| Literature DB >> 34078889 |
Myoung-Woo Yoo1, J Tornos2, A Sander1, Ling-Fang Lin3,4, Narayan Mohanta5, A Peralta2, D Sanchez-Manzano2, F Gallego2, D Haskel6, J W Freeland6, D J Keavney6, Y Choi6, J Strempfer6, X Wang7, M Cabero8,9, Hari Babu Vasili10, Manuel Valvidares10, G Sanchez-Santolino2, J M Gonzalez-Calbet9,11, A Rivera2, C Leon2, S Rosenkranz12, M Bibes1, A Barthelemy1, A Anane1, Elbio Dagotto3,5, S Okamoto5, S G E Te Velthuis12, J Santamaria13, Javier E Villegas1.
Abstract
The anomalous Hall effect (AHE) is an intriguing transport phenomenon occurring typically in ferromagnets as a consequence of broken time reversal symmetry and spin-orbit interaction. It can be caused by two microscopically distinct mechanisms, namely, by skew or side-jump scattering due to chiral features of the disorder scattering, or by an intrinsic contribution directly linked to the topological properties of the Bloch states. Here we show that the AHE can be artificially engineered in materials in which it is originally absent by combining the effects of symmetry breaking, spin orbit interaction and proximity-induced magnetism. In particular, we find a strikingly large AHE that emerges at the interface between a ferromagnetic manganite (La0.7Sr0.3MnO3) and a semimetallic iridate (SrIrO3). It is intrinsic and originates in the proximity-induced magnetism present in the narrow bands of strong spin-orbit coupling material SrIrO3, which yields values of anomalous Hall conductivity and Hall angle as high as those observed in bulk transition-metal ferromagnets. These results demonstrate the interplay between correlated electron physics and topological phenomena at interfaces between 3d ferromagnets and strong spin-orbit coupling 5d oxides and trace an exciting path towards future topological spintronics at oxide interfaces.Entities:
Year: 2021 PMID: 34078889 PMCID: PMC8172877 DOI: 10.1038/s41467-021-23489-y
Source DB: PubMed Journal: Nat Commun ISSN: 2041-1723 Impact factor: 14.919
Fig. 1Structure and chemistry of the interfaces.
a Low magnification HAADF image of an LSMO (15 nm)/SIO (4.4 nm) sample. b High-resolution image of the [110] [001] SIO/LSMO interface. c High-resolution image of the [010] [001] LSMO (2.4 nm)/SIO (3 nm) interface and corresponding normalized intensity profile of the Mn L2,3 (green symbols), La M4,5 (blue symbols), and Ir M4,5 (red symbols) and Sr L2,3 (black symbols), of an EELS line scan acquired across the LSMO/SIO/STO interfaces.
Fig. 2Hall effect measurement and analysis.
a Transverse Hall resistivity vs. out of the plane magnetic field, H, (black lines) of La0.7Sr0.3MnO3 25.3 nm (upper panel) and SrIrO3 4.6 ± 1.1 nm (middle panel) thin films and an LSMO (26.1 nm)/SIO(4.9 nm) bilayer (lower panel) measured at T = 100 K. Ordinary Hall resistivity (blue lines) and anomalous Hall resistivity, (red lines) have been separated. indicates the value of at magnetic saturation (green arrow) b vs. of La0.7Sr0.3MnO3/SrIrO3 bilayers for different thicknesses of SrIrO3 (symbols). and are measured at T = 20, 35, 50, 65, 80, and 100 K for each . Lines are linear fits to Eq. 1c AHE conductivity, , vs. thickness of the SrIrO3 layer, of bilayer samples. The symbols are experimental values of the Hall conductivity obtained from linear fitting curves in Fig. 2b. The gray solid line indicates the calculated using a bilayer model (Eq. 3). To calculate , we use = 27.3 nm which is the average value of of the different samples. The red dashed line is the calculated using a trilayer model (Eq. 4). For the calculation, = 2 nm and are chosen. d Sketch illustrating the bilayer and the trilayer models used to fit Hall data (see text). e Calculated AHE conductivity of the interface layer, , as a function of using Eq. 5. For the calculation, we used = 2 nm based on the XMCD measurements. The red dashed line indicate which is a mean value when > 2 nm.
Fig. 3X-ray absorption spectroscopy.
a Ir L2,3 XAS (black lines) and XMCD (blue lines) PFY spectra measured at T = 20 K under a saturating magnetic field of 55.6 mT applied in the [100] direction of a sample SrTiO3(100)//SrIrO3 (4 nm)/La0.7Sr0.3MnO3 (5 nm). Inset: L3 Ir hysteresis loop measured at T = 20 K and E = 11.217 keV with in-plane magnetic fields along with the [100] (magenta open squares) and [110] (green circles) directions, measured from the fluorescence and X-ray reflectivity intensities, respectively. b Mn XAS absorption spectra (black line) and XMCD (blue line) measured in the TEY mode at T = 50 K at remanence after saturating in a 280 mT magnetic field applied in the [110] direction. c XMCD intensities for samples STO//SIO(d)/LSMO(5 nm) at the Ir L3 edge. For = 1.2 nm and 7 nm, T = 10 K and = 60 mT. For = 4 nm, two nominally identical samples were measured, at various temperatures (20 K and 2 K) and magnetic fields (55.6 mT, 0.5 T). The intensity was independent of the magnetic field applied. The peak intensity at 2 K is higher than those at 20 K. Inset: Normalized XAS intensity. d The ratio between measured XMCD peak intensities of samples with larger SIO thicknesses and the peak intensity of the sample with the thinnest SIO = 1.2 nm as a function of SIO thickness.
Fig. 4Theoretical analysis.
a Intrinsic AH conductivity (a) as a function of the Fermi level with several values of spin polarization and (b) as a function of with several values of . 2D plot of the Berry curvature for (c) at and , (d) at and , (e) at eV and , and (f) at eV and . is the spin-up (down) electron density per Ir site.