| Literature DB >> 32722625 |
Chaker Fares1, Shu-Min Hsu2, Minghan Xian1, Xinyi Xia2, Fan Ren1, John J Mecholsky3, Luiz Gonzaga4, Josephine Esquivel-Upshaw2.
Abstract
To mitigate the corrosion of titanium implants and improve implant longevity, we investigated the capability to coat titanium implants with SiC and determined if the coating could remain intact after simulated implant placement. Titanium disks and titanium implants were coated with SiC using plasma-enhanced chemical vapor deposition (PECVD) and were examined for interface quality, chemical composition, and coating robustness. SiC-coated titanium implants were torqued into a Poly(methyl methacrylate) (PMMA) block to simulate clinical implant placement followed by energy dispersive spectroscopy to determine if the coating remained intact. After torquing, the atomic concentration of the detectable elements (silicon, carbon, oxygen, titanium, and aluminum) remained relatively unchanged, with the variation staying within the detection limits of the Energy Dispersive Spectroscopy (EDS) tool. In conclusion, plasma-enhanced chemical vapor deposited SiC was shown to conformably coat titanium implant surfaces and remain intact after torquing the coated implants into a material with a similar hardness to human bone mass.Entities:
Keywords: biomaterials; coating; dentistry; implant
Year: 2020 PMID: 32722625 PMCID: PMC7435394 DOI: 10.3390/ma13153321
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1Schematic process of how the SiC-coated titanium implants were torqued into acrylic blocks to simulate implant placement.
Figure 2Low-resolution (a) and high-resolution (b) SEM images of a SiC-coated titanium disk after exposing the SiC/Ti interface.
Figure 3FTIR spectrum taken of SiC on Ti deposited by plasma-enhanced chemical vapor deposition.
Figure 4XPS survey scans of SiC on Ti deposited by plasma-enhanced chemical vapor deposition.
Atomic concentration determined by X-ray photoelectron spectroscopy for the SiC-coated titanium disks before and after ion etching.
| Element | No Ion Etching (At %) | After Ion Etching for 2 min (At %) |
|---|---|---|
| Carbon | 51 | 49 |
| Silicon | 38 | 48 |
| Oxygen | 9 | 3 |
| Nitrogen | 2 | <1 |
Figure 5Atomic force microscopy scans comparing the surface roughness of (a) uncoated vs. (b) SiC-coated substrates.
Figure 6Scanning electron microscope images of a SiC-coated titanium implant at various magnifications. Image (a) shows the overall surface of the implant, whereas images (b–d) show detailed images of the implant surface morphology at increasing magnifications.
Figure 7Surface composition of a SiC-coated titanium implant measured using energy dispersive spectroscopy. Images (a–d) were taken of the SiC-coated implant directly after fabrication, whereas images (e–h) were taken after torquing into an acrylic block used to simulate clinical implant placement.
Atomic concentration determined by energy dispersive spectroscopy for the SiC-coated titanium implants before and after torquing.
| Element | As Deposited (At %) | After Torquing (At %) |
|---|---|---|
| Carbon | 46 | 49 |
| Silicon | 37 | 33 |
| Oxygen | 7 | 9 |
| Titanium | 5 | 5 |
| Aluminum | 5 | 4 |