| Literature DB >> 23445785 |
Daniel W Drumm1, Akin Budi, Manolo C Per, Salvy P Russo, Lloyd C L Hollenberg.
Abstract
: The differences in energy between electronic bands due to vEntities:
Year: 2013 PMID: 23445785 PMCID: PMC3606473 DOI: 10.1186/1556-276X-8-111
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Eight-atom cubic unit cell equilibrium lattice parameters for different methods used in this work
| PW ( | 5.469 |
| DZP ( | 5.495 |
| SZP ( | 5.580 |
Figure 1(001) Planar slice of the (22) structure at the 1/4 ML doped monolayer. One of the Si sites has been replaced by a P atom (shown in dark gray). The periodic boundaries are shown in black.
Figure 2Ball and stick model of a -doped Si:P layer viewed along the [110] direction. Thirty-two layers in the [001] direction are shown. Si atoms (small gray spheres), P atoms (large dark gray spheres), covalent bonds (gray sticks), repeating cell boundary (solid line).
Figure 3Full band structure (colour online) of the 40-layer tetragonal system calculated using PW (). Bulk band structure (shaded gray background), doped band structure (solid black) and Fermi level (labelled solid red).
Figure 4Band structure (colour online) of the 40-layer tetragonal system zoomed in on the band. (a) PW (vasp), (b) DZP (siesta) and (c) SZP basis sets were used. Fermi level is shown by a solid horizontal red line.
Figure 5Minimum band energies for tetragonal systems with 1/4 ML doping. (a) PW (vasp), (b) DZP (siesta) and (c) SZP (siesta) basis sets were used. Fermi level also shown where appropriate. Bold numbers indicate energy differences between band minima.
Valley splitting values of 1/4 ML P-doped silicon obtained using different techniques
| | ||
|---|---|---|
| Planar Wannier orbitala[ | 1,000 | 20 |
| Tight binding (4 K)b[ | ∼150 | ∼17 |
| Tight binding (4 K)b[ | 120 | 25 |
| Tight binding (300 K)b[ | ∼150 | ∼17 |
| | 40 | 7 |
| | 80 | 6 |
| DFT, SZP basis set a[ | 120 | 6 |
| | 160 | 6 |
| | 200 | 6 |
| DFT, SZP: ordered b[ | 40 | 120 |
| DFT, SZP: random disorder b[ | 40 | ∼70 |
| DFT, SZP: [110] direction alignment b[ | 40 | ∼270 |
| DFT, SZP: dimers b[ | 40 | ∼85 |
| DFT, SZP: random disorder b[ | 40 | ∼80 |
| DFT, SZP: clusters b[ | 40 | ∼65 |
| DFT, SZP: [100] direction alignment b[ | 40 | ∼50 |
| DFT, SZP: ordered, | 80 | 153 |
| DFT, SZP: ordered, | 80 | 147 |
| DFT, SZP: ordered, | 80 | 147 |
| | 40 | 145.1 |
| | 60 | 144.7 |
| SZP, | 80 | 144.8 |
| | 120 | 144.7 |
| | 160 | 144.7 |
| | 200 | 144.7 |
| | 16 | 118.6 |
| | 32 | 94.1 |
| PW, | 40 | 93.5 |
| | 60 | 93.3 |
| | 80 | 93.2 |
| | 40 | 100 |
| | 60 | 99.5 |
| DZP, | 80 | 99.5 |
| | 120 | 99.3 |
| 160 | 99.6 |
Techniques are grouped by similarity. aImplicit doping; bExplicit doping; cM × M × 1k-points; dM × M × Nk-points; N as in Appendix 1.
Figure 6Electronic densities of states for tetragonal systems with 0 and 1/4 ML doping. The DZP (siesta) basis set was used. The Fermi level is indicated by a solid vertical line with label, and 50-meV smearing was applied for visualization purposes.
Figure 7Planar average of donor-electron density as a function of -position for 1/4 ML-doped 80-layer cell. The DZP basis set was used. The fitted Lorentzian function is also shown.
Calculated maximum donor-electron density,, and FWHM
| 40 | 3.8 | 6.2 |
| 60 | 3.9 | 6.2 |
| 80 | 3.9 | 6.5 |
Values are presented as a function of the number of layers in 1/4 ML-doped cells. The DZP basis set was used.
Figure 8Band structure and physical structure of FCC and SC cells. (a) Typical band structure of bulk Si for two-atom FCC (solid lines) and eight-atom SC cells (dotted lines with squares), calculated using the vasp plane-wave method (see ‘Methods’ section). (b) Two-atom FCC cell. (c) Eight-atom SC cell.
Figure 9Geometrical difference between the simple cubic and tetragonal cells. A (001) planar cut through an atomic monolayer is shown.
Figure 10The Brillouin zone for a tetragonal cell. The M–Γ–X path used in this work is shown.
Figure 11Band structure (colour online) diagram for tetragonal bulk Si structures with increasing number of layers. The vasp plane wave method was used (see ‘Methods’ section).
Energy levels of tetragonal bulk Si structures
| PW | 4 | 12 | 0.7517 | |
| ( | 8 | 6 | 0.7517 | |
| | 16 | 3 | 0.6506 | |
| | 32 | 2 | 0.6170 | |
| | 40 | 1 | 0.6179 | |
| | 64 | 1 | 0.6137 | |
| | 80 | 1 | 0.6107 | 0.6102 |
| DZP | 40 | 1 | 0.6218 | |
| ( | 60 | 1 | 0.6194 | |
| | 80 | 1 | 0.6154 | |
| | 120 | 1 | 0.6145 | |
| | 160 | 1 | 0.6151 | 0.6145 |
| SZP | 40 | 1 | 0.8392 | |
| ( | 60 | 1 | 0.8349 | |
| | 80 | 1 | 0.8315 | |
| | 120 | 1 | 0.8311 | |
| | 160 | 1 | 0.8315 | |
| 200 | 1 | 0.8310 | 0.8309 |
For details of the calculation parameters, see the ‘Methods’ section.