| Literature DB >> 35733664 |
Yun Sun1,2, Pengpeng Li1,2, Esko I Kauppinen3, Dong-Ming Sun1,2, Yutaka Ohno4.
Abstract
Approximately 30% of as-grown carbon nanotube (CNT) networks are metallic, usually leading to a trade-off between carrier mobility and on/off ratio in CNT thin-film transistors (TFTs). Figuring out the key factors of ultra-high on/off ratio in CNT TFTs should be considerably essential for the development of large-scale electronic devices in the future. Here ultra-high on/off ratios of 107-108 are realized for CNT TFTs with mobility of ∼500 cm2 V-1 s-1. We propose that one of the key factors to achieve the high on/off ratio is a clean CNT thin film without charge traps and doping due to residual dispersant used in conventional solution processes. Moreover, on/off ratio degradation under operation voltage is significantly suppressed by decreasing the diameter of CNTs. This journal is © The Royal Society of Chemistry.Entities:
Year: 2022 PMID: 35733664 PMCID: PMC9157530 DOI: 10.1039/d2ra02088b
Source DB: PubMed Journal: RSC Adv ISSN: 2046-2069 Impact factor: 4.036
Fig. 1Typical transfer characteristics (ID–VGS) of CNT TFTs. The channel length (Lch) and channel width (Wch) are both 100 μm, the thickness of dielectric layer (SiO2) is 100 nm. The on/off ratio decreases from 5 × 108 to 2 × 107 with |VDS| increasing from 0.5 to 5 V.
On/off ratio degradation of the various CNT TFTs. The CNT TFTs fabricated by a dry process (this work) exhibit much higher on/off ratios than those fabricated by a solution process (Ha et al.,[4] Engel et al.[15]). For the on/off ratio degradation under a large VDS, the degradation magnitude of the smaller-diameter (1.1 nm) CNT TFTs was obviously improved compared to that of the larger-diameter (1.4 nm, 1.5 nm, 1.3–1.7 nm, 1.6 nm) CNT TFTs
| Reference | Low | High | Diameter of CNTs (nm) | CNT synthesis | TFT fabrication | ||
|---|---|---|---|---|---|---|---|
|
| On/off |
| On/off | ||||
| This work (1.1 nm) | −0.5 (5 × 103) | 106–108 | −5 (5 × 104) | 105–107 | 1.1 | Floating-catalyst CVD | Dry process |
| This work (1.6 nm) | −0.5 (5 × 103) | 106–108 | −5 (5 × 104) | 103–106 | 1.6 | Floating-catalyst CVD | Dry process |
| Cao | −0.5 (5 × 103) | ∼104 | −5 (5 × 104) | 80 | ∼1.5 | Supported-catalyst CVD | Dry transfer, CNT strips |
| Ha | −0.1 (2 × 103) | ∼105 | −1 (2 × 104) | 400 | ∼1.4 | Arc discharge | Solution, DGU |
| Engel | −0.1 (5 × 104) | 104 | −3 (1.5 × 106) | 300 | 1.3–1.7 | Arc discharge | Solution, DGU |
Fig. 2Charge trapping effect of the SDS solution on the CNT TFT. (a) On/off ratio degraded from 3 × 106 to 4 × 102 after 1% SDS solution treatment. (b) Schematics of the charge trapping effect of the SDS solution.
Fig. 3Chemical doping effect of the F4TCNQ on the CNT TFT. (a) Threshold voltage shifted after the doping of the toluene solution of F4TCNQ with various concentrations. (b) Schematics of chemical doping effect of F4TCNQ.
Fig. 4Distribution of on/off ratio degradation for the CNT TFTs. (a) and (b) Typical ID–VGS characteristics of the TFTs, at VDS of −0.5 and −5 V, for the CNTs with diameter of 1.1 and 1.6 nm, respectively. The insets show schematic band diagrams of electron tunneling for 1.1 and 1.6 nm CNTs, respectively. (c) and (d) On/off ratio distributions for 1.1 and 1.6 nm CNTs, respectively.