| Literature DB >> 35159881 |
Jia Du1, Jun Zhou1, Lianzhen Zhang1, Na Yang1, Xin Ding1, Jin Zhang1.
Abstract
Laser pulses can be utilized to induce intermediate states of phase change materials between amorphous and crystalline phases, making phase change materials attractive and applicable for multi-level storage applications. In this paper, intermediate states of Ge2Sb2Te5 thin films induced via employing a nanosecond multi-pulse laser with different energy and pulse duration were performed by Raman spectroscopy, reflection measurement and thermal simulations. Upon laser-crystallized Ge2Sb2Te5 films, optical functions change drastically, leading to distinguishable reflectivity contrasts of intermediate states between amorphous and crystalline phases due to different crystallinity. The changes in optical intensity for laser-crystallized Ge2Sb2Te5 are also accompanied by micro-structure evolution, since high-energy and longer pulses result in higher-level intermediate states (corresponding to high reflection intensity) and largely contribute to the formation of stronger Raman peaks. By employing thermal analysis, we further demonstrated that the variations of both laser fluence and pulse duration play decisive roles in the degree of crystallinity of Ge2Sb2Te5 films. Laser fluence is mainly responsible for the variations in crystallization temperature, while the varying pulse duration has a great impact on the crystallization time. The present study offers a deeper understanding of the crystallization characteristic of phase change material Ge2Sb2Te5.Entities:
Keywords: Ge2Sb2Te5; Raman spectra; laser-induced crystallization; multi-level intermediate states; thermal simulations
Year: 2022 PMID: 35159881 PMCID: PMC8839464 DOI: 10.3390/nano12030536
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1Schematic of the experimental set-up, (a) the 532 nm laser beam propagated along the green line for phase transition experiment with GST films; (b) the home-built micro-area reflection measurement system for GST films.
The material properties of c-Si and GST.
| Material | Density (kg/m3) | Thermal Conductivity (W/m∙K) | Specific Heat (J/kg∙K) |
|---|---|---|---|
| a-GST | 5860 | 0.25 | 228 |
| c-GST | 6130 | 0.45 ± 0.09 | 240 |
| c-Si | 2330 | 140 | 700 |
Figure 2(a) Optical microscopy image (left) and AFM topography (right) of three categories of irradiation marks on the a-GST background film; (b) the heights distribution corresponding to cross-sectional views of blue dotted line in AFM topography; (c) thermal simulations of three categories of irradiation marks.
Figure 3(a) Reflection intensity of three categories of irradiation marks on the a-GST background films; (b) Raman spectra characterization of M-amorphous and crystallized GST regions.
Figure 4The characterization of multi-level intermediate states on an a-GST film induced by 10 laser pulses with varying drive current and pulse widths by (a) optical microscope image, (b) reflection spectra, (c) Raman spectra and (d) thermal simulations.
Figure 5The irradiation marks on an a-GST background film characterized by (a) optical microscope image, (b) reflection spectra (normalized reflectivity), (c) Raman spectra and (d) thermal simulations; (e) thermal simulations for the maximum temperature variation at the top surface center of GST films induced with a certain laser fluence of 54.5 mJ/cm2 and varying pulse widths; (f) maximum temperature variations at the top surface center simulated by varying pulse energy and pulse widths.