| Literature DB >> 24089580 |
D Kriegner1, J M Persson, T Etzelstorfer, D Jacobsson, J Wallentin, J B Wagner, K Deppert, M T Borgström, J Stangl.
Abstract
In this work the structure of ternary Ga x In1 - x P nanowires is investigated with respect to the chemical composition and homogeneity. The nanowires were grown by metal-organic vapor-phase epitaxy. For the investigation of ensemble fluctuations on several lateral length scales, X-ray diffraction reciprocal space maps have been analyzed. The data reveal a complicated varying materials composition across the sample and in the nanowires on the order of 20%. The use of modern synchrotron sources, where beam-sizes in the order of several 10 μm are available, enables us to investigate compositional gradients along the sample by recording diffraction patterns at different positions. In addition, compositional variations were found also within single nanowires in X-ray energy dispersive spectroscopy measurements.Entities:
Keywords: III–V semiconductors; Nanowires; X-ray diffraction
Year: 2013 PMID: 24089580 PMCID: PMC3770020 DOI: 10.1016/j.tsf.2013.02.112
Source DB: PubMed Journal: Thin Solid Films ISSN: 0040-6090 Impact factor: 2.183
Fig. 1In panel (a) a scanning electron microscopy image of a sample grown at 460 °C using a TMI/TMG ratio of 1.7 recorded under an angle of 30° is shown. Vertical, non-tapered GaInP nanowires were grown. From the initially mono-disperse Au droplets with a size of 80 nm an inhomogeneous ensemble of nanowires with diameters ranging from ~ 40 nm to > 200 nm evolves. Panel (b) shows a scanning electron micrograph of a sample after removal of the wires by an ultrasonic bath. Panel (c) shows the nominal structure of a nanowires grown on InP(111)B substrates.
Fig. 2X-ray diffraction reciprocal space maps of a sample grown at 460 °C with a TMI/TMG ratio of 1.7 showing the logarithmic scattering intensity. In panel (a) the reciprocal space map around the Bragg peaks is shown. Black circles mark the nominal position of InP and GaP. Furthermore an artifact from the measurement, the detector streak, is indicated by a dotted line and the broadening due to the finite beam size is shown in the inset. In panel (b) the reciprocal space map including the InP, GaP , WZ and Bragg reflections is shown. White circles mark the nominal positions of InP and GaP.
Fig. 3X-ray diffraction line cuts through the reciprocal space map shown in Fig. 2a. In panel (a) the line cuts along the direction are shown. To obtain those line cuts the intensity was summed up along the perpendicular direction. Vertical lines mark the position where line cuts along the direction were done. These line cuts are shown normalized to their maximum in panel (b). The two line cuts through the GaIn1 − P signal are virtually the same when normalized. The third line cut through the GaP-rich signal is significantly broader.
Fig. 6Panel (a) shows a STEM image and xGa as obtained from an XEDS line scan along a nanowire from a sample grown at 460 °C using a TMI/TMG ratio of 1.47. Abrupt changes of the chemical composition are observed at positions where stacking defects can also be seen in TEM images. In panel (b) a comparison of the chemical composition as found for the particular nanowire investigated in TEM (black dots) and the ensemble XRD measurement (red line) of the same sample is shown.
Fig. 4Scattered intensity on square root scale plotted versus the chemical composition determined from the reciprocal space position around the Bragg peak. It shows the different chemical compositions present in the nanowire ensembles. Intensity curves for samples grown at 480 °C using different TMI/TMG ratios (r) are shown. The ratio r influences the average chemical composition in the nanowires. For all samples we observe gradients in the chemical composition of 20% and more within the illuminated spot-size of ≈ 2 × 4 mm2. The GaP-rich barrier shows up as weak signal at xGa ∼ 0.9. In addition a dashed line shows the measurement performed after removal of the NWs.
Fig. 5Synchrotron X-ray diffraction line cuts measured at a sample grown at 440 °C using a TMI/TMG ratio of 0.4. The measurements were done using a circular X-ray beam with diameter of 40 μm at different positions on the same sample. The projection of the beam spot into the sample surface is indicated by the ellipse shown in the inset. In addition the sum of the synchrotron measurements and the line cut obtained from laboratory measurements using a beamsize of several millimeters is shown.