| Literature DB >> 35334651 |
Min Liu1, Xinyang Wu1, Yanxu Niu1, Haotian Yang1, Yingmin Zhu1, Weidong Wang1.
Abstract
As a typical type of MEMS acceleration sensor, the inertial switch can alter its on-off state while the environmental accelerations satisfy threshold value. An exhaustive summary of the design concept, performance aspects, and fabrication methods of the micro electromechanical system (MEMS) inertial switch is provided. Different MEMS inertial switch studies were reviewed that emphasized acceleration directional and threshold sensitivity, contact characteristics, and their superiorities and disadvantages. Furthermore, the specific fabrication methods offer an applicability reference for the preparation process for the designed inertial switch, including non-silicon surface micromachining technology, standard silicon micromachining technology, and the special fabrication method for the liquid inertial switch. At the end, the main conclusions of the current challenges and prospects about MEMS inertial switches are drawn to assist with the development of research in the field of future engineering applications.Entities:
Keywords: MEMS; contact effect; fabrication; inertial switch; sensitive direction; threshold acceleration
Year: 2022 PMID: 35334651 PMCID: PMC8951254 DOI: 10.3390/mi13030359
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 2.891
Figure 1Schematic diagram of the spring (k)–mass (movable electrode m)-damping (c) system model of a uniaxial inertial switch. y0 means the initial distance between the movable electrode and the fixed electrode.
Figure 2Some uniaxial inertial switches: (a) [40], (b) [12], (c) [41], (d) [42].
Figure 3Schematic of the two-axis low-g inertial switch.
Figure 4Structural sketch of the omnidirectional inertial switch.
A summary of some examples of typical sensitive direction inertial switch performance.
| Sensitive Direction | References | Material | Acceleration Threshold | Contact Time | Special Design and Function | Application |
|---|---|---|---|---|---|---|
| Uniaxial | Wang et al. [ | Ni | 180 g | 1050 μs | Compliant cantilever fixed electrode to contact enhancement | — |
| Wang et al. [ | Ni | 38 g | 230 μs | Elastic fixed electrode | Safety airbags | |
| Kim et al. [ | Si | 2.0–17.25 g | — | — | Environments and applications require accurate threshold | |
| Yang et al. [ | Ni | 100 g | 12 μs | Bridge-type elastic beams to enhance contact time | — | |
| Cai et al. [ | Ni | 70 g | 30 μs | Stationary electrode changed from two bridge-type beams to one cross beam to reduce the off-axis sensitivity. | — | |
| Zhang et al. [ | Ni | 165 g | 35 μs | Double-stair shape cantilever beam | Internet of Things (IoT) system to remote detection of vibration shock | |
| Yang et al. [ | Ni | 272 g | 20 μs | Double-layer suspended springs for improving single-axis sensitivity | IoT system | |
| Fathalilou et al. [ | — | 154 g | — | A dual-mass switch with auxiliary mass spring | Automobile, medicine, and aerospace | |
| Ren et al. [ | Ni | 40 g | 80 μs | Self-powered | Vibration energy harvester (VEH) and potential wake-up application | |
| Raghunathan et al. [ | SOI | 60–131 g | — | Surviving acceleration loads 200 times greater than its designed trigger load | Ballistic rockets | |
| Chen et al. [ | Ni | 297 g | 80 μs | Compliant cantilever beam | Automotive safety crash airbags | |
| Biaxial | Lin et al. [ | Si | 60 g | — | Buffering springs to extend the contact time | — |
| Niyazi et al. [ | Si | 69 g and 121 g | — | Separate digital outputs for each threshold | Active suspension systems | |
| Xu et al. [ | Si | 800–2600 g | — | High-resolution digital quantitative acceleration measurements | IoT system | |
| Triaxial | Chen et al. [ | Ni | 255–260 g (+ | ~60 μs (+ | Flexible fixed electrode can prolong the contact time and eliminate the rebound | IoT system |
| Currano et al. [ | Si | 50–250 g | 255 μs | Compliance in all axes identical | Early warning for traumatic brain injury (TBI) | |
| Omnidirectional | Xi et al [ | Ni | 450 g | 60 μs | A dual mass–spring system | — |
| Liu et al. [ | Si | 20 g | — | The response time of 0.46 ms is short enough | — | |
| Du et al. [ | Ni | 35–40 g | ~100 μs | Electrode with a spherical contact surface | Automotive airbags | |
| Du et al. [ | Ni | 7.9–11.3 g | >300 μs | Method of “thickness compensation” to control threshold accuracy | Wearable systems and airbags | |
| Chen et al. [ | Ni | 58 g | 18 μs | Rectangular spring to reinforce switching system’s stability | Transport of special goods and drop detection | |
| Multidirectional | Yang et al. [ | Ni | 70 g | 110 μs | Polymer–metal composite fixed electrode | — |
Figure 5Schematic diagrams of three low-g inertial switches. (a) The nickel low-g MEMS inertial switch [57]. (b) The silicon-based low-g MEMS inertial switch [58]. (c) The lower stiffness of the redesigned inertial switch [59].
Figure 6Schematic diagrams of the MEMS inertial high-g switch.
Figure 7Simplified schematic view of a 3-bit digitally operated MEMS switch.
A summary of some examples of typical threshold acceleration inertial switch performance.
| Threshold Acceleration | References | Material | Acceleration Threshold | Special Design and Function | Application |
|---|---|---|---|---|---|
| Low-g | Chen et al. [ | Ni | 18 g | L-shaped elastic cantilever beam fixed electrode | Health monitoring and special industrial transportation |
| Xiong et al. [ | Double buried SOI | 7.4 g | Low-stiffness spiral spring | Linear acceleration sensing | |
| Zhang et al. [ | Double buried SOI | 5 g | Circular spiral springs | — | |
| Hwang et al. [ | Si | 6.61 g | Displacement-restricting structures for all directions to prevent breakage of the spring | Military applications | |
| Massad et al. [ | Gold | 6–10 g | Four folded beams as springs | RF MEMS | |
| High-g | Nie et al. [ | Ni | 3000 g | Zigzag groove to distinguish the fuse launch acceleration and the accidental fall shock | Medium- and large-caliber projectile fuses |
| Singh et al. [ | SOI | 3500 g | Independent angled latching mechanism | Critical applications without electricity | |
| Xu et al. [ | Ni | 500 g | Synchronous follow-up compliant electrodes for extending the contact | — | |
| Xi et al. [ | Ni | 1200 g | Detecting the acceleration threshold and direction | Directional warheads impacting targets at high speed | |
| Threshold tuning | Kim et al. [ | Si and glass | 2–17.25 g | Comb drive actuators to tune the acceleration threshold | Secure/armed position convertibility for military applications |
| Kumar et al. [ | Si | 0~1 g | Bias voltage and working voltage are used to adjust acceleration | Integrated systems | |
| Ma et al. [ | Si | 40–75 g | MEMS digital-to-analog converter (M-DAC) to adjust acceleration thresholds | Crash recorders and arming and firing systems |
Comparison of the contact time of inertial microswitches from different designs.
| Inertial Microswitches of Different Designs | Simulated Contact Time (μs) | Measured Contact Time (μs) | Sketch of the Microswitches |
|---|---|---|---|
| Conventional microswitch | ~1 | -- |
|
| Microswitch with a bridge-type compliant fixed electrode | ~5(t1), ~10(Δt), | ~13(t1), ~60 (Δt), |
|
| Improved microswitch with cantilevers | ~160 no | ~240 no |
|
Figure 8Modal analysis of various microswitches and their first two frequencies. Type I adopted a vertically driven structure with low off-axis sensitivity. Type II and III used a fixed contact point on the proof mass. Type IV realized a longer duration contact with a movable contact point.
A summary of some examples of typical contact-enhanced inertial switch performance.
| Methods of Contact Enhancement | References | Material | Acceleration Threshold | Contact Time | Application | |
|---|---|---|---|---|---|---|
| Special structure | Double mass–spring system | Cai et al. [ | Ni | 145 g | >50 μs | Automotive airbag system |
| L-shaped flexible cantilever fixed electrode | Wang et al. [ | Ni | 180 g | 1050 μs | Circuit analyzing in many applications | |
| L-shaped compliant cantilever beam | Chen et al. [ | Ni | 259 g | 75 μs | Small-scale or longlifetime systems | |
| Bridge-type elastic fixed electrodes | Yang et al. [ | Ni | 100 g | 12 μs | Accessories and automobile applications | |
| Cantilever beams on the mass block as the buffer | Yang et al. [ | Ni | 55 g | 240 μs | — | |
| Two L-shaped elastic cantilever beam electrodes | Xu et al. [ | Ni | 288 g | 150 μs | Small-scale or long-lifetime systems with limited supply power | |
| Materials | Carbon nanotubes (CNTs) | Lee et al. [ | SOI | — | 108 μs | Airbag restraint systems and geriatric healthcare systems |
| Polymer metal composite | Yang et al. [ | Ni | 70 g | 110 μs | Detecting | |
| Carbon nanotubes/copper(CNTs/Cu) | Wang et al. [ | Ni | 80 g | 112 μs | — | |
| Electrostatic force assistance | Li et al. [ | Ni | 22 g | 540 μs | Hard conditions or remote monitoring | |
Figure 9Schematic and structural parameters of the designed MEMS bistable inertial switch.
Figure 10Schematics of the proposed microfluidic system design: (a) the S-A device and (b) top view of the device.
Characteristics of some droplets in microfluidic switches.
| Working Droplet | Density | Melting Point | Toxicity | Surface Tension (mN/m) | Others Characteristic |
|---|---|---|---|---|---|
| Water | 1.0 | 0 | Non-toxic | 73 | -- |
| Mercury | 5.43 | −38.83 | Toxic | 485.5 | Opaque |
| Glycerol | 1.26 | −17.8 | Non-toxic | 63.4 | High dielectric constant |
| gallium-indium (EGaIn) | 6.25 | 15.7 | Non-toxic | 445 | Low viscosity |
| Galinstan [ | 6.44 | −19 | Non-toxic | 534.6 | Low vapor pressure |
A summary of some examples of typical persistent inertial switch performance.
| Type | References | Material | Acceleration Threshold | Performance | Application |
|---|---|---|---|---|---|
| Latching switches | Lee et al. [ | Si and glass | 43.7 g | Mechanical hooked latch | Airbags, parachutes, and military devices |
| Reddy et al. [ | SOI | 20–250 g | Robust latching mechanism with mass-spring assembly | Long-term remote monitoring applications | |
| Ramanathan et al. [ | SOI | 60 g | Semi-circular latch key | Projectiles or the separation of rocket stages | |
| Guo et al. [ | Si and glass | 4600 g | Easy-latching/difficult-releasing (ELDR) latching mechanism | — | |
| Zhang et al. [ | Si and Ni | 57 g | Stable “on” state due to a predefined bias voltage | Monitoring the transportation of special goods | |
| Bistable inertial switches | Zhao et al. [ | Ni | 32.38 g | V-shaped slender bistable beams | Remote detection of threshold acceleration and corresponding response time |
| Liu et al. [ | SOI | 8 g (self-locking) | Three-segment fully compliant bistable beams | Military applications | |
| Liquid inertial switches | Yoo et al. [ | Si and glass | — | Liquid–metal (LM) droplet combined with selective surface modification inside the channel | — |
| Kuo et al. [ | Si, glass, and PDMS | ∼60 g | Multiwall carbon nanotube (MWCNT)–hydrogel composite integrated with an inductor/capacitor (L–C) resonator | Sensing acceleration inducing by impact | |
| Nie et al. [ | Si | 75.1 g, 46.6 g, 36.5 g | Precise time-delay response characteristic | Fuze safety and arming systems | |
| Liu et al. [ | Glass and PDMS | 51.2 g | Automatic-recovery inertial switch and Galinstan marbles | — |
Figure 11Schematic view showing the fabrication process of a standard silicon micromachine.
Figure 12Sketch of the main fabrication process of surface micromachining.
The performance and coating thickness of common photoresists.
| Type | Name | Performance | Coating |
|---|---|---|---|
| Positive | AZ P4620 | Ultra-thick film, high-contrast, and high-speed positive-tone standard photoresist for semiconductor and/or GMR head manufacturing processes. | 10–15 μm |
| AZ 50XT | Stable, excellent coating characteristics and sidewall profiles for developing plating and wafer-bumping applications. | 40–80 μm | |
| AZ 9260 | Small absorption coefficient and a typical photoresist for thick resist etching processes. | 6.2–15 μm | |
| Negative | SU-8 series | High aspect ratio imaging, improved adhesion, reduced coating stress, vertical sidewalls, and faster drying for increased throughput. | 0.5–300 μm |
| Variable | AZ 5214E | Wide viscosity variation suitable for high resolution process (lift-off process) and available for positive/negative patterning. | 0.5–6 μm |
Figure 13The special fabrication method for a liquid inertial switch.
Figure 14Manufacturing and packaging process for a fluid switch.