| Literature DB >> 34914865 |
Guang Cui1,2,3, Zhe Peng4, Xiaoyan Chen1, Yi Cheng2,3, Lin Lu1, Shubo Cao1, Sudong Ji1, Guoxin Qu1, Lu Zhao1, Shaokai Wang5, Shida Wang1, Yizhen Li1, Haina Ci3,6,7, Maoyuan Li1, Zhongfan Liu2,3.
Abstract
Graphene films, fabricated by chemical vapor deposition (CVD) method, have exhibited superiorities in high crystallinity, thickness controllability, and large-scale uniformity. However, most synthesized graphene films are substrate-dependent, and usually fragile for practical application. Herein, a freestanding graphene film is prepared based on the CVD route. By using the etchable fabric substrate, a large-scale papyraceous freestanding graphene fabric film (FS-GFF) is obtained. The electrical conductivity of FS-GFF can be modulated from 50 to 2800 Ω sq-1 by tailoring the graphene layer thickness. Moreover, the FS-GFF can be further attached to various shaped objects by a simple rewetting manipulation with negligible changes of electric conductivity. Based on the advanced fabric structure, excellent electrical property, and high infrared emissivity, the FS-GFF is thus assembled into a flexible device with tunable infrared emissivity, which can achieve the adaptive camouflage ability in complicated backgrounds. This work provides an infusive insight into the fabrication of large-scale freestanding graphene fabric films, while promoting the exploration on the flexible infrared camouflage textiles.Entities:
Keywords: flexible devices; freestanding; graphene fabric film; infrared camouflage; rewetting
Year: 2021 PMID: 34914865 PMCID: PMC8844486 DOI: 10.1002/advs.202105004
Source DB: PubMed Journal: Adv Sci (Weinh) ISSN: 2198-3844 Impact factor: 16.806
Figure 1Fabrication of graphene@SiO2 fabric (G@SF) by the low‐pressure CVD (LPCVD) method. a) Schematic of the experimental design. 800 cm × 40 cm SiO2 fabric was rolled in the CVD chamber. b) 800 cm × 40 cm sized G@SF. c) Sheet resistance mapping of the G@SF. d) Raman spectra of G@SF. e) SEM image of the as‐fabricated G@SF. f) C 1s XPS spectrum of graphene layers.
Figure 2Fabrication of freestanding graphene fabric film (FS‐GFF). a) Schematic of the etching and drying process. b) The as‐fabricated ultralight FS‐GFF. c) SEM image of FS‐GFF with a fabric structure. d,e) atomic force microscope (AFM) (d) and TEM (e) characterizations of a single graphene ribbon in FS‐GFF. f) Sheet resistance mapping of G@SF (left) and the corresponding FS‐GFF (right). g) Photograph of a large‐scale FS‐GFF.
Figure 3Rewetting process and resoft mechanism of the FS‐GFF. a) FS‐GFF was transferred onto a shaped object. b) Finite element analysis of the resoft process. c) Schematic of graphene ribbon dispersion in organic solution. d) Resistance variation of the FS‐GFF rewet by different organic solutions. e) FS‐GFF on various shaped objects.
Figure 4Adjustable infrared camouflage (AIC) flexible textile based on FS‐GFF. a) Schematic of the (AIC) flexible textile device. b,c) Reflectance (b) and infrared emission spectra (c) of the AIC textile device by applying different voltages. d) Apparent temperature change of the AIC textile device by different voltages. e) Infrared camouflage ability of the AIC textile device under complicated environment.