Laser ablation in conjunction with Raman spectroscopy can be used to attain a controllable reduction of the thickness of exfoliated black phosphorus flakes and simultaneous measurement of the local temperature. However, this approach can be affected by several parameters, such as the thickness-dependent heat dissipation. Optical, thermal, and mechanical effects in the flakes and the substrate can influence the laser ablation and may become a source of artifacts on the measurement of the local temperature. In this work, we carry out a systematic investigation of the laser thinning of black phosphorus flakes on SiO2/Si substrates. The counterintuitive results from Raman thermometry are analyzed and elucidated with the help of numerical solutions of the problem, laying the groundwork for a controlled thinning process of this material.
Laser ablation in conjunction with Raman spectroscopy can be used to attain a controllable reduction of the thickness of exfoliated black phosphorus flakes and simultaneous measurement of the local temperature. However, this approach can be affected by several parameters, such as the thickness-dependent heat dissipation. Optical, thermal, and mechanical effects in the flakes and the substrate can influence the laser ablation and may become a source of artifacts on the measurement of the local temperature. In this work, we carry out a systematic investigation of the laser thinning of black phosphorus flakes on SiO2/Si substrates. The counterintuitive results from Raman thermometry are analyzed and elucidated with the help of numerical solutions of the problem, laying the groundwork for a controlled thinning process of this material.
Two-dimensional (2D) materials
are an emerging research field for
a wide range of applications.[1,2] Among these, orthorhombic
black phosphorus (BP) at the 2D limit presents intriguing thickness-dependent
optical and electronic properties, such as its direct bandgap ranging
from 0.3 eV in the bulk to 1.5 eV in a single layer.[3] Its strong in-plane anisotropy can also be exploited in
innovative device applications.[4−6] Finally, its high carrier mobility
allowed the use of BP in ultrathin field-effect transistors,[7,8] phototransistors,[9,10] heterojunctions diodes,[11] solar cells,[12] and
gas sensors.[13,14]Bottom-up approaches for
the synthesis of 2D phosphorus are limited
to the epitaxy of the so-called blue phosphorene allotrope,[15] which is endowed with an atomically precise
thickness but limited by the use of (111)-terminated Au substrates
as specific templates. Conversely, thin BP crystals can be produced
only by means of top down techniques, such as the mechanical and liquid
phase exfoliation,[16−18] but these methods lack an accurate control of the
thickness. Consequently, the exfoliation methods are often complemented
with additional thinning steps. Specifically, plasma etching,[19−21] thermal sublimation,[22] vacuum,[23] and rapid thermal annealing[24] methods have all demonstrated the capability to control
the thickness of the flakes down to the single layer.However,
all these thinning approaches do not allow for the control
of the thickness on individual flakes, which is necessary when such
flakes have an unknown initial thickness. A promising route in this
respect is represented by the laser-thinning technique,[25] demonstrated also for graphite and multilayer
MoS2.[26−28] In addition, when coupled with Raman spectroscopy,
laser thinning can benefit from the simultaneous control of thickness[29] and structural properties,[25] as well as the local measurement of the temperature,[30] a fundamental parameter for the control of the
ablation.The laser thinning of BP has been investigated in
the literature
using both high-power ultrafast pulsed laser sources[31,32] and low-power continuous-wave laser sources.[33,34] Most of these studies, however, focused on the final results without
a quantitative analysis of the optical and thermal effects that influence
this process, including parameters such as the thermal coupling with
the substrate and the illumination process.In this work we
want to fill this gap by carrying out a Raman thermometric
analysis of the laser heating and etching of BP. In particular, we
addressed the technologically relevant case of flakes in the range
from 1 μm down to 10 nm on SiO2/Si substrates. We
show that the threshold laser power for the ablation of BP crystals
depends on the thickness of the exfoliated flakes and that the conventional
experimental determination of the temperature by the Raman peak position
is affected by apparent inconsistencies. With a combined experimental
and numerical approach, we explain such results by analyzing the role
of optical interferences, the effect of the substrate, and the artifacts
related to a high-temperature gradient. Finally, we propose that estimating
the temperature by the Raman full width at half-maximum (fwhm) can
yield more accurate measurements for the thinning temperature of the
BP flakes.
Methods
Experimentals
In order to probe the
effects of optical interference, the experiments were carried out
on two thickness ranges, thick and thin flakes, as compared to the
angle-averaged laser penetration depth in BP, δBP = 100 nm.[35] Thick flakes in the range
of 0.3–1.2 μm were obtained by liquid phase exfoliation:
bulk BP crystals were sonicated for 3 h in an isopropyl alcohol solution,
centrifugated for 20 min, and drop-casted on SiO2/Si. Thin
BP flakes in the range between 10 and 120 nm, instead, were obtained
via tape exfoliation and transferred on SiO2/Si substrates.
The thickness was measured by atomic force microscope (AFM) using
a Bruker Dimension Edge instrument in tapping mode equipped with sharp
silicon probes (TESPA, Bruker) with a typical radius of curvature
in the 8–12 nm range. All the AFM and Raman characterizations
were carried out immediately after the exfoliation in order to avoid
the degradation of the BP flakes in ambient air[36−38] (although we
did not observe significant differences from fresh and aged samples
in the Raman response). Raman spectra were acquired with a Jobin-Yvon
T6400 spectrometer with a continuous-wave 532 nm excitation and a
100× (0.9 numerical aperture) objective. The focus diameter was
about 0.4 μm. The BP flakes were optically heated as pictured
in Figure a by controlling
the laser incident power with optical filters and a photodiode.
Figure 1
(a) Schematic
illustration of a laser-heating experiment carried
out on a SiO2/Si-supported black phosphorus crystal. (b)
Raman spectra acquired during a laser-heating and ablation experiment
on a thick flake. Inset: optical image of the flake showing the laser-ablated
region (circled in red) (c) Peak position of the Ag1, B2g, and Ag2 Raman modes as
a function of the incident power from the spectra (b). (d) Raman shift
of the Ag2 mode
as a function of the incident laser power for three different thin
BP flakes. The threshold power for the ablation of the flakes is indicated
by Pc, and its position is highlighted
by dashed lines in panel (c) and (d).
(a) Schematic
illustration of a laser-heating experiment carried
out on a SiO2/Si-supported black phosphorus crystal. (b)
Raman spectra acquired during a laser-heating and ablation experiment
on a thick flake. Inset: optical image of the flake showing the laser-ablated
region (circled in red) (c) Peak position of the Ag1, B2g, and Ag2 Raman modes as
a function of the incident power from the spectra (b). (d) Raman shift
of the Ag2 mode
as a function of the incident laser power for three different thin
BP flakes. The threshold power for the ablation of the flakes is indicated
by Pc, and its position is highlighted
by dashed lines in panel (c) and (d).
Modeling
Modeling was carried out
by solving a stationary heat equation with a finite element method
implemented in Mathematica (Wolfram Research). The effects of the
substrate were modeled imposing a room-temperature thermal bath boundary
condition at the bottom SiO2 interface. The anisotropic
thermal properties of BP were accounted for by an average in-plane
thermal conductivity of 28.8 W m–1 K–1 and a cross-plane conductivity of 4 W m–1 K–1.[39−42]
Results
Figure b reports
the spectra measured on a thick BP flake. The spectra were collected
after an exposure of 20 s for each power. The Raman measurements were
performed also varying the exposure time between 1 s and 10 min and
keeping the incident power fixed. However, in this situation, we did
not observe any significant change in the measured Raman spectra.
Thus, a 20 s laser exposure was chosen to provide a common time scale
for all the Raman measurements. For low incident powers, Pinc, all the measured spectra present the typical Raman
bands of BP: Ag1 (362 cm–1), B2g (439 cm–1), and Ag2 (467
cm–1). However, above the threshold of a critical
power Pc the spectra (highlighted in red
in Figure b) show
a marked reduction of the intensity of the BP bands accompanied by
the appearance of the 520 cm–1 band of the silicon
substrate. This effect is the result of a localized laser ablation
of the top layers of the flake similarly to that reported in refs (33 and 34) and can be also observed by a
local reflectivity change in the microscope image in the inset of Figure b.In Figure c we
report the wavenumber variation Δω of the three BP modes,
as a function of Pinc. In the low-power
region (Pinc < Pc), the linear red shifts of Δω indicate an increase
of the temperature. In this region of the curve the heating process
of the samples is reversible, meaning that if we reduce the power,
the Raman shift (and the intensity) will reduce accordingly following
the same curve. The marked difference observed between the slope,
χP = d(Δω)/dPinc, of the B2g, Ag2, and Ag1 Raman modes can be attributed to the different
nature of the corresponding atomic vibrations. The B2g and
Ag2 modes are
associated with in-plane atomic vibrations along the zigzag and armchair
direction of BP, respectively, whereas the Ag1 is mode is associated with the out-of-plane
atomic vibrations. Since the behavior of Δω for the three
Raman bands is the same (apart from a multiplication constant), we
can refer hereafter only to the Ag2 mode, which is the one with the better signal-to-noise
ratio and the strongest shifts. The observed threshold power Pc for the laser ablation of the flake corresponds
to an incident power just above the minimum of the Δω
curve in agreement with the Raman spectra of Figure b. With Δωc we denote
the highest |Δω| value measured just before the ablation
at Pc.. Above Pc, Δω changes in a nonmonotonous way following an oscillating
behavior. This apparently puzzling behavior will be explained later
in the discussion. For all the thick flakes the initial part of the
curve is always the same: Pc lies in the
16–20 mW range, Δωc is about −10
cm–1, and the slope χP is 6.3 ×
10–2 cm–1/W.Figure d reports
that thin BP flakes have a markedly different behavior. As opposed
to thick layers, Pc, Δωc, as well as the slope χP show pronounced
variations as can be inferred from the Δω of the Ag1 mode measured
for three different thin BP layers. In general, as compared to thick
layers, Pc takes higher values (varying
above 16 mW), |Δωc| is lower, and the slope
χP is lower. Additionally, also in this case Δω
changes in a nonmonotonous way above Pc.In Figure we report
a direct comparison of the case of a thick and a thin film. The value
of Δω can be used to estimate the average local temperature
increase ΔT caused by the laser optical heating.[43−45] Using a temperature-shift coefficient χT = dω/dT of 2.76 × 10–2 cm–1 K–1 reported in ref (43), the ablation temperature for thick BP flakes
is 410 °C, whereas for the thin BP flake it is 203 °C. Other
experimental values reported in the literature for χT[43,46−48] yield similar results. The typical
temperature Tc reported for the thermal
sublimation of BP lies within the 350–400 °C range.[22,49,50] This is compatible with the heating
of the thick BP film but not with the heating of the thin BP film,
suggesting that for the latter some other effects must be accounted
for.
Figure 2
Raman shift and fwhm of the Ag2 mode as a function of the incident laser power
for (a)–(c) a thick BP flake and (b)–(d) a thin flake.
Blue and red arrows indicate ablation and heating processes, respectively. Pc indicates the threshold incident laser power.
Raman shift and fwhm of the Ag2 mode as a function of the incident laser power
for (a)–(c) a thick BP flake and (b)–(d) a thin flake.
Blue and red arrows indicate ablation and heating processes, respectively. Pc indicates the threshold incident laser power.Figure c and d
show the power dependence of Γ, namely, the fwhm of the Ag2 band. The values
reported correspond to panels (a) and (b), respectively. We notice
again that in the low-power region Γ increases monotonically.
Since the fwhm is a monotonic increasing function of the temperature,[43,45,51] the behavior of Γ corroborates
the temperature increase within the Raman-probed region also observed
from the Raman shifts at Pinc < Pc. However, in this case the value of Γc, the highest Γ value measured just before the ablation
at Pc, is similar for the thick and thin
BP films (6.3 ± 0.1 and 5.6 ± 0.1 cm–1, respectively). This finding suggests that the ablation temperature
derived from Γ is indeed the same for thick and thin flakes.
This is reasonable since we expect that the sublimation temperature
of BP should not depend sensitively on the flake thickness in the
multilayer regime. However, this fact still does not help to explain
the anomalous behavior observed for Δωc. A
detailed understanding of this behavior involves a more in-depth discussion
of the process of absorption and diffusion of the incident optical
power, as well as a modeling of the process of Raman measurement (see
the next section).Once we observe that for thinner samples
Δωc is a function of thickness, the apparently
incoherent behavior consisting
of backward and forward shifts of Δω observed for Pinc > Pc can
be
explained as follows. The samples are heated until the local temperature
is above Tc. Then, there is an ablation
of material that locally reduces the thickness of the BP flake. Each
time that BP is thinned down, the material is characterized by a different
χP and a lower Δωc. With this
new thickness, the power must increase further in order to reach again
the critical temperature. The heating of the thinned flake continues
until we observe the occurrence of a second ablation sequence, with
a further change in χP and Δωc. In Figure such
cycles are highlighted by an alternation of red (heating) and blue
(ablation) arrows. For Pinc > Pc, the corresponding behavior of Γ reproduces
the sequence observed on the Δω curves. However, the modulation
in the Γ curves for Pinc > Pc is less pronounced than the modulation observed
in the Δω curves. Additionally, we notice that the value
of Γc remains nearly the same after each ablation
sequence of the flake. This fact again shows that Γ is a better
parameter to provide a local probe of the thinning temperature of
BP.
Discussion
Heat and Temperature Distribution
We numerically calculated the temperature generated in the BP flakes
by the optical absorption of the laser. For this purpose, we modeled
the inhomogeneous heat generated by the laser absorption inside the
material by a position-dependent heat source term Q̇(r, z):[52]where g(r, z)
is the Gaussian laser beam intensity profile, r0 is the laser beam radius, and R is the reflectance
calculated on the BP surface. The function f(z) describes both the attenuation due
to absorption and the modulation due to multiple interference among
the rays reflected at the interfaces (see ref (52)). Figure a reports the plot of the heat source term Q̇ in the case of a 70 nm thick BP flake. Inside the
BP region, Q̇ is attenuated exponentially in
the z-direction and modulated by oscillations caused
by multiple interferences. Inside the SiO2 region, instead,
the heat-source term is always zero since SiO2 is optically
transparent to the incoming radiation, and therefore, no heat can
be generated in its volume. For thick flakes the interference is negligible,
and f(z) follows the Beer–Lambert
attenuation law.
Figure 3
(a) Local heat distribution and (b) temperature for a
70 nm BP
flake supported on a SiO2 (50 nm)/Si substrate. The incident
power of 12.5 mW induces a 360 °C temperature on the top, corresponding
to the ablation temperature. (c) Plot of the threshold ablation power Pc as a function of the black phosphorus thickness.
The blue and red lines show the case of an ideal and realistic thermal
coupling at the BP/SiO2 interface, respectively.
(a) Local heat distribution and (b) temperature for a
70 nm BP
flake supported on a SiO2 (50 nm)/Si substrate. The incident
power of 12.5 mW induces a 360 °C temperature on the top, corresponding
to the ablation temperature. (c) Plot of the threshold ablation power Pc as a function of the black phosphorus thickness.
The blue and red lines show the case of an ideal and realistic thermal
coupling at the BP/SiO2 interface, respectively.Figure b plots
the temperature corresponding to the heat source in Figure a. The incident optical power Pinc was chosen to induce a surface temperature
at the threshold of the sublimation of BP. Within the range of temperatures
reported in the literature, we arbitrarily chose the value of 360
°C. Therefore, this value of Pinc corresponds to the Pc value observed
in the laser-thinning experiments.
Threshold
Ablation Power
The blue
curve of Figure c
shows the values of Pc as a function of
the flake thickness. The threshold ablation power is characterized
by an oscillating behavior as a function of the thickness, especially
in the case of thin flakes. This oscillating behavior of Pc is a consequence of the interferential modulation of
the absorbed light and explains the differences in the threshold ablation
power observed on thick and thin BP flakes. The modulation stops around
300 nm, which is consistent with our findings on thick flakes.While the blue curve is calculated with an infinite thermal boundary
conductance, the orange curve refers to a calculation performed including
the effects of a finite value for the thermal boundary conductance Gint = 5 MW m–2 K–1 at the BP/SiO2 interface. This value, although very low,[53] has the same order of magnitude of the thermal
boundary conductance experimentally measured at the interfaces between
highly dissimilar materials.[54] Although
the qualitative behavior is the same, we see that a low thermal boundary
conductance introduces a change in the modulation of Pc that turns out to be more pronounced in thin rather
than thick BP flakes. This fact indicates that for thin BP flakes
the heat dissipation mechanism is governed also by the thermal coupling
with the SiO2 interface rather than only by the intrinsic
thermal properties of BP.
Analysis of the Δω
Trend
The temperature dependence of the BP Raman peaks is
generally described
as the result of three effects:[51,55]ΔωA(T) is the shift caused
by the decay of phonons because of the phonon–phonon
anharmonic interaction.[45,51] The second term ΔωV(T) is related to the BP lattice thermal
expansion equation.[51] ΔωM(T) describes the effect of the mechanical
strain caused by the thermal expansion coefficient mismatch between
the BP flake and the underlying SiO2/Si substrate.[55] The second and third contributions of eq may introduce a thickness
dependence in the Δω because typically the mechanical
properties of thinner BP films are more influenced by the adjacent
substrate. The evaluation of the three terms can be observed in Figure in the 20–400
°C temperature range, which was calculated on the basis of the
data reported in the literature.[43,51] At Tc, ΔωA(T) brings the major contribution of about 6 cm–1. The mechanical strain effect, reflected in ΔωM(T), contributes with a positive shift of about
1 cm–1. The relatively less important contribution
of ΔωV(T) instead is less
than 1 cm–1.
Figure 4
Calculated temperature dependence of the
Raman shift of the Ag2 mode obtained
as the sum of the phonon–phonon anharmonic decay, lattice thermal
expansion, and mechanical strain of the substrate contributions. Sublimation
occurs in the range of temperatures marked by the red band.
Calculated temperature dependence of the
Raman shift of the Ag2 mode obtained
as the sum of the phonon–phonon anharmonic decay, lattice thermal
expansion, and mechanical strain of the substrate contributions. Sublimation
occurs in the range of temperatures marked by the red band.An additional cause that may influence the value
of Δω
is related to the existence of high-temperature gradients in thin
BP films caused by the heat sink effect of the supporting substrate.
Each Raman spectrum is the result of the scattering from different
regions of the sample illuminated by the laser. When the temperature
gradient is high, each region inside the scattering volume of the
sample contributes a significantly different Δω. Figure reports the Ag2 Raman line shapes
simulated for three BP flakes with different thicknesses. Each of
the three spectra is obtained by summing up all the contributions
from the regions inside the BP flake corresponding to the finite elements
of the simulation.[56,57] In the sum, each contribution
has been weighted with a position-dependent factor f(z)2g(r, z) that accounts for the nonuniform collection
of the Raman scattered radiation inside the illuminated region of
the flake. Finally, the calculations are performed assuming a surface
temperature of 360 °C for the three BP flakes. The sum of spectra
from hot and cold regions in the flake yields an apparent blue shift
of the overall Raman peak, which is up to 1 cm–1 for the thinnest films. This is a pure artifact of the averaging
process that occurs during the collection of the Raman-scattered light
from the sample.
Figure 5
Simulated spectral line shapes of the Ag2 Raman mode assuming a temperature
of
360 °C at the focal point on the top surface of three black phosphorus
flakes with different thicknesses. The blue shift of the Raman frequency
toward high wavenumbers in thinner flakes is due to the high-temperature
gradient.
Simulated spectral line shapes of the Ag2 Raman mode assuming a temperature
of
360 °C at the focal point on the top surface of three black phosphorus
flakes with different thicknesses. The blue shift of the Raman frequency
toward high wavenumbers in thinner flakes is due to the high-temperature
gradient.
Analysis
of Γ
Unlike Δω,
the temperature dependence of Γ is related only to the decay
of optical phonons due to the phonon–phonon anharmonic interaction.[43,45,51] Γ is not affected by the
volumetric expansion of the BP lattice and by the mechanical strain
effect. Using the parametric expression of Γ(T) reported in
ref (51) for a 20 nm
thick BP flake, we can extract the ablation temperature of BP using
the highest value of Γ measured just before the ablation, Γc, obtaining Tc = 360 °C for
the thin BP flake and Tc = 420 °C
for the thick BP flake in Figure . Both these values agree well with the thermal sublimation
temperature of BP.[22,49,50] This observation resolves the contradiction in the ablation temperatures
probed using the Δω values
in thick and thin BP flakes. For Pinc > Pc the ablation process reduces the thickness
of the flakes to values for which the absorption of the radiation
is lower due to the combined effect of optical interferences and heat
sink of the supporting Si/SiO2 substrate. The measured
temperature in the flake is, therefore, lower than the value determined
at the incident power where |Δω| and Γ assume the
highest value. This change of the temperature can therefore be observed
by both a slight decrease in the Γ values and the corresponding
blue shift of Δω at Pinc > Pc. However, our results show that despite the
fact that Δω is a quantity that can be measured with a
better accuracy it can be considered as a reproducible parameter for
the local measurement of temperature for thick BP flakes only. In
the case of thin flakes, instead a more trustworthy measurement of
the temperature is given by the value of Γ.
Conclusions
Laser ablation in conjunction with local measurement
of the temperature
by Raman spectroscopy can be used as a method for the controlled thinning
of BP. We carried out a systematic study on multilayer BP flakes supported
on SiO2/Si substrates aiming to observe the variation of
the Raman spectra as a function of the increasing laser power and
the advancement of the ablation process.We found that the threshold
incident optical power for the laser
ablation is reproducible for all thick layers but not for flakes below
hundreds of nanometers. In this thickness regime the threshold laser
ablation power is an oscillating function of the thickness since it
is affected by the interplay between the thermal coupling and optical
interference effects with the supporting substrate.Additionally,
we proved that a simple model for the temperature
dependence of the Raman shifts may lead to discrepancies when used
to probe the temperatures in multilayer BP flakes, especially at high
incident optical powers close to the ablation threshold. In particular,
beyond the contributions due to the phonon–phonon anharmonic
coupling, also the thermal expansion of the BP lattice and the mechanical
strain effect with the supporting substrate play a role. Moreover,
we also observed that the heat-sink effect of the substrate together
with the nonuniform Raman collection efficiency from the flakes may
alter the Raman shift values and the predicted temperatures at the
ablation.We considered also the temperature versus power dependence
of the
fwhm of the Raman bands. This quantity is mostly sensitive to the
anharmonic effects of the temperature and can be used as a reliable
indicator for its measurement at all the thickness ranges. In this
respect, the present study not only provides a better understanding
of the laser-thinning process in BP but also envisages a correct methodology
for the correct determination of the temperature from Raman optical
thermometry experiments.
Authors: A Castellanos-Gomez; M Barkelid; A M Goossens; V E Calado; H S J van der Zant; G A Steele Journal: Nano Lett Date: 2012-06-04 Impact factor: 11.189