| Literature DB >> 35935132 |
Raza Gulfam1,2, Yongping Chen1,2.
Abstract
This review reports the recent progress and future prospects of wettability gradient surfaces (WGSs), particularly focusing on the governing principles, fabrication methods, classification, characterization, and applications. While transforming the inherent wettability into artificial wettability via bioinspiration, topographic micro/nanostructures are produced with changed surface energy, resulting in new droplet wetting regimes and droplet dynamic regimes. WGSs have been mainly classified in dry and wet surfaces, depending on the apparent surface states. Wettability gradient has long been documented as a surface phenomenon inducing the droplet mobility in the direction of decreasing wettability. However, it is herein critically emphasized that the wettability gradient does not always result in droplet mobility. Indeed, the sticky and slippery dynamic regimes exist in WGSs, prohibiting or allowing the droplet mobility, respectively. Lastly, the stringent bottlenecks encountered by WGSs are highlighted along with solution-oriented recommendations, and furthermore, phase change materials are strongly anticipated as a new class in WGSs. In all, WGSs intend to open up new technological insights for applications, encompassing water harvesting, droplet and bubble manipulation, controllable microfluidic systems, and condensation heat transfer, among others.Entities:
Year: 2022 PMID: 35935132 PMCID: PMC9327586 DOI: 10.34133/2022/9873075
Source DB: PubMed Journal: Research (Wash D C) ISSN: 2639-5274
Figure 1Evolutionary timeline of the fundamental surface science and technology to the advanced surface science and technology (note: HPo, HPi, SHPo, and SHPi stand for hydrophobic, hydrophilic, superhydrophobic, and superhydrophilic, respectively. Images on the condensation of water vapors belong to the authors' reference [24], except for the conical wire that belongs to Reference [18]).
Figure 2Classification of droplet wetting and droplet dynamic (sticky and slippery) regimes. The examples of living surfaces demonstrate the slippery dynamics (top) and sticky dynamics (bottom) (note: θe (°) is the equilibrium contact angle and α (°) is the sliding/rolling angle).
Figure 3Mechanism of droplet dynamics influenced by the involved forces: (a) droplet affected by the wettability gradient, (b) slippery dynamics, and (c) sticky dynamics.
Pre-investigated dry WGSs.
| Ref. | Substrate | Fabrication method | Artificial coating | Stimulus | Gradient regime | Water contact angle | Applications |
|---|---|---|---|---|---|---|---|
| [ | Poly(methyl methacrylate) sheet | Laser cutting | PDMS and silica particles | Self | SHPo-HPi | 162°-68° | Electrolysis and gas collection |
| [ | Brass sheet | Laser texturing | NA | NA | Variable | — | Chemical sensing |
| [ | PDMS sheet | Photolithography and plasma etching | NA | Self | HPo-HPo | 140°-100° | Underwater air bubble manipulation |
| [ | Silicon wafer | Vapor diffusion | Alkyltrichlorosilane | NA | HPo-HPi | 100°-52° | Steam condensation and drop distribution shift |
| [ | Silicon wafer | Photolithography and dry etching | CYTOP | Self | HPo-HPi | 100°-35° | Steam condensation heat transfer |
| [ | Glass, cloth, and filter paper | Photolithography and UV treatment | Trimethoxyoctadecylsilane | Self | HPo-HPi | 135°-53° | Water droplet manipulation, metering, and merging |
| [ | Copper wires | Electrochemical corrosion combined with the gradual solution-rise method | NA | Self | HPo-HPi | NA | Fog collection |
| [ | Silicon wafer | Photolithography, reactive, and deep reactive ion etching | Fluoropolymer | Self | SHPo-HPo | 150°-118° | Droplet positioning and coalescence-induced motion |
| [ | Silicon wafer | Vapor diffusion | Alkyltrichlorosilane | Self | HPo-SHPi | 100°-0° | Steam condensation |
| [ | Silicon wafer | Vapor diffusion | Dodecyltrichlorosilane and decyltrichlorosilane | Self | HPi-HPi | 70°-10° | Tetraethylene glycol droplet manipulation |
| [ | Graphite plate | Electrochemical oxidation | PCM (paraffin wax) | Self | HPo-HPi | 104°-31° | Water droplet manipulation |
| [ | Glass plate | Vacuum ultraviolet-assisted photodegradation | Octadecyltrimethoxysilane | Self | HPo-HPi | NA | Water droplet manipulation |
| [ | Acrylic polymer | Ultraviolet-ozone treatment | Fluorosilane | Self | HPo-HPi | 120°-60° | Water collection |
| [ | Graphite plate | Electrochemical oxidation combined with gradual solution removal method | NA | Gravity | HPo-HPi | 123°-66° | Underwater oil droplet manipulation |
| [ | Copper plate | Laser cutting and vapor deposition | Perfluorodecanethiol | NA | SHPo-HPo | 172°-131° | Steam condensation heat transfer |
| [ | Cyclic olefin copolymer and thermoplastic polymer | Interference lithography, UV, and thermal-nanoimprint lithography | Perfluorodecyltrichlorosilan | NA | HPo-HPo | 132°-108° | NA |
| [ | Silicon wafer | Photolithography, deep reactive ion etching, and oxygen-based plasma treatment | Fluoropolymer | Self | SHPi-HPo | 0°-105° | Droplet splitting |
| [ | Silicon | Optical lithography | Perfluorodecyltrichlorosilane | NA | HPo-HPi | 128°-70° | Glycerol/water droplet transport |
| [ | Silicon wafer | Photolithography and deep reactive ion etching | Perfluorooctyl silane | NA | HPo-HPi | 107°-67° | Water vapor condensation |
| [ | Silicon wafer | Photolithography, plasma etching, and gradual solution rise | Decyltrichlorosilane | Self | SHPo-HPi | 151°-39° | Water droplet manipulation |
| [ | Copper mesh and copper sheet | Femtosecond laser scanning and vapor deposition | Polytetrafluoroethylene (sheet) | Gravity | SHPo-HPi | 159°-76° | Fog harvesting |
| [ | PDMS | Laser irradiation | NA | Vibration and gravity | HPo-HPi (periodic) | 125°-NA | Droplet manipulation, biochemical detection |
| [ | Cu mesh combined with PDMS-graphene | Laser etching and ultrasonic vibration | NA | NA | SHPo-HPo | 153°-117° | Fog collection |
| [ | Janus polyester/nitrocellulose textile | CO2-based laser drilling | NA | NA | HPi-SHPo | 84°-0° | Sweat droplet transportation and thermal management of the human body |
| [ | Silicon nanowires | UV-enhanced photodecomposition | Dodecyltrichlorosilane | Gravity | SHPo-HPi | 150°-NA | Guiding droplet tracks |
| [ | Glass slide | Laser ablation | Polydimethylsiloxane and silica | Gravity | SHPo-HPi | 153°-34° | Underwater gas bubble manipulation |
| [ | Aluminum plate | Gradual substrate move and vapor deposition | Perfluorodecyltrichlorosilane | Self | HPo-HPi | — | Steam condensation heat transfer |
| [ | Silicon wafer | Gradual substrate move (layer by layer deposition) | Polyelectrolytes | NA | SHPo-SHPi | 164°-5° | Rewritable and switchable wetting |
| [ | Aluminum plates | Physical vapor deposition | Heptadecafluoro-1-decanethiol | Self and magnetic | HPo-HPi | 90°-15° | Ferrofluid droplet manipulation |
| [ | Polyethylene | Oxidation (electrode corona treatment) | NA | NA | HPo-HPi | 95°-45° | Cell growth and protein adsorption |
| [ | Glass | Vapor deposition(moving substrate) | Octadiene-allyalamine | NA | HPo-HPi | 90°-70° | Protein adsorption and cell culturing |
| [ | Polyethylene sheets | Corona oxidation (moving substrate) | NA | NA | HPo-HPi | 100°-40° | Platelet adhesion and protein adsorption |
| [ | Polyethylene sheets | Corona oxidation (moving substrate) | Monomer solution | NA | HPi-HPi | 90°-40° | Platelet adhesion |
| [ | Coverslips | Plasma polymerization | Octadiene-acrylic acid | NA | HPo-HPi | 96°-48° | Cell culturing and adhesion |
| [ | Silicon wafer | Photolithography | NA | Self | NA | NA | Water droplet manipulation |
| [ | Aluminum alloy | Electrochemical etching and electrolyte jet machining | PCM (stearic acid) | Gravity | NA | NA | Droplet adhesion and sliding |
| [ | Nickel-titanium sheet | Laser etching | PCM (stearic acid) | Self | SHPo-HPo | 155°-94° | Antithrombosis, antiadhesion of protein and cells |
| [ | Aluminum sheet | Laser scanning (patterned arrangement) | PCM (stearic acid) | Self | SHPo-Hpo | 161°-98° | Underwater air bubble manipulation |
Abbreviations: SHPo: superhydrophobic; HPo: hydrophobic; SHPi: superhydrophilic; HPi: hydrophilic; NA: not available.
Pre-investigated wet WGSs.
| Ref. | Substrate | Fabrication method | Artificial coating | Stimulus | Gradient regime | Water contact angle | Applications |
|---|---|---|---|---|---|---|---|
| [ | Glass wafer | Photolithography, reactive ion etching, and oil infusion | Salinized nanoparticles and silicon oil | Self | SHPo-HPo | 165°-108° | Water droplet manipulation (uphill and straight mobility) |
| [ | Glass | Printing and oil infusion | Krytox GPL-103 oil | Electric potential | HPi-HPi | 71.5°-52.9° | Underoil water droplet manipulation, water condensation, and dust-cleaning |
| [ | Glass wafer | Photolithography and oil infusion | Ionic liquid and Krytox GPL oil | Self | NA | NA | Water and ethylene glycol droplet manipulation |
| [ | Silicon wafer | Vapor diffusion | Chlorine-terminated polydimethylsiloxane | Self | HPi-HPi | 26.9°-21.5° (FC40) | Manipulation of low surface tension fluids and their condensation |
Abbreviations: SHPo: superhydrophobic; HPo: hydrophobic; SHPi: superhydrophilic; HPi: hydrophilic; NA: not available.
Figure 4Classification of WGSs.
Potential PCMs and their melting temperatures [24].
| PCMs |
| PCMs |
|
|---|---|---|---|
| Waxy paraffin oils | |||
| RT-(-9) HC | -9 | Tetradecane | 5-6 |
| RT-(-4) | -4 | RT-8 | 8 |
| RT-0 | 0 | Pentadecane | 10 |
| RT-2 HC | 2 | RT-12 | 12 |
| RT-3 HC_1 | 3 | RT-15 | 15 |
| RT-4 | 4 | Hexadecane | 18-19 |
| Paraffin waxes | |||
| Heptadecane | 22 | Tricosane | 48-50 |
| Octadecane | 28 | Tetracosane | 50-52 |
| Nonadecane | 32-33 | Pentacosane | 52-54 |
| Eicosane | 36-37 | Hexacosane | 56-68 |
| Heneicosane | 39-41 | Heptacosane | 58-60 |
| Docosane | 42-44 | Octacosane | 60-62 |
| Waxy natural PCMs | |||
| Peanut oil | 2-3 | Carnuaba wax | 80 |
| Coconut oil | 25 | Palm oil | — |
| Cocoa oil | 35 | Tea wax | — |
| Beeswax | 61 | ||
| Nonwaxy fatty acids | |||
| Butyric acid | -5.6 | Pentadecanoic acid | 52-53 |
| Caproic acid | -3 | Palmitic acid | 61-64 |
| Caprylic acid | 16-17 | Margaric acid | 60 |
| Capric acid | 30-32 | Stearic acid | 65-70 |
| Lauric acid | 41-44 | Nonadecylic acid | 67 |
| Tridecylic acid | 41.4 | Heneicosylic acid | 73-74 |
| Myristic acid | 49-58 | Tricosylic acid | 79 |
| Nonwaxy polyalcohols | |||
| Threitol | 88.6 | Erythritol | 117-120 |
| Xylitol | 92-96 | D-Mannitol | 166-167 |
| Adonitol | 96-104 | Dulcitol | 187-189 |
| Sorbitol | 93-99 | Inositol | 224 |
| Arabinitol | 106.2 | ||
| Nonwaxy polymers | |||
| PEG400 | 3.2 | PEG3400 | 56.5 |
| PEG600 | 22.2 | PEG4000 | 59.7 |
| PEG1000 | 32 | PEG6000 | 64.8 |
| PEG1500 | 46.5 | PEG10000 | 66 |
| PEG2000 | 51 | PEG20000 | 68.7 |
| PANIPAAM | 32-36 | ||
| Nonwaxy salts and salt hydrates | |||
| AlCl3 | 192 | MgCl2 | 714 |
| LiNO3 | 250 | Na2P2O7·10H2O | 70 |
| NaNO3 | 307 | Ba(OH)2·8H2O | 78 |
| KNO3 | 333 | (NH4)Al(SO4)2·12H2O | 95 |
| KOH | 380 | MgCl2·6H2O | 117 |
| KclO4 | 527 | Mg(NO3)2·6H2O | 89.3 |
| LiH | 699 | ||
| Nonwaxy metals | |||
| Mercury | -38.8 | Lithium | 186 |
| Cesium | 28.6 | Sn91Zn9 | 199 |
| Gallium | 29.8 | Tin | 232 |
| Bi58Sn42 | 138 | Bismuth | 271.4 |
Figure 5(a) Gradual solution rise method, (b, c) surface morphology, (d) wettability gradient [46], (e) gradual solution rise combined with electrochemical oxidation method, (f) wettability gradient, and (g, h) surface morphology and wetting regimes [59].
Figure 6(a–e) Preparation steps of dry WGS, (f) wettability gradient, (g) surface morphology, (h) droplet dynamics, and self-stimulus uphill droplet transport along (i) circular track, (j) straight track, and (k) S-shaped track [42].
Figure 7(a) Preparation of WGS, (b–d) position-oriented surface morphology and wettability gradient, and (e) droplet dynamics [55].
Figure 8(a) Peparation of WGS, (b, c) surface morphology, and (d) droplet dynamics [61].
Figure 9(a–d) Fabrication of WGS, (e) droplet dynamics, and applications of WGS in (f) collection of droplets, (g) self-cleaning, and (h) under-oil water droplet transport [84].