| Literature DB >> 18783279 |
Katsuhiro Tomioka1, Junichi Motohisa, Shinjiroh Hara, Takashi Fukui.
Abstract
We report on control of growth directions of InAs nanowires on Si substrate. We achieved to integrate vertical InAs nanowires on Si by modifying initial Si(111) surface in selective-area metal-organic vapor phase epitaxy with flow-rate modulation mode at low temperature. Cross-sectional transmission electron microscope and Raman scattering showed that misfit dislocation with local strains were accommodated in the interface.Entities:
Year: 2008 PMID: 18783279 DOI: 10.1021/nl802398j
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189