d) 1.6 μm (l) | Au | Resistor | Humidity | 30%–95% (mc) | [ | ||
| 2011 | In | TD (p) | ∼200 nm (d) 4–6 μm (l) | PTE from metal | Resistor | NH3, NO2 | 1 ppb (s) 10 ppb (s) | [ | ||
| 2011 | Chen | TD (n) | 55 μm (l) | Hexamethyldisilazane | Resistor (IDE) | Humidity | 11.3%–93% (mc) | [ | ||
| 2012 | Demami | BU (n) | 100 nm (d) 20 μm (l) | Bare | Resistor | NH3, smoke | No data | [ | ||
| TD (n) | 100 nm (d) 10 μm (l) | |||||||||
| 2012 | Ni | BU (n) | 150 nm (d) >20 μm (l) | Bare | Resistor | NH3 | 175–700 ppm (mc) | [ | ||
| 2013 | Taghinejad | BU (n) | 20–600 nm (d) | Bare | Resistor | Humidity | 42%–92% (mc) | [ | ||
| 2013 | Yang | BU | 50 nm (d) | Te NPs | Resistor | NH3, propylamine | 10–400 ppm (mc) 5–25 ppm (mc) | [ | ||
| 2010 | Clavaguera | TD (p) | 0.2, 1, 4 μm (w) 2, 4 μm (l) | DPCP receptor | FET | DPCP | 500–800 ppb (mc) | [ | ||
| 2010 | Engel | BU (p) | 2 μm (g) | APTES | FET | TNT | 10-2 ppt (s) | [ | ||
| 2012 | Wang | TD (p) | 100, 200, 400 nm (w) 100 μm (l) | H2/O2 plasma treatment | Resistor | Nitro explosives | Sat. con. (mc) | [ | ||
| 2010 | Kim | BU (p) | 50 nm (w) 3 μm (l) | Bare | Resistor | DMMP | No data | [ | ||
| 2011 | Passi | TD (p) | 25 nm (w) 300 nm (l) | DPCP receptor | FET | DPCP | 500-800 ppb (mc) | [ | ||
| 2011 | Clavaguera | TD (p) | 0.2, 1, 4 μm (w) 2, 4 μm (l) | DPCP receptor | FET | DPCP | 500 ppb (mc) | [ | ||
| 2011 | Niskanen | BU | 30–70 nm (d) ≥400 nm (l) | Bare | FET | Different VOCs | No data | [ | ||
| TD | 50 nm (d) | |||||||||
| 2011 | Paska | BU (p) | 60 nm (d) 2 μm (g) | CH3(CH2)15SiCl3 | FET | (Non) polar VOCs | ppm level (mc) | [ | ||
| 2012 | Paska | BU (p) | 50 ± 5 nm (d) 2 μm (g) | CH3(CH2)15SiCl3 | FET | Nonpolar VOCs | ppm level (mc) | [ | ||
| 2012 | Paska | BU (p) | 50 ± 5 nm (d) 2 μm (g) | CH3(CH2)nSiCl3 (n + 1 = 3, 6, 8, 12, 18) | FET | (Non) polar VOCs | ppm level (mc) | [ | ||
| 2013 | Wang | BU (p) | 40 ± 8 nm (d) 2 μm (g) | APTES + 4 different carbonyl chlorides | FET | (Non) polar VOCs | 0.01–0.08 pa/po (mc) | [ | ||
| 2013 | Wang | BU (p) | 40 ± 8 nm (d) 2 μm (g) | APTES + CH3(CH2)nCOCl (n + 1 = 6, 7, 10, 11) | FET | (Non) polar VOCs | 0.01–0.08 pa/po (mc) | [ | ||
| 2013 | Ermanok | BU (p) | 40 ± 8 nm (d) 2 μm (g) | Silanes with different chain lengths and end groups | FET | (Non) polar VOCs | 0.01–0.08 pa/po (mc) | [ |
TD: top down; BU: bottom up; p: positive type doping; n: negative type doping;
w: width; l: length; d: diameter; g: gap between electrode contacts;
s: sensitivity; mc: measurement concentration;
no doping, but n-type behavior;
type of doping not reported, but deduced from the sensor response data;
non-doped;
interdigitated electrode;
DPCP: diphenylchlorophosphate (Figure 10a); its receptor is 3-(4-ethynylbenzyl)-1,5,7-trimethyl-3-aza-bicyclo[3.3.1]nonane-7-methanol (EBTAM or TABINOL, compound 1 in Figure 10b);
OTS: octadecyltrichlorosilane;
PTE: porous top electrode (Figure 8a);
APTES: 3-aminopropyltriethoxysilane (Figure 7a);
APTES-modified SiNW were reacted with acyl chlorides to form amides (Figure 11g);
TNT: 2,4,6-trinitrotoluene;
DMMP: dimethylmethylphosphonate (Figure 10a);
Sat. con.: saturated concentration;
pa: VOC's partial pressure, po: vapor pressure.
Figure 1.Simplified schematics of the SiNW-based (a) resistor and (b) SiNW-based FET to illustrate the differences in the electrical configuration and the way the nanowires are orientated with respect to the electrodes (E) and the source (S) and drain (D).
Figure 2.Electrical characterization of nanowire thin-film transistors on plastic. (a) Schematic illustration of the active area of a transistor, with the electrodes and various layers labeled; (b) Scanning Electron Microscope image of the sensor platform. Each device (horizontal strip) is contacted by two Ti electrodes (oriented vertically) that extend to larger pads (top and bottom image edges). Inset: Digital photograph of the flexible sensor chip; (c) Electrical response of a nanowire-based sensor to 20 ppm (red curve), 2 ppm (blue curve), 200 ppb (green curve) and 20 ppb (black curve) NO2 diluted in N2. The gas is introduced to the sensing chamber after 1 min of flowing N2. Inset: An extended response of the sensor to 20 ppb NO2; the gas is introduced after 20 min of flowing N2. This figure is composed of figures taken from [31], reprinted with permission from the Nature Publishing Group ©.
Figure 3.(a) A schematic representation of the interdigitated structure used as a substrate to grow SiNWs. W = 200 μm, L = 3–21 μm, h =100 nm, SEM images of (b) the final chemoresistive sensor and (c) SiNW network detail onto the interdigitated structure; (c) The inset shows a SEM image of self-welding NW-NW junctions present in the SiNW network. This figure is composed of figures taken from [39], reprinted with permission from the American Institute of Physics ©.
Figure 4.(a) Schematic of the SBNWFET, consisting of p-type doped nanowires; (b) Energy band diagram before H2 is introduced, where EC and EV stand for the energy levels of the conduction and valence band, respectively. The holes do not experience a barrier and the contact is Ohmic. The native SiO2 layer is omitted in this diagram because it is too thin to affect transport; (c) Energy band diagram after H2 is introduced, showing the formation of a Schottky barrier; (d) Comparison of the responses of Ni and Pd contacted NWFETs to 1% H2. This figure is composed of figures taken from [36], reprinted with permission from Elsevier B.V. ©.
Figure 5.(a) Real-time electrical response curve of a device with vertical-standing SiNWs coated with a 7 nm thick Pd film to varying H2 concentrations in air at room temperature. The inset shows a clear and reversible response behavior even at very low H2 concentrations down to 5 ppm; (b) A plot of the sensitivity vs. H2 concentrations revealing two regimes with different rates of sensitivity change; (c) A proposed model of the hydrogen-sensing mechanism. Panel (c1) represents the initial devices with Pd-coated SiNWs with two on-top electrodes as indicated by the yellow lanes. The inset of the left panel shows a magnified distribution of SiNWs inside a cluster, indicating that the wires do not touch each other. Panel (c2) illustrates nanowire contacts inside clusters with gaps between neighboring clusters. In this case, the current flows through slanted nanowires between clusters. The inset is a magnified picture of contacted distribution of SiNWs inside a cluster. Panel (c3) illustrates the formation of current paths between neighboring clusters by large volume expansion of the Pd film caused by absorption of high concentrations of H2. This figure is composed of figures taken from reference [37], reprinted with permission from The Royal Society of Chemistry ©.
Figure 6.(a) Schematic description of surface modification by self-heating of a nanowire: in method 1, nanoparticles are formed by a hydrothermal reaction via Joule heating of a SiNW. In method 2, a metal thin film is locally deposited on a SiNW after PMMA decomposition, metal evaporation and lift-off. SEM images of the nanoparticle-decorated SiNW via Joule heating in a liquid metal precursor environment; (b) Pd nanoparticles selectively coated on the heated SiNW; and (c) high magnification SEM image of Pd nanoparticles on the heated SiNW. This figure is composed of figures taken from [40], reprinted with permission from the Royal Society of Chemistry ©.
Figure 7.(a) Schematic representation of the (left) APTES- and (right) peptide-modified SiNW surface. Note that two different peptides have been used, i.e., an ammonia recognition peptide and an acetic acid recognition peptide; (b) Electrical responses of the three different devices (APTES, NH3 peptide and acetic acid peptide) to ammonia and acetic acid vapors (100 ppm in N2) introduced to the sensing chamber after 5 min of flowing N2; (c) Conductance responses of the peptide-nanowire hybrid sensors, averaged over a 5 min time window of target vapor exposure (starting 10 min after the analyte gas exposure), and normalized to the amine-terminated sensor. Figures b,c are taken from [44], reprinted with permission from American Chemical Society ©.
Figure 8.(a) Schematic illustration of the periodically porous top electrode (PTE) nanowire array sensor concept; (b) Sensor response to various concentrations of NO2 and NH3 following 2 min of clean air: 1 ppm of NH3 (red), 500 ppb of NH3 (black), 1 ppm of NO2 (green) and 500 ppb of NO2 (blue) at ∼30% RH. This figure is composed of figures taken from [48], reprinted with permission from IOP Publishing Ltd ©.
Figure 10.(a) Molecular structure of DPCP and two structurally related phosphates; (b) Sensitive receptor towards DPCP. Compound 1 converts into compound 2 upon exposure nerve agent simulant DPCP. The red oval highlights an alkyne group, which can react with H-terminated Si to form a stable Si-C bond; (c) Change in drain current of a SiNW FET device that has been modified with compound 1 upon exposure to DPCP, which was introduced at t = 240 s. Figure c is taken from [54] with permission Wiley-VCH.
Figure 9.(a) The response of an APTES-functionalized SiNW device to (red) 5 μM solutions and (blue) 5 nM solutions. The inset shows the two different kind of interactions between TNT and the NH2-terminated SiNWs; (b) Molecular structures of six different N-containing compounds: (1) TNT; (2) 2,6-dinitrotoluene; (3) 2,4-dinitrophenol; (4) aniline; (5) (1,3,5-trinitroperhydro-1,3,5-triazine; and (6) p-nitrophenol. Figure based on graphs taken from [55] and used with permission from Wiley-VCH©.
Figure 11.Simplified scheme of the attachment of hexyltrichlorosilane (HTS) to the SiO2 surface: (a) Preparation of surface hydroxyl (Si–OH) groups; (b) Exposure to trimethylamine (TMA) to form a hydrogen bond with the Si–OH group to make the oxygen atom more nucleophilic; (c) Exposure to 1.5 mM of HTS in chloroform. At this stage, the oxygen atom of the Si–OH group attacks the silicon atom of HTS to form a Si–O–Si bond as given in (d); (e) The presence of water residues assists the replacement of chlorine atoms by OH groups to form the final product given in (f); (g) Schematic illustration of molecular layer with different functional groups on the SiNW surface. Figure a–f and Figure g are taken from [63] and [64], respectively, reprinted with permission from American Chemical Society ©.