| Literature DB >> 32603585 |
Wei Zhang1, Fuguo Zhang2, Bo Xu2, Yuanyuan Li3, Linqin Wang2, Biaobiao Zhang2, Yu Guo1, James M Gardner1, Licheng Sun2,4, Lars Kloo1.
Abstract
Despite the ubiquity and importance of organic hole-transport materials in photovoltaic devices, their intrinsic low conductivity remains a drawback. Thus, chemical doping is an indispensable solution to this drawback and is essentially always required. The most widely used p-type dopant, FK209, is a cobalt coordination complex. By reducing Co(III) to Co(II), Spiro-OMeTAD becomes partially oxidized, and the film conductivity is initially increased. In order to further increase the conductivity, the hygroscopic co-dopant LiTFSI is typically needed. However, lithium salts are normally quite hygroscopic, and thus, water absorption has been suggested as a significant reason for perovskite degradation and therefore limited device stability. In this work, we report a LiTFSI-free doping process by applying organic salts in relatively high amounts. The film conductivity and morphology have been studied at different doping amounts. The resulting solar cell devices show comparable power conversion efficiencies to those based on conventional LiTFSI-doped Spiro-OMeTAD but show considerably better long-term device stability in an ambient atmosphere.Entities:
Keywords: LiTFSI-free; hole-transport material; organic salt; p-type dopant; perovskite solar cell; stability
Year: 2020 PMID: 32603585 PMCID: PMC7467566 DOI: 10.1021/acsami.0c08322
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229
Figure 1Molecular structures of (MeO-TPD)TFSI, (TBD)TFSI, Spiro(TFSI)2, and their reactivity with respect to Spiro-OMeTAD.
Figure 2(a) EPR spectra of (MeO-TPD)TFSI and (TBD)TFSI. UV–vis spectra from (b) (MeO-TPD)TFSI as the dopant for Spiro-OMeTAD, (c) (TBD)TFSI as the dopant for Spiro-OMeTAD, and (d) (MeO-TPD)TFSI and (TBD)TFSI. All spectra were recorded from an acetonitrile solution.
Figure 3(a) Current response of Spiro-OMeTAD thin films doped with (MeO-TPD)TFSI under different applied voltages. (b) Conductivity of Spiro-OMeTAD thin films doped by (MeO-TPD)TFSI at different doping levels.
Figure 4Top-down surface SEM images of (a) a bare perovskite surface; (b) a Spiro-OMeTAD film doped by a 3% molar ratio of FK209 (reference); a Spiro-OMeTAD film doped by (MeO-TPD)TFSI at (c) 0, (d) 10, (e) 20, (f) 30, and (g) 40% molar ratios; (h) Spiro-OMeTAD film doped with a 30% molar ratio of FK209.
Figure 5(a) J–V curves, (b) Steady-state output of photovoltaic champion devices based on the dopant Spiro(TFSI)2 (blue squares), the dopant (MeO-TPD)TFSI (red circles), and the reference cells (yellow triangles). (c) Incident photon-to-electron conversion efficiency (IPCE) of champion devices doped by (MeO-TPD)TFSI.
Photovoltaic Parameters of Devices Based on (MeO-TPD)TFSI, Spiro(TFSI)2, and the Reference Cella
| FF | η (%) | |||
|---|---|---|---|---|
| Spiro+LiTFSI+TBP+FK209 (reference) | 1.08 ± 0.03 (1.10) | 22.6 ± 0.1 (22.8) | 0.74 ± 0.02 (0.76) | 18.1 ± 0.7 (19.1) |
| Spiro+TBP+30% (MeO-TPD)TFSI | 1.07 ± 0.02 (1.08) | 22.6 ± 0.2 (22.8) | 0.74 ± 0.01 (0.75) | 17.9 ± 0.4 (18.6) |
| Spiro+TBP+15% Spiro(TFSI)2 | 1.01 ± 0.04 (1.06) | 22.4 ± 0.3 (22.7) | 0.71 ± 0.03 (0.74) | 16.1 ± 1.0 (17.8) |
All HTLs contain TBP as an additive, and in addition, the reference cell contains LiTFSI as a co-dopant. The fabricated devices are based on SnO2 as the electron transport material and (FA)0.91(MA)0.09Pb(I3)0.91(Br3)0.09 as the active layer. The average data are obtained from 15 devices. The bracketed numbers are from champion cells.
Figure 6(a) Contact-angle measurement of the Spiro-OMeTAD film doped by the reference HTL. (b) Contact-angle measurement of Spiro-OMeTAD films doped by TBP and (MeO-TPD)TFSI at a 30% molar ratio; (c) Normalized ratios between perovskite and lead iodide diffraction peaks from XRD tracking. (d) Stability of device performances.