| Literature DB >> 35744297 |
Alexander Grenadyorov1, Andrey Solovyev1, Konstantin Oskomov1, Ekaterina Porokhova2, Konstantin Brazovskii3, Anna Gorokhova2, Temur Nasibov2, Larisa Litvinova4, Igor Khlusov2.
Abstract
This paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiOx films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiOx films in a solution of 0.9% NaCl was used. It is shown how the a-C:H:SiOx film thickness (0.5-3 µm) affects the surface morphology, adhesive strength, and Na+ and Cl- precipitation on the film surface from the NaCl solution. With increasing film thickness, the roughness indices are reducing a little. The adhesive strength of the a-C:H:SiOx films to metal substrate corresponds to quality HF1 (0.5 µm in thickness) and HF2-HF3 (1.5-3 µm in thickness) of the Rockwell hardness test (VDI 3198) that defines strong interfacial adhesion and is usually applied in practice. The morphometric analysis of the film surface shows that on a-C:H:SiOx-coated Ti-6Al-4V alloy surface, the area occupied by the grains of sodium chloride is lower than on the uncoated surface. The reduction in the ion precipitation from 0.9% NaCl onto the film surface depended on the elemental composition of the surface layer conditioned by the thickness growth of the a-C:H:SiOx film. Based on the results of energy dispersive X-ray spectroscopy, the multiple regression equations are suggested to explain the effect of the elemental composition of the a-C:H:SiOx film on the decreased Na+ and Cl- precipitation. As a result, the a-C:H:SiOx films successfully combine good adhesion strength and rare ion precipitation and thus are rather promising for medical applications on cardiovascular stents and/or friction parts of heart pumps.Entities:
Keywords: 0.9% NaCl solution; a-C:H:SiOx film; adhesion; diamond-like nanocomposite; five-week biodegradation
Year: 2022 PMID: 35744297 PMCID: PMC9231245 DOI: 10.3390/ma15124239
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.748
Elemental composition of Ti-6Al-4V alloy before immersion in 0.9% NaCl solution, X ± SD.
| Titanium, wt.% | Aluminum, wt.% | Vanadium, wt.% | Impurities (Fe, Zr, O, C, Si, N), wt.% |
|---|---|---|---|
| 88.4 ± 1.2 | 6.2 ± 0.6 | 4.1 ± 0.4 | ˂1.3 |
Figure 1General configuration of the PACVD vacuum system to prepare a-C:H:SiOx films on Ti-6Al-4V substrate.
Figure 2VDI 3198 indentation tests (a) and classification of the results as acceptable failure (b) and unacceptable failure of the film integrity (c).
Figure 3SEM images of a-C:H:SiOx-coated Ti-6Al-4V alloy surface before in vitro biodegradation in 0.9% NaCl solution: (a) uncoated, (b) 0.5 µm thick film, (c) 1.5 µm thick film, (d) 3 µm thick film.
Figure 4Two- and three-dimensional SPM images of Ti-6Al-4V alloy surface with a-C:H:SiOx film of different thickness before in vitro biodegradation in 0.9% NaCl solution: (a,b) 0.5 µm, (c,d) 1.5 µm, (e,f) 3 µm.
Roughness values for Ti-6Al-4V alloy surface with a-C:H:SiOx film of different thickness before in vitro biodegradation in 0.9% NaCl solution, X ± SD.
| Thickness, µm | ||||
|---|---|---|---|---|
| Uncoted Ti-6Al-4V | 352 ± 22 | 164 ± 14 | 45 ± 5 | 56 ± 7 |
| 0.5 ± 0.1 | 330 ± 20 | 152 ± 12 | 39 ± 5 | 51 ± 7 |
| 1.5 ± 0.2 | 289 ± 16 | 162 ± 11 | 29 ± 4 | 37 ± 5 |
| 3 ± 0.3 | 273 ± 14 | 129 ± 9 | 28 ± 4 | 36 ± 5 |
Notation: Rmax—maximum peak height, Rmean—average peak height, Ra—average of a set of individual measurements, Rq—root-mean-square roughness. Each substrate was tested at least at 3 random points.
Figure 5Optical micrographs of Ti-6Al-4V surface with deposited a-C:H:SiOx films of different thickness after the Rockwell indentation process: (a,b) 0.5 µm, (c,d) 1.5 µm, (e,f) 3 µm.
Ti-6Al-4V substrate weight before and after five-week in vitro biodegradation in 0.9% NaCl solution, Me (Q1; Q3), n1 = 15.
| Substrates | Initial Weight, mg | Dry Weight, Initial Weight Percentage |
|---|---|---|
| Uncoated | 337.58 | 100.00 |
| a-C:H:SiOx-coated 0.5-µm thick film | 341.62 | 100.02 |
| a-C:H:SiOx-coated 1.5-µm thick film | 343.78 | 100.03 |
| a-C:H:SiOx-coated 3-µm thick film | 341.46 | 100.03 |
Figure 6SEM images of a-C:H:SiOx-coated substrate surface after five-week in vitro biodegradation in 0.9% NaCl solution: (a) uncoated; (b) 0.5 µm thick film; (c) 1.5 µm thick film; (d) 3 µm thick film. Magnification: 5000×.
a-C:H:SiOx films vs. NaCl precipitation after five-week in vitro immersion, Me (Q1–Q3).
| Group Number | Substrates, | Surface Area of NaCl Precipitates, Area Percentage on SEM Image, |
|---|---|---|
| 1 | Uncoated Ti-6Al-4V | 23.23 (13.60–54.88) |
| 2 | a-C:H:SiOx-coated 0.5 µm thick | 1.08 (0.80–1.29), |
| 3 | a-C:H:SiOx-coated 1.5 µm thick | 4.18 (0.005–6.32), |
| 4 | a-C:H:SiOx-coated 3 µm thick | 2.06 (0.59–2.81), |
Note: n—the number of substrates in each group; n1—the number of SEM images with measured area in each group.
Elemental (at.%) composition of Ti-6Al-4V substrate surface after five-week in vitro biodegradation in 0.9% NaCl solution, Me (Q1; Q3), n=10.
| Group Number | Substrates | C | O | Si | Ti | Na | Cl |
|---|---|---|---|---|---|---|---|
| 1 | Uncoated | 3.30 | 7.08 | 0.39 | 76.43 | 9.63 | 4.15 |
| 2 | a-C:H:SiOx-coated 0.5-µm thick film | 45.62 | 5.43 | 3.27 | 45.63 | 0.28 | 0.07 |
| 3 | a-C:H:SiOx-coated 1.5-µm thick film | 63.29 | 4.88 | 10.84 | 20.72 | 0.06 | 0.16 |
| 4 | a-C:H:SiOx-coated 3-µm thick film | 80.91 | 2.98 | 14.69 | 1.42 | 0.06 | 0.10 |
Note: n is the number of measurements in each substrate group. Significant differences were determined with the Mann–Whitney U test: PU1-PU3 < 0.05 vs. the corresponding group number.
Figure 7Dual regression dependences of C and Si content in a-C:H:SiOx-coated Ti-6Al-4V substrate on the film thickness after five-week immersion in 0.9% NaCl solution. The EDX data are shown on the Y axis.
Regression coefficients for chemical elements in a-C:H:SiOx film surface after five-week immersion in 0.9% NaCl solution, X ± SD.
| Surficial Chemical Elements | Na+ Precipitation | Cl− Precipitation | ||
|---|---|---|---|---|
| Coefficients | Coefficients | |||
| C | −0.632 ± 0.018 | <0.001 | −0.306 ± 0.012 | <0.001 |
| O | −0.791 ± 0.057 | <0.001 | −0.318 ± 0.037 | <0.001 |
| Si | −0.537 ± 0.058 | <0.001 | −0.301 ± 0.038 | <0.001 |
| Ti | −0.594 ± 0.030 | <0.001 | −0.306 ± 0.020 | <0.001 |