Sayan Bhowmik1, Ananth Govind Rajan1. 1. Department of Chemical Engineering, Indian Institute of Science, Bengaluru, Karnataka 560012, India.
Abstract
Chemical vapor deposition (CVD) is extensively used to produce large-area two-dimensional (2D) materials. Current research is aimed at understanding mechanisms underlying the nucleation and growth of various 2D materials, such as graphene, hexagonal boron nitride (hBN), and transition metal dichalcogenides (e.g., MoS2/WSe2). Herein, we survey the vast literature regarding modeling and simulation of the CVD growth of 2D materials and their heterostructures. We also focus on newer materials, such as silicene, phosphorene, and borophene. We discuss how density functional theory, kinetic Monte Carlo, and reactive molecular dynamics simulations can shed light on the thermodynamics and kinetics of vapor-phase synthesis. We explain how machine learning can be used to develop insights into growth mechanisms and outcomes, as well as outline the open knowledge gaps in the literature. Our work provides consolidated theoretical insights into the CVD growth of 2D materials and presents opportunities for further understanding and improving such processes.
Chemical vapor deposition (CVD) is extensively used to produce large-area two-dimensional (2D) materials. Current research is aimed at understanding mechanisms underlying the nucleation and growth of various 2D materials, such as graphene, hexagonal boron nitride (hBN), and transition metal dichalcogenides (e.g., MoS2/WSe2). Herein, we survey the vast literature regarding modeling and simulation of the CVD growth of 2D materials and their heterostructures. We also focus on newer materials, such as silicene, phosphorene, and borophene. We discuss how density functional theory, kinetic Monte Carlo, and reactive molecular dynamics simulations can shed light on the thermodynamics and kinetics of vapor-phase synthesis. We explain how machine learning can be used to develop insights into growth mechanisms and outcomes, as well as outline the open knowledge gaps in the literature. Our work provides consolidated theoretical insights into the CVD growth of 2D materials and presents opportunities for further understanding and improving such processes.
Chemical vapor deposition (CVD) is a scalable route to produce large-area two-dimensional (2D) materials (Cai et al., 2018), required in applications such as optoelectronic devices (Cheng et al., 2019), sensors (Tyagi et al., 2020), and membrane separation modules (Hyun et al., 2019). CVD has been used to grow 2D materials such as graphene (Ani et al., 2018; Muñoz and Gómez-Aleixandre, 2013; Zhang et al., 2013), transition metal dichalcogenides (TMDs) (Jiang et al., 2019; Kumar et al., 2015; Okada et al., 2019; Zhang et al., 2019b), and hexagonal boron nitride (hBN) (Siegel et al., 2018; Stehle et al., 2015; Wang et al., 2019a). Among TMDs, the prominent examples of materials obtained via CVD are molybdenum disulfide (MoS2) and tungsten diselenide (WSe2). Nevertheless, CVD methods are challenging to reproduce, with variability existing between batches grown in different reactors using the same growth conditions (Narayanan et al., 2019). Further, it is quite difficult to optimize the reaction conditions, such as the temperature, pressure, carrier gas flow rate, and vapor-phase composition required for the synthesis of large-area materials with the desired density of defects. In this regard, modeling and simulation can help in predicting suitable conditions for growth as well as by offering mechanistic insight into the nucleation and growth process. In this review, we discuss the use of tools such as ab initio density functional theory (DFT) (Hohenberg and Kohn, 1964; Kohn and Sham, 1965), kinetic Monte Carlo (KMC) simulations (Gillespie, 1976; Voter, 2007), and reactive molecular dynamics (MD) simulations (van Duin et al., 2001; Senftle et al., 2016) to obtain theoretical insights into the CVD growth of 2D materials.Quantum-mechanical DFT calculations can be used to predict the thermodynamic and kinetic barriers for the reaction and diffusion processes underlying materials synthesis. However, while DFT calculations allow for the ab initio (first-principles) prediction of potential energy landscapes, they do not involve the simulation of the explicit temporal evolution of the system. In this regard, KMC simulations, based on probabilistic principles, offer the possibility of studying the kinetics of growth over large time scales such as minutes or hours. However, KMC simulations, whether done on a lattice or in an off-lattice manner, only consider a finite number of plausible reaction or diffusion events, for which rates are determined through ab initio calculations or by fitting to experimental data. On the other hand, ab initio MD (AIMD) simulations allow one to use first-principles potential energy surfaces to calculate forces and the resultant atomic velocities, thereby incorporating atomic motion and entropic effects into the model. Because AIMD simulations are computationally very demanding, classical MD simulations using reactive force fields have been explored to simulate chemical reactions, with greatly increased computational speeds, but lower accuracy as compared with AIMD simulations. In this work, we discuss the use of the above-mentioned theoretical techniques to obtain physical and chemical insight into the synthesis of 2D materials.There have been several review papers focused on the CVD growth of 2D materials from an experimental perspective (Cai et al., 2018; MacKenzie et al., 2010; Muñoz and Gómez-Aleixandre, 2013). From a computational standpoint, Gao et al. and Momeni et al. extensively discussed the simulation tools, including DFT calculations, KMC simulations, and reactive force field MD simulations, that can be used to investigate 2D material synthesis via CVD. While Momeni et al. primarily discussed the theory and basic formulae underlying atomistic to meso/macroscale simulation models in detail, Gao et al. focused more on the growth of specific 2D material systems, particularly graphene (Gao et al., 2018; Momeni et al., 2020). Recently, Dong et al. provided a perspective on the theoretical study of the CVD of graphene and newer 2D materials (Dong et al., 2021). In this work, however, we focus on carrying out an extensive review of modeling, simulation, and machine learning studies aimed at the CVD growth of specific 2D materials, focusing equally on various 2D materials and the knowledge gaps in understanding their CVD synthesis, with the article organized as follows. We first discuss the basic principles of crystal growth and CVD reactors as applied to the synthesis of 2D materials. We dedicate individual sections to modeling the growth of graphene, hBN, TMDs, and newer 2D materials (e.g., silicene, phosphorene, and borophene). In each section, before reviewing and discussing theoretical work, we also summarize the initial experimental work in the area to provide a perspective to the reader as to how the field began. We also review the CVD growth of 2D material heterostructures, which are becoming increasingly popular, as they allow the combination of the favorable properties of various 2D materials. Subsequently, we discuss the use of machine learning strategies to predict and improve CVD processes for 2D materials. We conclude with a consolidated discussion of the knowledge gaps in the field, which could be investigated more deeply in the future.
Basic principles of CVD and crystal growth
CVD reactors used for 2D material synthesis are typically cylindrical in shape, with a diameter of one inch or two inches, and are placed horizontally within a heated furnace. The usual material of construction of the reactor is quartz, so as to sustain the high temperatures to which the system is heated. The furnace is insulated and consists of a single heating zone or three heating zones, with a separate temperature programmer available for each zone. Note that even though the temperatures of the three zones can be set independently, there is heat transfer between the zones such that the final temperatures obtained may be different from the programmed setpoints (Menzel et al., 2012; Sojková et al., 2019; Zheng and Chen, 2017). The growth mechanism depends on the temperature attained inside the reactor, which can be low, moderate, or high, and is determined by heat transfer inside the reactor (Doering and Nishi, 2017). In terms of the pressure used, although atmospheric pressure CVD growth is common (Han et al., 2013; Li et al., 2015b; Vlassiouk et al., 2013), several researchers have investigated low-pressure or vacuum CVD growth of materials (Li et al., 2011; Singhal et al., 2021; Zhang et al., 2019a), with the low pressure maintained using a vacuum pump. To assist with modeling efforts, CVD processes used for 2D materials can be categorized into two types, based on whether the vapor-phase precursors enter the reactor or are generated inside the reactor, with the latter more difficult to model theoretically and control experimentally. In the first type (Figure 1A), gas phase precursors enter the reactor (e.g., methane and hydrogen for graphene; vaporized borazine and nitrogen for hBN; vaporized Mo(CO)6 and H2S for MoS2). In the second type (Figure 1B), solid-phase precursors are placed inside the reactor (e.g., sulfur and molybdenum trioxide or molybdenum pentachloride for MoS2), which then sublime and form a vapor phase. Understandably, the second type poses challenges in modeling and simulation, because of the need to account for the kinetics of precursor vaporization/sublimation, and the resulting concentration gradients. Nevertheless, in both types of CVD, a variety of structures are seen on the growth substrate, depending on the temperature, pressure, growth time, precursor concentrations, and flow patterns inside the reactor. Mass flow controllers are used to maintain a constant flow rate of the gases flowing into the reactor (Ciambelli et al., 2011; Hoecker et al., 2016), with the flow rate typically quantified in standard cubic centimeters per minute (sccm), i.e., at conditions of 273.15 K and 1 bar. Thus, modeling studies should take into account the prevalent temperature and pressure conditions to calculate the actual molar flow rate of gases inside the reactor. Ultimately, because many 2D materials have hexagonal lattices, the prominent crystal shapes obtained via CVD are hexagons, triangles, and truncated triangles (Figure 1C). The main types of edges exposed in the synthesized flakes of 2D materials are zigzag (ZZ), armchair (AC), and singly bonded (Klein) edges, with the possibility for unterminated, hydrogen (H) terminated, and hydroxyl (OH) terminated edges. Sometimes, due to severe diffusion limitations on the growth surface, dendritic or fractal structures may also be seen (Chowdhury et al., 2020).
Figure 1
Growth of 2D materials using flow CVD reactors
(A) Using gas-phase precursors introduced via mass flow controllers.
(B) Using solid-phase precursors sublimated to produce vapors that are transported by a carrier gas and participate in the CVD process. In both cases, growth substrates are placed at an appropriate position inside the reactor oriented horizontally or vertically. Important operating variables include the temperatures, Tr1 and Tr2, of the boats containing the two solid precursors (reactants); the temperature of the substrate, Ts; the pressure in the reactor, p; the distance between the boats and the growth substrate; and the volumetric flow rate of the carrier gas and reactants.
(C) A variety of shapes, including hexagons, triangles, and truncated triangles, of varying sizes, are typically formed on the substrate during the CVD process
Growth of 2D materials using flow CVD reactors(A) Using gas-phase precursors introduced via mass flow controllers.(B) Using solid-phase precursors sublimated to produce vapors that are transported by a carrier gas and participate in the CVD process. In both cases, growth substrates are placed at an appropriate position inside the reactor oriented horizontally or vertically. Important operating variables include the temperatures, Tr1 and Tr2, of the boats containing the two solid precursors (reactants); the temperature of the substrate, Ts; the pressure in the reactor, p; the distance between the boats and the growth substrate; and the volumetric flow rate of the carrier gas and reactants.(C) A variety of shapes, including hexagons, triangles, and truncated triangles, of varying sizes, are typically formed on the substrate during the CVD processThe CVD synthesis of a material involves several competing processes, such as vapor-phase transport of reactants, adsorption and desorption of precursors on the surface, nucleation and growth of the crystal involving attachment and detachment of adatoms, and the diffusion of adatoms on the surface (Zhang and Lagally, 1997). These processes are depicted in Figure 2A. Furthermore, there are three main modes for epitaxial crystal growth (Markov, 1995). These are the “layer-by-layer” mode (also called Frank–Van der Merwe growth, depicted in Figure 2A), the “isolated islands” mode (also called Volmer–Weber growth, depicted in Figure 2B), and the “layer-plus-islands” mode (also called Stranski–Krastanov growth, depicted in Figure 2C). For the growth of monocrystalline large-area 2D materials, the layer-by-layer mode is the most preferred followed by the layer-plus-islands mode, as opposed to the isolated islands mode, because the latter involves small flakes growing in a disconnected manner. For obtaining polycrystalline 2D materials, any of the above modes of growth may be sufficient. The mode of growth depends upon the free energetics and kinetics of the various processes mentioned above and is an important prediction that theory can be used to make. Indeed, if the lateral growth of the 2D material is faster than the nucleation of another layer, then layer-by-layer growth will take place; otherwise, there will be a tendency for island-type growth to occur.
Figure 2
Various modes of growth and the atomistic processes involved in the CVD of a 2D material layer on a suitable substrate
(A) “Layer-by-layer” mode (Frank–van der Merwe growth), (B) “isolated islands” mode (Volmer–Weber growth), and (C) “layer-plus-islands” mode (Stranski–Krastanov growth). Steps involved in the CVD process, such as adsorption, diffusion, attachment, and desorption of adatoms are depicted in panel (A)
Various modes of growth and the atomistic processes involved in the CVD of a 2D material layer on a suitable substrate(A) “Layer-by-layer” mode (Frank–van der Merwe growth), (B) “isolated islands” mode (Volmer–Weber growth), and (C) “layer-plus-islands” mode (Stranski–Krastanov growth). Steps involved in the CVD process, such as adsorption, diffusion, attachment, and desorption of adatoms are depicted in panel (A)
Modeling of graphene CVD growth
Experimental background
Graphene, the first 2D material to be isolated, has found use in several application areas, such as separation processes (e.g., water desalination (Song et al., 2018) and gas separations (Yoo et al., 2017)), electronics (Avouris and Xia, 2012; Wang et al., 2012), energy storage (Olabi et al., 2021; Raccichini et al., 2014), and biosensing (Chung et al., 2013). While graphene was initially isolated using scotch-tape exfoliation (Novoselov et al., 2004), this method is not scalable and leads to small sizes and quantities of 2D flakes. Thus, researchers turned to other techniques for producing graphene: liquid-phase exfoliation (Nicolosi et al., 2013), a top-down approach, and CVD, a bottom-up approach. However, graphene obtained via liquid-phase exfoliation is also limited in its lateral size and has several defects due to the vigorous conditions presented by ultrasonication (Skaltsas et al., 2013). To overcome these challenges, over the years, researchers have perfected CVD as a potential growth method for graphene. Few-layered graphene was first synthesized via CVD in 2007 (Obraztsov et al., 2007). Subsequently, single-layered graphene was synthesized via CVD by three different research groups in 2008-10 (Cao et al., 2010; Kim et al., 2009; Reina et al., 2008). The growth of graphene involves the use of methane and hydrogen gases as reactants. Several experimental and theoretical studies tried to understand the mechanism of graphene nucleation and growth on various substrates. Tetlow et al. reviewed progress in this area extensively (Tetlow et al., 2014).In terms of experimental studies focused on understanding the CVD process, Girit et al. examined the mechanism of edge reconstruction in graphene via aberration-corrected transmission electron microscopy (AC-TEM), as shown in Figure 3A(i). A movie generated from the imaging of the edges in graphene established the stability of the zigzag edge. The authors also investigated whether a KMC model could predict the experimentally observed results (Figure 3A(ii)). Although the atomic migration probabilities were calculated from an Arrhenius dependence on the energy barrier obtained from ab initio calculations, the ejection and addition probabilities were set to match experimental results, thus leaving room for future improvement where all rates could be calculated from first principles. The dynamics of the edges and holes were predicted to be similar to the observed results (Girit et al., 2009).
Figure 3
Modeling and experimental studies focused on understanding the CVD synthesis of graphene
(A) Reconfiguration of the graphene edge (i) TEM image depicting the conversion of an edge in graphene from an armchair configuration (top) to a zigzag configuration (bottom)
On the modeling front, the first theoretical studies focused on the vapor-phase synthesis of graphene came in the year 2012. Artyukov and Yakobson carried out detailed first-principles calculations of the growth rate of graphene edges using a step-flow model of crystal growth (Artyukhov et al., 2012). The authors modeled the migration of carbon atoms from the feed to the nickel (Ni) catalyst surface and their attachment to the growing lattice. Subsequently, they calculated the energies of the various intermediate states to elucidate the sequence of steps involved in the graphene growth process (Figure 3C). The atoms were observed to attach at the edges and not form many defects in the presence of substrates. This work was successful in explaining the anisotropy of the growth process, the kinetics of growth, and the morphology of the islands, thereby providing physical insight into previous experimental results, including the synthesis of carbon nanotubes (Artyukhov et al., 2012). Meng et al. studied the kinetics of growth of carbon structures on Ni(111) at various temperatures using classical reactive MD simulations by employing the ReaxFF potential (Meng et al., 2012). The study found that higher concentrations of carbon atoms favor graphene island formation and lower concentrations yield dissolution of carbon into the Ni surface. Thus, extended sp2 networks are not feasible at a low carbon concentration (due to dissolution of growth precursors) and at a high concentration (due to the formation graphene islands), thereby suggesting an optimal carbon concentration for large-area growth. The authors further reported that graphene islands can act as nucleation centers and allow growth by the addition of carbon (Meng et al., 2012). The Ding group found out that the orientation of graphene islands is determined by the interactions operating between the graphene edge and the catalyst surface (Zhang et al., 2012). This important finding provided an explanation for various experimental observations, such as the crossing of grain boundaries (formed by adjacent facets of polycrystalline catalyst surfaces) by monocrystalline graphene; synthesis of graphene with a domain size larger than the domains in the catalyst surface; and correlation between the graphene flake orientation and the catalyst surface (Zhang et al., 2012).In other work, researchers investigated the mechanism of nonlinear graphene growth on metal surfaces using ab initio calculations and KMC simulations. Particularly, Wu et al. modeled the addition of smaller carbon species along with adsorption and diffusion phenomena (Wu et al., 2012). The authors elucidated the mechanism of nucleation and growth by studying the step sites on the substrate and carbon attachment to the edges, respectively. The lattice mismatch between graphene and the substrate resulted in inhomogeneous growth, an aspect which deserves more attention in future work, as it can explain different growth regimes in the same CVD reactor. The authors could not investigate perpendicular growth of carbon chains larger than seven due to the finite substrate size considered. Future studies can focus on the growth of larger carbon chains by using larger system sizes. Nevertheless, the methodology to investigate simultaneously adsorption, diffusion, and growth developed in their paper can be extended to understand the growth of other heteroepitaxial structures (Wu et al., 2012). Theoretical studies have also been carried out using semi-empirical electronic methods. For example, using a tight-binding model, semi-empirical molecular orbital theory, and reactive empirical bond order (REBO) potential-based calculations, Elliot et al. showed that graphene is thermodynamically stable on crystalline Ni(111). The researchers considered the “complementary” crystallization of graphene and metal in their calculations. Thereby, they demonstrated a crystallization process involving the simultaneous heterogeneous nucleation of graphene and metal, which could provide better control of the growth process for both graphene and carbon nanotubes (Elliott et al., 2013).Another work investigated methane dissociation on the Ni (111) surface with the help of AIMD simulations (Shibuta et al., 2013). The study found that methane dissociates into carbon and hydrogen atoms via the chemisorbed CH3, CH2, and CH intermediates on the Ni surface. The authors proposed that carbon atoms diffuse into the subsurface resulting in the precipitation growth of graphene on the catalyst surface (Shibuta et al., 2013). Monolayer graphene was formed in the temperature range between 1100 and 1200 K. The growth of graphene on other nickel surfaces, e.g., Ni(110) and Ni(100), was investigated by Mafra et al. (Mafra et al., 2018). The authors observed that multilayer growth was possible only using Ni(100). No carbon structures were observed at lower temperatures (below 800°C) due to reduction in the reactivity rates of methane. Nevertheless, a higher growth time can be employed to overcome the reduced reactivity. Hence, a tradeoff between the growth time and temperature is evident in the monolayer growth of graphene on Ni substrates, an aspect that can prove useful for the diagnosis of reasons for failed growth. The authors further proposed that the planar structure is the most stable one with half of the carbon atoms attached to the “on top” position and the other half to the “hollow hcp” position. However, there are disagreements on the most stable structure of graphene on Ni(111) and deeper investigations are needed to address the problem (Mafra et al., 2018). Regarding growth on other surfaces, Page et al. investigated the nucleation of graphene on Ni, Cu, and iron (Fe) surfaces (Page et al., 2013). The authors found that weakly binding catalysts such as Ni and Cu are better for graphene growth as they do not degrade with time. Nevertheless, Ni and Cu require a higher carbon concentration on the surface for graphene growth to take place. On the other hand, although quantum-chemical calculations showed that Fe facilitated graphene precursor formation even at lower carbon densities, Fe(111) suffers degradation due to a strong interaction with carbon. The authors postulated that graphene growth, like carbon-nanotube growth, demonstrates a substantial correlation with the catalyst-carbon interaction (Page et al., 2013).Apart from temperature and growth time, the flow profile of vapor inside the reactor can play a critical role in modulating CVD growth. Li et al. studied the dynamics of the gas-phase in growth of graphene on Cu using computational fluid dynamics (CFD) (Li et al., 2015a). The authors calculated the deposition rate of carbon on the surface during the growth of graphene in a horizontal tube furnace. The researchers considered 3D, compressible flow in the laminar regime along with chemical reaction at the surface, wherein the flow is governed by the continuum continuity, Navier-Stokes, and heat equations. The surface deposition rate was found to depend on the surface reaction rate constant and the mass transfer coefficient of methane, both of which are affected by pressure. Indeed, under low pressure conditions, the deposition rate increased exponentially with temperature whereas the increase was moderate under atmospheric conditions. The deposition rate was shown to depend on the placement of the Cu substrate. Accordingly, a higher concentration of unsaturated species in the downstream section resulted in thicker growth of graphene. This study is important as it provides insights into the transport phenomena occurring during graphene growth, where under lower pressures, the surface reaction process is controlling but at atmospheric pressure, the mass transport process is controlling (Li et al., 2015a). In another comprehensive work, Zhang et al. discovered the role of hydrogen in terminating the graphene edges (Zhang et al., 2014). They found out that at low hydrogen pressures, the graphene edges tend to attach to the surface of the catalyst as the edges are not terminated by the hydrogen atom. This prohibits the diffusion of carbon species to the bottom and favors growth of single layers of graphene. At higher pressures, the graphene edges were passivated by the hydrogen atoms and hence the formation of an adlayer beneath the top layer was favored. This observation paves the way for controlled synthesis of bilayer graphene or few-layered graphene. Further, Li et al. also observed in their KMC simulations that graphene edges are H-passivated at higher hydrogen partial pressures and metal passivated at lower pressures. With the help of DFT calculations, the researchers showed that growth at the hydrogen-passivated edge can proceed via C2 or CH attachment as both produce sp2 structures (Li et al., 2017). CH attachment is generally not favorable at the edges due to the former’s lower desorption barrier, whereas, C2 attachment is easier due to a higher desorption barrier at the edges. However, at higher H2 partial pressures, the CH concentration is higher than the C2 concentration and attachment at the H-passivated edge is driven by the CH species (Li et al., 2017). Thus, the growth mechanism not only depends on reaction energetics, but also on species concentrations. This coupled effect should be investigated in more detail in the future.Research work focused on evaluating the accuracy of theoretical methods is also required to ensure that the predictions made using simulation tools are reliable. Shu et al. studied the various carbon species that form during the CVD growth of graphene using first-principles methods. They found that the CH and C monomers are predominant on the Cu surface; and on Ni, C monomers were larger in number during graphene growth. On Ir and Rh surfaces, C species were stable and drove the CVD growth process (Shu et al., 2015). Note that a strong binding between the transition metal and carbon species is required for the latter to get attached to the surface and contribute to the nucleation and growth of graphene. The binding energies of the carbon species to the surface decrease on addition of hydrogen. To this end, dispersion corrections to DFT must be added to accurately obtain the binding energy and incorporate the weak van der Waal’s interaction between the carbon species and the substrate. Shu et al. reported that the binding energies of the active species, CH (i = 0,1,2,3) are dependent on the method (type of functionals and dispersion correction), an aspect which should be investigated more deeply in the future. In fact, the stabilities of the various species also depend on the temperature and the type of substrate surface. An increase in the temperature causes the reduction of chemical potential of hydrogen and leads to further dehydrogenation of the species (Shu et al., 2015). Simulation studies taking into account the effect of temperature on growth are essential to make progress in this area. In DFT calculations, thermal effects are mainly incorporated via the harmonic oscillator approximation. In this regard, Andersen et al. found that the harmonic oscillator representation may not be accurate at higher temperatures on both solid and liquid Cu substrates (Andersen et al., 2019). Hence, the researchers considered a hindered translator/rotator (HTR) and 2D ideal gas model for the adsorbate. It was shown that in the absence of diffusional and rotational barriers, the HTR model reduces to the 2D ideal gas model. Observing the Gibbs free energy of formation of hydrocarbon species, the authors concluded that the species containing lesser number of hydrogen atoms were more stable at higher temperatures for CVD growth on solid Cu. The authors observed that for a decrease in methane to hydrogen partial pressure ratio (at fixed total pressure) or an increase in total pressure, the hydrogenated species become more stable in agreement with previous studies. However, the authors reported in disagreement with Zhang et al. (2014) that an increase in the methane-hydrogen partial pressure ratio leads to multilayer growth of graphene, a mismatch that may be attributed to the lack of thermal corrections to the internal energy and entropy of the adsorbents in previous investigations. Most of the previous studies considered a harmonic oscillator framework, which may not be applicable in case of low rotational or diffusion barriers. Andersen et al. further observed a lower stability for all the hydrocarbon species in the case of CVD growth on liquid Cu. The carbon dimer is expected to have a higher coverage than other carbon clusters owing to its presence on a local minimum on the free energy surface. Therefore, the dimer forms a candidate species to propagate growth after nucleation as observed in KMC simulations. The authors postulated based on stability arguments that both hydrogen-terminated and metal-terminated edges are possible during CVD growth of graphene on Cu substrates, which contradicts previous studies where researchers advocated for the presence of hydrogen-passivated edges at higher hydrogen partial pressures. Such contradictions call for further research in this area to firmly investigate and establish a mechanism of growth, while considering the stability of various edge terminating groups (Andersen et al., 2019).Interesting physical observations regarding the graphene growth process have also been reported. Artyukhov et al. inferred that the symmetry of the carbon islands formed is not strictly related to the symmetry of graphene (Artyukhov et al., 2015). Using DFT calculations, they found that the symmetry of stacking on the surface is lower than that of either the hexagonal graphene or the catalyst surface. The study found out that symmetry breaking is evident at the edges, resulting in various stable structures (Klein or zigzag) depending on the relative orientation of the graphene flake and the substrate. This phenomenon results in equilibrium shapes which violate the inversion symmetry of graphene mildly. The symmetry-lowering interactions were observed to amplify the growth kinetics exponentially, leading to the rapid growth of Klein edges rather than zigzag edges (Artyukhov et al., 2015). Subsequently Jiang and Hou developed a KMC scheme augmented with DFT calculations to model the growth of graphene on arbitrary catalyst surfaces with lattice mismatch. They proposed a growth mechanism based on the various active sites available on the catalyst surface for graphene growth. The authors found that the rate-determining step for graphene growth was different for various growth fronts, thereby indicating it to be a geometric effect (Jiang and Hou, 2015). In this regard, accurate information on the energetics of atomic-scale transformations in graphene is crucial for the development of reliable theoretical models. Accordingly, Skowron et al. reviewed the effect of defects on the physical and chemical properties of graphene. The study revealed that there were various knowledge gaps, in the areas of energetics of formation and migration of vacancy defects, realignment of bonds, and displacements of crystallographic planes (Skowron et al., 2015). Göltl et al. developed a KMC model to understand the growth of graphene nanoribbons on Ge(001). By considering aspects such as precursor formation, row nucleation, and row growth, the authors were able to reproduce experimental observations in their simulations, concluding that an anisotropic stabilization of growth precursors favored ribbon formation (Göltl et al., 2020). Future work could explore the formation of nanoribbons of graphene and other 2D materials on various substrates, and strategies to control their width, from a computational standpoint. In another work, researchers verified that first-principles calculations coupled with KMC simulations can accurately predict graphene growth kinetics on Ir(111), thereby enabling a deeper understanding of growth mechanisms and the development of better synthesis routes. The carbon monomers were observed to be present in large numbers on Ir(111) and thus, monomers attached to all the sites that were exothermic with respect to carbon attachment (Figure 3D(i)). On endothermic sites, growth occurred via exothermic cluster attachment (Figure 3D(ii)). Thus, the growth rate is a combination of the attachment kinetics of monomers and large clusters. The variation of growth rates with carbon monomer concentration is shown in Figure 3D(iii) (Qiu et al., 2018b). Recently, Zhang and Duin investigated the CVD growth of graphene on silicon carbide using classical reactive MD simulations. This work involved the development of a silicon/hydrogen/graphene force field, using which the operating temperatures were found to be optimal between 1000 and 3000 K (Zhang and Duin, 2020). Future work can explore the use of ReaxFF models to understand the controlled growth of graphene on various substrates.To conclude this section, several theoretical studies, based on various simulation methods, have provided critical insights into the nucleation and growth of graphene, as reviewed above and summarized in Table 1. Nevertheless, there is a considerable lack of studies which probe the detailed chemical reaction mechanism of graphene nucleation and growth, while considering edge functionalization, and use it to predict the kinetics of CVD synthesis of graphene. The inclusion of the effects of temperature, pressure, precursor concentration, flow profile, and substrate placement will impart further realism to the modeling efforts. Indeed, in Table 1, one clearly sees a lack of studies focused on nucleation and transport modeling. Such investigations would allow researchers to predict optimal conditions for CVD growth on various substrates, based on the atomic-scale chemistry of the process. The pursuit of such research directions may be a promising endeavor in the future.
Table 1
Summary of the studies addressing different focus areas in graphene CVD growth using various theoretical methods
Focus Area↓
Method →
DFT
MD
KMC
AIMD
CFD/Phase-Field Modeling
Nucleation
Wu et al. (2012)
Meng et al. (2012), Elliott et al. (2013)
Growth
Artyukhov et al. (2012), Wu et al. (2012), Artyukhov et al. (2015), Jiang and Hou (2015), Qiu et al. (2018b)
Meng et al. (2012), Elliott et al. (2013), Zhang and Duin (2020)
Wu et al. (2012), Jiang and Hou (2015), Göltl et al. (2020), Qiu et al. (2018b)
Momeni et al. (2021), Li et al. (2015a)
Role of the Substrate
Zhang et al. (2012), Mafra et al. (2018), Shu et al. (2015), Zhang et al. (2014), Jiang and Hou (2015)
Shibuta et al. (2013), Page et al. (2013), Jiang and Hou (2015)
Transport Modeling
Momeni et al. (2021), G. Li et al. (2015a)
Summary of the studies addressing different focus areas in graphene CVD growth using various theoretical methods
Modeling of hBN CVD growth
Hexagonal boron nitride (hBN), also known as white graphene, is an insulating 2D material that has found application in several areas, such as optoelectronic devices (Caldwell et al., 2019; Cheng et al., 2019; Ougazzaden et al., 2021), molecular/ionic separations (Gao et al., 2017; Lei et al., 2013), and osmotic power harvesting (Kim et al., 2019; Macha et al., 2019; Yazda et al., 2021). An early work by Allendorf and group investigated the kinetics of the gas-phase CVD growth of boron nitride (BN) from BCl3 and NH3 precursors. The study found the presence of Cl2BNH2, which occurs during the reaction of BCl3 and NH3, to be a critical precursor in the CVD growth of BN (Allendorf et al., 1995). Later, in 2010, few-layered and single-layered hBN were first synthesized using CVD by Kong and coworkers using borazine (B3N3H6), aided by nitrogen as the carrier gas at a temperature of about 400°C on a Ni surface (Shi et al., 2010). In other work, Stehle et al. studied the growth of hBN crystals and showed that they change shape depending on the distance between the substrate (Cu) and the precursor. They found out that the heating method of the precursor influences the morphology of the hBN films (Stehle et al., 2015). Song et al. studied the thermokinetics of the CVD growth of hBN from solid ammonia borane. The optimal carrier gas flow rate, temperature of growth and heating, and growth time were determined. The researchers were able to produce large hBN film domains of 80 μm2 having 95–100% coverage ratio, thereby indicating the important role played by the aforementioned process parameters in the CVD process (Song et al., 2016). In a review article, McLean et al. observed that the CVD growth of BN is not very well understood due to the vast variability in precursors, reaction conditions, and catalysts. Hence, there is adequate scope for theoretical and experimental investigations that might reveal deeper insights into the mechanism of crystal formation, reaction pathways, and related understanding of the atomistic processes at play (McLean et al., 2017).On the theoretical front, the edge energies of BN were first calculated by Yakobson and coworkers. The authors considered both N-rich and B-rich zigzag edges and reported the variation of the edge energies as a function of the chemical potentials of B and N (Figure 4A(a)), thus offering insights on how to control the morphology of hBN flakes (Figure 4A(b-f)) and determine the resultant electronic and magnetic properties of BN (Liu et al., 2011a). The authors developed a methodology to describe the energetics of the graphene edge in any arbitrary crystallographic direction at a particular chemical potential. The Wulff construction method was applied to determine the equilibrium shapes of the various BN clusters. The researchers discovered the equilibrium shapes of the BN flakes to be triangular with primarily zigzag edges. The authors also studied hybrid in-plane heterostructures consisting of graphene and hBN. The edge energies of the BN/C interface were determined using the pristine edge values and correcting them via binding energies at the interface. Although expensive, it would be interesting to determine how the estimated values would compare to the values calculated in the traditional way by computing the total slab energy, subtracting the energy of the equivalent bulk material, and assigning the rest to the edges. Nevertheless, the work elucidates how the chemical potential of the species can be used as an additional parameter to control the growth of 2D monolayers (Liu et al., 2011a). In another study, Liu et al. explained the alignment of monolayer hBN on Cu (100) surfaces. The first-principles calculations of total energy versus rotational angles at the initial nucleation stages revealed why hBN orients on the surface in a particular direction, whereas various rotational orientations are observed in the graphene-Cu(100) system. This difference was attributed to the weaker N-Cu and B-Cu interactions than C-Cu interactions. In the future, investigating rotational barriers could inform the stability of rotational orientations observed in CVD-grown structures in greater detail, although it is not necessary to gain insights into the orientational preference, as suggested by Liu et al. Further, the authors observed rearrangements of Cu atoms in the lattice, caused by bonding interactions between the B/N atoms and the substrate, thus pointing to the role of non-van der Waal interactions in the orientation of CVD-grown structures (Liu et al., 2014).
Figure 4
Modeling studies focused on understanding the CVD synthesis of hBN
Summary of the studies addressing different focus areas in hBN CVD growth using various theoretical methods
Focus Area↓
Method →
DFT
MD
Nucleation and Growth
Liu et al. (2011a); Zhao et al. (2015); Song et al. (2015); Z. Zhang et al. (2016b); Song et al. (2016); Zhu et al. (2021)
Liu et al. (2017)
Role of the Substrate
Fu and Zhang (2017); Zhao et al. (2015); Song et al. (2015)
Summary of the studies addressing different focus areas in hBN CVD growth using various theoretical methods
Modeling of TMD CVD growth
TMDs are 2D materials with the general formula MX2, where M is a transition metal (e.g., molybdenum (Mo) or tungsten (W)) and X is a chalcogen from group 16 of the periodic table (e.g., sulfur (S), selenium (SE), or tellurium (Te)). TMDs are semiconducting materials, with a bandgap in the visible range, and have found applications in optoelectronic devices (Mak and Shan, 2016; Zeng and Liu, 2018) as well as membrane separations (Heiranian et al., 2015; Hirunpinyopas et al., 2017). As opposed to graphene and hBN, there is substantial structural complexity in a monolayer TMD where the metal (M) atoms are sandwiched in between the chalcogen (X) atom layers. This presents a unique challenge in terms of understanding the separation of the metal and chalcogen atoms from their respective precursors and their incorporation into their corresponding lattice positions. In this regard, various diffusion processes affect the synthesis in different ways – M and X adatom diffusion affects the growth rate and nucleation density of TMD layers whereas their edge diffusion influences the continuity and shape of the TMD domain. With respect to the vapor-phase synthesis of TMDs, Najmaei et al. synthesized few-layered MoS2 using CVD in the year 2013 by the reaction between vaporized MoO3 and sulfur. The reaction temperature was maintained at 850°C and insulating SiO2/Si were used as substrates. The optimum pressure range was found to be 4–10 kPa, wherein the triangular domains coalesced to form large-area sheets of MoS2 (Najmaei et al., 2013). Other precurors used for MoS2 synthesis include MoCl5, Mo(CO)6, and H2S. Studies have also focused on the role of vapor-phase composition in modulating the growth of MoS2. Particularly, the hydrogen-free CVD growth of MoS2 on silicon was examined by Wang et al. using SEM and atomic force microscopy. The study found that the location of the Si substrate influences the shape of the domains from triangular to hexagonal configurations. The authors attributed the change in the shape of the crystals to the spatial variation in the Mo:S ratio on the substrate (Wang et al., 2014a).Other TMD materials that have been synthesized via CVD include MoSe2, WSe2, and WS2. Wang et al. synthesized molybdenum diselenide (MoSe2) under ambient pressure conditions. The smaller band gap and higher mobility of electrons make the selenides a better choice for device applications (Wang et al., 2014b). Another study examined the role of hydrogen in the CVD growth of TMDs using ADF-STEM. The authors observed that in the presence of hydrogen gas MoSe2 monolayers were the dominant product. The stable edge types included the ZZ-Mo, ZZ-Se, and ZZ-Se-derived Klein edge with dangling Mo atoms (Wang et al., 2018). Liu et al. studied the growth of WSe2, which has important applications in mechanical, electronic, and optical devices (Liu et al., 2015). WO3 and Se powder were used as the precursors and the growth was performed on Si/SiO2 substrates. A rise in temperature led to the formation of WSe2 domains followed by geometric shapes which included incomplete triangles and hexagons with various edge structures (Liu et al., 2015). In other work, Chen et al. observed that 2D WSe2 grew in a spiral manner driven by screw-dislocation defects (Chen et al., 2014). CVD growth aided by sulfur resulted in pyramidal structures. The sulfur partially reduces the WO3 precursor which played a critical role in the growth process. The mechanism of growth and generation was studied in detail (Chen et al., 2014). Subsequently, Kang et al. synthesized WS2 monolayers from WO3 using hydrogen gas and sulfur via reduction and subsequent sulfurization. At lower hydrogen pressure, the SiO2 substrate was etched due to insufficient reaction with WO3 whereas, at higher pressures, the WS2 layer was etched (Kang et al., 2015).In a combined experimental-modeling study, Van der Zande et al. studied the lattice orientation, morphology of the edges, and crystallinity of the triangular islands formed during the CVD growth of MoS2. The authors found that mirror twin boundaries are formed along with form-faceted tilt boundaries, when the island crystals merge together via eight and four membered rings (van der Zande et al., 2013). In this study, solely DFT calculations were used to obtain the relaxed edge geometries, leaving scope for future studies to consider grain boundary formation via KMC and reactive MD simulations. Ji et al. investigated the CVD growth of MoS2 on sapphire (0001) substrates (Figure 5A(a,e)) (Ji et al., 2014). The formed domains (Figure 5A(b,d)) were aligned in two directions (Figure 5A(c)) in agreement with their DFT calculations. The binding energies at different angles of rotation (Figure 5A(h)) indicated that there is a minor contribution from vdW interactions, and that the electrostatic interactions play a dominant role in the binding interactions (Figure 5A(f,g)). The controlled growth of MoS2 provided a remedy to the problem of misorientation-related polycrystalline CVD growth (Ji et al., 2014). Furthermore, the success of DFT calculations in rationalizing experimental observations of MoS2 CVD synthesis promises to provide further mechanistic insights into the growth of 2D materials, in the future.
Figure 5
Modeling and experimental studies focused on understanding the CVD synthesis of MoS2
Summary of the studies addressing different focus areas in TMD CVD growth using various theoretical methods
Focus Area↓
Method →
DFT
MD
KMC
CFD/Phase-Field Modeling
Nucleation
Caturello et al. (2018); Xue et al. (2018); Chen et al. (2019)
Chen et al. (2019)
Growth
van der Zande et al. (2013); Ji et al. (2014); Govind Rajan et al. (2016); Cao et al. (2015); Nie et al. (2016); Nie et al. (2017); Caturello et al. (2018); Xuan et al. (2019); Chen et al. (2019)
Xuan et al. (2019)
Govind Rajan et al. (2016); Nie et al. (2016); Nie et al. (2017); Chen et al. (2019)
Xuan et al. (2019)
Role of the Substrate
van der Zande et al. (2013); Ji et al. (2014); Xue et al. (2018); Nie et al. (2017)
Transport Modeling
Govind Rajan et al. (2016); Xuan et al. (2019)
Govind Rajan et al. (2016); Xuan et al. (2019)
Xuan et al. (2019)
Summary of the studies addressing different focus areas in TMD CVD growth using various theoretical methods
Modeling the CVD growth of other 2D materials
Although techniques for the vapor-phase synthesis of newer 2D materials, such as silicene, germanene, MXenes, phosphorene, and borophene are still under development, there have been some theoretical studies exploring the CVD growth of these materials. An early study by Takeda and Shiraishi revealed the theoretical possibility of 2D material layers made up of Si and Ge (Takeda and Shiraishi, 1994). With the success of conventional 2D materials like graphene, hBN, and TMDs, researchers started investigating other elements (e.g., silicon, germanium, and tin in group 14 and phosphorus, arsenic, and antimony in group 15) and their prospects in 2D materials chemistry. Shu et al. studied the growth of 2D silicene on Ag(111) using DFT and nucleation theory (Shu et al., 2013). Ground state-clusters of SiN were found to undergo a structural change from non-hexagonal to hexagonal shapes when the cluster size became 22. Parameters such as diffusion barriers, size of the nucleus, and the nucleation barrier and rate were investigated to understand the mechanism of growth. The authors concluded that silicene could be synthesized at a comparatively low temperature (around 500 K). The nucleation rate was studied as a function of both the difference in chemical potential (Δμ) and temperature (T). Higher temperatures above 500 K and larger Δμ (>0.1 eV) resulted in higher nucleation rates leading to creation of numerous silecene nuclei, which in turn introduced larger number of defects in the grown sheet. A lower nucleation rate may therefore be used to obtain silicene with lesser number of defects. Hence, a lower growth temperature was proposed (Shu et al., 2013). In another study, Meng et al. observed using ab initio calculations that silicene has a buckled conformation on Ir(111), which explained the formation of buckled geometries found in experiments (Meng et al., 2013). The buckled geometry indicates the presence of interactions between the silicon layer and the substrate. In this regard, electron localization function (ELF) calculations reveal regions of charge localization in the system and thus help in gaining insights on inter-material interactions. The ELF results of Meng et al. indicated chemical interactions between every pair of silicon atoms and electron localization at top-bridge and fcc-bridge pairs revealed covalent bonding between the Si atoms. The ELF value was much smaller between the Si-Ir atom pairs indicating the absence of electron pairing. We therefore can gain deep insights into the bonding characteristics of the 2D monolayer and its interactions with the substrate via ELF calculations and researchers can use ELF to effectively gauge the inter-atomic interactions during CVD growth on various substrates (Meng et al., 2013). Cherukara et al. studied silicene growth on Ir(111) with the help of MD simulations (Cherukara et al., 2017). The first step involved cluster formation via surface diffusion, subsequently leading to larger rings with the addition of Si atoms. Finally, a continuous sheet was formed due to coalescence of clusters, although several defects were observed. The authors inferred a correlation between the formation of atomic islands and the substrate temperature. The mobility of atoms increased on increasing the temperature and therefore the clusters had a larger probability to come into contact and merge with one another. Bridge formation via dangling bonds or attachment of smaller clusters or adatoms also led to coalescence of the islands. The presence of point and extended defects in the grown monolayer was attributed to the low energy of formation of the defects in silicene (Cherukara et al., 2017). Future studies can investigate the formation of defects during the CVD synthesis of various 2D materials, an aspect that we also highlight later in the paper.With respect to MXenes, Sang et al. studied the layer-by-layer growth of TiC. Ti3C2 MXene was used as both the substrate and source, thus resulting in homoepitaxial growth (Sang et al., 2018). The authors observed that TiC layers formed above 500°C on the defunctionalized surface of the MXene to produce Ti4C3 and Ti5C4. First-principles calculations augmented by force-bias Monte Carlo and MD simulations were employed to elucidate the growth mechanism and energetics of the process. This work provides a firm theoretical basis for the development of synthesis methods for monolayer transition metal carbides (Sang et al., 2018). In another work, Zhu and David studied the electronic properties, stability, and equilibrium structure of blue phosphorous using DFT calculations (Zhu and Tománek, 2014). The stability of this material was found to be comparable to that of black phosphorous, which is the most stable form of phosphorous, and the stacking of the layers was determined to be similar to that of graphene. The study concluded that CVD growth would be possible on lattice-matched substrates, as well as by stretching the black phosphorous lattice (Zhu and Tománek, 2014). Zhao et al. investigated the growth of blue phosphorous on various noble metal substrates. The authors studied the possibility of forming extended monolayers, rather than a 2D alloy network with metal atoms that is commonly observed in epitaxial growth of blue phosphorous on Au (Zhao and Li, 2021). The (111) facet of four substrates – Au, Ag, Pt, and Pd – were tested for monolayer growth. With the help of DFT and charge density difference calculations, the authors showed that Ag(111) is the only appropriate substrate to grow a blue phosphorous monolayer which can be attributed to the greater strength of P-P bonds than P-Ag bonds, resulting in large clusters. The transition from 1D structures to 2D monolayer islands occured at a cluster size of 19. AIMD simulations of the growth of phosphorene on Ag(111) proved that the configuration of the atoms is preserved at relatively higher temperatures, indicating the stability of the growth process. The work thus presented a systematic methodology to test the growth of blue P on substrates and to carry out a static and dynamic stability study of the structures (Zhao and Li, 2021). Qiu et al. studied the CVD growth of 2D black phosphorene on tin (Sn) catalyst and blue phosphorene on Ag and Au using ab initio calculations (Qiu et al., 2018a). The study found out a large binding energy between the metal substrate and the 2D phosphorene layer which suggested that exfoliation/transfer of the grown layer to other substrates might not be possible for various applications. The authors showed via DFT calculations that black phosphorene, blue phosphorene, and γ-phosphorene can be grown using CVD methods (Qiu et al., 2018a). However, the study did not discuss the chemistry of the reactions that could be used to synthesize phosphorene. In this regard, the phosphorus-containing precursors used to grow phosphorene are presumed to be toxic and difficult to handle (Khandelwal et al., 2017). Hence, there is a need for modeling the CVD growth chemistry a priori so that safe and robust synthetic routes can be predicted for experimentalists to synthesize phosphorene.Finally, with respect to the synthesis of germanene and borophene, there are no modeling studies exploring their growth, in the literature. On the experimental front, Mazaheri et al. were the first to grow single layer borophene by CVD from diborane (B2H6) pyrolysis (Mazaheri et al., 2021). (Previous studies mainly used molecular-beam epitaxy as the method of choice for the synthesis of borophene.) The rate of deposition and the effect of temperature and pressure on the CVD growth were studied and a comprehensive analysis of the phase and morphology was presented. SEM imaging was done to characterize the morphology of the grown borophene sheets. TEM was used to study the lattice structure (hollow hexagons) of the grown islands. The authors found a temperature of 830–860 K to be most optimal for growth on aluminum substrates (Mazaheri et al., 2021). d’Acapito et al. studied the growth of germanene on epitaxial AlN supported by Ag(111) experimentally, although no simulation studies have explored the CVD synthesis of this material (d’Acapito et al., 2016). From the above discussion, it is evident that not much work has been done on the CVD growth of newer 2D materials and this leaves plenty of room for further modeling studies which can provide important insights to experimental research groups working toward the vapor-phase synthesis of silicene, germanene, MXenes, phosphorene, and borophene.
Modeling the growth of 2D material heterostructures
The advances made in the synthesis of nanomaterials led to the development of layer-by-layer assembly of 2D materials, allowing vertical heterostructures consisting of various 2D materials. Vertical heterostructures are built as a stack of 2D layers held together by weak van der Waals interactions, thereby allowing one to combine the desirable properties of different materials (Geim and Grigorieva, 2013). Apart from out-of-plane heterostructures, lateral, i.e., in-plane, heterostructures display unique electronic and photonic properties and allow the formation of junctions of 2D materials. Such heterostructures have paved the way for tuning the functional properties of 2D materials. Nevertheless, there is a lack of understanding regarding how the growth of both in-plane and out-of-plane heterostructures occurs. Note that vertical heterostructures are more readily fabricated, as compared to lateral heterostructures, because strict lattice matching between the various layers is not required. This is because only weak dispersion interactions are operative between the layers, in most cases.Theoretical studies can play an important role in providing strategies to improve the reliability and robustness of synthesis methods for 2D heterostructures. Before discussing the theoretical advances, we present a few examples of experimental studies that investigated the formation of heterostructures. In an experimental study, Ci et al. were one of the first researchers to report the growth of in-plane heterostructures of hBN and graphene, wherein the domains of hBN and graphene were distributed randomly. The authors observed that the bandgap and the features were contrasting to that of hBN and graphene, indicating that heterostructures can be used to tune the properties of 2D materials (Ci et al., 2010). With respect to out-of-plane heterostructures, Liu et al. studied the growth of hBN on a graphitic surface and on exfoliated graphene using a two-step mechanism. The first step involved graphene growth on Cu foil from liquid carbon. This was followed by the growth of hBN using ammonia borane (Liu et al., 2011b). Ling et al. devised a general growth strategy of in-plane parallel heterostructures from 2D materials and TMDs despite the possibility of lattice mismatch. This methodology could allow researchers to develop functional units for electronic and optoelectronic applications (Ling et al., 2016).With respect to theoretical work, Fu et al. used DFT calculations to model the growth of MoS2/hBN heterostructures on Ni-containing substrates (Ni and Ni-Ga alloy) present on a Mo foil (Fu et al., 2016). First, the researchers ascertained the energetics of decomposition of the precursor for hBN growth, BH2NH2, concluding that the process is easier on Ni-Ga alloy than on pure Ni. The Mo foil below the alloy surface acted as a source for Mo which underwent sulfurization by H2S. The MoS2 then followed a “layer-by-layer” growth mechanism on the hBN layer, thereby resulting in a vertical heterostructure. The authors indicated that Ni-Ga alloy has sulfide-resistant properties, thereby preventing poisoning of the catalyst surface (Fu et al., 2016). In another work, Zhang et al. developed a controllable approach to epitaxially grow MoS2/WS2 heterostructures (Zhang et al., 2021). The structures were synthesized on SiO2/Si substrates in confined CVD chambers at atmospheric pressure using MoO3 and sulfur as precursors. The experimental growth was complimented with dispersion-corrected DFT calculations of high-symmetry stacking patterns. It was found that the AA and AB stackings were energetically favorable (Zhang et al., 2021). The determination of optimal stacking sequences is important from the perspective of understanding the synthesis of vertical heterostructures.The knowledge gap in understanding the mechanism of the growth process of heterostructures presents difficulties in developing scalable synthesis routes for both vertical and lateral heterostructures. In this regard, some theoretical studies have attempted to throw light on the mechanism of heterostructure formation. Zhang et al. utilized a twinned growth strategy to grow vertical heterostructures of ReS2/WS2 (Zhang et al., 2016a). The authors used DFT to simulate the growth of ReS2 and WS2 on Au(111) substrate (Figure 7A). The energy for adsorption of W over Au(111) (2.77 eV) and Re over WS2 (3.04 eV) were found to be similar, whereas the adsorption energy of Re over Au(111) (1.52 eV) was much weaker Figure 7B). At a growth temperature of 900°C, Re was found to desorb from the Au (111) surface making the nucleation process an unlikely event. WS2 nucleated on the surface owing to its higher adsorption energy. Further growth of ReS2 on the WS2 surface was induced by the high adsorption energy of Re atoms on the WS2 domains. Hence, the authors postulated a twinned growth behavior which was validated using various substrates, including foils made from Re, W, and Re-W alloy (Zhang et al., 2016a).
Figure 7
Mechanism and modeling of the growth of an out-of-plane 2D ReS2/WS2 heterostructure
(A) Schematic of twinned growth of ReS2/WS2 heterostructures on Au substrate with W-Re alloy support
Use of machine learning to understand and predict CVD growth
Machine learning (ML) has assumed great importance in modern-day research due to the availability of large amounts of experimental and simulation data, as well as large materials databases. These data can be used to train statistical models, thereby allowing one to make predictions regarding the type of growth that will result, given the process conditions used. Indeed, ML has found many applications in CVD growth, especially in prediction and classification of material morphology, and growth tracking. Note that mainly two types of ML exist, supervised learning and unsupervised learning. In the former, existing data is used to train a specific type of model, e.g., linear regression, random forests, gradient-boosted decision trees, support vector machines, etc., to predict a certain observable. In the latter technique, existing data is used to infer the correlations and connections that may exist within the dependent and independent variables, e.g., using k-means clustering. A common example of unsupervised learning is “clustering” where the datapoints are clustered into various classes based on the underlying features of the dataset. Most of the work carried out in this field thus far has focused on supervised learning, leaving room for using unsupervised learning to categorize and interpret the CVD process in the future.In terms of previous work, Zhang et al. emphasized the need for a data-based approach, including a combination of experiments and modeling, to overcome the challenge of achieving controllable CVD growth of 2D materials (Zhang et al., 2020). The authors elucidated how morphology diagrams could facilitate validation of hypothesized synthesis mechanisms based on available data. Indeed, large amounts of data on various synthesis conditions and their respective growth outcomes can lead to an unbiased assessment of synthesis routes by invoking the methods of data analytics and ML. A schematic explaining this workflow is shown in Figure 9A (Zhang et al., 2020) and can help in finding underlying relations between growth outcomes and the process parameters (Momeni et al., 2020). As seen in Figure 9A, materials databases and models can be used to create morphology diagrams, and such diagrams can be used to guide experiments. Subsequently, the experimental data could be added to the materials database, leading to further optimization of the ML model.
Figure 9
Usefulness of data analysis in understanding CVD synthesis
The growth of 2D materials via CVD is a promising strategy to produce large-area surfaces in a scalable manner. However, there are several knowledge gaps, particularly from a theoretical standpoint, that prevent further advances in understanding and engineering the controlled synthesis of 2D materials. Some of these knowledge gaps are discussed in this section and could provide avenues for future research.First, the formation of grain boundaries at locations where different 2D material islands coalesce is still not well understood (Yao et al., 2020). In this regard, Wang et al. conducted a combined experimental-theoretical investigation where they examined the coalescence of graphene grains misaligned at an angle of 21.8° using DFT calculations and that of MoS2 grains using phase-field modeling, along within situ imaging (Wang et al., 2020). The authors concluded that the 2D material-substrate interaction plays a prominent role in the formation of grain boundaries, with strong adlayer-substrate interactions dictating the orientation of the individual grains. In another study, Li et al. used phase-field modeling to study the formation of grain boundaries in graphene (Li et al., 2018). The authors showed that curved grain boundaries and triple junctions are likely in graphene when nucleation occurs in a random fashion. Chen at al. used KMC simulations to model the kinetics of formation of grain boundaries in MoS2 and validated their predictions using high-resolution TEM (HRTEM) imaging (Chen et al., 2019). However, such studies have not been carried out for other 2D materials. Looking forward, several opportunities are available to investigate the merging of grains and the formation of grain boundaries in 2D materials via DFT calculations, KMC simulations, and reactive force field simulations. A related aspect to this work is the computational investigation of the formation of in-plane heterostructures. As was seen in our review of the literature, solely experimental studies have been carried out on this front. Here, DFT calculations can be used to predict the energies of edges formed at the junction of disparate 2D materials and the chemistry of combination of precursors containing different metals and nonmetals, which could then feed into KMC simulations of the growth of in-plane heterostructures.Second, several experimental studies have recently reported the formation of nanopores in 2D materials during the growth process itself. These nanopores are useful from the perspective of using 2D materials for membrane separation applications. Very recently, Yuan et al. reported the CVD synthesis of nanoporous graphene to produce monolayered graphene membranes demonstrating the highest hydrogen to methane permeation selectivity reported so far (Yuan et al., 2021). The authors observed a larger number of nanopores at a growth temperature of 800°C, as compared to 900°C. From this observation, they inferred that a lower temperature reduces the rate of defect healing to a larger extent than the rate of defect formation, in agreement with DFT results from the literature. Previously, Yuan et al. synthesized nanoporous graphene via CVD, with the level of defects quantified by the D peak in the Raman spectrum of graphene. The authors hypothesized that the number and size of the nanopores formed in graphene depended on the amount of oxygen leaking into the CVD reactor from the atmosphere (Yuan et al., 2018). Other experimental work has also reported the presence of gas-sieving defects in large-area CVD-grown graphene (Huang et al., 2018; Khan et al., 2019), with the latter work employing a benzene-based CVD process. Reduction in the CVD temperature has been successfully used to introduce defects into graphene (Kidambi et al., 2018; Villalobos et al., 2021), by promoting polycrystalline growth. Despite these experimental advances, there is a lack of understanding about how nanopores are formed during the CVD process and how their shape and size may be controlled. Thus, theoretical studies in this direction can be very promising. A KMC-based study by Dutta et al. studied competitive etching and growth of graphene to form nanopores (Dutta et al., 2019). The authors observed the creation of elongated nanopores based on activation barriers for methane dehydrogenation and carbon detachment from the lattice. Such studies may find it beneficial to use the isomer cataloging technique developed by Govind Rajan et al. to distinguish between nanopore shapes in 2D materials using graph theory (Govind Rajan et al., 2019), and thus understand the shapes of nanopores formed during the CVD process. Furthermore, the inclusion of ab initio barriers and reaction rates can make the modeling of nanopore creation during CVD more realistic.Third, more work is needed to predict the effect of the substrate on 2D material nucleation and growth. Models that can predict the growth mode (i.e., layer-by-layer, island, or layer-plus-island) need to be developed to aid experimental efforts and make them more reproducible. In this regard, imaging techniques coupled with ML have the potential to identify growth modes in an automated fashion to create a library of growth recipes. To this end, recently, Millard et al. characterized CVD-grown WSe2 and MoSe2-WS2 heterostructures via automated photoluminescence imaging and image processing (Severs Millard et al., 2020). Such studies offer great promise and potential for the future. In a theoretical study, Shang et al. combined DFT simulations and calculation of phase diagrams (CALPHAD) modeling to understand the competition between lateral and vertical growth for MoS2 on graphene and sapphire substrates (Shang et al., 2016). The authors concluded that the growth of bilayer MoS2 becomes favorable as the size of the monolayer increases, with the substrate primarily determining this critical size of the MoS2 flake. A related knowledge gap is predicting the conditions that promote monolayer versus multilayer growth, which will have to be addressed to precisely control the number of layers in the grown 2D materials. Very recently, Ahn et al. developed an experimental method to grow layer-controlled MoS2 films using MoOCl4-based chemistry, with control achieved by simply varying the pressure in the system (Ahn et al., 2021). Future work can explore such ideas from a computational perspective to discover growth strategies to enable layer control for 2D materials. In this regard, Guo et al. formulated a Burton-Cabrera-Frank model based on lattice incorporation energetics, kinetic barriers, vdW interactions, layer edge energy penalties, and adatom entropies, to predict the conditions required for vertical versus monolayer CVD growth of 2D layers of TMDs. The authors used a phase-field/diffuse domain-based method to numerically solve the model. The study performed was parametric, but moving forward, the exact energies could be obtained from ab initio calculations and this can be an avenue for future studies (Guo et al., 2020). In another recent work by Zeng et al., the authors presented the limitation of static DFT calculations in obtaining KMC rates in cases where the substrate melts during CVD. The authors compared the minimum energy path (MEP) model with data from AIMD simulations for graphene growth on the Cu (111) facet. At lower temperatures (300 K), methane dehydrogenation had similar energy barriers as obtained from MEP and AIMD. However, at higher temperatures (1300 K) the structure of Cu (111) drastically changed due to melting, resulting in sampling of different structures in AIMD from those obtained in MEP. The dehydrogenation barrier for larger species (CH3 and CH2) remained almost same in both the cases but the barrier for smaller species (CH) changed. This behavior was attributed to the steric hindrance encountered in the movement of larger species. The CH atoms were trapped in between the Cu atoms making their local coordination different from that in MEP. On the other hand, the steric hindrance did not allow the larger species to be easily trapped inside Cu cavities and it was difficult for the Cu atoms to reach the C atoms in CH3 and CH2. Thus, the researchers showed that at higher temperatures (note that CVD is generally a high-temperature process) DFT-based MD simulations are the way to go forward to determine the rates and activation barriers depending on the availability of computational resources (Zeng et al., 2020). Moving forward, accurate estimates of precursor adsorption energies and diffusion rates on the bare substrate and the 2D material, as well as of the growth rates of the 2D layers, via first-principles calculations, are essential to make realistic predictions. Such investigations can also tie into the study of out-of-plane heterostructures of 2D materials, where the competitive nucleation and growth of various 2D layers can be examined.Fourth, efforts toward modeling the vapor-phase and surface transport inside the CVD reactor will be valuable to understand transport limitations and their effect on the morphology of the grown 2D materials. Indeed, detailed CFD modeling of the reactor could be undertaken to understand the role played by fluid mechanics and mass transfer in the nucleation and growth process. Momeni et al. combined phase-field modeling with simulations of heat and mass transfer inside a CVD reactor to understand the synthesis of MoS2 (Momeni et al., 2018). By using accurately determined precursor concentration profiles in their model, the authors demonstrated good agreement between the simulated and experimental morphology of MoS2. In another work, Ji et al. quantified the role played by fluid, heat, and mass transport on the CVD growth of hBN on Cu(111), using a CFD simulation coupled with phase-field modeling (Ji et al., 2021). In terms of mass transfer on the surface of the substrate, Li et al. revealed the role played by the Mo concentration in determining whether dendritic or compact growth of MoS2 occurs via DFT-supported KMC simulations (Li et al., 2019). By quantifying diffusion and attachment barriers via DFT calculations, the authors accurately modeled surface transport phenomena during the CVD growth of MoS2. Despite these studies, more investigations are required to realistically model the nanoscale and macroscale processes occurring simultaneously inside a CVD reactor.Finally, as discussed in the section on modeling the CVD growth newer 2D materials, computational investigations into the vapor-phase synthesis of silicene, germanene, phosphorene, borophene, and layered oxides (e.g., MoO3) will be valuable. In this regard, understanding the chemistry and the reaction mechanism underlying 2D material growth is also essential. CALPHAD-type models can provide potential preliminary clues regarding the possible chemical reactions that can occur during CVD synthesis. These would have to be combined with more detailed DFT calculations of reaction free energies and activation barriers, which could feed into KMC simulations of the growth process. Finally, reactive force field-based MD simulations can also be used for growth mechanism discovery, as was demonstrated for the case of MoS2 (Hong et al., 2017). This would, however, involve the painstaking effort of developing reactive force-field parameters using DFT calculations. An alternative approach could be the use of AIMD simulations to probe the synthesis of newer 2D materials.
Conclusions
In this review, we discussed how modeling and simulation techniques can be used to inform and predict the synthesis of 2D materials via CVD processes. We reviewed how theoretical studies using DFT calculations, KMC simulations, and reactive MD simulations help understand the mechanisms underlying nucleation and growth, as well as optimize reaction conditions, such as temperature, pressure, vapor-phase composition, and carrier gas flow rate, to obtain large-area 2D materials. While DFT calculations provide accurate estimates of potential/free energy surfaces, one often needs to combine them with KMC simulations or use them as input to AIMD or reactive MD simulations to understand the kinetics of vapor-phase nucleation and growth. We discussed several studies focused on modeling the CVD synthesis of various layered materials, such as graphene, hBN, MoS2, MoSe2, WS2, and WSe2. Furthermore, we provided a brief overview of theoretical investigations of the vapor-phase synthesis of newer 2D materials, such as phosphorene, silicene, MXenes, and borophene. There is a considerable lack of theoretical mechanistic studies in this area, which may be addressed in the future. We also reviewed the literature considering the synthesis of vertical and lateral heterostructures, identifying the formation of in-plane heterostructures as a topic requiring more research effort. Subsequently, we discussed the use of machine learning strategies to understand, predict, and improve the CVD of layered materials, in conjunction with databases of materials properties and experimental growth outcomes. Finally, we outlined several knowledge gaps that could be addressed by theoretical studies in the future. In particular, the study of grain boundary formation and defect incorporation in 2D materials during CVD synthesis, the prediction of various growth modes and reaction chemistries as a function of reactor conditions, modeling of the heat and mass transport inside the reactor using CFD/phase-field modeling, and investigation of the synthesis of newer 2D materials offer promising avenues for future research. We hope that our review motivates the use of modeling, simulation, and machine learning tools to better understand and predict the CVD growth of 2D materials.
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