| Literature DB >> 35812805 |
Abstract
Focused ultrasound (FUS) is a powerful tool widely used in biomedical therapy and imaging as well as in sensors and actuators. Conventional focusing techniques based on curved surfaces, metamaterial structures, and multielement phased arrays either present difficulties in massively parallel manufacturing with high precision or require complex drive electronics to operate. These difficulties have been addressed by microfabricated self-focusing acoustic transducers (SFATs) with Parylene air-cavity Fresnel acoustic lenses (ACFALs), which require a time-demanding step in removing the sacrificial layer. This paper presents three new and improved types of ACFALs based on polydimethylsiloxane (PDMS), an SU-8/PDMS bilayer, and SU-8, which are manufactured through simple sacrificial-layer-free microfabrication processes that are two to four times faster than that for the Parylene ACFALs. Moreover, by studying the effect of the lens thickness on the acoustic transmittance through the lens, the performance of the transducers has been optimized with improved thickness control techniques developed for PDMS and SU-8. As a result, the measured power transfer efficiency (PTE) and peak output acoustic pressure are up to 2.0 and 1.8 times higher than those of the Parylene ACFALs, respectively. The simple microfabrication techniques described in this paper are useful for manufacturing not only high-performance ACFALs but also other miniaturized devices with hollow or suspended structures for microfluidic and optical applications.Entities:
Keywords: Electrical and electronic engineering; Electronic devices
Year: 2022 PMID: 35812805 PMCID: PMC9256634 DOI: 10.1038/s41378-022-00407-w
Source DB: PubMed Journal: Microsyst Nanoeng ISSN: 2055-7434 Impact factor: 8.006
Fig. 1Schematic diagrams and acoustic pressure distributions of an SFAT with an air-cavity Fresnel acoustic lens (ACFAL).
a Perspective schematic diagrams showing an SFAT consisting of a PZT sound source with patterned electrodes and an ACFAL with annular-ring air cavities. Quadrant portions of the ACFAL and PZT are made translucent to better illustrate the structure of the transducer. b Cross-sectional diagram of an SFAT, showing how the ACFAL focuses ultrasound by blocking destructively interfering acoustic waves. c Top-view diagram of the transducer showing the relative positions of the top electrode (and soldering pad), air-cavity rings, and non-air-cavity regions. d, e FEM-simulated normalized acoustic pressure in water at 2.32 MHz from an ideal ACFAL with six non-air-cavity regions designed for a 5-mm focal length (d) on the central vertical plane and e the lateral focal plane at Z = 5 mm, with the same color bar scale but different dimension scales.
Fig. 2Photos of SFATs based on newly developed ACFALs.
a–d Top-view photos of SFATs with a a PDMS ACFAL, b an SU-8/PDMS ACFAL, c a 45-μm-thick SU-8 ACFAL, and d a 283.5-μm-thick SU-8 ACFAL, all before electric wires are soldered. e–g Cross-sectional scanning electron microscope (SEM) photos of SFATs with e a PDMS ACFAL, f a 45-μm-thick SU-8 ACFAL, and g a 283.5-μm-thick SU-8 ACFAL. h–i Top-view microscope photos showing parts of h an SU-8/PDMS ACFAL and i a 283.5-μm-thick SU-8 ACFAL.
Summary of device information and measured focal parameters.
| Device type | PDMS ACFAL (New) | SU-8/PDMS ACFAL (New) | SU-8 ACFAL (New) | Parylene ACFAL (Old) | Patterned electrode rings (Old) | ||
|---|---|---|---|---|---|---|---|
| Device annotation | P260 | P350 | S35/P245 | S45 | S284 | PL | ER |
| Substrate | 1-mm-thick PZT-5A | ||||||
| Device area | 16 × 16 mm2 | ||||||
ACFAL layers (from PZT to water, with main layers highlighted in bold) | 3.5 μm Parylene 3.5 μm SU-8 24 μm Parylene | 3.5 μm Parylene 3.5 μm SU-8 24 μm Parylene | 3.5 μm Parylene 24 μm Parylene | 3.5 μm Parylene 24 μm Parylene | 3.5 μm Parylene 24 μm Parylene | ||
| Air-cavity height (μm) | 50 | 50 | 35 | 35 | 253.5 | 2 | NA |
| Measured anti-resonant frequency (MHz) | 2.316 | 2.316 | 2.304 | 2.312 | 2.314 | 2.287 | 2.321 |
| Measured focal length (mm) | 5.04 | 5.14 | 5.05 | 4.98 | 4.70 | 4.98 | 4.97 |
| Measured focal diameter (μm) | 325.4 | 360.2 | 319.0 | 300.0 | 284.5 | 331.0 | 386.9 |
| Measured depth of focus (μm) | 1284.0 | 1190.4 | 1249.7 | 1362.2 | 1240.5 | 1350.0 | 1443.7 |
Summary of the processes involved in the microfabrication of different types of SFATs.
| Device type | PDMS ACFAL (new) | SU-8/PDMS ACFAL (new) | SU-8 ACFAL (new) | Parylene ACFAL (old) | Patterned electrode rings (old) |
|---|---|---|---|---|---|
Photolithography (details and annotations shown in Table | A + B (once per batch) G + H (one time only) | A + C | A + C + D (thin-SU-8) or A + B + E + F (thick SU-8) | A + sacrificial-layer patterning + release hole patterning (tight alignment tolerance) | A |
| Parylene deposition | 1 (for electrical encapsulation, can be replaced by other sealants) + 1 (optional for adhesion promotion) | 1 (for SU-8/PDMS bonding) + 1 (optional for adhesion promotion) | 1 (for electrical encapsulation, can be replaced by other sealants) + 1 (optional for adhesion promotion) | 2 | 1 |
| RIE & Sacrificial-layer release | 0 | 0 | 0 | 1 (time-consuming) | 0 |
| PDMS casting | 0.25 (4 sheets/16 lenses per batch) | 0.25 (4 sheets/16 lenses per batch) | 0 | 0 | 0 |
| Bonding | 1 | 1 | 1 (laminator needed) | 0 | 0 |
| Fabrication time | ~1 day | ~1 day | ~1 day (thin-SU-8) or ~2 days (thick SU-8 with thickness planarization) | ~4 days (limited by sacrificial-layer release) | ~0.5–1 day |
| Cleanroom equipment involved | Spinner, mask aligner, hot plate (for baking photoresist), plasma asher, fume hood | Spinner, mask aligner, oven (for baking photoresist), plasma asher, fume hood, RIE | Spinner, mask aligner, oven (for baking photoresist), fume hood | ||
| Non-cleanroom equipment involved | Parylene coater, vacuum desiccator, oven (for curing PDMS), stereomicroscope, dicing saw (for parallel fabrication) | Parylene coater, laminator, dicing saw | Parylene coater, dicing saw | Parylene coater, dicing saw | |
| Measured peak output acoustic pressure (MPa) | 0.68 (from P260) | 0.74 | 1.10 (from S284) | 0.61 | 0.28 |
| Measured best power transfer efficiency (%) | 15.37 (from P260) | 15.20 | 30.13 (from S284) | 15.13 (limited by Parylene thickness) | 4.72 (limited by fringing electrical fields and non-thickness vibration modes) |
Details of the photolithography processes described in this work.
| Photolithography process | For electrode patterning on PZT | 3.5-μm-thick SU-8 adhesion layer | 35-μm-thick SU-8 bottom layer | 10-μm-thick SU-8 top layer | 250-μm-thick SU-8 bottom layer | 30-μm-thick SU-8 top layer | 2-μm-thick SU-8 adhesion layer on glass | 50-μm-thick SU8 mold for PDMS casting |
|---|---|---|---|---|---|---|---|---|
| Label for reference | A | B | C | D | E | F | G | H |
| Cleaning or surface treatment | Rinse with acetone, methanol, IPA, and DI water; Blow-dry with N2. | 30 s O2 plasmaa | 30 s O2 plasmaa | Wipe with IPA; Blow-dry with N2. | 30 s O2 plasmaa | Wipe with IPA; Blow-dry with N2. | Piranha solutionb cleaning (20 min); Dehydration bake @ 175 °C (30 min) on a hot plate. | 30 s O2 plasmaa |
| Photoresist | AZ 5214 (Integrated Micro Materials) | SU-8 2005 (Kayaku Advanced Materials) | SU-8 2050 (Kayaku Advanced Materials) | SU-8 2005 (Kayaku Advanced Materials) | SU-8 2100 (Kayaku Advanced Materials) | SU-8 2050 (Kayaku Advanced Materials) | SU-8 2002 (Kayaku Advanced Materials) | SU-8 3050 (Kayaku Advanced Materials) |
Spin-coating (spin speed, acceleration, duration of each step) | 500 rpm, 500 rpm/s, 5 s; 1200 rpm, 600 rpm/s, 55 s. | 500 rpm, 100 rpm/s, 10 s; 3000 rpm, 300 rpm/s, 60 s; 1,000 rpm, 500 rpm/s, 10 s. | 500 rpm, 100 rpm/s, 10 s; 3000 rpm, 300 rpm/s, 60 s; 1,000 rpm, 500 rpm/s, 10 s. | On 75-μm-thick PET film: 500 rpm, 100 rpm/s, 10 s 600 rpm, 300 rpm/s, 30 s | 500 rpm, 100 rpm/s, 10 s; 1450 rpm, 300 rpm/s, 30 s; Followed by thickness planarization. | On 38-μm-thick PET film: 500 rpm, 100 rpm/s, 10 s; 3500 rpm, 300 rpm/s, 60 s; 1,000 rpm, 500 rpm/s, 10 s. | 500 rpm, 100 rpm/s, 10 s; 3000 rpm, 300 rpm/s, 30 s; 1000 rpm, 500 rpm/s, 10 s. | 500 rpm, 100 rpm/s, 10 s; 3000 rpm, 300 rpm/s, 30 s; 1000 rpm, 500 rpm/s, 10 s. |
| Soft-bake (on a hot plate unless otherwise specified) | 90 °C (5 min) in a convection oven | 5 °C/min ramp rate RT → 95 °C (1 min) → RT | 5 °C/min RT → 65 °C (1 min) → 95 °C (4 min) → RT | 5 °C/min 65 °C → 90 °C (15 min) → RT | 2 °C/min RT → 65 °C (5 min) → 95 °C (65 min) → RT | 5 °C/min RT → 65 °C (5 min) → 90 °C (25 min) → RT | 30 °C (30 min) | 2 °C/min RT → 65 °C (70 min) → RT |
| SU-8/SU-8 bonding | NA | NA | 1 min plasma treatment on bottom layer. Bonding in a laminator (Tamerica TCC6000) with speed level 3 @ 80 °C. | 1 min plasma treatment on bottom layer. Bonding in a laminator with speed level 3 @ 80 °C. | NA | NA | ||
| Exposure dose (mJ/cm2) | 140 | 150 (without photomask) | 120 | 170 | 250 | 230 | 900 (without photomask) | 800 |
| Post-exposure bake (PEB) (on a hot plate) | NA | 5 °C/min RT → 95 °C (hold 2 min) → RT | 5 °C/min RT → 65 °C (1 min) → 95 °C (5 min) → RT | 5 °C/min RT → 65 °C (1 min) → 90 °C (2 min) → RT | 2 °C/min RT → 65 °C (5 min) → 95 °C (11 min) → RT | 5 °C/min RT → 65 °C (2 min) → 90 °C (5 min) → RT | 2 °C/min RT → 55 °C (60 min) → RT | 2 °C/min RT → 55 °C (60 min) → RT |
| Development | 70 s in AZ 400 K (1:4 diluted) (Integrated Micro Materials) | NA | 6.5 min in PGMEA (Kayaku Advanced Materials) | 2.5 min in PGMEA | 22 min in PGMEA with stirring | 5 min in PGMEA | NA | 7 min in PGMEA |
| Hard bake (in a convection oven) | 90 °C (15 min) | NA | NA | NA | NA | NA | 10 °C/min RT → 150 °C (30 min) → RT | 10 °C/min RT → 110 °C (30 min) → RT |
RT room temperature, PGMEA propylene glycol monomethyl ether acetate.
aPlasma treatment condition: 35 W, 265 mTorr.
bPiranha solution: H2SO4 and 30% H2O2 with a volume ratio of 3:1.
Fig. 3Microfabrication processes for SFATs with PDMS ACFALs.
a–i Microfabrication processes for the transducer (not to scale). On a glass plate, a create an SU-8 adhesion layer and SU-8 mold; b replicate the PDMS membrane from the SU-8/glass mold, control the PDMS thickness with the aid of a clamping mechanism (Figs. 3j, k) and another blank glass plate; c detach the PDMS membrane from the glass plates. On PZT sheet, d pattern top/bottom electrodes; e deposit Parylene for improved adhesion to SU-8 (optional); f spin-coat thin-SU-8 and soft-bake; g trim the PDMS membrane to the desired size, align and attach it to the SU-8 layer on the PZT substrate; h soft-bake again to liquefy the SU-8 and initiate bonding between SU-8 and PDMS, followed by exposure and post-exposure bake to crosslink the SU-8; i solder electrical wires (not shown), then deposit Parylene for electrical encapsulation. (j–k) j Cross-sectional diagram and k photo of the clamping mechanism designed for precisely controlling the thickness of the PDMS membrane during curing. l Measured thickness profile of a fabricated PDMS membrane with good thickness uniformity across an 80-mm length.
Fig. 4Microfabrication processes for SFATs with SU-8/PDMS ACFALs.
a–g Microfabrication processes for the transducer (not to scale). On a glass plate, a create PDMS membrane from two blank glass plates using the thickness-controlling clamping mechanism, and b detach PDMS membrane from the glass plates. On PZT sheet, c pattern top/bottom electrodes; d deposit Parylene for improved adhesion to SU-8 (optional); e pattern bottom SU-8 layer through photolithography; f trim the PDMS membrane to the desired size, align and attach it to the patterned SU-8 bottom layer on the PZT substrate; g solder electrical wires (not shown), then deposit Parylene for sealing PDMS and SU-8 together.
Fig. 5Microfabrication processes for SFAT-based SU-8 ACFALs.
a–j Microfabrication processes for the transducer (not to scale). On a glass plate, a attach polyester (PET) film, spin-coat SU-8 top layer followed by long soft-bake, and b remove the PET film with SU-8 from the glass plate. On PZT sheet, c pattern top/bottom electrodes; d deposit Parylene for improved adhesion to SU-8 (optional); e create a thin-SU-8 adhesion layer (not necessary for SU-8 thinner than 50 μm); f pattern bottom SU-8 layer through photolithography; g bond top SU-8 (on PET film) to bottom patterned SU-8 layer on PZT with a laminator; h crosslink top SU-8 layer through exposure; i peel off PET film from SU-8, then remove uncrosslinked top SU-8 through development; j solder electrical wires (not shown), then deposit Parylene for electrical encapsulation. k Thickness profile of a 250-μm-thick patterned bottom SU-8 layer for two adjacent ACFALs after planarization, showing good thickness uniformity across most lens areas.
Fig. 6Thickness optimization simulation and measurement results.
Thickness optimization simulation and measurement results. a Simulated acoustic transmittance versus main layer thickness for SFATs with ACFALs based on PDMS, 35-μm-thick SU-8/PDMS, SU-8, and Parylene (also for the electrode-ring SFATs); also showing the chosen layer thicknesses for the devices demonstrated in this paper along with their notations (with details shown in Table 1). b Measured impedance magnitude (upper graph) and phase (lower graph) of the fabricated transducers. c–d Measured acoustic pressure in water (c) along the central vertical axis and d along the central lateral axis on the focal plane of the fabricated devices when they are driven with six cycles of 40 Vpp sinusoidal voltage signals at their anti-resonant frequency. e Summary of the simulated acoustic transmittance (left y-axis), measured power transfer efficiency (left y-axis), and measured peak acoustic pressure at the focal point (right y-axis) of each type of transducer. The error bars represent the standard deviation of the measured values.