Literature DB >> 16217240

Exposure assessment for retrospective follow-up studies of semiconductor- and storage device-manufacturing workers.

Robert F Herrick1, James H Stewart, Drew Blicharz, Colleen Beall, Thomas Bender, Hong Cheng, Robert Matthews, Nalini Sathiakumar, Elizabeth Delzell.   

Abstract

OBJECTIVE: This exposure assessment was conducted in the first large study of mortality and cancer incidence in semiconductor and storage device manufacturing.
METHODS: Unique combinations of division, department and job codes and names (DDJ) from work history records were assigned to work groups and exposure categories. Agent exposure matrices assessed differences in potential exposures between groups. Changes in exposure over time were tracked by dividing the production history into manufacturing eras.
RESULTS: Nineteen work groups were developed to capture 310,351 unique DDJs from 1965-1999. Agent exposure matrices contrasted exposure potential to solvents, metals, and work in cleanrooms between groups, and three manufacturing eras were identified for each site.
CONCLUSIONS: The work groups, manufacturing eras and agent matrices have been used to classify workers in the study of cancer incidence and mortality.

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Mesh:

Year:  2005        PMID: 16217240     DOI: 10.1097/01.jom.0000177128.50822.01

Source DB:  PubMed          Journal:  J Occup Environ Med        ISSN: 1076-2752            Impact factor:   2.162


  6 in total

1.  Cancer incidence among semiconductor and electronic storage device workers.

Authors:  T J Bender; C Beall; H Cheng; R F Herrick; A R Kahn; R Matthews; N Sathiakumar; M J Schymura; J H Stewart; E Delzell
Journal:  Occup Environ Med       Date:  2006-07-17       Impact factor: 4.402

2.  Retrospective assessment of exposure to chemicals for a microelectronics and business machine manufacturing facility.

Authors:  Donald A Fleming; Susan R Woskie; James H Jones; Sharon R Silver; Lian Luo; Stephen J Bertke
Journal:  J Occup Environ Hyg       Date:  2014       Impact factor: 2.155

3.  Exposure Reconstruction and Risk Analysis for Six Semiconductor Workers With Lymphohematopoietic Cancers.

Authors:  Rachael M Jones; Linda Dell; Craig Torres; Catherine E Simmons; James Poole; Fred W Boelter; Paul Harper
Journal:  J Occup Environ Med       Date:  2015-06       Impact factor: 2.162

4.  Cancer mortality and incidence in korean semiconductor workers.

Authors:  Hye-Eun Lee; Eun-A Kim; Jungsun Park; Seong-Kyu Kang
Journal:  Saf Health Work       Date:  2011-06-30

5.  Cancer mortality in IBM Endicott plant workers, 1969-2001: an update on a NY production plant.

Authors:  Richard W Clapp; Kate Hoffman
Journal:  Environ Health       Date:  2008-04-28       Impact factor: 5.984

Review 6.  Review for Retrospective Exposure Assessment Methods Used in Epidemiologic Cancer Risk Studies of Semiconductor Workers: Limitations and Recommendations.

Authors:  Donguk Park
Journal:  Saf Health Work       Date:  2018-06-07
  6 in total

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