| Literature DB >> 30675346 |
Xinbin Cheng1,2,3, Siyu Dong1,2, Song Zhi1,2, Sebastian Paschel4, Istvan Balasa4, Detlev Ristau4, Zhanshan Wang1,2,3.
Abstract
With the ever-increasing laser power and repetition rate, thermal control of laser media is becoming increasingly important. Except for widely used air cooling or a bonded heat sink, water cooling of a laser medium is more effective in removing waste heat. However, how to protect deliquescent laser media from water erosion is a challenging issue. Here, novel waterproof coatings were proposed to shield Nd:Glass from water erosion. After clarifying the dependence of the waterproof property of single layers on their microstructures and pore characteristics, nanocomposites that dope SiO2 in HfO2 were synthesized using an ion-assisted co-evaporation process to solve the issue of a lack of a high-index material that simultaneously has a dense amorphous microstructure and wide bandgap. Hf0.7Si0.3O2/SiO2 multifunctional coatings were finally shown to possess an excellent waterproof property, high laser-induced damage threshold (LIDT) and good spectral performance, which can be used as the enabling components for thermal control in high-power laser cavities.Entities:
Year: 2019 PMID: 30675346 PMCID: PMC6342822 DOI: 10.1038/s41377-018-0118-6
Source DB: PubMed Journal: Light Sci Appl ISSN: 2047-7538 Impact factor: 17.782
Fig. 1Schematic of a water-cooled Nd:Glass laser cavity
Fig. 2SiO2 and HfO2 coatings prepared by EBE and IAD processes.
a1–d1 Optical photographs, a2–d2 microscopic images, a3–d3 cross-sectional TEM images, a4–d4 schematics of water diffusion along the nanopores in the coatings. It is worth noting that the TEM images of the SiO2 coatings are replaced using TEM images of Ta2O5 coatings to better reveal the microstructure. TEM images and the electron diffraction pattern of the SiO2 coatings are shown in Figure S2 and S3 in the Supplementary Information
Fig. 3Schematic of water diffusion in nanopores; optical photographs; cross-sectional SEM images of HfO2/SiO2 and Ta2O5/SiO2 multilayers prepared by an IAD process
Fig. 4Comparisons among HfSi1−O2 nanocomposite films and oxide films. Cross-sectional TEM images of HfSi1−O2 nanocomposite layers with a 20% SiO2 concentration, b 30 and 40% SiO2 concentration. c Transmission spectra of single layers of Hf0.7Si0.3O2, SiO2, HfO2 and Ta2O5