| Literature DB >> 35516576 |
Paola M Morales-Carvajal1, Avra Kundu1, Charles M Didier1,2, Cacie Hart1,3, Frank Sommerhage1, Swaminathan Rajaraman1,2,3,4.
Abstract
Microfabrication and assembly of a Three-Dimensional Microneedle Electrode Array (3D MEA) based on a glass-stainless steel platform is demonstrated involving the utilization of non-traditional "Makerspace Microfabrication" techniques featuring cost-effective, rapid fabrication and an assorted biocompatible material palette. The stainless steel microneedle electrode array was realized by planar laser micromachining and out-of-plane transitioning to have a 3D configuration with perpendicular transition angles. The 3D MEA chip is bonded onto a glass die with metal traces routed to the periphery of the chip for electrical interfacing. Confined precision drop casting (CPDC) of PDMS is used to define an insulation layer and realize the 3D microelectrodes. The use of glass as a substrate offers optical clarity allowing for simultaneous optical and electrical probing of electrogenic cells. Additionally, an interconnect using 3D printing and conductive ink casting has been developed which allows metal traces on the glass chip to be transitioned to the bottomside of the device for interfacing with commercial data acquisition/analysis equipment. The 3D MEAs demonstrate an average impedance/phase of ∼13.3 kΩ/-12.1° at 1 kHz respectively, and an average 4.2 μV noise. Lastly, electrophysiological activity from an immortal cardiomyocyte cell line was recorded using the 3D MEA demonstrating end to end device development. This journal is © The Royal Society of Chemistry.Entities:
Year: 2020 PMID: 35516576 PMCID: PMC9057996 DOI: 10.1039/d0ra06070d
Source DB: PubMed Journal: RSC Adv ISSN: 2046-2069 Impact factor: 4.036
Fig. 1Schematic process flow for laser micromachining of 3D microneedle electrodes: (a) laser micromachining a obelisk-type geometry using 1064 nm (IR) wavelength using Quick Laze 50ST2, Eolite Lasers onto a stainless steel substrate having a thickness of 25 μm; (b) transitioning the laser micromachined area out-of-plane using a hypodermic needle and releasing the 3D microneedles from the bulk stainless steel substrate by laser micromachining at the same wavelength, 1064 nm (IR); (c) the keyhole of the released 3D microneedles. The microneedle electrodes have a width of 300 μm, height of 400 μm and a pitch of 600 μm. The keyhole cutout in the stainless steel sheet is further obtained shown as inset.
Fig. 2Schematic process flow of glass chip fabrication and stainless steel assembly: (a) glass chip (500 μm thickness) cleaned in ∼2 M solution of KOH (potassium hydroxide) in IPA (isopropyl alcohol; 2-propanol); (b) metallization of a stack of titanium–gold (30 nm–90 nm) using electron beam evaporation through a Kapton shadow mask. The Kapton shadow mask was laser micromachined using 355 nm (UV) using the same Eolite Laser; (c) the titanium–gold traces are 150 μm wide and the contact pads at the periphery of the chip are designed to be 1 mm × 1 mm; (d) the 3D microneedle electrodes are aligned with the metal traces and bonded using silver paste. The silver paste is cast through the SS cutout; (e) the glass chip bonded to the 3D stainless steel keyhole having 10 microneedles using silver paste; (f) a PET-G culture ring is attached using PDMS and the 3D microneedles are isolated from each other using laser micromachining (1064 nm) to yield ten (10) of 3D recording/stimulating electrodes; (g) controlled precision drop-casting and self-planarization of PDMS to achieve the insulation layer; (h) the volume of PDMS controls the height of the PDMS insulation in the area confined by the PET-G ring and determines the geometric area of the 3D Microneedle Electrode Array (MEA); (i) HL-1 cells interacting with a singular 3D microneedle electrode.
Fig. 3Schematic process flow of interconnect fabrication: (a) affixing a 3D printed frame printed using Asiga MAX 27UV DLP 3D printer. Two frames slide onto each side of the glass. The frames have a designed groove of 700 μm into which the glass chip slides into. The diameter of the vias is 1 mm and the channel which transitions the vias to the bottom side of the frame is 1 mm wide; (b) silver ink casting of the 3D printed vias effectively transitions the gold pads on the top side of the glass chip to silver pads on the bottom side of the 3D printed frame.
Fig. 4SEM images of the obelisk-type 3D microneedles after each of the microneedles have been transitioned out-of-plane. The keyhole pattern has not been released from the stainless steel substrate as observed in (a). The close-up SEM images of the 3D microneedles is shown in (b); (c) box plot of the angle of tilt for the 3D microneedles transitioned out-of-plane after laser micromachining (N = 10); (d) SEM image of the laser scribed keyhole array to define 10 individual 3D microneedle electrodes. (e) A close-up SEM image shows the laser scribe lines and the 3D microneedle resting on a layer of silver paste; (f) SEM image of the PDMS insulated 3D MEA. PDMS insulates the traces and the planar portions of the device to yield the recording/stimulating sites at a height of ∼400 μm. Close-up of a singular 3D microneedle electrode is shown as an inset. (g) Box plot of the angle of tilt for the 3D microelectrodes transitioned out-of-plane after laser micromachining and CPDC (N = 10). (h) Box plot of the tip spacing between the 3D microelectrodes transitioned out-of-plane after laser micromachining (N = 7). (i) Box plot of the tip spacing between the 3D microelectrodes transitioned out-of-plane after laser micromachining and CPDC (N = 7).
Fig. 5Optical photomicrographs of the fully assembled device: (a) glass chip with Ti–Au metal traces and pads; (b) photomicrograph of the device after the 3D microneedles are bonded to the glass substrate using silver paste and subsequently laser micromachined to be isolated from each other as depicted in (c); (d) fully assembled device with the 3D printed frame slid onto the glass chip; (e) close up image of the 3D printed via showing the metallized gold pad aligned with the vias on the 3D printed frame; (f) ready-to-interface device with the vias filled with silver paste so that the gold traces on the top side of the glass chip transitions to the bottom side of the packaged device.
Technological summary of the microfabrication development between makerspace microfabrication and other recent approaches[31,32]
| Glass/silicon-based microfabrication | This work: makerspace microfabrication | |
|---|---|---|
| Environment | Cleanroom | Makerspace/Benchtop |
| Process steps | 12 for 3D probe fabrication, 4 for actuation shank design and fabrication[ | 8 for 3D MEA fabrication, 2 for packaging |
| 10 for 3D gold mushroom shaped electrodes[ | ||
| Resolution | <1 μm | ∼1 μm (subtractive)/27 μm (additive) |
| Total time | Up to 16 weeks | ∼2 weeks |
| Cost | $$$$ | $ |
| Fabrication equipment | Mask aligner, fumehood, spinner, hot plate, wire-bonder, die attach, E-beam evaporator, mask maker/high res. printer, dicing saw, | 3D printer, oven, UV-lamp, micromill, laser, spinner, benchtop sputterer or E-beam evaporator |
| Packaging equipment | PCBs requiring design and external packaging fabrication | 3D printed jigs and fixtures |
| Materials | Glass wafer, photoresist, photo mask, isopropanol, metal pellets/metal target, insulation, electroplating materials solvents, PCB, gold wire, | Glass wafer, SS sheets, 3D printing resin, isopropanol, stencil mask, conductive ink, insulation |
| Electrodes | 80 per array[ | Up to 64 (not depicted in this work but scalable to 64) |
| Customization | Limited by cleanroom and mask used for photolithography | Rapid customization possible with on-the-fly design changes |
Fig. 6(a) Impedance (real) spectra of the assembled device, packaged device with 3D printed frame and fitted plot as per Randles equivalent circuit; (b) phase spectra of the assembled device, packaged device with 3D printed frame and fitted plot as per (c) Randles' equivalent circuit used for circuit fitting and extraction; (d) box plot of the DC resistance of the vias after silver ink casting process.
Extracted parameters from the fitted model as per Randles' equivalent circuit
| 3D MEA |
|
|
|
|
|---|---|---|---|---|
| Assembled MEA chip | 181 | 5.0 | 0.125 | 3.25 |
| Packaged MEA chip | 181 | 7.5 | 0.125 | 4.875 |
Fig. 7(a) and (b) The packaged device connected to the commercial Axion BioSystems MUSE electronics interface; (c) representative noise plot of one of the microelectrodes of the 3D MEA; (d) optical photomicrograph of HL-1 cells after 2 DIV; (e) screen capture of cardiac beats from AxIS software from a single 3D microneedle electrode; (f) post processed, exaggerated plot of a repeatable single beats from HL-1 cells cultured on the 3D MEA.