Eran Zvuloni1, Adam Zrehen1, Tal Gilboa2,3, Amit Meller1. 1. Department of Biomedical Engineering, Technion-IIT, Haifa 32000, Israel. 2. Department of Pathology, Brigham and Women's Hospital, Harvard Medical School, Boston, Massachusetts 02115, United States. 3. Wyss Institute for Biologically Inspired Engineering, Harvard University, Boston, Massachusetts 02115, United States.
Abstract
Nanopores are single-molecule sensors capable of detecting and quantifying a broad range of unlabeled biomolecules including DNA and proteins. Nanopores' generic sensing principle has permitted the development of a vast range of biomolecular applications in genomics and proteomics, including single-molecule DNA sequencing and protein fingerprinting. Owing to their superior mechanical and electrical stability, many of the recent studies involved synthetic nanopores fabricated in thin solid-state membranes such as freestanding silicon nitride. However, to date, one of the bottlenecks in this field is the availability of a fast, reliable, and deterministic fabrication method capable of repeatedly forming small nanopores (i.e., sub 5 nm) in situ. Recently, it was demonstrated that a tightly focused laser beam can induce controlled etching of silicon nitride membranes suspended in buffered aqueous solutions. Herein, we demonstrate that nanopore laser drilling (LD) can produce nanopores deterministically to a prespecified size without user intervention. By optimizing the optical apparatus, and by designing a multistep control algorithm for the LD process, we demonstrate a fully automatic fabrication method for any user-defined nanopore size within minutes. The LD process results in a double bowl-shaped structure having a typical size of the laser point-spread function (PSF) at its openings. Numerical simulations of the characteristic LD nanopore shape provide conductance curves that fit the experimental result and support the idea that the pore is produced at the thinnest area formed by the back-to-back facings bowls. The presented LD fabrication method significantly enhances nanopore fabrication throughput and accuracy and hence can be adopted for a large range of biomolecular sensing applications.
Nanopores are single-molecule sensors capable of detecting and quantifying a broad range of unlabeled biomolecules including DNA and proteins. Nanopores' generic sensing principle has permitted the development of a vast range of biomolecular applications in genomics and proteomics, including single-molecule DNA sequencing and protein fingerprinting. Owing to their superior mechanical and electrical stability, many of the recent studies involved synthetic nanopores fabricated in thin solid-state membranes such as freestanding silicon nitride. However, to date, one of the bottlenecks in this field is the availability of a fast, reliable, and deterministic fabrication method capable of repeatedly forming small nanopores (i.e., sub 5 nm) in situ. Recently, it was demonstrated that a tightly focused laser beam can induce controlled etching of silicon nitride membranes suspended in buffered aqueous solutions. Herein, we demonstrate that nanopore laser drilling (LD) can produce nanopores deterministically to a prespecified size without user intervention. By optimizing the optical apparatus, and by designing a multistep control algorithm for the LD process, we demonstrate a fully automatic fabrication method for any user-defined nanopore size within minutes. The LD process results in a double bowl-shaped structure having a typical size of the laser point-spread function (PSF) at its openings. Numerical simulations of the characteristic LD nanopore shape provide conductance curves that fit the experimental result and support the idea that the pore is produced at the thinnest area formed by the back-to-back facings bowls. The presented LD fabrication method significantly enhances nanopore fabrication throughput and accuracy and hence can be adopted for a large range of biomolecular sensing applications.
Nanopores
have emerged as highly
versatile single-molecule sensors that can be adapted for a broad
range of biological applications, including genomics, epi-genomics,
transcriptomics, and proteomics.[1,2] To date, a variety of
nanopore sensors have been developed, such as protein nanopores, glass
nanocapillaries, and solid-state nanopores (ssNPs).[2−5] Regardless of the specific nanopore
class, they share the same generic sensing principle: The nanopore
is embedded or fabricated in an electrically insulating substrate,
which divides the space into two small liquid reservoirs filled with
an electrolyte solution. Since the nanopore serves as the only liquid
connection between the two chambers, when an external electric potential
is applied across it, a steady ionic flow occurs through the nanopore,
called the open-pore current (iO).[6] The convergence of the ion’s flow lines
in the nanopore’s vicinity creates a strong electric field
gradient that attracts and focuses charged biomolecules toward and
through the nanopore.[7] As the molecules
are entering the pore, they partially block the ion current allowing
real-time sensing of biomolecules from a dilute solution by simply
monitoring the time-dependent ion flow.One of the most remarkable
features of nanopores is their ability
to sense unlabeled biomolecules in solution. Much like classical gel
electrophoresis, which has been extensively used to sense multiple
kinds of biomolecules in bulk, nanopores have been adapted for basic
life sciences applications ranging from DNA sequencing to characterization
of DNA/protein interactions and detection of free proteins in solution.[8] Notably, recent studies even demonstrated ways
for using nanopores with clinical samples including monitoring biomarkers
in biofluids, such as plasma and saliva.[9−14] Moreover, nanopores have been suggested as key tools in futuristic
applications such as DNA-based information storage.[15−17] Among the various
nanopore types, planar ssNPs have been widely adapted for various
sensing goals, due to their mechanical robustness, the ability to
functionalize their surfaces using organic or inorganic treatments,[18] and the fact that they can be conveniently integrated
in microfluidic devices used for upstream sample processing.[19] The possibility of complementing the purely
electrical single-molecule sensing with opto-electrical modalities
has further extended the scope of ssNP-based sensing.[20−22] Overall, these developments have created a growing unmet need for
the development of highly robust, affordable, and deterministic ssNP
fabrication techniques with specific molecular dimensions of a few
nanometers.To date, the fabrication of ssNPs in thin membranes
has been accomplished
by several approaches. One common method used a tightly focused beam
of ions (e.g., Ga+)[23,24] in a Focused Ion Beam
(FIB) apparatus or electrons in a field-emission Transmission Electron
Microscope (TEM).[25,26] The energetic particles were
shown to be able to blast atoms from the membrane, ultimately creating
a nanopore at the desired point of impact. This approach is considered
highly controllable, yet to date has remained manual and involves
a dedicated trained user. Moreover, high-resolution TEM instruments
are expensive and are not designed for high fabrication throughput.
More recently, nanopore formation has been achieved by inducing stochastic
dielectric breakdown (DB) at defect sites in the membrane, followed
by enlargement of the pore with a series of high-amplitude electric
pulses.[27−29] In contrast to the TEM approach, the DB-based drilling
method is considered to be low-cost and accessible, and has the advantage
of producing ssNPs in the aqueous environment. However, as DB relies
on the breakdown and expansion of random defects in the membrane,
it may involve large variability in ssNP 3D shape, drilling time,
and pore location.[29]One alternative
to the current ssNPs drilling techniques is a laser-based
approach for in situ ssNP fabrication using photochemical
induced etching.[30] It was found that when
the laser’s photon energy is comparable to or larger than the
material’s electronic bandgap, a relatively low-power focused
laser beam may induce rapid photochemical etching of free-standing
SiN membranes in an aqueous environment.
Specifically, at alkaline conditions (pH 10), 50-nm-thick Si-rich
SiN membranes could be drilled in a few
minutes using a <10 mW blue laser beam.[31] This discovery enables the development of a robust, rapid, and most
importantly deterministic ssNP fabrication technique for molecular
size nanopores. To advance laser-based ssNP drilling, increase its
robustness, and ensure a highly deterministic fabrication, several
obstacles must be addressed. One challenge is to determine the conditions
that provide the greatest control over the rate and extent of each
of the fabrication steps (membrane thinning, nanopore formation, and
nanopore expansion). Having these conditions at hand, one can proceed
to develop and validate a computer-controlled strategy to obtain an
arbitrary ssNPsize with high probability and within short processing
time. Preferably, this approach would minimize or eliminate user intervention
in the processes, leading the way for high-throughput ssNP fabrication.In this study, we present a subwavelength autofocusing optical
design for drilling ssNPs, coupled to an end-to-end multistep algorithm
for controlling the entire drilling process. Importantly, we achieved
deterministic ssNP drilling with high accuracy and reproducibility.
Specifically, our optimized system can complete the ssNP drilling
within 2 min from beginning to end, with an error of less than 5%
in the open-pore conductance corresponding to a sub-nanometer error
in the pore dimensions. We numerically simulated the effect of the
Gaussian form-factor of the laser-drilled pores on the electric field
distribution and ionic current of the pores. Our results indicate
that while the general Ohmic behavior remains similar to TEM-drilled
nanopores, the distribution of the electrical field gradient near
the pore favors molecule capture due to the wider-field distribution
in the nanopore vicinity. The open-pore current calculated from the
simulations was fitted to experimental data to obtain a more realistic
approximation of ssNPs conductance dependence on pore diameter, as
compared with the widely used theoretical model of ssNP conductance.
We validated the functionality of the laser-drilled nanopore by performing
translocations of denatured proteins immediately after drilling, such
that the entire process of nanopore drilling and single-protein sensing
took less than 20 min.
Results and Discussion
Characterizing Laser Etching
Kinetics of Nanoscale Apertures
Before attempting to systematically
manipulate and control the
laser drilling (LD) process, we fabricated a custom sample that allows
a thorough investigation of the laser-based etching kinetics. We hypothesized
that as the full-width half-maximum (FWHM) of a tightly focused laser
beam is much larger than the typical ssNP diameter, if the etching
process is allowed to proceed freely it would result in the formation
of an aperture having a size roughly of the beam’s point spread
function (PSF), λ/(2 NA), where λ is the laser wavelength
and NA is the objective’s numerical aperture. However if the
laser etching is timely terminated, it would permit the formation
of ssNPs much smaller than the PSF size, and with fine control over
the process kinetics, it can be used to create nanopores with nanometer
resolution.To image the etching process using TEM, we fabricated
a two-layer model substrate consisting of a 50-nm-thick SiN on which a 10 nm TiO2 layer was deposited
by atomic layer deposition (ALD). Previous studies revealed that the
LD rate is extremely sensitive to the Si/N ratio in the free-standing
SiN film.[31] Specifically, nitride-rich membranes or stoichiometric Si3N4 were found to remain nearly intact even when irradiation
with high intensities of blue laser, whereas Si-rich membranes could
be readily etched at relatively low laser intensities, even when exposed
for brief lengths of time. This phenomenon is attributed to the smaller
bandgap of the Si-rich membranes, which permits efficient electron
excitation of the membrane by visible light. Consistent with this
result, we find that free-standing, high-bandgap materials such as
TiO2 (3.0 eV for rutile and 3.2 eV for anatase)[32,33] remain intact even after extremely long (>300 s) and high-intensity
(>30 mW) 488 nm laser irradiation focused to a diffraction-limited
spot. Therefore, the TiO2 layer deposited on top of a the
SiN membrane may provide a convenient
means for analyzing the thinning progress using high-resolution TEM
combined with nanoscopic elemental analysis in which silicon, nitrogen,
titanium, and oxygen are easily distinguished.Figure a displays
a TEM (FEI Titan Cubed Themis G2) image of the composite SiN/TiO2 50/10 nm membrane after illuminating
the membrane with a focused 488 nm laser beam (18 mW measured before
the objective lens; see Figure a) for variable doses from 5 to 60 s, as indicated. An additional
dose (t = 110 s) was performed as a long-time reference
point, noting that longer exposures (roughly above 2 min) may not
produce consistent results due to slow mechanical drift of the stage.
We used high Si content (n = 2.42) material deposited
by low pressure chemical vapor deposition (LPCVD) and submerged in
alkaline solution (pH 10) in this experiment. Based on previous studies,[31] these conditions are expected to result in nanopore
formation in just a few seconds, should we use the bare SiN membrane. We find, however, that the 10 nm TiO2 layer prevents nanopore formation up to roughly 60 s of irradiation,
while providing a strong contrast for imaging of the resulting nanowells
using high resolution TEM. The FWHM of the nanowells as a function
of the laser irradiation is shown in Figure b. Interestingly, and in accordance with
previous reports, we see that laser etching can form sub-PSF-sized
nanowells, with a diameter that is linearly dependent on the laser
exposure time, ranging from about 20 to 250 nm. Moreover, a closer
examination of the nanowell intensity suggests that for doses smaller
than about 35 s, the intensity appears to be brighter than at later
times. To further evaluate this finding, we performed energy dispersive
X-ray spectroscopy (EDS) analysis of the nanowells by integrating
the signal from a fixed area centered around each of the spots. As
summarized in Figure c, Si and N atoms are depleted as time progresses, reaching a plateau
at about 30 s. At the same time, and as expected, the content of Ti
and O atoms rises in the first 30 s, reaching nearly 30% and 60%,
respectively, for t > 30 s.
Figure 1
Characterization of the
laser-drilling (LD) kinetics using transmission
electron microscopy (TEM). (a) Left: A series of etch marks applied
by the 488 nm laser at varying doses, imaged with TEM. The dose increases
in 5 s increments from 5 to 60 s, with an additional overetching dose
of 110 s. (b) Analysis of the FWHM obtained at different doses. The
laser forms nanowells with a diameter that is linearly dependent on
the laser dose. Inset: A schematic of the specimen used in this study.
The 50 nm silicon nitride (SiN) free-standing
membrane was coated with a thin 10 nm layer of TiO2, and
the structure was etched by the Gaussian laser beam. (c) Elemental
analysis by energy dispersive X-ray spectroscopy (EDS). The elemental
compositions of the 5, 10, 20, 35, and 60 s etch marks were measured.
The background was used for the 0 s point. The atomic fractions of
the TiO2 elements increase, while the SiN elements decrease, demonstrating that LD depletes only specific
elemental components of the membrane.
Figure 2
System
design and laser drilling time traces. (a) Optical setup
overview. The 405 nm continuous-wave laser is transmitted into the
objective and focused on the membrane, where the reflected light is
long-pass-filtered to measure photoluminescence (PL) by the sCMOS
camera. The applied voltage, laser power, ND filters, camera, and
piezo stage are fully controlled by custom LabVIEW software (gray
dashed arrows). The laser power is measured before the objective lens
(black dashed line). (b) Schematic of the software designed to run
the nanopore laser drilling algorithm (NLDA). The user sets the chip
above the objective, positions the laser, and presses the start button.
Then, the autofocus is activated, followed by the NLDA. The inputs
(described in Methods section) are used to
ensure convergence to the set nanopore value. (c) NLDA three main
steps: thinning, drilling, and polishing. For display purposes only,
the photoluminescence (PL, red) and current (blue) traces are smoothed
and interpolated, thereby allowing a clear representation during the
process (see SI Figure 3 for the raw data).
During the experiment, the PL decreases, indicating local thinning,
while the current rises to the target open-pore current level. The
pulse intensities and durations are represented by the violet trace.
During the thinning step, the laser exposure is continuous. Starting
from the drilling step, the laser is set to pulse mode, so the intensity
trace is fragmented with increasing intensity and duration. In the
polishing phase, the pulses are set to be short and weak since the
current is susceptible to rapid increases. (d) Pore stabilization,
demonstrating how the open-pore current is maintained over 20 min.
The NLDA parameters used in this example, inputs: P0 = 14.4 mW, P+ = 1%, , It = 6 nA;
parameters: t0 = 100 ms, d = 1 s, tIPDl = 2 s, tIPDs = 1 s, γ = 1.2, φTH = 1 nA, ρTH = 0.8, ψTH = 1 nA, R = 2.
Characterization of the
laser-drilling (LD) kinetics using transmission
electron microscopy (TEM). (a) Left: A series of etch marks applied
by the 488 nm laser at varying doses, imaged with TEM. The dose increases
in 5 s increments from 5 to 60 s, with an additional overetching dose
of 110 s. (b) Analysis of the FWHM obtained at different doses. The
laser forms nanowells with a diameter that is linearly dependent on
the laser dose. Inset: A schematic of the specimen used in this study.
The 50 nm silicon nitride (SiN) free-standing
membrane was coated with a thin 10 nm layer of TiO2, and
the structure was etched by the Gaussian laser beam. (c) Elemental
analysis by energy dispersive X-ray spectroscopy (EDS). The elemental
compositions of the 5, 10, 20, 35, and 60 s etch marks were measured.
The background was used for the 0 s point. The atomic fractions of
the TiO2 elements increase, while the SiN elements decrease, demonstrating that LD depletes only specific
elemental components of the membrane.System
design and laser drilling time traces. (a) Optical setup
overview. The 405 nm continuous-wave laser is transmitted into the
objective and focused on the membrane, where the reflected light is
long-pass-filtered to measure photoluminescence (PL) by the sCMOS
camera. The applied voltage, laser power, ND filters, camera, and
piezo stage are fully controlled by custom LabVIEW software (gray
dashed arrows). The laser power is measured before the objective lens
(black dashed line). (b) Schematic of the software designed to run
the nanopore laser drilling algorithm (NLDA). The user sets the chip
above the objective, positions the laser, and presses the start button.
Then, the autofocus is activated, followed by the NLDA. The inputs
(described in Methods section) are used to
ensure convergence to the set nanopore value. (c) NLDA three main
steps: thinning, drilling, and polishing. For display purposes only,
the photoluminescence (PL, red) and current (blue) traces are smoothed
and interpolated, thereby allowing a clear representation during the
process (see SI Figure 3 for the raw data).
During the experiment, the PL decreases, indicating local thinning,
while the current rises to the target open-pore current level. The
pulse intensities and durations are represented by the violet trace.
During the thinning step, the laser exposure is continuous. Starting
from the drilling step, the laser is set to pulse mode, so the intensity
trace is fragmented with increasing intensity and duration. In the
polishing phase, the pulses are set to be short and weak since the
current is susceptible to rapid increases. (d) Pore stabilization,
demonstrating how the open-pore current is maintained over 20 min.
The NLDA parameters used in this example, inputs: P0 = 14.4 mW, P+ = 1%, , It = 6 nA;
parameters: t0 = 100 ms, d = 1 s, tIPDl = 2 s, tIPDs = 1 s, γ = 1.2, φTH = 1 nA, ρTH = 0.8, ψTH = 1 nA, R = 2.The results shown in Figure demonstrate that during the laser etching process, the TiO2 layer remained intact, while the Si and N atoms were evacuated
to the surrounding hydroxyl-rich aqueous solution. Interestingly,
the process kinetics indicate that even after a short exposure, the
TiO2 layer becomes exposed with the formation of a sub-PSF
nanowell: starting from a 5:1 ratio of SiN/TiO2 based on the initial layer thicknesses, one can
see a steep inversion in the elemental composition already at the
10 s time point. These results demonstrate the capability of a submicrometer
optical beam to controllably form nanoscale wells. Evidently, a key
to the process is maintaining the tightly and well-controlled laser
focus at the membrane position and monitoring the process with a real-time
algorithm. These are key features for the development of a deterministic
LD method.
Applying Real-Time Feedback Control for Deterministic
LD of
ssNPs
To facilitate the optical feedback process and permit
precise autofocusing, we designed an optomechanical system and developed
a computer program to control the entire LD process, as shown schematically
in Figure , panel
a and panel b, respectively. The optical design includes a 405 nm
CW laser coupled to a single-mode polarization preserving fiber. The
single-mode fiber is used as a spatial filter ensuring a clean TEM00 mode, which is crucial for producing a diffraction-limited
Gaussian laser spot. Before entering the microscope, the beam is expanded
using a telescope made by two achromatic lenses forming an effective
5× magnifying telescope, which ensures the microscope objective
back-aperture is filled. The beam intensity is software-controlled
by a variable intensity module and an on/off digital port switch for
millisecond-scale intensity adjustment. This feature proved to be
essential to the algorithm developed here, increasing its ability
to deal with different membrane structures, thickness variations,
etc. In this study, we used a 63×/1.15 NA water immersion objective
with a long working distance to permit focusing with minimal stress
on the bottom cover slide. The sample is mounted on an XYZ piezo nanopositioner
for accurate placement of the sample in front of the objective lens.
The emitted light from the sample is filtered using a long-pass filter
and is imaged using a scientific CMOS (sCMOS) camera. The camera is
used to find and center the SiN window
using white light illumination; to automatically focus the beam prior
to drilling; and to measure photoluminescence (PL) during drilling.
The sCMOS has a large dynamic range, which by using image processing
allows one to compute the PL at various laser intensities. Accordingly,
The PL is calculated by summing the 3-by-3 neighborhood of the brightest
pixel in the frame.We find that precise focusing of the beam
at the membrane plane is critical for successful and reproducible
LD. A slight shift in the z of even less than 100
nm may inhibit the LD process. To that end, we implemented a simple
“search and find” focusing algorithm which converges
within typically 10–15 s to the exact focus. SI Figure 1 shows the main aspects of the autofocus process.
First, the PL PSF is imaged and fitted by a Gaussian function to extract
its amplitude and width. Then, the software moves the stage along
the z-axis in a stepwise manner converging to the
optimal focus (within 50 nm resolution) by maximizing the intensity.
We define a minimization parameter, δ, which corresponds to
the normalized distance from the focus point, where the highest PL
value is measured along the z-axis. Minimizing δ
equalizes the initial conditions for the subsequent drilling process,
thus keeping the process robust and effective.Figure b shows
schematically the general flow of the LD process, which is controlled
by the nanopore laser drilling algorithm (NLDA), integrated into our
software (see SI Figure 2 for the graphical
user interface). The core algorithm was designed to be a “one-button”
program; i.e., the user loads the chip into its position, sets the
laser in the desired X–Y location,
dials the desired nanopore size, and pushes a “GO” button.
A pseudocode representation of the algorithm is provided in the Supporting Information (SI Algorithm 1) along
with an explanation of the variables and parameters with their notations
(SI List 1). The algorithm consists of
several main blocks to handle the four steps of the LD process (Figure b): thinning, drilling,
polishing, and stabilization. During the thinning phase, the membrane
is continuously irradiated by the laser, resulting in a rapid local
thinning which can be monitored by a corresponding decrease in PL
intensity. This step is concluded when the software determines the
formation of a pore based on monitoring the ion current time derivative, δI/δt. Pore drilling and polishing
involve software modulated laser pulsing, which uses feedback Ohmic
(DC) measurements of the pore conductance. Finally, pore stabilization
occurs with the laser fully blocked. The rationale for this strategy
is based on the observation that abrupt changes in the laser intensity
(or large dP/dt values) induce SiN membrane charging or discharging, which
in turn produces large jumps in the ion current followed by relaxation
to a steady level. Therefore, to determine the unbiased Ohmic conductance,
the software switches off the laser and waits for the current to stabilize.In Figure c,d,
we provide a typical account of the entire ssNP drilling process,
which commences after the autofocusing step is done. Figure c shows time traces of the
laser intensity (violet), PL intensity (red), and the nanopore ion
current (blue) during the first three steps of the process: membrane
thinning, nanopore drilling, and nanopore polishing. Gaps in the laser
intensity plot represent the time intervals in which the software
turns off the laser. In this example, the user sets the target open-pore
current (It) to 6 nA (conductance of 20
nS). Once the NLDA determines that the set value has been reached,
the system blocks the laser and begins the stabilization step, which
typically lasts a few minutes. Typically, 2–3 min is sufficient
for the stabilization, but in Figure d we show a continuous current measurement of 20 min
to illustrate its long-term stability.The main complication
in LD in comparison to classical control
systems is that at present it is only possible to expand nanopores
and not to controllably contract them. Therefore, the NLDA must converge
to its target current on its first trial (“overshoots”
are not allowed). Importantly, maximum sensitivity in the measurement, required in the thinning step, is achieved by
continuously calculating the ion current gradient (δI/δt) of a smoothed
version of the current trace. The thinning step is terminated when
the software detects the condition δI/δt ≥ ηTH where ηTH is a predetermined threshold (e.g., 4 ) common to all chips
in a given batch (∼200
units). This threshold, indicated in the inset of Figure c by a red line, signals the
initial formation of the nanopore and the first penetration of electrolytes
through the membrane. We observe an abrupt positive change in δI/δt values, used to trigger
laser shutoff and the end of the thinning step. During the drilling
and polishing steps, maximum accuracy is achieved by relying on DC
Ohmic measurements of the pore conductance when the laser is off.
Here, we apply laser pulses of about 100 ms, which are modulated by
three parameters: (i) the pulse duration tpulse, (ii) the pulse power P, and (iii) the interpulse
delay time tIPD. These parameters are
tuned in real-time based on the ion-current measurements during the
previous interpulse delays. The Methods section
provides additional information regarding the laser pulsing control.
Deterministic and Rapid Nanopore LD
Using the fabrication
method implemented by the NLDA, we could efficiently and deterministically
drill stable ssNPs with an average size of 4 nm, as estimated by our
model (see below) and validated by translocation experiments. Once
the NLDA was fully optimized, the mean drilling time was just a few
minutes, equivalent to or shorter than previous reports of laser-based
ssNP drilling[30,31,34] and substantially shorter than other ssNP drilling methods when
considering the deterministic size control feature. In Figure , we present a summary of 42
NLDA experiments, each resulting in a drilled ssNP. The overall drilling
time (including thinning, drilling, and polishing) is shown in Figure a. We did not include
the stabilization time, as this is an optional step that is often
used with all other nanopore drilling strategies. The histogram is
fitted using a normal distribution, with a mean value of 84 s and
a STD of 42 s. The large STD in the drilling time can be attributed
to the fact that each of the chips was manually assembled in the holder,
and in addition, each chip was selected from a different area in the
wafer where slight variances in membrane thickness and Si/N composition
exist, both of which impact the drilling time of the NLDA.
Figure 3
Samples of
nanopore laser-drilling algorithm (NLDA) experiments.
(a) Drilling time statistics. Histogram of the drilling time (not
including stabilization) fitted using a Gaussian function. The mean
and STD are indicated. (b) Final open-pore current Iresult with respect to the set target size by the NLDA It. Whiskers show 1 STD, and outliers are marked
with red asterisks. The gray line is linearly fitted to the group
mean values (gray points) obtaining slope = 1.026 ± 0.062. (c)
Histogram of the deviation of the final current from the target current
Δ = Iresult – It. NLDA achieves an error of <5%. (d) Three representative
NLDA examples taken from the population presented in panel c. Each
one was set with a different It of 3 nA,
4 nA, and 6 nA, and obtained drilling times of 85.4 s, 26.3 s, and
52.3 s, respectively, from top to bottom. The stability of the nanopore
open-pore current up to 5 min is presented for each trace.
Samples of
nanopore laser-drilling algorithm (NLDA) experiments.
(a) Drilling time statistics. Histogram of the drilling time (not
including stabilization) fitted using a Gaussian function. The mean
and STD are indicated. (b) Final open-pore current Iresult with respect to the set target size by the NLDA It. Whiskers show 1 STD, and outliers are marked
with red asterisks. The gray line is linearly fitted to the group
mean values (gray points) obtaining slope = 1.026 ± 0.062. (c)
Histogram of the deviation of the final current from the target current
Δ = Iresult – It. NLDA achieves an error of <5%. (d) Three representative
NLDA examples taken from the population presented in panel c. Each
one was set with a different It of 3 nA,
4 nA, and 6 nA, and obtained drilling times of 85.4 s, 26.3 s, and
52.3 s, respectively, from top to bottom. The stability of the nanopore
open-pore current up to 5 min is presented for each trace.The boxplot in Figure b displays the NLDA performance for different set target values It. Each of the boxes represents a different
target for a group of experiments with respect to the actual final
open-pore current obtained, Iresult. Each
box is statistically separated from its neighbors, where overlapping
is found only outside of the majorities. In addition, it demonstrates
the process uniformity, where the behavior is similar, regardless
of the fabricated nanopore size. The gray line is a linear fit between
the Iresult and It having a slope = 1.026 ± 0.062. Figure c displays the overall performances (as in Figure a), showing the deviation
of Iresult from It. As can be seen, based on the statistics of 42 nanopores
drilled using a range of It from 2 nm
to 8 nA, a mean error of 0.2 nA (equivalent to ∼0.67 nS) between
the set value and the stabilized open-pore current is obtained. This
corresponds to a less than 5% mean error in achieving the set point
current or a roughly 2.5% error in the corresponding calculated ssNP
diameter. Three typical ssNP LD traces are shown in Figure d having an It of 3 nA, 4 nA, and 6 nA from top to bottom, respectively
(all measured with V = 300 mV). Notably, NLDA achieved
the desired levels within 26 to 86 s, before the pores were left for
a few minutes of stabilization.
Investigating the NLDA-Fabricated
ssNP 3D Shape
After
developing the NLDA for rapid and deterministic ssNP fabrication,
we asked whether the special pore form-factor produced by the Gaussian
laser beam has an impact on the nanopore’s performance. Nanopore
conductance is generally affected by both the in-pore resistance and
the access resistance, modeled according towhere heff is
the membrane effective thickness, d is the nanopore
diameter, and σ is the solution specific conductivity. Equation represents a simplified
approximation of the physical ssNP shape as a perfect cylinder and
ignores additional effects such as surface roughness and surface charge.
Nevertheless, it is practically useful in providing an idea of the
ssNP dimensions based on the measured conductance and has often been
used to approximate the ssNP diameter. Importantly, however, not only
the Ohmic characteristics of the nanopore determine its ability to
efficiently sense biomolecules. In addition to the pore conductance,
the electrical field distribution outside the pore E⃗(z, r) affects the rate at which
charged biomolecules are transported to the nanopore prior to their
entry, hence playing an important role in the functionality of the
device.[7] Therefore, when determining the
ssNP performance, it is essential to consider not only its diameter
and the membrane thickness, but also its physical shape beyond the
narrowest constriction.Previous investigations of TEM-drilled
nanopores suggested an approximately hourglass form factor with a
cone angle of roughly 30° and an effective thickness of roughly
1/3 of the membrane nominal thickness.[35] For LD ssNPs, TEM-based thickness profiling of the membrane demonstrated
that the membrane thinning follows a Gaussian profile having the dimensions
of the tightly focused laser beam.[30] As
photoinduced etching may occur symmetrically on both sides of the
membrane, it is likely that the actual nanowell shape formed by the
laser includes two back-to-back Gaussian “bowls” connected
by the nanopore. This structure resembles to some extent the “hourglass”
shape of nanopores created by the TEM drilling, except with a much
wider opening.To gain deeper insight into the LD ssNP properties,
we performed
numerical simulations using COMSOL Multiphysics (COMSOL, Inc.) of
the electrical potential V(z, r) and electrical field via the ion current density vector J⃗(z, r) = σE⃗(z, r),
as shown in Figure a and in SI Figure 4. To provide context
to our simulations, we compared it with a naive (perfect cylinder)
and hourglass nanopore of similar dimensions, as indicated. Line profiles
of the z-components of J⃗(z, r) suggest that the LD ssNP
electrical field decays away from the ssNP (z axis
and r = 0) in a similar fashion as the TEM drilled
ssNP (hourglass), as shown on the leftmost panel on Figure b. However, in the pore vicinity
the electrical field z-component extends to a much
broader range as compared with the other form factors, as shown in
the Figure b right
panel, suggesting potentially better biomolecule focusing and capture.
We note, however, that an experimental confirmation of this observation
would require extensive investigation of the precise nanopore form
factors using TEM tomography or alternative approaches that are beyond
the scope of this study.
Figure 4
Numerical simulations of the spatial distributions
of the electrical
potential and current density in the vicinity of ssNPs having either
a perfect cylinder, hourglass, or Gaussian form factors. (a) Simulated
spatial distributions of the current density z-component
(J, top row) and the
electric potential (bottom row) distributions using the three form
factors, as indicated (d = 4.2 nm). The Gaussian
form factor’s thickness profile assumed a λ = 405 nm
Gaussian laser’s beam. The X axis is obtained
by cylindrical reconstruction. (b) Left and right panels show Z and X cross sections of the J calculated along the yellow and black
lines in panel a, respectively. Solid and dashed lines correspond
to 4.2- and 10.6-nm-diameter pores, respectively. (c) Numerical evaluation
of the nanopore conductance G at different diameters d from the simulations. Data was globally fitted using eq (solid lines) as described
in the text. Green symbols represent the nanopore diameters obtained
in the experiments from Figure that were computed according to the measured conductance.
Numerical simulations of the spatial distributions
of the electrical
potential and current density in the vicinity of ssNPs having either
a perfect cylinder, hourglass, or Gaussian form factors. (a) Simulated
spatial distributions of the current density z-component
(J, top row) and the
electric potential (bottom row) distributions using the three form
factors, as indicated (d = 4.2 nm). The Gaussian
form factor’s thickness profile assumed a λ = 405 nm
Gaussian laser’s beam. The X axis is obtained
by cylindrical reconstruction. (b) Left and right panels show Z and X cross sections of the J calculated along the yellow and black
lines in panel a, respectively. Solid and dashed lines correspond
to 4.2- and 10.6-nm-diameter pores, respectively. (c) Numerical evaluation
of the nanopore conductance G at different diameters d from the simulations. Data was globally fitted using eq (solid lines) as described
in the text. Green symbols represent the nanopore diameters obtained
in the experiments from Figure that were computed according to the measured conductance.The numerical simulations of the ion current density
may be used
to evaluate the accuracy of the simplified theoretical description
presented in eq , for
each of the nanopore form factors (cylinder, hourglass, and Gaussian).
To that end, we used the numerical simulations to calculate the open-pore
current (see Supporting Information section
IV) and divided by the full potential drop to obtain the conductance G(d) as a function of the pore diameter.
Our results are presented in Figure c with the axes inverted to show d(G), as the nanopore conductance is readily measured
in experiments, whereas its diameter is not as easily determined.
Using eq , we globally fit the three data sets, fixing heff of the naive (a perfect cylinder) pore to the membrane
nominal thickness (50 nm) and forcing a single value for the specific
solution conductance. From the fits, we obtained σ = 26.86 ±
0.54 (Ω nm)−1; heff(HG) = 28.6 ± 0.8 nm; heff(LD) =
17.5 ± 0.5 nm. Returning to Figure , we added on top of the numerically simulated
LD pore the 42 experimentally measured NLDA nanopores. This allowed
us to estimate the pore diameter from the measured conductance subject
to the assumptions made in the numerical simulation. As shown in the Figure c, the nanopore sizes
were between 2.5 and 5 nm, within the expected range based on the
protein translocation results.
Translocation Analysis
of SDS-Denatured Carbonic Anhydrase Proteins
To validate
the ability of the NLDA to fabricate functional ssNPs,
we measured SDS-denatured Carbonic Anhydrase II (CA2) translocations
right after LD. CA2 is a 260-amino-acid-long protein (pI 6.87), which
is negatively charged in the alkaline LD buffer. The protein was added
to the cis chamber of the setup with a final concentration
of 10 nM. Importantly, to maintain the proteins’ denatured
state, translocations were performed in the presence of SDS (see Methods section for more details). Figure a displays a characteristic
NLDA trace achieving a stable 13 nS ssNP (about 4 nA at 300 mV), in
less than 30 s. According to the LD conductance simulations (Figure c) this corresponds
to a ∼3.5 nm ssNP diameter. After ∼11 s of membrane
thinning, the program started the pore polishing, terminating the
process after 7 laser “pulses” when achieving the target
open-pore current (It = 4 nA). Inset displays
bright light images showing the PL spot before pore formation (left)
and the same area after pore formation (right, laser off). The nanopore
measured I–V curve is shown
in SI Figure 5. As in the NLDA process,
the next steps take place under voltage of V = 300
mV as well. Right after the ssNP stabilized, we added the protein
and SDS sample to the cis chamber and recorded translocation
events for about 20 min. We noted that upon analyte addition the open-pore
current (IO) slightly increased to about
4.6 nA and remained stable throughout the experiment with IO = 4.65 ± 0.05 nA (mean ± STD). Figure b top panel displays IO measured in between the events. The bottom
panel in Figure b
displays an event diagram (the fractional current IB versus event dwell time tD shown in logarithmic scale) consisting of 358 translocation events
plotted on top of a heat map representing the 2D histogram density.
As can be seen, we obtained relatively deep and long translocation
dwell times, suggesting that the nanopore is only slightly larger
than the SDS denatured polypeptide chain. Histograms of the fractional
current blockage and dwell time yield mean values of 0.43 ± 0.04
and 900 ± 95 μs, respectively (SI Figure 6). These values qualitatively agree with a nominal thickness
of the SDS denatured polypeptide chain of about 2 nm. Notably, since
the CA2 pI is ∼6.87, when using our pH 10 buffer we expected
to obtain a beneficial negative charge that can assist with drawing
the proteins from the cis reservoir to the trans one, according to the applied electric field. The
relatively long measured dwell time of the proteins may suggest a
relatively small charge/mass ratio and/or preferable interactions
with the ssNP wall, presumably mediated by the SDS molecules.
Figure 5
SDS-denatured
carbonic anhydrase II protein (CA2) translocations
using a laser-drilled nanopore. (a) NLDA process, showing the PL and
ion current traces during thinning and drilling. The processes lasted
30 s, where the target open-pore current was It = 4 nA. Inset shows bright light before pore formation (PL
spot visible, violet circle) and thinned area after drilling (laser
off, red circle). (b) Nanopore stability during translocations of
SDS-denatured CA2. Top: After addition of the CA2 analytes and SDS
molecules, the open-pore current (IO)
increased to 4.65 nA and remained stable during at least 20 min of
recording the CA2 translocations. Right panel shows IO values in-between the events and its histogram fitted
to a Gaussian function 4.65 ± 0.05 nA (mean ± STD). Bottom:
a scatter plot of the fractional blocked current and dwell time tD for the 437 translocation events collected
in about 20 min. The scatter plot is superimposed on a heat map representing
the 2D histogram density. Inset shows typical translocation events.
SDS-denatured
carbonic anhydrase II protein (CA2) translocations
using a laser-drilled nanopore. (a) NLDA process, showing the PL and
ion current traces during thinning and drilling. The processes lasted
30 s, where the target open-pore current was It = 4 nA. Inset shows bright light before pore formation (PL
spot visible, violet circle) and thinned area after drilling (laser
off, red circle). (b) Nanopore stability during translocations of
SDS-denatured CA2. Top: After addition of the CA2 analytes and SDS
molecules, the open-pore current (IO)
increased to 4.65 nA and remained stable during at least 20 min of
recording the CA2 translocations. Right panel shows IO values in-between the events and its histogram fitted
to a Gaussian function 4.65 ± 0.05 nA (mean ± STD). Bottom:
a scatter plot of the fractional blocked current and dwell time tD for the 437 translocation events collected
in about 20 min. The scatter plot is superimposed on a heat map representing
the 2D histogram density. Inset shows typical translocation events.
Photochemical Etching Mechanism
The ability to consistently
fabricate large numbers of ssNPs in an unattended manner facilitates
further investigation into the photochemical laser etching process.
Our previous studies indicated that low-intensity/time-efficient LD
requires Si-rich SiN membranes and alkaline
conditions (i.e., pH 10).[31] When the laser
energy is greater than the material bandgap energy, the laser irradiation
generates electron–hole pairs within the SiN surface and charge transfer at the liquid–solid interface.
This surface charging catalyzes a rapid photochemical etching of the
membrane at the beam center. The etching progresses into the membrane
resulting in a shape that roughly replicates the Gaussian beam profile.
Importantly, however, as the thinning process progresses, the interfacial
charges from the two sides of the membrane may gradually repel each
other, creating a charge depletion zone. The localized charge depletion
zone slows down the etching kinetics, prior to the eventual formation
of the nanopore, as schematically depicted in Figure a.
Figure 6
(a) Schematic (not to scale) model for the photochemical
SiN membrane thinning leading to pore
formation.
A charge depletion zone is generated by the thinning process. (b)
Characteristic photoluminescence (PL) intensity trace during membrane
thinning showing a fast decay followed by a slow decay. The processes
are approximated by a sum of two decaying exponentials with rate constants
λ1 and λ2. Analysis of 15 membrane
thinning traces consistently yield two decaying rates differing by
2 orders of magnitude (inset, boxplot is defined as in Figure ).
(a) Schematic (not to scale) model for the photochemical
SiN membrane thinning leading to pore
formation.
A charge depletion zone is generated by the thinning process. (b)
Characteristic photoluminescence (PL) intensity trace during membrane
thinning showing a fast decay followed by a slow decay. The processes
are approximated by a sum of two decaying exponentials with rate constants
λ1 and λ2. Analysis of 15 membrane
thinning traces consistently yield two decaying rates differing by
2 orders of magnitude (inset, boxplot is defined as in Figure ).To check this hypothesis, we analyzed the photoluminescence time
traces during the membrane thinning stage of 15 LD trials, as defined
by the NLDA. We observed a characteristic rapid reduction in PL intensity,
followed by a slower decay over longer times (Figure b). We empirically fitted the processes by
a sum of two decaying exponential functions, which yielded two clearly
distinct rate constants (λ1 = 0.343 ± 0.008
s–1 and λ2 = (60.0 ± 0.7)
× 10–4 s–1 differing by more
than 2 orders of magnitude (additional examples for such traces are
found in SI Figure 7). Upon the creation
of a nanopore (signaled by the ion current jump), the membrane thinning
step is terminated and the nanopore expansion/polishing starts. We
checked if nanopore expansion proceeds without the laser by keeping
the laser off while monitoring the ion current flow under a constant
applied voltage (300 mV) typically used in translocation measurements.
Over the course of >10 min, we did not observe any change in the
ion
current (n = 3), hence ruling out the possibility
of purely electrically driven pore expansion. In contrast, when short
laser pulses are applied, we observe larger spikes in the measured
ion current. Presumably, the localized laser induces the creation
of electron–hole pairs, but the different mobilities of two
carriers generate a local electromotive force (EMF) in the radial
direction (Dember effect) that acts as a battery leading to the observed
current spikes.[36] Moreover, the local and
transient charging of the nanopore interfaces facilitates the process
of photochemical etching of the SiN and
the controlled enlargement of the nanopore, which would be otherwise
too abrupt to finely control.
Conclusions
With
the rapid growth of nanopore sensing in basic life sciences
and in clinical diagnostics applications, there is an unmet need for
a fast, highly deterministic, and broadly accessible nanopore fabrication
method. Laser-based nanopore drilling is a promising technique for
fast in situ nanoscale material etching in buffered
aqueous solutions. Sophisticated devices for biomolecule sensing applications
may involve the integration of the nanopore sensor in fluidic chambers
used for sample preparation and delivery. Hence, the flexibility of
forming the pore at the desired destination location using a focused
laser beam is of high practical value.[37] A general outstanding issue of many of the nanopore drilling methods
has been the method’s ability to rapidly and reproducibly deliver
the desired pore size without user intervention. To accomplish this
goal, effective and real-time feedback indicators such as the nanopore
ion current and PL intensity can be implemented to ensure a high probability
convergence of the process to the set values. To that end, the LD
process offers sufficient versatility as the photon energy, pulse
duration, and environmental conditions such as the buffer pH can be
employed as a wide bandwidth of control values.Here, we have
demonstrated that a multistep control algorithm (called
NLDA), coupled to an electromechanical system, can be realized to
achieve fast and deterministic nanopore fabrication with sizes in
the range of 2.5 to 5 nm, which are useful for sensing DNA and protein
molecules. Notably, our system is not limited to this size range,
and we anticipate that both smaller and larger pores can be created
with minor adjustment to NLDA. Our method has been tested using a
number of different SiN deposition batches
and performed well even when the exact initial membrane thickness
varied significantly. We noticed, however, that exact z-focusing of the beam and mechanical stability of the stage during
the drilling are critical factors that must be preserved to ensure
a high success rate. Despite variability in the overall drilling
time of NLDA (attributed primarily to variable initial physical properties
of the fabricated solid-state free-standing membranes), we noted that
the typical drilling time remained well below 2 min, roughly an order
of magnitude faster than TEM- or CDB-based drilling. Moreover, the
flexibility of forming the nanopore at any specific location along
the membrane in situ presents an additional value
to the method. Future improvements of the LD method may include a
compact apparatus and higher drilling throughput, further paving
the way toward a broad adoption of ssNPs in basic research and industry.
Methods
NLDA Pulse Control
Figure a shows a
set of 10 laser pulses during the
nanopore drilling step, and the resulting nanopore current. The laser
pulses widths are indicated at the top. After each pulse, the laser
is blocked for time tIPD, and the system’s
open-pore current is stabilized and measured. With each successive
pulse, the current is either increased or remains roughly at the same
level. See Table and SI List 1 for the NLDA variable description.
Figure 7
NLDA pulse
control scenarios. (a) Example for pulse intensity (P) and duration (tpulse) modulation.
The 10 pulses demonstrate the differences between “effective
and significant” (green asterisks), “effective but insignificant”
(gold), or “ineffective” (pink). After each two consecutive
ineffective pulses (R = 2), the intensity and the
pulse duration grow by P+ and γ,
respectively. After each effective and significant pulse, the power
and duration are reduced to P0 = 12.8
mW and t0 = 100 ms, respectively. (b)
Interpulse delay duration switching example. The periods between pulses
are modified by the φTH = 1 nA threshold. The first
and second interpulse duration last for τIPDs = 1 s, allowing relatively
fast drilling, whereas the third, which is above φTH, lasts for τIPDl = 2 s, enabling measurement of the current in a precise,
fine-tuning polishing mode.
Table 1
NLDA Inputs and Parameters
input/parameter
notation
description
NLDA inputs
(Set by the user)
P0
Initial laser power
P+
Laser power increment factor
ηTH
Current gradient
threshold
It
Target open-pore current
Optimized parameters
(Should not be changed between batches)
t0
Initial pulse duration
d
Delay before applying the
η condition during the pulse operation
tIPDl
Long interpulse delay
tIPDs
Short interpulse delay
γ
Pulse time geometrical increment
factor
φTH
Polishing threshold
ρTH
Effectiveness threshold
ψTH
Significance threshold
R
Consecutive ineffective
pulses limit
NLDA pulse
control scenarios. (a) Example for pulse intensity (P) and duration (tpulse) modulation.
The 10 pulses demonstrate the differences between “effective
and significant” (green asterisks), “effective but insignificant”
(gold), or “ineffective” (pink). After each two consecutive
ineffective pulses (R = 2), the intensity and the
pulse duration grow by P+ and γ,
respectively. After each effective and significant pulse, the power
and duration are reduced to P0 = 12.8
mW and t0 = 100 ms, respectively. (b)
Interpulse delay duration switching example. The periods between pulses
are modified by the φTH = 1 nA threshold. The first
and second interpulse duration last for τIPDs = 1 s, allowing relatively
fast drilling, whereas the third, which is above φTH, lasts for τIPDl = 2 s, enabling measurement of the current in a precise,
fine-tuning polishing mode.The main control principle implemented in the NLDA involves decision
making based on analysis of the drilling past trajectory (as opposed
to a single data point), performed in real-time by the setPulseParameters
(sPP) function (Supporting Information – SI Algorithm 1). Two parameters control the next pulse characteristics:
the effectiveness and significance of the previous pulse, denoted
ρ and ψ, respectively. These parameters are used to classify
the pulse into one of three categories: “effective and significant”,
“effective but insignificant”, or “ineffective”.
Examples of this classification are shown in Figure a by asterisks (green, gold, and pink, respectively).
The effectiveness parameter, defined as , where and N is the last pulse,
quantifies the change in the current after the last pulse in comparison
to several previous pulses. The R parameter (e.g.., R = 2) determines
the number of previous pulses to be considered and serves as a limit
for consecutive ineffective pulses. The algorithm keeps in memory
the currents of the consecutive ineffective pulses, as μ suggests, and when this number
is crossed, i.e., N > R, the
sPP
function alters tpulse and P to be used in the next pulse. A pulse is assumed to be effective
when the effectiveness parameter meets the threshold condition ρ
≤ ρTH (e.g.., ρTH = 0.8). The significant parameter is defined as ψ
≡ I –
μ, and similarly, a pulse
is considered significant when ψ > ψTH (e.g., ψTH = 1 nA). If a pulse is found
to be effective but insignificant, sPP will keep the same laser intensity
and duration for the next pulse. This occurred after the second pulse
in Figure b, where
207 ms duration was applied in the third pulse as well (note the mild
current level rise between these pulses). On the contrary, consecutive
ineffective pulses will results in increments of these properties,
as in the shift between the fourth and fifth pulses toward the sixth
one, where the duration grows to 249 ms (in this case R = 2). The increment is set by a factor γ (e.g., γ = 1.2) that alters the duration in geometrical growth (i.e., tpulse ← γtpulse), which can result in a steep pulse-duration
increment in cases of long ineffective pulse series. On the other
hand, the intensity grows in a linear manner (i.e., P ← P + P+, where P+ is the power increment
factor with units of % measured from the maximum laser power, e.g., P+ = 1%), to keep mild steps of power over the
duration geometrical growth. Notice that the seventh and tenth pulses
are considered ineffective despite the observable growth in the current
level, which is a result of the ratio definition of ρ. Accordingly,
at higher current levels the threshold becomes much less permissive.
This causes a linear increase in the intensity when the pore is already
open yet has not reached its final targeted size. Thus, it usually
happens at the beginning of an ineffective series when the duration
geometrical increment is still at its short negligible period (mild
increments). Such behavior is found to be beneficial to the polishing
stage. This incremental behavior ceases when a significant pulse appears.
Then, the significance parameter ψ crosses a threshold value
(ψ > ψTH), which causes the duration and
intensity
to be restored back to their initial low values (e.g., P0 = 14.4 mW and t0 = 100 ms)
and ensure pulsing in a fine-tuning mode. This is demonstrated in Figure a, where a significant
current rise following the sixth pulse is considered, resulting in
the shortening of the seventh pulse back to 100 ms. This behavior
of substantial pore expansion is often visible in the transition between
the drilling and polishing stages,
as demonstrated in Figure c, where the pulses are becoming weaker and shorter. Note
that Figure a represents
only an example taken from a specific experiment, where in fact each
of the experiments results in a different trajectory of pulses with
diversity of durations and intensities, according to the initial conditions.Another performance that the NLDA alters is the duration of tIPD, i.e., how much time the algorithm waits
before sampling I. This
simple yet important distinction sets the threshold between the drilling and polishing modes. By passing
the “polishing threshold” φTH, an optimized
parameter defined with an absolute current level, the NLDA switches
between two tIPD values: short tIPDs and long tIPDl for drilling and polishing, respectively. In this way, the NLDA alternates
between two types of behaviors: the short interpulse delay allows
the overall process to run faster, whereas the long interpulse delay
permits a more precise measurement of the ion current I, after waiting the extended time. This might alternate several times
in different manners during each specific pulse trajectory, but it
usually will end with a series of consecutive polishing pulsing, as Figure c suggests. Figure b displays the transition
section between drilling and polishing triggered by crossing the threshold φTH = 1 nA
and the resulting doubling of tIPD from
1 to 2 s between the second and third pulses.
Membrane Fabrication and
Device Assembly
Four-inch
∼350-μm-thick silicon wafers were coated by LPCVD with
layers of ∼500 nm silicon dioxide (SiO2) and ∼50
nm SiN from both sides. The SiN refractive index was measured by ellipsometry (FS-1,
Film sense) and confirmed to be n = 2.29 ± 0.01.
Each wafer was spin-coated with a photoresist (AZ1518, Micro chemicals)
applied by direct photolithography with a custom window-pattern mask
(written with Microwriter ML3, Durham Magneto Optics Ltd.), and finally
developed (5035S, Novo). Then, the first SiN layer was etched and removed by reactive ion etching (RIE,
diener electronic PCCE machine). The exposed SiO2 was dissolved
with buffered oxide etch (BOE) to complete the hard mask. Then, KOH
was used to etch the Si layer all the way through for 19 h @ 57 °C
in a custom-built bath for maintaining the temperature and flow in
the solution. Another BOE etching was applied to remove the second
SiO2 layer, resulting in a ∼50 nm SiN free-standing membrane. For the TiO2 samples,
the membrane was coated using atomic layer deposition (ALD) according
to the manufacturer’s recipe (GEMStar XT) to obtain a 10 nm
layer (applied before the KOH step).Each chip is mounted onto
a Teflon holder by PDMS, which is used to isolate the two chip sides.
The holder is placed in a Teflon cell to form two chambers of separated
aqueous solution. A custom seating is installed above the objective
to hold the Teflon cell, where its bottom side is glued to a thin
glass cover slide that allows the laser to be focused on the chip
through the aqueous solution.
Optical Setup
A custom-made confocal setup was used
for the NLDA as described in Figure a. The excitation path includes the Toptica iBeam smart
lasers (488 or 405 nm, including cleanup filters) and Thorlabs neutral
density filters and mirrors. All are directed through a Zeiss Axiovert
200M microscope frame into a Zeiss Apochromat water objective (NA
= 1.15, 63×) which focuses the laser into a diffraction-limited
spot. In the emission path, the fluorescence and reflected laser from
the sample are collected by the same objective, where a Semrock dichroic
mirror of 405 nm (Di01-R405/488/532/635–25×36), and 430
or 488 nm (laser dependent) long-pass filter (FF01-430 or -496/LP-25)
are used to selectively capture the PL and measure it by an Andor
Zyla 4.2 sCOMS camera (PL images are sampled at 33.33 Hz). The laser
intensity was measured by a Thorlabs power meter before the objective
lens. A PI P-561 piezo stage controlled by an E-710 controller is
installed above the objective and is used to move the nanopore device
in submicrometer steps laterally and axially. An Axon Axopatch 200B
amplifier is used to measure the electrical current (sampled at 125
kHz) and apply voltage across the membrane. All the instruments and
devices are controlled by a custom LabVIEW software, connected through
serial connections and/or digital/analog input and outputs of NI PCI-6602
and NI PCI-6154.
Aqueous Solution Preparation
Drilling-only
experiments
were performed in a salt solution containing 1 M KCl and 0.02 M sodium
bicarbonate-based buffer (18:22 ratio of sodium bicarbonate and sodium
carbonate) titrated to pH 10. For in situ translocation
experiments, 173 μM sodium-dodecyl sulfate (SDS) was added to
the buffer.
TEM Imaging and EDS Analysis
EM Imaging: High-resolution images were acquired with an
FEI Titan Themis Cs-Correct
HR-S/TEM. The low loss energy spectrum was measured in scanning transmission
electron microscopy (STEM) in increments of 20 nm and was used to
automatically generate relative thickness maps using Digital Micrograph
software (Gatan). Composition Analysis: Chemical
mapping of the SiNx membranes was performed using EDS (Dual Bruker
XFlash6) and STEM based on core-loss EELS. The EDS quantification
was done using Velox (Thermo Fisher) and EELS quantification was done
using the Digital Micrograph software (Gatan).
Signal and Image Processing
All post-processing of
the LD experiments and image processing during laser focusing were
computed with a custom Matlab (Mathworks) code, as described in the Supporting Information Section II. All graphs
were plotted and fitted in IgorPro (Wavemetrics).
Software Programming
Control and automation software
including the NLDA algorithm (SI Algorithm 1) was programmed in LabVIEW
(National Instruments).
Sample Preparation
The protein sample
was prepared
at high concentration which was further diluted by 100-fold for the
nanopore experiment. For preparing a denatured protein sample, a standard
protocol was followed: 10 μg/mL of the carbonic anhydrase protein
was dissolved into 1 M PBS buffer. To disrupt the disulfide interaction
of the cysteine residue, 5 mM of TCEP was added to the reaction mixture.
350 μM of ionic surfactant SDS, which is used for protein denaturation
in combination with heat, was also added to the reaction mixture.
The reaction was allowed to shake for 30 min at 25 °C and 300
rpm. Furthermore, to denature the protein, the reaction mixture was
heated at 90 °C for 5 min. The reaction was allowed to cool again
to room temperature before it was added to the nanopore device cis chamber for the experiment.
Numerical Simulations
Numerical simulations were conducted via Comsol
Multiphysics (Comsol Inc.) to solve the Nernst–Planck–Poisson
equations in a finite element method. See the Supporting Information for comprehensive details.