Literature DB >> 16089420

Stamp collapse in soft lithography.

Yonggang Y Huang1, Weixing Zhou, K J Hsia, Etienne Menard, Jang-Ung Park, John A Rogers, Andrew G Alleyne.   

Abstract

We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the PDMS stamp and substrate. A scaling law among the stamp modulus, punch height and spacing, and work of adhesion between the stamp and substrate is established. Such a scaling law leads to a simple criterion against the unwanted roof collapse. The present study agrees well with the experimental data.

Year:  2005        PMID: 16089420     DOI: 10.1021/la0502185

Source DB:  PubMed          Journal:  Langmuir        ISSN: 0743-7463            Impact factor:   3.882


  25 in total

1.  Microstructured elastomeric surfaces with reversible adhesion and examples of their use in deterministic assembly by transfer printing.

Authors:  Seok Kim; Jian Wu; Andrew Carlson; Sung Hun Jin; Anton Kovalsky; Paul Glass; Zhuangjian Liu; Numair Ahmed; Steven L Elgan; Weiqiu Chen; Placid M Ferreira; Metin Sitti; Yonggang Huang; John A Rogers
Journal:  Proc Natl Acad Sci U S A       Date:  2010-09-21       Impact factor: 11.205

2.  Soft-lithographic replication of 3D microstructures with closed loops.

Authors:  Christopher N LaFratta; Linjie Li; John T Fourkas
Journal:  Proc Natl Acad Sci U S A       Date:  2006-05-23       Impact factor: 11.205

3.  Subnanometer structure and function from ion beams through complex fluidics to fluorescent particles.

Authors:  Kuo-Tang Liao; Joshua Schumacher; Henri J Lezec; Samuel M Stavis
Journal:  Lab Chip       Date:  2017-12-19       Impact factor: 6.799

4.  Flexible electronic/optoelectronic microsystems with scalable designs for chronic biointegration.

Authors:  Enming Song; Chia-Han Chiang; Rui Li; Xin Jin; Jianing Zhao; Mackenna Hill; Yu Xia; Lizhu Li; Yuming Huang; Sang Min Won; Ki Jun Yu; Xing Sheng; Hui Fang; Muhammad Ashraful Alam; Yonggang Huang; Jonathan Viventi; Jan-Kai Chang; John A Rogers
Journal:  Proc Natl Acad Sci U S A       Date:  2019-07-15       Impact factor: 11.205

5.  From 2D to 3D: Strain- and elongation-free topological transformations of optoelectronic circuits.

Authors:  Dejiu Fan; Byungjun Lee; Caleb Coburn; Stephen R Forrest
Journal:  Proc Natl Acad Sci U S A       Date:  2019-02-12       Impact factor: 11.205

6.  Lithography Technology for Micro- and Nanofabrication.

Authors:  Dahee Baek; Sang Hun Lee; Bong-Hyun Jun; Seung Hwan Lee
Journal:  Adv Exp Med Biol       Date:  2021       Impact factor: 2.622

7.  Refinement of current monitoring methodology for electroosmotic flow assessment under low ionic strength conditions.

Authors:  Mario A Saucedo-Espinosa; Blanca H Lapizco-Encinas
Journal:  Biomicrofluidics       Date:  2016-06-03       Impact factor: 2.800

Review 8.  Flexible fabrication and applications of polymer nanochannels and nanoslits.

Authors:  Rattikan Chantiwas; Sunggook Park; Steven A Soper; Byoung Choul Kim; Shuichi Takayama; Vijaya Sunkara; Hyundoo Hwang; Yoon-Kyoung Cho
Journal:  Chem Soc Rev       Date:  2011-03-25       Impact factor: 54.564

9.  A soft, wearable microfluidic device for the capture, storage, and colorimetric sensing of sweat.

Authors:  Ahyeon Koh; Daeshik Kang; Yeguang Xue; Seungmin Lee; Rafal M Pielak; Jeonghyun Kim; Taehwan Hwang; Seunghwan Min; Anthony Banks; Philippe Bastien; Megan C Manco; Liang Wang; Kaitlyn R Ammann; Kyung-In Jang; Phillip Won; Seungyong Han; Roozbeh Ghaffari; Ungyu Paik; Marvin J Slepian; Guive Balooch; Yonggang Huang; John A Rogers
Journal:  Sci Transl Med       Date:  2016-11-23       Impact factor: 17.956

10.  A method for nanofluidic device prototyping using elastomeric collapse.

Authors:  Seung-min Park; Yun Suk Huh; Harold G Craighead; David Erickson
Journal:  Proc Natl Acad Sci U S A       Date:  2009-08-27       Impact factor: 11.205

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