| Literature DB >> 33927216 |
Sara M Franzén1,2, Magdalena Tasić3, Christian B M Poulie3, Martin H Magnusson1,2, Daniel Strand4, Maria E Messing5,6.
Abstract
The stability of nanoparticles and their supports are critical, but poorly understood, parameters for applications of such systems in liquid environments. Here we develop an approach to systematically investigate the stability of aerosol-generated nanoparticles after exposure to commonly used solvents using a combination of identical location-SEM and density/size analysis. We demonstrate that the choice of solvent needs to be carefully matched with both the particle and support materials. We show that thermal annealing significantly increases the adhesion of the particles and expands the scope of applications in aqueous media and for biological applications. The results clarify combinations of inorganic nanoparticles on oxide and semiconductor supports with solvents and environmental conditions that give sufficient stability. Combined, the presented methods should be of value in investigating the stability of nanoparticle systems after exposure to solvent and can be used for future developments of high-performing supported aerosol-generated nanoparticles for solvent-based applications.Entities:
Year: 2021 PMID: 33927216 PMCID: PMC8085219 DOI: 10.1038/s41598-021-88510-2
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Schematics and SEM images showing the supported nanoparticles (a) before treatment, as well as the possible outcomes when exposed to solvent under varying conditions; (b) good stability; (c) clustered nanoparticles due to nanoparticle movement; and (d) etched nanoparticles.
Figure 2HRTEM image of aerosol-generated nano-particles: (a) gold nanoparticle; (b) palladium nanoparticle.
Screening of the stability of AuNP/Si supports in different solvents, with and without the addition of base/acida,b.
aGeneral procedure: A nanoparticle support was immersed into 1 mL solvent or 1 mL solvent and 0.05 mM triethylamine (Et3N) or 1 mL solvent and 0.05 mM benzoic acid (BzOH) for 24 h at room temperature or slightly below the boiling temperature of the respective solvent or to a maximum of 95 °C.
bQualitative assessment: —good stability, no movement or etching of nanoparticles; ○—minor movement of nanoparticles; —major movement of nanoparticles; —etched nanoparticles; grey—not tested. Each entry is based on reference images with a total area of 18 μm2 (~ 360 nanoparticles) per sample and at least two independent experiments.
*Taken from reference[42].
Screening of the stability of supported nanoparticles in a selection of solvents when changing the material of the nanoparticles or the support. In selected cases with the addition of base/acida,b.
aGeneral experimental: Nanoparticle supports immersed into 1 mL solvent or 1 mL solvent and 0.05 mM Et3N or 1 mL solvent and 0.05 mM BzOH for 24 h at room temperature or slightly below the boiling temperature of the solvent (maximum 95 °C).
b —good stability; ○—minor movement of nanoparticles; —major movement of nanoparticles; —etched nanoparticles; —etched surface; grey—not tested. Each entry is based on reference images with a total area of 18 μm2 (~ 360 nanoparticles) per support and at least two independent experiments.
Figure 3Representative IL-SEM images of AuNP/Si supports (a) before and (b) after treatment in room temperature H2O, (c) before and (d) after treatment in 95 °C H2O and (e) before and (f) after treatment in room temperature acetonitrile. The arrows mark examples of changes in the images before and after exposure to the solvent. The presence of additional nanoparticles in (b) and the absence of a few nanoparticles in (d) indicate minor movement of the nanoparticles. The decreased size of the particles in (f) compared to in (e) indicates that the nanoparticle has been etched.
Figure 4PdNP/Si chip (a) before and (b) after treatment in 95 °C dioxane. Clustering of nanoparticles into small, compact agglomerates. AuNP/GaP chip (c) before and (d) after treatment at 95 °C in H2O. Significant etching of the surface, resulting in the complete removal of the nanoparticles from the support. GaP chip without nanoparticles (e) before and (f) after treatment at 95 °C in H2O.