Literature DB >> 349165

Patch size and base composition of ultraviolet light-induced repair synthesis in toluenized Escherichia coli.

R Ben-Ishai, R Sharon.   

Abstract

Entities:  

Mesh：

Substances：

Year:  1978        PMID： 349165     DOI： 10.1016/0022-2836(78)90428-x

Source DB:  PubMed          Journal:  J Mol Biol        ISSN： 0022-2836            Impact factor:   5.469


× No keyword cloud information.
  4 in total

1.  Short deoxyribonucleic acid repair patch length in Escherichia coli is determined by the processive mechanism of deoxyribonucleic acid polymerase I.

Authors:  S W Matson; R A Bambara
Journal:  J Bacteriol       Date:  1981-04       Impact factor: 3.490

2.  Impaired incision of ultraviolet-irradiated deoxyribonucleic acid in uvrC mutants of Escherichia coli.

Authors:  E Seeberg; W D Rupp; P Strike
Journal:  J Bacteriol       Date:  1980-10       Impact factor: 3.490

3.  The repair patch of E. coli (A)BC excinuclease.

Authors:  A Sancar; J E Hearst
Journal:  Nucleic Acids Res       Date:  1990-09-11       Impact factor: 16.971

4.  uvrC gene function in excision repair in toluene-treated Escherichia coli.

Authors:  S Sharma; R E Moses
Journal:  J Bacteriol       Date:  1979-01       Impact factor: 3.490
  4 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.