| Literature DB >> 36014126 |
Zeyong Wei1,2,3, Haoyu Li1, Linyuan Dou1, Lingyun Xie1,2,3, Zhanshan Wang1,2,3, Xinbin Cheng1,2,3.
Abstract
Optical analog computing has natural advantages of parallel computation, high speed and low energy consumption over traditional digital computing. To date, research in the field of on-chip optical analog computing has mainly focused on classical mathematical operations. Despite the advantages of quantum computing, on-chip quantum analog devices based on metasurfaces have not been demonstrated so far. In this work, based on a silicon-on-insulator (SOI) platform, we illustrated an on-chip quantum searcher with a characteristic size of 60 × 20 μm2. We applied classical waves to simulate the quantum search algorithm based on the superposition principle and interference effect, while combining it with an on-chip metasurface to realize modulation capability. The marked items are found when the incident waves are focused on the marked positions, which is precisely the same as the efficiency of the quantum search algorithm. The proposed on-chip quantum searcher facilitates the miniaturization and integration of wave-based signal processing systems.Entities:
Keywords: metasurface; on-chip; optical analog computing; quantum search algorithm
Year: 2022 PMID: 36014126 PMCID: PMC9413265 DOI: 10.3390/mi13081204
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 3.523
Figure 1Schematic diagram of the proposed quantum searcher. The designed quantum searcher is comprised of four metasurfaces: an oracle metasurface, two metalenses, and a middle metasurface (MMS). Two insets: the corresponding on-chip structures. The term f = 20 µm denote the focal length of the metalens. The TE wave of wavelength λ = 1550 nm travels in the positive x-direction (polarized in the y-direction).
Figure 2The design of the on-chip unit structure. (a) Schematic diagram of the three-dimensional structure of the on-chip metasurface-based device with wavelength λ = 1550 nm. w and L are the width and length of the etched slots, respectively. h is thickness of the Si layer, and f(y) is the incident signal. (b) Schematic diagram of the cross section of the device unit structure. The term h = 0.25 μm denotes the thickness of the upper Si layer of the SOI and the etched slots. The slots are etched in the middle of the upper Si layer. (c) Calculated transmission results. The length of etched slot waveguide varies from 0.2 μm to 2.5 μm and the width varies from 0 to 0.5 μm. The simulated transmission is a function of the width and length of the slot. The wavelength of the input light is 1550 nm (polarized in y-direction). (d) Calculated phase and transmission results. The simulated transmission and phase are related to the length of the slot. The length of the etched slot waveguide varies from 0.2 μm to 2.5 μm while the width of etched slot is fixed at w = 140 μm. The slot waveguide with a length of 0.5 μm to 2.5 μm brings phase coverage from 0 to 2π, while the transmittance is more than 80%.
Figure 3The design of on-chip oracle metasurface and MMS. (a) The structure diagram of the proposed oracle metasurface. (b) The structure diagram of the proposed MMS. (c,d) Simulation results for the in-plane wave distribution of |Ey|2 in the middle of the silicon slab with incident light parallel to its optical axis are applied: (c) oracle metasurface, (d) MMS.
Figure 4The design of on-chip metalens. (a) The structure diagram of the proposed metalens. (b) In-plane electric-field distribution |E| in the middle of the silicon slab with incident light parallel to its optical axis. (c,d) Simulated electric-field distribution |E| and E in the region highlighted by a dashed red box in (b), respectively.
Figure 5Theoretical simulation of the on-chip quantum search algorithm. (a,c) The snapshots for the intensity of the incident microwave throughout the metamaterial functioning as quantum searching simulator with 0.5-iterations: (a) y = −2.75 µm and y = −1.25 µm, (c) y = 1.25 µm and y = 2.75 µm. (b,d) Simulation results for the normalized output intensity of the metamaterial with the incident wave propagating 0.5-roundtrips within the device: (b) y = −2.75 µm and y = −1.25 µm, (d) y = 1.25 µm and y = 2.75 µm.